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81. 发明专利

JPS62208447A MODE OPERATING MECHANISM FOR MAGNETIC RECORDING AND REPRODUCING DEVICE 失效
公开(公告)号：JPS62208447A
公开(公告)日：1987-09-12
申请号：JP5035286
申请日：1986-03-10
申请人： HITACHI LTD
发明人： OSAWA ATSUO , OGIJI KENJI , KAKU NOBUYUKI , SASAKI TAKASHI , TAKITA KOHEI
IPC分类号： G11B15/10 , G11B15/665
摘要： PURPOSE:To improve workability at the time of assembly, by constituting a mode operating mechanism of an annular member having a cam surface formed by the first and the second circles and a line for connecting a circular arc having a relation of a concentric circle and a point on the periphery, and a driving source for driving to rotate this annular member. CONSTITUTION:A ring driving mechanism is constituted of a loading mode motor 27, a decelerating gear train for transferring driving force to a driving ring 32, a transfer gear train for transferring rotation of the driving ring 32 to a loading ring 10, and a transfer gear train for transferring said rotation to a cam ring 38, the respective rings are turned, the ring 10 executes a loading operation for winding a magnetic tape 3 around a rotary cylinder 2, and the cam ring 38 executes a mode shift operation for operating a mechanism element such as a brake, etc. by a rugged surface (cam surface) which has been provided on the inside periphery. In this way, plural cam surfaces are formed on an annular member which uses two circles in relation of a concentric circle, as the reference circle, and all operating points of plural members to be operated are placed in the peripheral range of this reference circle, therefore since an intermediate transfer member is not interposed between the cam and the member to be operated, the workability at the time of assembly is improved.

82. 发明专利

JP2010179249A Apparatus and method for decomposing perfluoro compound 审中-公开
标题翻译：用于分解全氟化合物的装置和方法
公开(公告)号：JP2010179249A
公开(公告)日：2010-08-19
申请号：JP2009025497
申请日：2009-02-06
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SASAKI TAKASHI , IIZUKA HIDEHIRO , MUSHA SHUJI
IPC分类号： B01D53/86 , B01D53/68 , B01D53/77
CPC分类号： Y02C20/30
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for decomposing perfluoro compounds, in which the HF corrosion of a member of a cooling unit, which is used for cooling a high-temperature gas containing HF of high concentration, is alleviated and to provide a method for decomposing perfluoro compounds by using the apparatus for decomposing perfluoro compounds. SOLUTION: The apparatus for decomposing perfluoro compounds is provided with: a decomposition unit for decomposing the perfluoro compounds in the gas to be treated; the cooling unit for wetly cooling the gas generated by decomposing the perfluoro compounds; and an acidic gas removal unit for removing an acidic gas which is generated by decomposing the perfluoro compounds and contains HF. A HF neutralizing agent is added to the cooling unit. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于分解全氟化合物的装置，其中用于冷却含有高浓度HF的高温气体的冷却单元的部件的HF腐蚀得到缓解，并且提供通过使用全氟化合物分解装置分解全氟化合物的方法。解决方案：用于分解全氟化合物的装置设置有：用于分解待处理气体中的全氟化合物的分解单元; 用于对通过分解全氟化合物而产生的气体进行湿式冷却的冷却单元; 以及酸性气体除去单元，其除去由全氟化合物分解并含有HF而产生的酸性气体。将HF中和剂加入到冷却单元中。版权所有（C）2010，JPO＆INPIT

