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1. 发明专利

JP2007010420A Usable time measuring method of body of amorphous refractory material and measuring instrument used for it 有权
$Usable time measuring method of body of amorphous refractory material and measuring instrument used for it$
标题翻译：非正式耐火材料体的可用时间测量方法和用于其的测量仪器
公开(公告)号：JP2007010420A
公开(公告)日：2007-01-18
申请号：JP2005190028
申请日：2005-06-29
申请人： Asahi Glass Ceramics Co Ltd , 旭硝子セラミックス株式会社
发明人： KINOSHITA SHUICHI
IPC分类号： G01N3/34 , G01N3/08
摘要： PROBLEM TO BE SOLVED: To provide a measuring method for simply and quantitatively measuring the usable time of the body of an amorphous refractory material with good reproducibility, and a measuring instrument used for it.
SOLUTION: This usable time measuring instrument of the body of the amorphous refractory material includes a flexible bag which houses the body of the amorphous refractory material being a measuring target, the rod penetrated in the body of the amorphous refractory material housed in the bag through the bag, a reciprocating means for penetrating the rod in the body to bring it back, a means for detecting the position of the rod, and a clocking means for measuring the penetration cycle of the rod.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于简单且定量地测量具有良好重现性的非晶态耐火材料的主体的可用时间的测量方法和用于其的测量仪器。解决方案：该无定形耐火材料的本体的这种可用的时间测量仪器包括容纳无定形耐火材料的主体作为测量对象的柔性袋，该杆穿透在容纳在该无定形耐火材料的无定形耐火材料的主体中穿过袋子的袋子，用于穿透身体中的杆以使其返回的往复装置，用于检测杆的位置的装置，以及用于测量杆的穿透周期的计时装置。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2007001827A ALUMINA-CHROMIA BASED MONOLITHIC REFRACTORY 审中-公开
公开(公告)号：JP2007001827A
公开(公告)日：2007-01-11
申请号：JP2005185573
申请日：2005-06-24
申请人： ASAHI GLASS CERAMICS CO LTD
发明人： MIYAGISHI YOSHIMASA
IPC分类号： C04B35/66 , F27D1/00
摘要： PROBLEM TO BE SOLVED: To provide alumina-chromia monolithic refractory exhibiting high volume stability and improved spalling resistance as monolithic refractory for a melting furnace lining. SOLUTION: The alumina-chromia monolithic refractory comprises alumina particles, chromia particles and a zirconia based electromelting particles containing a vitreous material and unstabilized zirconia. COPYRIGHT: (C)2007,JPO&INPIT

3. 发明专利

JP2005256175A Target and method of producing high refractive index film by the target 有权
$Target and method of producing high refractive index film by the target$
标题翻译：目标和目标生产高折射率薄膜的方法
公开(公告)号：JP2005256175A
公开(公告)日：2005-09-22
申请号：JP2005129659
申请日：2005-04-27
申请人： Asahi Glass Ceramics Co Ltd , 旭硝子セラミックス株式会社
发明人： MITSUI AKIRA , OSAKI HISASHI
IPC分类号： C04B35/00 , C04B35/495 , C23C14/34
摘要： PROBLEM TO BE SOLVED: To provide a sputtering target which is used for depositing a high refractive index thin film by a DC sputtering process, and allows a high film deposition rate of the high refractive index thin film and high productivity, and to provide a method of depositing the high refractive index thin film using the target. SOLUTION: The sputtering target is composed of a metal oxide expressed by the chemical formula of MO x , wherein the MO x is a metal oxide in which oxygen is more depleted than the stoichiometric composition, M is Nb, the range of x satisfies 2 COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于通过DC溅射工艺沉积高折射率薄膜的溅射靶，并且允许高折射率薄膜的高成膜速率和高生产率，并且提供使用该靶沉积高折射率薄膜的方法。解决方案：溅射靶由化学式MO x 表示的金属氧化物组成，其中MO x SB是其中氧更多的金属氧化物耗尽的化学计量组成，M是Nb，x的范围满足2

