会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明专利
    • Reflection high-energy electron diffraction method
    • 反射高能电子衍射方法
    • JP2012227009A
    • 2012-11-15
    • JP2011094239
    • 2011-04-20
    • Avc Co Ltd株式会社 エイブイシー
    • SASAKI TOMOAKICHIBA AKIOKAWAMURA MASAMI
    • H01J37/244G01N23/20H01J37/252
    • G01N23/20058G01N2223/102G01N2223/406H01J37/06H01J37/244H01J2237/24475
    • PROBLEM TO BE SOLVED: To provide a reflection high-energy electron diffraction method with which a reflection electron image diffraction pattern can be generated using an electron beam having an extremely small emission current value at a nanoampere level.SOLUTION: In the reflection high-energy electron diffraction method, microchannel plates 17a and 17b are disposed immediately in front of a fluorescent screen 18, and amplify the current of reflected electrons. An electron beam 28 having an emission current value at a nanoampere level is emitted from an electron gun 15 towards the surface of a thin film. Reflected electrons, whose current is already amplified by the microchannel plates 17a and 17b, are incident on the fluorescent screen 18, and a reflection electron diffraction pattern generated from the reflected electrons is displayed on the fluorescent screen 18.
    • 要解决的问题:提供一种反射高能电子衍射方法,利用该反射高能电子衍射方法,可以使用具有纳秒级发射电流值极小的电子束来产生反射电子图像衍射图案。 解决方案:在反射高能电子衍射法中,微通道板17a和17b立即设在荧光屏18的前面,并放大反射电子的电流。 从电子枪15朝向薄膜的表面发射具有纳秒级发射电流值的电子束28。 其电流已经被微通道板17a和17b放大的反射电子入射到荧光屏18上,并且从荧光屏幕18上显示由反射电子产生的反射电子衍射图案。版权所有(C) )2013,JPO&INPIT
    • 2. 发明专利
    • Lighting fixture for vacuum device
    • 真空装置的照明装置
    • JP2012059538A
    • 2012-03-22
    • JP2010201568
    • 2010-09-09
    • Avc Co Ltd株式会社 エイブイシー
    • SASAKI TOMOAKICHIBA AKIOSEKINO HIROYUKI
    • F21S2/00F21V19/00F21Y101/02
    • F21V33/00F21V33/0052G03B15/00G03B2215/0567G03B2215/0575H01L21/67253H04N5/2251
    • PROBLEM TO BE SOLVED: To provide a lighting fixture for a vacuum device, capable of letting light into the vacuum device from an observation window and visually recognizing the inside of the device from the observation window by illuminating the inside.SOLUTION: The lighting fixture for a vacuum device 10A includes: a coupling adapter 11 coupled with the observation window through a coupling means in free detachment; an opening 12 formed at a center part of the coupling adapter 11 to visually recognize the inside of the vacuum device through the observation window; and a plurality of LEDs 13 (light-emitting diodes) fitted to the coupling adapter 11 and facing the observation window. The lighting fixture 10A illuminates the inside of the vacuum device and is fitted to the observation window for recognizing the inside of the vacuum device.
    • 要解决的问题:提供一种真空装置的照明器具,其能够从观察窗口将光从观察窗口进入真空装置,并通过照亮内部从观察窗口目视识别装置的内部。 解决方案:用于真空装置10A的照明器具包括:耦合适配器11,通过耦合装置与观察窗结合,自由分离; 形成在联接适配器11的中心部分的开口12,以通过观察窗目视识别真空装置的内部; 以及多个LED 13(发光二极管),其安装在耦合适配器11上并面向观察窗。 照明器具10A照亮真空装置的内部,并且安装到用于识别真空装置内部的观察窗。 版权所有(C)2012,JPO&INPIT
    • 3. 发明专利
    • Vapor guide tube
    • 蒸气指导管
    • JP2010053390A
    • 2010-03-11
    • JP2008218593
    • 2008-08-27
    • Avc Co Ltd株式会社 エイブイシー
    • SASAKI TOMOAKICHIBA AKIOSEKINO HIROYUKISUZUKI SATOSHIWAKAYAMA YUTAKAHAYAKAWA RYUMA
    • C23C14/24
    • PROBLEM TO BE SOLVED: To provide a vapor guide tube capable of uniformly heating the entire tube and efficiently re-evaporating a material deposited on an inner circumferential surface of the tube.