83. 发明专利

JP2009301881A Plasma display panel 审中-公开
标题翻译：等离子显示面板
公开(公告)号：JP2009301881A
公开(公告)日：2009-12-24
申请号：JP2008155354
申请日：2008-06-13
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TAKAURA MAKOTO , SASAKI TAKASHI , KUNII YASUHIKO
IPC分类号： H01J11/10 , H01J11/12 , H01J11/24 , H01J11/26 , H01J11/34
摘要： PROBLEM TO BE SOLVED: To provide a PDP technology which can improve both characteristics of bright room contrast and brightness.
SOLUTION: This PDP 10 has a structure in which a visible light transmittance (T1) in a first region 31 is lower than that (T2) in a second region 32 owing to a difference between the materials of electrodes placed in the first region 31 in the upper half side and the second region 32 in the lower half side of the light-emitting region of a cell in a front surface substrate structure 11. An opaque electrode 21 of metal is placed in the first region 31, and a transparent electrode 22 of ITO or the like is placed in the second region 32.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供可以改善明亮的房间对比度和亮度的特征的PDP技术。解决方案：该PDP 10具有这样的结构，其中第一区域31中的可见光透射率（T1）比第二区域32中的（T2）低，这是由于放置在第一区域31中的电极的材料之间的差异在前表面基板结构11中的单元的发光区域的上半侧的区域31和下半侧的第二区域32中。金属的不透明电极21被放置在第一区域31中，并且 ITO等的透明电极22被放置在第二区域32中。（C）2010，JPO＆INPIT

84. 发明专利

JP2009136815A Exhaust gas treatment apparatus 有权
标题翻译：排气处理设备
公开(公告)号：JP2009136815A
公开(公告)日：2009-06-25
申请号：JP2007317829
申请日：2007-12-10
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SASAKI TAKASHI , SUGANO SHUICHI , KARASAWA HIDETOSHI , IIZUKA HIDEHIRO
IPC分类号： B01D53/68 , B01D53/14 , B01D53/18 , B01D53/50 , B01D53/77 , B01D53/81 , B01D53/86 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To attain enhancement of durability and simplification of maintenance of a treatment apparatus for an exhaust gas containing a fluorine compound discharged from a manufacturing factory for a semiconductor and a crystal. SOLUTION: The exhaust gas treatment apparatus comprises a gas separation means for separating a mist formation gas in a gas to be treated and a mist deposition gas, a wet type removal apparatus for removing at least any one of an acidic gas or a silicon compound contained in the gas to be treated passing through the gas separation means, and a fluorine compound decomposition apparatus provided with a catalyst for decomposing the fluorine compound contained in the gas to be treated passing through the wet type removal apparatus. By the above apparatus, in the pre-treatment step of a former stage of a catalyst reaction layer, SO 3 and SiF 4 are separated, and the SiF 4 is removed by the wet type removal apparatus installed in a latter stage of a dry type removal apparatus. A prolongation of life of the fluorine compound decomposition catalyst can be attained by separating SO 3 and SiF 4 contained in the exhaust gas. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决的问题：为了提高含有从半导体和晶体的制造厂排出的氟化合物的废气的处理装置的耐久性和维护的简化。解决方案：废气处理装置包括用于分离待处理气体中的雾化气体和气雾沉积气体的气体分离装置，用于除去至少任一种酸性气体或含有待处理气体中的硅化合物通过气体分离装置，以及氟化合物分解装置，其具有用于分解通过湿式除去装置的被处理气体中所含的氟化合物的催化剂。通过上述装置，在催化剂反应层的前一阶段的预处理步骤中，分离出SO 3 SB 3和SiF 4 SB 3，并且SiF SB 通过安装在干式除去装置后期的湿式除去装置除去。氟化合物分解催化剂的寿命延长可以通过分离废气中所含的SO 3 SB 3和/或SBF 4获得。版权所有（C）2009，JPO＆INPIT

85. 发明专利

JP2008165245A Plasma display device and method of driving the same 有权
标题翻译：等离子体显示装置及其驱动方法
公开(公告)号：JP2008165245A
公开(公告)日：2008-07-17
申请号：JP2008015743
申请日：2008-01-28
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SASAKI TAKASHI , ISHIGAKI MASAHARU , OTAKA HIROSHI
IPC分类号： G09G3/20 , G09G3/288 , G09G3/291 , G09G3/294 , G09G3/296 , G09G3/298
摘要： PROBLEM TO BE SOLVED: To prevent degradation of image quality resulting from irregularities of luminance or malfunctions, which are caused by electric charges gradually separating and accumulating inside cells, due to slight variations in the cells or in an XY drive circuit.
SOLUTION: The above object is attained by alternately applying two kinds of waveforms of different sustaining waveform shapes to XY electrodes. The waveform shapes are different in the widths, voltages, rise or fall times, and the waveforms are applied alternately within sustaining periods, by subfield or by field.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了防止由于电池的轻微变化或XY驱动电路中由电荷逐渐分离和积聚而导致的由亮度或故障的不规则性引起的图像质量的劣化。解决方案：通过交替地向XY电极交替施加不同维持波形形状的两种波形来实现上述目的。波形形状在宽度，电压，上升或下降时间上是不同的，并且波形在维持周期内通过子场或场进行交替应用。版权所有（C）2008，JPO＆INPIT