4. 发明专利

JP2005126813A Method for producing silicon oxide film, and method for producing optical multi-layer film 有权
标题翻译：生产硅氧烷膜的方法，以及生产光学多层膜的方法
公开(公告)号：JP2005126813A
公开(公告)日：2005-05-19
申请号：JP2004086299
申请日：2004-03-24
申请人： Asahi Glass Ceramics Co Ltd , Asahi Glass Co Ltd , 旭硝子セラミックス株式会社 , 旭硝子株式会社
发明人： IKEDA TORU , MASHITA NAOHIRO , SHIDOUJI EIJI , KAMIYAMA TOSHIHISA , KATAYAMA YOSHIHITO
IPC分类号： G02B5/26 , C23C14/10 , C23C14/34 , G02B1/11 , G02B5/28
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a silicon oxide film with which the film having uniform optical constants, such as refractive index, absorption coefficient, etc., can be formed at high deposition rate. SOLUTION: The method for producing the silicon oxide film is performed, with which the silicon oxide film is formed on a substrate by using a sputtering target comprising silicon carbide and silicon with a ratio in number of atoms of C to Si being from 0.5 to 0.95 and carrying out AC sputtering having from 1 to 1000 kHz frequency in an atmosphere containing oxidizing gas. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种可以以高沉积速率形成具有均匀光学常数的膜（如折射率，吸收系数等）的氧化硅膜的制造方法。
解决方案：进行氧化硅膜的制造方法，通过使用包含碳化硅和硅的溅射靶，在基板上形成氧化硅膜，其中C与Si的原子数之比来自 0.5〜0.95，在含有氧化气体的气氛中进行1〜1000kHz的AC溅射。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2003313077A Silicon carbide member and method for manufacturing the same 有权
标题翻译：硅碳化物部件及其制造方法
公开(公告)号：JP2003313077A
公开(公告)日：2003-11-06
申请号：JP2002120286
申请日：2002-04-23
申请人： Asahi Glass Ceramics Co Ltd , Imae Kogyo Kk , Tocalo Co Ltd , トーカロ株式会社 , 井前工業株式会社 , 旭硝子セラミックス株式会社
发明人： TANI KAZUMI , KOBAYASHI KEIJI , KITAAKI HIROYUKI , TOKUDA MASAO , UEDA HIROSHI , IMAE KENJI
IPC分类号： C04B35/565 , C04B41/90
摘要： PROBLEM TO BE SOLVED: To provide a silicon carbide member having high adhesive strength to a ceramic coating layer containing zirconia as the surface layer and having high thermal characteristics and mechanical strength, and to provide a method for manufacturing the member. SOLUTION: A silicon-based cermet coating layer relating to any combination selected from metal silicon, silicon nitride and silicon oxide is applied as an undercoat on the surface of a silicon carbide substrate, and then a ceramic coating layer containing zirconia is applied as a topcoat on the undercoat. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：为了提供一种具有高粘合强度的碳化硅构件，该陶瓷涂层含有氧化锆作为表面层并且具有高的热特性和机械强度，并提供一种制造该构件的方法。＆lt; P＆gt;解决方案：将与金属硅，氮化硅和氧化硅中的任何组合相关的硅基金属陶瓷涂层作为底涂层涂覆在碳化硅衬底的表面上，然后施加含有氧化锆的陶瓷涂层作为底漆上的面漆。版权所有（C）2004，JPO

6. 发明专利

JP2006186309A CONDUCTIVE LAMINATE, ELECTROMAGNETIC WAVE SHIELDING FILM FOR PLASMA DISPLAY, AND PROTECTIVE PLATE FOR PLASMA DISPLAY 审中-公开
公开(公告)号：JP2006186309A
公开(公告)日：2006-07-13
申请号：JP2005254907
申请日：2005-09-02
申请人： ASAHI GLASS CO LTD , ASAHI GLASS CERAMICS CO LTD
发明人： MORIMOTO TAMOTSU , MIYAZAWA HIDEAKI , FUSEN MASAHIRO , KANDA KOICHI , NAKAGAMA SUSUMU
IPC分类号： H05K9/00 , B32B15/04 , G02B1/10 , G02B1/11 , G09F9/00
摘要： PROBLEM TO BE SOLVED: To provide a conductive laminate, an electromagnetic-wave shielding film for plasma display, and a protective plate for plasma display, which have a wide transmission/reflection band, in addition, high conductivity (electromagnetic-wave shield capability), high visible-light transmittance, and high shielding capability to near infra-red rays. SOLUTION: A conductive laminate 10 has a substrate 11, and a conductive film 12 formed on the substrate 11; wherein the conductive film 12 has a multi-layered structure where oxide layers 12a and metal layers 12b are alternately laminated in number of layers of 2n+1 (n is an integer of 1 or more) from a substrate 11 side. The oxide layers 12a mainly contain zinc oxide and a high-refractivity metal oxide having a refractivity of 2.3 or more, and the metal layers 12b mainly contain silver or a silver alloy. A protective plate for plasma display has a support base, the conductive laminate 10, and an electrode electrically contacted to the conductive film of the conductive laminate 10. COPYRIGHT: (C)2006,JPO&NCIPI