      SOLUTION: The vapor guide tube 10 comprises a crucible 12 which houses a material for vapor deposition, and heats the material to generate the vapor of the material, a glass tube 11 in which the crucible 12 is installed therein, and the vapor generated from the crucible 12 is allowed to flow forwardly in the longitudinal direction, and a metal tube 13 for covering an outer circumferential surface of the glass tube 11. In the vapor guide tube 10, a transparent conductive tin oxide film having the predetermined electric resistance is film-deposited on the outer circumferential surface of the glass tube 11, an electric resistance thin film having the predetermined thickness is deposited on the outer circumferential surface of the glass tube 11, and the electric resistance thin film is heated by its resistance heating to heat the glass tube 11 at the predetermined temperature.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供能够均匀地加热整个管并且有效地再蒸发沉积在管的内周表面上的材料的蒸汽引导管。 蒸汽导管10包括坩埚12,该坩埚12容纳用于气相沉积的材料,并且加热该材料以产生该材料的蒸汽,其中安装坩埚12的玻璃管11和蒸汽 允许从坩埚12产生的从纵向向前流动的金属管13和用于覆盖玻璃管11的外周面的金属管13.在导气管10中,具有预定电阻的透明导电氧化锡膜 在玻璃管11的外周面上成膜,在玻璃管11的外周面上沉积具有规定厚度的电阻薄膜,通过其电阻加热来加热电阻薄膜 在预定温度下加热玻璃管11。 版权所有(C)2010,JPO&INPIT
    • 4. 发明专利
    • 材料搬送器具
    • 材料运输装置
    • JP2014215279A
    • 2014-11-17
    • JP2013095473
    • 2013-04-30
    • 株式会社 エイブイシーAvc Co Ltd株式会社 エイブイシー
    • SASAKI TOMOAKICHIBA AKIOKAWAMURA MASAMIFUTAMURA SATOYUKI
    • G01N1/00
    • G01N1/00
    • 【課題】材料ホルダーを材料とともに安全に所定の真空装置の設置箇所に搬送することができ、材料ホルダーを材料とともにその真空装置に容易に据え付けることができる材料搬送器具を提供する。【解決手段】材料搬送器具10では、接続ロッド11のシャフト部21を固定する固定ベース26が材料ホルダー12Aの一端部に作られ、固定ベース26が、シャフト部21および嵌合凸部22を挿脱可能かつ回転可能に挿入するカギ孔と、カギ孔に対するシャフト部21の初期挿入位置から回転方向へ90度離間した位置に作られて嵌合凸部22をコイルバネ15の付勢力に抗して嵌合させる第1凹部と、第1凹部から回転方向へ90度離間した位置に作られて嵌合凸部22をコイルバネ15の付勢力に抗して嵌合させる第2凹部とを有し、第1凹部の軸方向後方への凹み寸法が第2凹部の軸方向後方へのそれよりも小さい。【選択図】図1
    • 要解决的问题:提供能够将材料保持器与材料一起安全地输送到预定真空装置的安装位置的材料运输装置,并且容易地将材料保持器与材料一起安装在真空装置中。解决方案:在 材料输送装置10,用于固定连杆11的轴部21的固定基座26制成在材料保持器12A的一端。 固定基座26包括:锁孔,可拆卸地并可旋转地插入轴部21和配合突起22的锁孔; 在从轴部21相对于键孔的初始插入点沿旋转方向以90度分开的点处形成的第一凹部,并且使配合突起22抵抗螺旋弹簧的激励力而配合到第一凹部 15; 以及在与第一凹部沿旋转方向成90度分开的位置处形成的第二凹部,并且使配合突起22克服螺旋弹簧15的受力而与第二凹部配合。轴向向后方向的凹部尺寸 的第一凹部小于第二凹部的轴向向后方的凹部。
    • 5. 发明专利
    • Four point resistance measurement instrument and four point measurement probe
    • 四点电阻测量仪器和四点测量探头
    • JP2014167394A
    • 2014-09-11
    • JP2013038629
    • 2013-02-28
    • Avc Co Ltd株式会社 エイブイシー
    • SASAKI TOMOAKICHIBA AKIOKAWAMURA MASAMI
    • G01R27/02G01R1/06
    • PROBLEM TO BE SOLVED: To provide a four point resistance measurement instrument which can prevent a measurement sample from rising temperature even when probes contact with the sample, and measure a resistance value with high reliability.SOLUTION: A four point resistance measurement instrument 10 includes: a vacuum chamber 11 in which a measurement stage removably holding a measurement sample is installed; an evacuating mechanism 15 and a helium freezing mechanism 16 which are connected to the vacuum chamber 11; and four point measurement probes disposed in the vacuum chamber 11. In the four point resistance measurement instrument 10, heat transfer flexible wires for transferring coldness of a second cooling stage to the four point measurement probes are attached to the probes respectively under insulation, and the heat transfer flexible wires have front end parts connected to the four point measurement probes and have base end parts connected to front end parts of a shield cover.
