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1. 发明专利

JP2012248641A Release treatment method for nanoimprint and release film 审中-公开
标题翻译：发布NANOIMPRINT和RELEASE膜的处理方法
公开(公告)号：JP2012248641A
公开(公告)日：2012-12-13
申请号：JP2011118531
申请日：2011-05-26
申请人： Hyogo Prefecture , 兵庫県 , Meisho Kiko Kk , 明昌機工株式会社
发明人： MATSUI SHINJI , OKADA MAKOTO , OKAMOTO TOSHIKI
IPC分类号： H01L21/027 , B29C33/42 , B29C33/60 , B29C33/68 , B29C59/02 , B81C99/00
摘要： PROBLEM TO BE SOLVED: To provide a release treatment method which has releasability comparable to that of an F-SAM conventionally used in nanoimprint lithography and is excellent in durability furthermore, and a release film formed by the method.SOLUTION: In a release treatment method, a polydimethylsiloxane (PDMS) thin film is used as a release film provided on a surface of a nanoimprint mold. The polydimethylsiloxane thin film is preferably deposited on the mold surface using a compound in which a silane coupling group is bonded to a terminal on one side of polydimethylsiloxane.
摘要翻译：要解决的问题：提供具有与常规用于纳米压印光刻中的F-SAM相当的释放性的剥离处理方法，此外还具有优异的耐久性，以及通过该方法形成的剥离膜。解决方案：在脱模处理方法中，使用聚二甲基硅氧烷（PDMS）薄膜作为设置在纳米压印模具的表面上的剥离膜。聚二甲基硅氧烷薄膜优选使用其中硅烷偶联基团与聚二甲基硅氧烷的一面上的末端键合的化合物沉积在模具表面上。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2011186092A Alignment control method of polymer liquid crystal 审中-公开
标题翻译：聚合物液晶的对准控制方法
公开(公告)号：JP2011186092A
公开(公告)日：2011-09-22
申请号：JP2010049943
申请日：2010-03-05
申请人： Hyogo Prefecture , Meisho Kiko Kk , 兵庫県 , 明昌機工株式会社
发明人： MATSUI SHINJI , KAWATSUKI YOSHIHIRO , OKADA MAKOTO , OKAMOTO TOSHIKI
IPC分类号： G02F1/1337
摘要： PROBLEM TO BE SOLVED: To provide a method determining alignment in polymer liquid crystal by a simple one-stage process and controlling alignment in a nanometer scale.
SOLUTION: The alignment of the polymer liquid crystal is controlled by nano imprint. For instance, by pressing a mold including a part having a fine pattern of lines and spaces and a part not having the fine pattern to the polymer liquid crystal, a part aligned in a specified direction and a part of random alignment are intentionally arranged and simultaneously formed in the liquid crystal.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供通过简单的一级方法确定聚合物液晶中的取向并以纳米级控制取向的方法。解决方案：聚合物液晶的取向由纳米印记进行控制。例如，通过将具有细线图案和空间的部分的模具和不具有精细图案的部件压到聚合物液晶上，有意地排列并排列与指定方向对齐的部分和随机取向的一部分形成在液晶中。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2010188580A Nano-imprint device 审中-公开
标题翻译：纳米印刷装置
公开(公告)号：JP2010188580A
公开(公告)日：2010-09-02
申请号：JP2009034282
申请日：2009-02-17
申请人： Hyogo Prefecture , Meisho Kiko Kk , 兵庫県 , 明昌機工株式会社
发明人： OKAMOTO TOSHIKI , KATASE TETSUYA , MATSUI SHINJI
IPC分类号： B29C59/02 , B81C99/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a preferable nano-imprint device capable of being inexpensively configured, being efficient, and easily installed even in a small space.
SOLUTION: The nano-imprint device 1 is a device for transferring a fine pattern of a mold on the surface of a workpiece W. The device 1 is provided with a rotary table 10 which can hold the workpieces W respectively at a plurality of holding parts 11 and rotates while stopping respective holding part 11 at a fixed stop angle position. A resin application means 30 to the workpiece W, a heating means 40 for the workpiece W, and a transfer means 60 to the workpiece are disposed around the rotary table 10 so that the order thereof may agree with the rotational direction of the rotary table 10. The device 1 is configured so that a handing over the workpiece can be performed by using a linear motion mechanism among the respective holding parts 11 and those respective means at the stop angle positions.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供能够廉价地构造，即使在小的空间中也是有效的并且容易安装的优选的纳米压印装置。解决方案：纳米压印装置1是用于在工件W的表面上转印模具的精细图案的装置。装置1设置有旋转工作台10，其可以分别将工件W分别保持在多个并且在固定的停止角位置停止相应的保持部11的同时旋转。工件W的树脂施加装置30，工件W的加热装置40和工件的转移装置60设置在转台10的周围，使其顺序与转台10的旋转方向一致装置1构成为能够通过在各个保持部11之间使用直线运动机构和在停止角位置处的各个装置来进行对工件的切换。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2014086100A Manufacturing method and manufacturing apparatus of nano-uneven patter 审中-公开
标题翻译： NANO-UNEVEN PATTER的制造方法和制造设备
公开(公告)号：JP2014086100A
公开(公告)日：2014-05-12
申请号：JP2012232447
申请日：2012-10-20
申请人： Meisho Kiko Kk , 明昌機工株式会社
发明人： OKAMOTO TOSHIKI , KATASE TETSUYA , TAKENAKA YOSHIO , NISHIYAMA NOBUYUKI
IPC分类号： G11B5/84 , C03C17/09 , G11B5/855
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method and a manufacturing apparatus, which can manufacture a nano-uneven pattern including a metallic glass in a short cycle and with hight efficiency.SOLUTION: A manufacturing method for forming a nano-uneven pattern on a metallic glass layer 3 on a substrate 1 includes: heating the metallic glass layer 3 on the substrate 1 by laser irradiation to supercooled liquid temperature range; subjecting the metallic glass layer 3 to nanoimprint using a mould 4 while the metallic glass layer 3 is within the temperature range, thereby forming a fine uneven pattern.
摘要翻译：要解决的问题：提供一种制造方法和制造装置，其可以以短周期和高效率制造包括金属玻璃的纳米不均匀图案。解决方案：一种用于在基板1上的金属玻璃层3包括：通过激光照射将基板1上的金属玻璃层3加热到过冷液体温度范围; 使金属玻璃层3在金属玻璃层3处于温度范围内时，使用模具4进行纳米压印，从而形成微细的凹凸图案。

