专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP4167520B2 Microwave dielectric material 有权
公开(公告)号：JP4167520B2
公开(公告)日：2008-10-15
申请号：JP2003081485
申请日：2003-03-24
申请人：大研化学工業株式会社 , 大里齊
发明人：昭雄原田 , 隆大川 , 齊大里 , 宏城岡部
IPC分类号： C04B35/46 , H01B3/12

2. 发明专利

JP5123678B2 Temperature coefficient improvement type microwave dielectric material 有权
标题翻译：空值
公开(公告)号：JP5123678B2
公开(公告)日：2013-01-23
申请号：JP2008015700
申请日：2008-01-26
申请人：大研化学工業株式会社 , 大里齊
发明人：隆大川 , 宏城岡部 , 昭雄原田 , 齊大里
IPC分类号： C04B35/462 , H01B3/12 , H01P7/10
CPC分类号： Y02B60/50
摘要： PROBLEM TO BE SOLVED: To provide an inexpensive and high-performance temperature coefficient-improved microwave dielectric material capable of approximating a temperature coefficient to zero and reducing a calcination temperature. SOLUTION: The microwave dielectric material is characterized by having BaLa 2 Ti 3 O 10 as a temperature improving agent incorporated to a ceramic dielectric composition. Further, the microwave dielectric material is characterized by having colemanite as a calcination temperature reducing agent incorporated into a ceramic dielectric composition. When selecting a homologous material of A x R 4 Ti 3+x O 12+3x for a principal constituent (where A is an alkali earth metal element, R is a rare earth element, and the composition ratio X is within the range expressed by 0.5 COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种廉价且高性能的温度系数改进的微波介电材料，其能够将温度系数近似为零并降低煅烧温度。解决方案：微波介电材料的特征在于具有掺入陶瓷电介质中的温度改进剂的BaLa 2 Ti O 10 组成。此外，微波介电材料的特征在于将钙质石棉作为掺入陶瓷电介质组合物中的煅烧温度降低剂。当为主要成分选择A x R 4 Ti 3 + x O 12 + 3x （其中A为碱土金属元素，R为稀土元素，组成比X为0.5

3. 发明专利

JPWO2003016237A1 マイクロ波誘電体複合組成物审中-公开
公开(公告)号：JPWO2003016237A1
公开(公告)日：2004-12-02
申请号：JP2003521166
申请日：2002-07-04
申请人：大里齊 , 齊大里 , 大研化学工業株式会社
发明人：大里　齊 , 齊大里 , 原田　昭雄 , 昭雄原田 , 大川　隆 , 大川　　隆 , 岡部　宏城 , 宏城岡部
IPC分类号： C04B35/46 , C01G23/00 , C01G25/00 , C04B35/462 , C04B35/638 , H01B3/12 , H01P7/10 , H05K1/03
CPC分类号： C04B35/462 , C01P2002/34 , C01P2002/50 , C01P2002/77 , C01P2004/61 , C01P2004/62 , C04B35/6262 , C04B35/62695 , C04B35/638 , C04B2235/3206 , C04B2235/3213 , C04B2235/3215 , C04B2235/3217 , C04B2235/3224 , C04B2235/3225 , C04B2235/3227 , C04B2235/3244 , C04B2235/3293 , C04B2235/3418 , C04B2235/604 , C04B2235/768 , H05K1/0306
摘要： BanLa4Ti3+nO12+3nからなる誘電体において、BaやLaやTiに他の元素を一部置換して複合本を形成し、多様で良質なマイクロ波誘電体複合組成物を開発する。その第1発明であるマイクロ波誘電体複合組成物は、(Ba1−xAx)nLa4Ti3+nO12+3n(AはBa以外のアルカリ土類金属元素、0.5

4. 发明专利

JP4658506B2 Pulse arc plasma generation power supply circuit and pulse arc plasma processing apparatus 有权
公开(公告)号：JP4658506B2
公开(公告)日：2011-03-23
申请号：JP2004102452
申请日：2004-03-31
申请人：大研化学工業株式会社 , 株式会社栗田製作所 , 浩史滝川
发明人：昭雄原田 , 浩史滝川 , 芳実西村
IPC分类号： H05H1/46 , H01L21/304 , H05H1/30 , H05H1/36
CPC分类号： H05H1/36 , H05H1/48
摘要： A power supply circuit for plasma generation by which a large quantity of generated plasma can be smoothly obtained without increasing the sizes of an apparatus, a plasma generating apparatus, a plasma processing apparatus which can process a large quantity of objects to be processed at a low cost by using the plasma generating apparatus, and plasma processed objects having target quantities are realized. An electric discharge generating electrode is composed of two or more first electrodes and one or more second electrodes. An LC series circuit is provided by connecting a capacitor C and a coil L in series between one of outputs of an alternating high voltage generating circuit which generates an alternating high voltage to be applied between the electrodes of electric discharge generating electrode, and the first electrode. When electricity is discharged in one of the electrode pair, voltage drop is suppressed by the coil even when the electric discharge of capacitor progresses, and since electric discharge from the other electrode pair is induced without being disturbed, a large quantity of plasma can be smoothly generated by common use of the alternating high voltage generating circuit.