86. 发明专利

JP2008155070A Method and apparatus for decomposing halogen compound 审中-公开
标题翻译：用于分解卤化物的方法和装置
公开(公告)号：JP2008155070A
公开(公告)日：2008-07-10
申请号：JP2006343040
申请日：2006-12-20
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SUGANO SHUICHI , MUSHA SHUJI , KARASAWA HIDETOSHI , SASAKI TAKASHI
IPC分类号： B01D53/86 , B01J21/04 , B01J21/06 , B01J23/06 , B01J23/75 , B01J23/755 , B01J23/89
CPC分类号： Y02C20/30
摘要： PROBLEM TO BE SOLVED: To efficiently decompose halogen compounds such as CF 4 , C 2 F 6 at low cost. SOLUTION: The method for decomposing halogen compounds is characterized in that halogen in a gas stream is converted into hydrogen halide by bringing the gas stream containing halogen compounds such as CF 4 , C 2 F 6 into contact with a catalyst containing Al at 200-800°C in the presence of an effective amount of hydrogen and oxygen. By this method, halogen compounds can efficiently be decomposed. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：以低成本有效地分解诸如CF 4 C 2 6 的卤素化合物。解决方案：分解卤素化合物的方法的特征在于，将气流中的卤素转化为卤化氢，通过使含有卤素化合物如CF S C 2的气流在有效量的氢气和氧气存在下，在200-800℃下与含Al的催化剂接触。通过这种方法，可以有效地分解卤素化合物。版权所有（C）2008，JPO＆INPIT

87. 发明专利

JP2007301467A Method and apparatus for treating fluorine compound contained in gas 有权
标题翻译：用于处理气体中含氟化合物的方法和装置
公开(公告)号：JP2007301467A
公开(公告)日：2007-11-22
申请号：JP2006132068
申请日：2006-05-11
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SASAKI TAKASHI , SUGANO SHUICHI , TAMADA SHIN
IPC分类号： B01D53/46 , B01D53/70 , B01D53/86
CPC分类号： Y02C20/30
摘要： PROBLEM TO BE SOLVED: To efficiently remove a small amount of fluorine compounds contained in a gas to be treated. SOLUTION: The small amount of fluorine compounds contained in the gas to be treated are concentrated with an adsorbent, separated when the adsorbing capacity of the adsorbent reaches its saturation, and treated in a fluorine compound treating apparatus installed in a rear stage. A detecting device for the fluorine compounds installed at the downstream of an adsorbing column monitors the concentration of the fluorine compounds passed through without being sufficiently adsorbed with the adsorbent, and heating of the fluorine compound treating apparatus and a gas heater heating the gas flowing in for separating the fluorine compounds starts after confirmation of the passing through of the unadsorbed fluorine compounds. Excessive running costs are saved by controlling a heating time. Further, since the gas heater is characterized by fast heating, the cycle of adsorption or separation is accelerated by fast separating the adsorbed fluorine compounds through fast heating and the amount of filling adsorbent is reduced, thereby making apparatus compact. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：待解决的问题：为了有效地除去少量被处理气体中所含的氟化合物。解决方案：将待处理气体中含有的少量氟化合物用吸附剂浓缩，当吸附剂的吸附能力达到饱和时分离，并在后级的氟化合物处理装置中进行处理。用于安装在吸附塔下游的氟化合物的检测装置监测通过的氟化合物的浓度不被吸附剂充分吸附，并且加热氟化合物处理装置和加热流入的气体的气体加热器在确认未吸附的氟化合物的通过之后开始分离氟化合物。通过控制加热时间可以节省运行成本。此外，由于气体加热器的特征在于快速加热，通过快速加热快速分离吸附的氟化合物并减少填充吸附剂的量，从而加速吸附或分离的循环，从而使设备紧凑。版权所有（C）2008，JPO＆INPIT