5. 发明专利

JP2013065723A Nanoimprint method 审中-公开
标题翻译： NANOIMPRINT方法
公开(公告)号：JP2013065723A
公开(公告)日：2013-04-11
申请号：JP2011203825
申请日：2011-09-16
申请人： Hyogo Prefecture , 兵庫県 , Meisho Kiko Kk , 明昌機工株式会社 , Daicel Corp , 株式会社ダイセル
发明人： MATSUI SHINJI , OKADA MAKOTO , OKAMOTO TOSHIKI , YUGAWA TAKAO
IPC分类号： H01L21/027 , B29C59/02
摘要： PROBLEM TO BE SOLVED: To ensure high throughput and low cost of nanoimprint technique by reducing the burden during the manufacture of a mold.SOLUTION: An uncured resist patterned by pressing a mold is patterned by pressing the mold again (once or a plurality of times). In other words, double patterning is performed on the same resist. A resist that can be patterned twice or more before curing is used. In the double patterning, the mold used in the first patterning should be used by changing the position (the position is changed in a range that does not deviate completely from the range where patterning has been performed so far).
摘要翻译：要解决的问题：通过减少模具制造过程中的负担，确保纳米压印技术的高产量和低成本。解决方案：通过压制模具图案化的未固化的抗蚀剂被图案化（一次或多次）。换句话说，对相同的抗蚀剂进行双重图案化。使用可以在固化前图案化两次以上的抗蚀剂。在双重图案化中，通过改变位置（位置在完全不偏离已经进行图案化的范围的范围内变化的位置）应该用于第一图案化中使用的模具。版权所有（C）2013，JPO＆INPIT