5. 发明专利

JP4630021B2 Spinel-type lithium manganese oxide powder, a method of manufacturing the same, electrode and lithium-based secondary battery 有权
标题翻译：空值
公开(公告)号：JP4630021B2
公开(公告)日：2011-02-09
申请号：JP2004246189
申请日：2004-08-26
申请人：大研化学工業株式会社
发明人：昭雄原田 , 隆大川 , 仁愛清
IPC分类号： H01M4/505 , C01G45/00 , H01M4/02 , H01M10/05
CPC分类号： Y02P70/54

6. 发明专利

JP4378073B2 Method of manufacturing a patterning method and ceramic electronic components using the same metal particles 有权
公开(公告)号：JP4378073B2
公开(公告)日：2009-12-02
申请号：JP2002227796
申请日：2002-08-05
申请人：大研化学工業株式会社 , 邦仁河本
发明人：昭雄原田 , 佳丈増田 , 邦仁河本
IPC分类号： C04B35/00 , C04B35/495 , H01G4/12 , H01G4/30
摘要： PROBLEM TO BE SOLVED: To develop a pattering method for arranging metallic particles into a desired pattern on the surface of an object and in particular to provide a method of manufacturing a ceramic electronic component with a base metal material. SOLUTION: The method of patterning the metallic particles is performed by forming a self-organizing film by combining a 1st functional group 4 to the surface of the object by self-organization, forming a template film 10 having a desired pattern by using the 1st functional group 4 remaining after the unnecessary portion of the 1st functional group 4 is removed from the self-organizing film by lithographic method, forming a 2nd functional group modified particles 17 obtained by chemically combining a 2nd functional group 18 to the metallic particle 16 and forming the metallic particle patterning film 20 having the pattern form by combining the 2nd functional group modified particles 17 onto the template film 10 by using the chemical bond or electrostatic bond between the functional groups. The metallic particle patterning film having about 1 μm precision is easily and firmly formed by the lithographic technique using photomasks or laser beams, etc. COPYRIGHT: (C)2004,JPO

7. 发明专利

JP4364782B2 Boron-based composite metal fine particles, its preparation and a conductive paste 有权
公开(公告)号：JP4364782B2
公开(公告)日：2009-11-18
申请号：JP2004365458
申请日：2004-12-17
申请人：大研化学工業株式会社
发明人：昭雄原田 , 禎治櫻内
IPC分类号： B22F1/02 , B22F9/02 , H01B1/00 , H01B1/22

8. 发明专利

JP3536924B2 Paste uniform coating apparatus 失效
公开(公告)号：JP3536924B2
公开(公告)日：2004-06-14
申请号：JP56026099
申请日：1998-06-03
申请人：大研化学工業株式会社
发明人：昭雄原田 , 毅西
IPC分类号： B05B13/06 , B05C7/00 , C23C10/30 , C23C24/08
CPC分类号： C23C24/087 , B05B13/0645 , B05C7/00 , C23C10/30

9. 发明专利

JP5244326B2 Amino acid platinum complex, its production method and the conductor paste 有权
公开(公告)号：JP5244326B2
公开(公告)日：2013-07-24
申请号：JP2007050184
申请日：2007-02-28
申请人：大研化学工業株式会社
发明人：康隆高橋 , 昭雄原田
IPC分类号： C07F15/00 , C07C229/08 , C07C229/76 , H01B1/20

10. 发明专利

JP4658490B2 Electron source and a method of manufacturing the same 有权
公开(公告)号：JP4658490B2
公开(公告)日：2011-03-23
申请号：JP2004050852
申请日：2004-02-26
申请人：喜萬中山 , 大研化学工業株式会社
发明人：喜萬中山 , 昭雄原田 , 隆大川 , 重宣山中
IPC分类号： H01J1/304 , H01J37/073 , H01J9/02
CPC分类号： H01J2237/06316

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式