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1. 发明专利

JP5637013B2 トリクロロシラン製造装置及び製造方法有权
公开(公告)号：JP5637013B2
公开(公告)日：2014-12-10
申请号：JP2011045184
申请日：2011-03-02
申请人：三菱マテリアル株式会社
发明人：政美三宅 , 政美三宅 , 斎木　渉 , 渉斎木
IPC分类号： C01B33/107
CPC分类号： B01J19/243 , B01J2219/00135 , B01J2219/00155 , C01B33/1071

2. 发明专利

JP5494534B2 Trichlorosilane manufacturing equipment 有权
公开(公告)号：JP5494534B2
公开(公告)日：2014-05-14
申请号：JP2011056103
申请日：2011-03-15
申请人：三菱マテリアル株式会社
发明人：一樹水嶋 , 渉斎木 , 直也村上 , 政美三宅
IPC分类号： C01B33/107
CPC分类号： B01J19/243 , B01J2219/00135 , B01J2219/00155 , B01J2219/1928 , C01B33/1071

3. 发明专利

JP5397580B2 The method of manufacturing a manufacturing method and a manufacturing apparatus and a polycrystalline silicon trichlorosilane 有权
公开(公告)号：JP5397580B2
公开(公告)日：2014-01-22
申请号：JP2008127143
申请日：2008-05-14
申请人：三菱マテリアル株式会社
发明人：渉斎木 , 一樹水嶋 , 誠漆原
IPC分类号： C01B33/107 , C01B33/02
CPC分类号： C01B33/1071 , C01B33/027
摘要： A method of manufacturing trichlorosilane includes a conversion reaction process (first reaction process) for producing a first reaction product gas, which contains trichlorosilane, dichlorosilylene, hydrogen chloride, and high-order silane compounds, by performing a conversion reaction of silicon tetrachloride and hydrogen, which are raw materials, in a first temperature range that is equal to or higher than 1000°C and equal to or lower than 1900°C; a first cooling process for cooling the first reaction product gas to a temperature of 950°C or lower within 1 sec (except that the first reaction product gas is cooled to a temperature lower than 600°C within 0.01 sec); a second reaction process for maintaining the temperature of the first reaction product gas in a second temperature range, which is equal to or higher than 600°C and equal to or lower than 950°C, during the time that is equal to or more than 0.01 sec and equal to or less than 5 sec; and a second cooling process for cooling a second reaction product gas, which has been subjected to the second reaction process, to a temperature lower than 600°C.

4. 发明专利

JP5633375B2 トリクロロシラン製造装置有权
标题翻译：为三氯硅烷制造装置
公开(公告)号：JP5633375B2
公开(公告)日：2014-12-03
申请号：JP2011001837
申请日：2011-01-07
申请人：三菱マテリアル株式会社
发明人：村上　直也 , 直也村上 , 斎木　渉 , 渉斎木
IPC分类号： C01B33/107

5. 发明专利

JP5482687B2 Trichlorosilane manufacturing apparatus and method for manufacturing 有权
公开(公告)号：JP5482687B2
公开(公告)日：2014-05-07
申请号：JP2011029307
申请日：2011-02-15
申请人：三菱マテリアル株式会社
发明人：直也村上 , 渉斎木
IPC分类号： C01B33/107
CPC分类号： B01J19/006 , B01J19/243 , B01J2219/00135 , B01J2219/00155 , B01J2219/00768 , B01J2219/185 , B01J2219/1943 , C01B33/10731

6. 发明专利

JP5633160B2 トリクロロシランの製造装置有权
标题翻译：装置三氯硅烷制造
公开(公告)号：JP5633160B2
公开(公告)日：2014-12-03
申请号：JP2010050383
申请日：2010-03-08
申请人：三菱マテリアル株式会社
发明人：斎木　渉 , 渉斎木 , アクベイタナー , アクベイタナー
IPC分类号： C01B33/107
CPC分类号： C01B33/1071 , B01J19/002 , B01J2219/0006 , B01J2219/00108 , B01J2219/00123 , B01J2219/00186 , B01J2219/00204 , B01J2219/00238 , B01J2219/00254

7. 发明专利

JP5392488B2 Manufacturing methods and uses of trichlorosilane 有权
公开(公告)号：JP5392488B2
公开(公告)日：2014-01-22
申请号：JP2009243152
申请日：2009-10-22
申请人：三菱マテリアル株式会社
发明人：渉斎木 , 一樹水嶋
IPC分类号： C01B33/107 , C01B33/035

8. 发明专利

JP5333725B2 Manufacturing method and the method of using the trichlorosilane 有权
公开(公告)号：JP5333725B2
公开(公告)日：2013-11-06
申请号：JP2008280591
申请日：2008-10-30
申请人：三菱マテリアル株式会社
发明人：渉斎木 , 一樹水嶋
IPC分类号： C01B33/107
摘要： PROBLEM TO BE SOLVED: To provide a method for producing trichlorosilane which effectively inhibits decomposition of trichlorosilane and production of polymer, reduces the removing operation load of polymer and has a high recovery ratio of trichlorosilane in a step of cooling gas generated by a conversion reaction step. SOLUTION: The method for producing trichlorosilane comprises subjecting a raw material including tetrachlorosilane and hydrogen to conversion reaction at a temperature of 1,000-1,900°C to form a reaction gas that contains trichlorosilane, dichlorosilylene, hydrogen chloride and higher silane compounds; cooling the reaction gas; and recovering the trichlorosilane, in which the method comprises (A) a first cooling step of cooling the reaction gas drawn from a convertor below 600°C within 0.01 second; (B) an intermediate reaction step of keeping the reaction gas obtained after the first cooling step within a temperature range of 500-950°C for 0.01-5 seconds; and (C) a second cooling step of cooling the reaction gas obtained after the intermediate reaction step to a temperature below 500°C. COPYRIGHT: (C)2010,JPO&INPIT

9. 发明专利

JP4075116B2 Production method and the method of manufacturing nuclear fuel pellets of nuclear fuel particles 失效
公开(公告)号：JP4075116B2
公开(公告)日：2008-04-16
申请号：JP35450997
申请日：1997-12-24
申请人：三菱マテリアル株式会社
发明人：晴雄土屋 , 渉斎木
IPC分类号： G21C3/62 , G21C21/02 , C01G43/025
CPC分类号： Y02E30/38

10. 发明专利

JP5648575B2 多結晶シリコン製造装置有权
标题翻译：多晶硅生产设备
公开(公告)号：JP5648575B2
公开(公告)日：2015-01-07
申请号：JP2011105640
申请日：2011-05-10
申请人：三菱マテリアル株式会社
发明人：隆宮澤 , 隆宮澤 , 斎木　渉 , 渉斎木
IPC分类号： C01B33/035
CPC分类号： C23C16/24 , B01J2219/00085 , B01J2219/00094 , C01B33/035 , C23C16/4411

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