6. 发明专利

JP2010080062A Vacuum duct 有权
标题翻译：真空管
公开(公告)号：JP2010080062A
公开(公告)日：2010-04-08
申请号：JP2008243481
申请日：2008-09-24
申请人： Meisho Kiko Kk , Mitsubishi Electric Corp , 三菱電機株式会社 , 明昌機工株式会社
发明人： KIJIMA HIROKO , MASUNO SHINICHI , OBATA JUN , ASHIDA MUNENOBU
IPC分类号： H05H13/04 , H05H7/14
摘要： PROBLEM TO BE SOLVED: To provide a straight line-shape vacuum duct or a deflecting vacuum duct with a deflection angle which has a thin-walled structure and is installed near a deflecting electromagnet in a charged particle beam accelerator having a highly accurate dimensional structure, capable of manufacturing with reduced man-hour and cost. SOLUTION: The vacuum duct 70 is formed to have a predetermined length as it is constructed of a plurality of straight-pipe unit vacuum ducts 75 linearly connected. An elastically deformable arc-shape end part 74 is formed at the end of each unit vacuum duct 75 toward outside of the unit vacuum duct 75, and the arc-shape end parts 74 are butt-welded to each other. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供具有薄壁结构的偏转角的直线形真空管道或偏转真空管道，并且安装在具有高精度的带电粒子束加速器中的偏转电磁体附近尺寸结构，能够减少工时和成本。解决方案：真空管道70形成为具有预定长度，因为其由直线连接的多个直管单元真空管道75构成。在单元真空管75的端部朝向单元真空管75的外侧形成弹性变形的弧形端部74，并且弧形端部74彼此对接。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2014172331A Fine pattern thermal transfer apparatus 有权
标题翻译：精细图案热转印装置
公开(公告)号：JP2014172331A
公开(公告)日：2014-09-22
申请号：JP2013048484
申请日：2013-03-11
申请人： Meisho Kiko Kk , 明昌機工株式会社 , Daikin Ind Ltd , ダイキン工業株式会社
发明人： OKAMOTO TOSHIKI , KATASE TETSUYA , YOSHIZUMI TAKASHI , SATO KAZUYUKI , FUJIWARA AKIHIRO , MATSUURA TETSUYA
IPC分类号： B29C59/04 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a fine pattern thermal transfer apparatus (1) for transferring a pattern to a film (2) by using a thin-film roll die (10) which is improved in transfer accuracy and allows an operation at a high transfer speed.SOLUTION: A film take-out side roller (41) to be hung with a thin-film roll die (10) is composed of a cooling roller (41) provided integrally with a cooling mechanism (40), and there are provided with a main pressure roller (32) which presses a film (2) toward the thin-film roll die (10) between the film take-out side roller (41) and a film introduction side roller (31) and dispersion pressure rollers (96) which press the main pressure roller (32) toward the film introduction side roller (31) at a plurality of positions in the axial direction of the main pressure roller (32).
摘要翻译：要解决的问题：提供一种精细图案传热装置（1），用于通过使用提高传送精度的薄膜辊模（10）将图案转印到膜（2），并允许高度操作传送速度。解决方案：与薄膜辊模（10）悬挂的胶片取出侧辊（41）由与冷却机构（40）一体设置的冷却辊（41）组成，并且设置有在薄膜取出侧辊（41）和薄膜引入侧辊（31）之间将膜（2）压向薄膜辊模（10）的主压辊（32）和分散压力辊（96），其在主加压辊（32）的轴向的多个位置处将主压力辊（32）压向薄膜引入侧辊（31）。