    • 要解决的问题:提供四点电阻测量仪器,即使当探针与样品接触时也可以防止测量样品升高温度,并且以高可靠性测量电阻值。解决方案:四点电阻测量仪器10包括: 其中安装有可拆卸地保持测量样品的测量台的真空室11; 与真空室11连接的排气机构15和氦冷冻机构16; 以及设置在真空室11中的四点测量探针。在四点电阻测量仪10中,分别在探针的绝缘下分别附接到用于将第二冷却级的冷度传递到四点测量探针的传热柔性线, 传热柔性线具有连接到四点测量探针的前端部分,并且具有连接到屏蔽罩前端部分的基端部分。
    • 6. 发明专利
    • Reflection high-energy electron diffraction apparatus
    • 反射高能电子衍射装置
    • JP2012227010A
    • 2012-11-15
    • JP2011094240
    • 2011-04-20
    • Avc Co Ltd株式会社 エイブイシー
    • SASAKI TOMOAKICHIBA AKIOKAWAMURA MASAMI
    • H01J37/252G01N23/20H01J37/06H01J37/16H01J37/20H01J37/244
    • G01N23/20058G01N2223/102G01N2223/406H01J37/06H01J37/244H01J2237/24475
    • PROBLEM TO BE SOLVED: To provide a reflection high-energy electron diffraction apparatus that can generate a reflection electron image diffraction pattern by using an electron beam having an extremely small current value at a nanoampere level.SOLUTION: A reflection high-energy electron diffraction apparatus 10 includes: vapor deposition sources 14a-14c disposed attachably to and detachably from the inside of a vacuum chamber; an electron gun 15 to emit an electron beam 28 toward a thin film formed on a sample 11; a fluorescent screen 18 configured to display thereon a reflection electron diffraction pattern generated from reflected electrons reflected from the surface of the thin film; and microchannel plates 17a and 17b to amplify the current of the reflected electrons. In the reflection high-energy electron diffraction apparatus 10, the electron beam 28 having an emission current value at a nanoampere level is emitted from the electron gun 15 toward the thin film.
    • 要解决的问题:提供一种反射高能电子衍射装置,其可以通过使用在纳秒级具有极小电流值的电子束来产生反射电子图像衍射图案。 解决方案:反射高能电子衍射装置10包括:与真空室的内部可拆卸地设置的气相沉积源14a-14c; 电子枪15向形成在样品11上的薄膜发射电子束28; 荧光屏18,被配置为在其上显示由从薄膜的表面反射的反射电子产生的反射电子衍射图; 和微通道板17a和17b以放大反射电子的电流。 在反射高能电子衍射装置10中,从电子枪15向薄膜发射具有纳秒级的发射电流值的电子束28。 版权所有(C)2013,JPO&INPIT
    • 7. 发明专利
    • Vacuum feedthrough
    • 真空真空
    • JP2012190824A
    • 2012-10-04
    • JP2011050395
    • 2011-03-08
    • Avc Co Ltd株式会社 エイブイシー
    • SASAKI TOMOAKICHIBA AKIOSEKINO HIROYUKIKASHIWABARA SADAO
    • H01L21/677B65G49/07H01J37/16H01J37/18H01J37/20
    • H01J37/185H01L21/67748H01L21/67754
    • PROBLEM TO BE SOLVED: To provide a vacuum feedthrough for precisely carrying predetermined material to any position in a vacuum chamber.SOLUTION: A vacuum feedthrough 10A has a pipe 11, a shaft 12 positioned in an inner space of the pipe 11, a magnetic slide 13 capable of sliding the outer peripheral surface of the pipe 11 in a length direction, and a magnet holder attached to a rear end portion of the shaft 12. The vacuum feedthrough 10A includes a fixing holder for holding the shaft 12 attached to an inner space front end portion of the pipe 11 at a center in a diametrical direction, and a moving holder for holding the shaft attached to the rear portion of the shaft 12 at the center in the diametrical direction. The fixing holder has a supporting housing equipped with a slide bearing for slidably supporting the outer peripheral surface of the shaft 12. The moving holder has an arm which can elastically deform, a roller which can rotate in the length direction, and a tapered plug which forcibly and elastically deforms the arm toward an inner peripheral surface of the pipe, and presses the roller against the inner peripheral surface of the pipe.
    • 要解决的问题:提供用于将预定材料精确地携带到真空室中的任何位置的真空馈通。 解决方案:真空馈通10A具有管11,位于管11的内部空间中的轴12,能够沿长度方向滑动管11的外周面的磁性滑块13和磁体 保持件安装在轴12的后端部分上。真空馈通装置10A包括用于保持安装在管11的内部空间前端部的轴12沿直径方向的中心的固定保持器,以及用于 将轴固定在轴12的沿直径方向的中心的后部。 固定架具有支承壳体,该支承壳体具有可滑动地支撑轴12的外周面的滑动轴承。移动保持器具有能够弹性变形的臂,能够在长度方向上旋转的辊和锥形塞, 将臂朝向管的内周面强制地弹性变形,并将辊压靠在管的内周面上。 版权所有(C)2013,JPO&INPIT