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    • 5. 发明专利
    • Corrosion resistant laminate
    • 耐腐蚀层压板
    • JP2013103487A
    • 2013-05-30
    • JP2011251143
    • 2011-11-16
    • Taiyo Kagaku Kogyo Kk太陽化学工業株式会社
    • SHIBUSAWA KUNIHIKO
    • B32B9/00
    • PROBLEM TO BE SOLVED: To provide a laminate having a protective layer directly or indirectly formed on a base material, composed of an amorphous carbon film, a rigid ceramic or the like, and having improved corrosion resistance.SOLUTION: The laminate 1 includes: the base material 10; the protective film 20 directly or indirectly formed on the surface of the base material and composed of at least one of the amorphous carbon film containing at least one of silicon, titanium and aluminum and the rigid ceramic film containing at least one of silicon, titanium and aluminum; and a coating film 30 which contains a fluorine-containing silane coupling agent and at least a part of which is impregnated in the protective film.
    • 要解决的问题:提供一种由非晶碳膜,刚性陶瓷等构成的具有直接或间接形成在基材上的保护层并具有改善的耐腐蚀性的层压体。 解决方案:层压体1包括:基材10; 直接或间接地形成在基材表面上并由至少一种含有硅,钛和铝中的至少一种的无定形碳膜和至少含有硅,钛和 铝; 以及含有含氟硅烷偶联剂并且其至少一部分浸渍在保护膜中的涂膜30。 版权所有(C)2013,JPO&INPIT
    • 6. 发明专利
    • Method for generating plasma and apparatus therefor
    • 用于产生等离子体及其装置的方法
    • JP2012038723A
    • 2012-02-23
    • JP2011156221
    • 2011-07-15
    • Taiyo Kagaku Kogyo Kk太陽化学工業株式会社
    • SHIBUSAWA KUNIHIKOSATO TAKESHI
    • H05H1/24C23C16/26C23C16/515H01L21/304
    • PROBLEM TO BE SOLVED: To provide a method by which film formation and surface property modification using plasma can be performed on an insulator, particularly an insulator with a low heat resistance, efficiently in a short time, and to provide an apparatus therefor.SOLUTION: The method for surface property modification and film formation with plasma includes: introducing a material gas used as a plasma generation source into an evacuated reaction chamber; applying a negative voltage to a cathode electrode placed in the reaction chamber to decompose the material gas, thereby generating plasma and causing reactions between the plasma and the top of a base material to be processed set in the reaction chamber; and using an electric field created by the application of the voltage to direct plasma ions and radicals to the top of the base material to be processed, or deposit them on the top of the base material. The cathode electrode is arranged to allow the material gas to pass through at least a part thereof and disposed out of direct contact with a face of the base material to be processed that requires a surface treatment, such as property modification or film formation. A DC pulse voltage of -2 kV to -20 kV is applied to the cathode electrode.
    • 解决的问题:提供一种能够在短时间内有效地在绝缘体,特别是具有低耐热性的绝缘体上进行使用等离子体的成膜和表面性质改性的方法,并提供其设备 。 解决方案:用于等离子体表面改性和成膜的方法包括:将用作等离子体发生源的材料气体引入抽真空反应室中; 对放置在反应室内的阴极施加负电压,使原料气体分解,从而产生等离子体并引起等离子体与反应室内待处理基材顶部的反应; 并且使用通过施加电压产生的电场将等离子体离子和自由基引导到待加工的基底材料的顶部,或者将它们沉积在基材的顶部上。 阴极电极被设置成允许材料气体至少通过其一部分,并且设置成与要处理的基材的面直接接触,需要进行表面处理,例如性能改性或成膜。 向阴极施加-2kV〜-20kV的直流脉冲电压。 版权所有(C)2012,JPO&INPIT
    • 7. 发明专利
    • Barrel plating apparatus
    • BARREL电镀设备
    • JP2008121100A
    • 2008-05-29
    • JP2006335107
    • 2006-11-14
    • Taiyo Kagaku Kogyo Kk太陽化学工業株式会社
    • ISHIHARA SHOJISATO TAKESHI
    • C25D17/20C25D17/16
    • PROBLEM TO BE SOLVED: To provide a barrel plating apparatus which can form a plating film having uniform thickness on a work surface.
      SOLUTION: An electrode 11 of the barrel plating apparatus 10 has: a center bar 16; and a plurality of electrode bars 17, each having a contact 17a arranged at the tip, which are arranged in the middle of the center bar so as to be apart from each other. In an approximately middle of side walls 13a and 13b in both ends in the axis direction of a rotating barrel 12, caps 15 and 15 are firmly fixed. The caps 15 and 15 have an annular structure and have head parts of fixed shafts 18 and 18 inserted in their centers. Furthermore, the positions of sides 16b and 16b located near the ends in the axis direction of the center bar 16 of the electrode 11 in the rotating barrel 12 are regulated by faces 15b and 15b which face to each other of the cap 15. Thereby, the barrel plating apparatus can inhibit the deviation of a relative position between the work and the electrode (cathode) in the rotating barrel, and can form the plating film having uniform thickness on a plurality of the works.
      COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:提供一种能够在工作表面上形成具有均匀厚度的镀膜的滚镀装置。 解决方案:滚镀装置10的电极11具有:中心杆16; 以及多个电极棒17,每个电极棒17具有布置在尖端处的接触件17a,它们布置在中心杆的中间以彼此分开。 在旋转筒12的轴线方向的两端的侧壁13a,13b的大致中央处,盖15,15牢固地固定。 盖15和15具有环形结构,并且具有插入其中心的固定轴18和18的头部。 此外,位于旋转筒12中的电极11的中心杆16的轴线方向端部附近的侧面16b和16b的位置由盖子15的彼此面对的面15b和15b调节。由此, 滚镀装置能够抑制工件与旋转筒体中的电极(阴极)的相对位置偏离,能够在多个工件上形成厚度均匀的镀膜。 版权所有(C)2008,JPO&INPIT
    • 8. 发明专利
    • Manufacturing method of metal mask plate for screen printing, and metal mask plate for screen printing
    • 用于丝网印刷的金属掩模板的制造方法和用于印刷的金属掩模板
    • JP2007152613A
    • 2007-06-21
    • JP2005347668
    • 2005-12-01
    • Taiyo Kagaku Kogyo Kk太陽化学工業株式会社
    • ARAI MASAHIRO
    • B41C1/14B41N1/24
    • PROBLEM TO BE SOLVED: To provide a manufacturing method of a metal mask plate for screen printing which can prevent a distortion in the contour of a printed pattern even in the case of obtaining the printed pattern of a thin layer and besides can make the thickness of the printed pattern uniform.
      SOLUTION: A plurality of recesses 10a are formed by etching in one surface (surface on the side to come into contact with a printing object surface) of a metal plate MP and thereafter a plurality of paste passing holes 10c are formed in each of bottom walls 10b of the recesses 10a by boring by irradiation with a laser so that they recede the peripheral wall of the recess 10a. Thereby the metal mask plate 10 is manufactured.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:为了提供丝网印刷用金属掩模板的制造方法,即使在获得薄层的印刷图案的情况下也能够防止印刷图案的轮廓变形,并且还可以制造 印刷图案的厚度均匀。 解决方案:通过在金属板MP的一个表面(与印刷对象表面接触的一侧的表面)上蚀刻形成多个凹部10a,然后在每个凹部10a中形成多个糊剂通过孔10c 的凹部10a的底壁10b通过用激光照射进行钻孔,使得它们后退凹部10a的周壁。 由此制造金属掩模板10。 版权所有(C)2007,JPO&INPIT