7. 发明专利

JP2005194174A Composition for monolithic refractory 审中-公开
$Composition for monolithic refractory$
标题翻译：单晶耐火材料的组成
公开(公告)号：JP2005194174A
公开(公告)日：2005-07-21
申请号：JP2004353036
申请日：2004-12-06
申请人： Asahi Glass Ceramics Co Ltd , 旭硝子セラミックス株式会社
发明人： ONO YASUSHI , SAKAMOTO SATOSHI , MURATA YUTAKA , KAJI TETSUO , ENDO YASUHIKO
IPC分类号： C04B35/66
摘要： PROBLEM TO BE SOLVED: To provide a composition for a monolithic refractory which can be transported by pump pressure when added with a small amount of water and kneaded because of its excellent fluidity and where bubbles float up naturally and are discharged without vibration when slip casting. SOLUTION: Refractory particles which are one or more kinds selected from alumina cement, alumina, bauxite, mullite, chamotte, zircon, magnesia, spinel, silicon carbide and the like, whose mean particle diameter is 30 μm or less and which are treated to be spherical are blended in the composition by 2-30 wt.%. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于整体式耐火材料的组合物，当由于其具有优异的流动性和气泡自然地浮起并且无振动地排出时，可以通过泵压力输送，当加入少量的水并捏合时，滑动铸造。解决方案：选自氧化铝水泥，氧化铝，铝土矿，莫来石，耐火砖，锆石，氧化镁，尖晶石，碳化硅等中的一种或多种耐火颗粒，其平均粒径为30μm以下，处理成球形的组合物以2-30重量％混合。版权所有（C）2005，JPO＆NCIPI

8. 发明专利

JP2004002202A Target and its manufacturing process 有权
公开(公告)号：JP2004002202A
公开(公告)日：2004-01-08
申请号：JP2003287703
申请日：2003-08-06
申请人： Asahi Glass Ceramics Co Ltd , 旭硝子セラミックス株式会社
发明人： MITSUI AKIRA , OYAMA TAKUJI , SASAKI KENICHI
IPC分类号： C04B35/46 , C23C14/34
摘要： PROBLEM TO BE SOLVED: To provide a spattering target solving defects in that the productivity is very poor because the conventional film forming rate is extremely late in forming a high refractive index thin film comprising titanium dioxide as a main component by using the DC spattering method, and to provide a method for manufacturing a high refractive index film using the target. SOLUTION: The manufacturing method of an oxide of a sintered material in which the main component is TiO x (1 COPYRIGHT: (C)2004,JPO

9. 发明专利

JP2003001373A Mold for electrocast brick and manufacturing method for electrocast brick using the same 有权
标题翻译：用于电动砖的模具和使用它的电动砖的制造方法
公开(公告)号：JP2003001373A
公开(公告)日：2003-01-07
申请号：JP2001191369
申请日：2001-06-25
申请人： Asahi Glass Ceramics Co Ltd , 旭硝子セラミックス株式会社
发明人： USHIMARU YUKIHIRO
IPC分类号： B22C1/00 , B22C7/00 , C04B35/657
CPC分类号： C03B5/43
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method for an extra-large electrocast brick having no defects such as a crack or shrinkage, and a mold for the electroforming brick which is used therefore. SOLUTION: The mold for the electrocast brick has a square pole shape, and at least in two faces or more except a gate riser part 3 of faces contacting with molten metal, a mold material at the center parts of the faces is alumina and/or Al2 O3 -ZrO2 -SiO2 , and a mold material at the corner parts thereof is silica sand. Thus, the mold material at the center parts of the faces comprises a material having larger thermal diffusion coefficient and thermal conductivity than the mold material at the corner part thereof.
摘要翻译：要解决的问题：提供一种无裂缝或收缩缺陷的超大型电铸砖的制造方法和用于电铸砖的模具。解决方案：用于电铸砖的模具具有方形极形，除了与熔融金属接触的面的浇口提升部分3之外，至少在两个或更多个面中，在其中心部分处的模具材料是氧化铝和/或 Al 2 O 3 -ZrO 2 -SiO 2，其角部的模具材料为硅砂。因此，面的中心部分的模具材料包括具有比在其拐角部分的模具材料更大的热扩散系数和导热性的材料。

10. 发明专利

JP2006188429A Zirconia-based refractory 有权
$Zirconia-based refractory$
标题翻译：基于ZIRCONIA的耐火材料
公开(公告)号：JP2006188429A
公开(公告)日：2006-07-20
申请号：JP2006041161
申请日：2006-02-17
申请人： Asahi Glass Ceramics Co Ltd , 旭硝子セラミックス株式会社
发明人： BEPPU YOSHIHISA
IPC分类号： C04B35/48 , C03B5/43 , F27D1/00
CPC分类号： C03B5/43 , Y02P40/57
摘要： PROBLEM TO BE SOLVED: To provide a zirconia-based refractory which exhibits excellent corrosion resistance and foaming properties in glass melting, and which has low substrate staining properties. SOLUTION: The zirconia-based refractory is produced by sintering a mixture of a pulverized material containing monoclinic system ZrO 2 of a high zirconia melt-resolidification substance as a main component and an alumina powder. COPYRIGHT: (C)2006,JPO&NCIPI

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