8. 发明专利

JP2010045092A Mold separating method and nano pattern forming method in nanoimprint 审中-公开
标题翻译：模具分离方法和纳米模型中的纳米图案形成方法
公开(公告)号：JP2010045092A
公开(公告)日：2010-02-25
申请号：JP2008206684
申请日：2008-08-11
申请人： Hyogo Prefecture , Meisho Kiko Kk , 兵庫県 , 明昌機工株式会社
发明人： MATSUI SHINJI , OKADA MAKOTO , OKAMOTO TOSHIKI
IPC分类号： H01L21/027 , B29C33/58 , B29C59/02
摘要： PROBLEM TO BE SOLVED: To provide a technique of carrying out nanoimprint lithography without requiring mold separation with respect to a mold.
SOLUTION: In pressing the mold against a resist to transfer a nano structure pattern of the mold on the resist, a mold separating agent is applied on the mold before pressing the mold. In applying, it is favorable to spray the mold separating agent on a surface of the resist while forming a thin film of the resist on a substrate by spin coating.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供进行纳米压印光刻的技术，而不需要相对于模具分离模具。解决方案：在将模具压在抗蚀剂上以将模具的纳米结构图案转印到抗蚀剂上时，在模具压制之前，将模具分离剂施加在模具上。在涂布时，有利的是在抗蚀剂的表面上喷涂模具分离剂，同时通过旋涂在衬底上形成抗蚀剂的薄膜。版权所有（C）2010，JPO＆INPIT

9. 发明专利

JP2008053666A Pattern formation method and pattern formation object 审中-公开
标题翻译：模式形成方法和图案形成对象
公开(公告)号：JP2008053666A
公开(公告)日：2008-03-06
申请号：JP2006231395
申请日：2006-08-28
申请人： Hyogo Prefecture , Meisho Kiko Kk , 兵庫県 , 明昌機工株式会社
发明人： MATSUI SHINJI , NAKAMATSU KENICHIRO , MITSUNARI CHIAKI , AKATA KOZO
IPC分类号： H01L21/316 , B29C59/02 , G02B3/00 , G02B5/18
摘要： PROBLEM TO BE SOLVED: To provide a method for forming a pattern in a way that a fine pattern on an HSQ film is maintained even at a high temperature and a pattern formation object having the fine pattern fabricated in a way that it is maintained event at a high temperature.
SOLUTION: A fine pattern 2a is added by a nano-imprint method which presses a mold 8 to an HSQ film 2 on a substrate 1. After the mold 8 is separated, oxygen is radiated onto a surface of the fine pattern 2a (HSQ film 2) without a heating process for the HSQ film 2.
COPYRIGHT: (C)2008,JPO&INPIT

10. 发明专利

JP2007320142A Mold for nanoimprinting 审中-公开
标题翻译：模具用于纳米复印
公开(公告)号：JP2007320142A
公开(公告)日：2007-12-13
申请号：JP2006152083
申请日：2006-05-31
申请人： Hyogo Prefecture , Meisho Kiko Kk , 兵庫県 , 明昌機工株式会社
发明人： MATSUI SHINJI , NAKAMATSU KENICHIRO , AKATA KOZO
IPC分类号： B29C59/02 , B29C33/38 , B29K33/04 , B81C99/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a mold for nanoimprinting which shows successful mold release characteristics so that a release agent need not be used.
SOLUTION: This mold for nanoimprinting is for the transfer of a micropattern formed with unevenness to a material to which a pattern is transferred. The surface of the unevenness representing the micropattern or the whole unevenness including the surface, is formed of a diamond-like carbon film (F-DLC film) containing fluorine. Especially, the F-DLC film is formed by a chemical vapor deposition process (CVD) so that the water repellency forms higher than 90° in water contact angle.
COPYRIGHT: (C)2008,JPO&INPIT

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