88. 发明专利

JP2006312121A Method and apparatus for treatment of perfluoride 审中-公开
标题翻译：用于治疗氟氯氰菊酯的方法和装置
公开(公告)号：JP2006312121A
公开(公告)日：2006-11-16
申请号：JP2005135053
申请日：2005-05-06
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TAMADA SHIN , SASAKI TAKASHI , IRIE KAZUYOSHI
IPC分类号： B01D53/68 , B01D53/34 , B01D53/46 , B01D53/70 , B01D53/77
CPC分类号： Y02C20/30
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for treatment of perfluoride enabling reduction of the amount of water used in treating the high-temperature exhaust gas produced in decomposition of e.g. PFCs gas and containing acidic gases, e.g. hydrogen fluoride, in high concentration. SOLUTION: The apparatus has an entrance scrubber 100 for removing solid etc. from an exhaust gas to be treated, the first heater 300 heating the exhaust gas after the removal of solid, a reaction water evaporator 200 for supplying moisture to the first heater, the second heater 400 heating the heated exhaust gas further to decompose with a catalyst, a heat exchanger 500 for heat-exchanging the heat-decomposed exhaust gas with open air to cool the exhaust air, an alkali scrubber 600 for removing acidic gases from the cooled exhaust gas and an exhauster 1000 for exhausting the treated gas with acidic gases removed. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于处理全氟化物的方法和设备，其能够减少用于处理例如分解中产生的高温废气的水量。 PFCs气体并含有酸性气体，例如氟化氢，浓度高。解决方案：该设备具有用于从待处理废气中除去固体等的入口洗涤器100，第一加热器300在除去固体之后加热废气;反应水蒸发器200，用于向第一个第二加热器400进一步加热废气进一步用催化剂分解;热交换器500，用于将热分解废气与露天空气进行热交换以冷却排气;碱洗涤器600，用于从酸性气体中除去酸性气体冷却的废气和用于排出处理过的气体的排气器1000，其中酸性气体被除去。版权所有（C）2007，JPO＆INPIT

89. 发明专利

JP2006095486A Method and apparatus for treating fluorine compound-containing gas 有权
标题翻译：用于处理含氟化合物的气体的方法和装置
公开(公告)号：JP2006095486A
公开(公告)日：2006-04-13
申请号：JP2004287631
申请日：2004-09-30
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SUGANO SHUICHI , SASAKI TAKASHI , TAMADA SHIN
IPC分类号： B01D53/46 , B01D53/34 , B01D53/70 , B01D53/77 , B01D53/86 , C07C19/08
CPC分类号： Y02C20/30
摘要： PROBLEM TO BE SOLVED: To decompose and remove fluorine compounds at high decomposition ratios by using a fluorine-compound-decomposing catalyst from gas containing gaseous and solid silicon compounds and fluorine compounds. SOLUTION: Gas to be treated that contains fluorine compounds and silicon compounds is subjected to wet treatment using water, an aqueous alkaline solution, or the like, to covert most of the silicon compounds into SiO 2 and then remove SiO 2 . Specifically, a part of the silicon compounds is discharged in the form of hydroxide or in other forms, while accompanying the gas to be treated. Before causing the gas to come into contact with the fluorine-compound-decomposing catalyst, the silicon compounds are removed by using a trapping material. Thereafter, fluorine compounds are decomposed in a reaction column using the fluorine-compound-decomposing catalyst. Even after a long time of continuous running, a high decomposition rate can be maintained. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：通过使用含气态和固态硅化合物和氟化合物的气体的氟化合物分解催化剂，以高分解比分解和除去氟化合物。解决方案：使用水，碱性水溶液等对含有氟化合物和硅化合物的待处理气体进行湿处理，以将大部分硅化合物转化成SiO 2 SBB 然后除去SiO 2 。具体地说，一部分硅化合物以伴随待处理气体的方式以氢氧化物或其它形式排出。在使气体与氟化合物分解催化剂接触之前，通过使用捕集材料除去硅化合物。此后，使用氟化合物分解催化剂在反应塔中分解氟化合物。即使经过长时间的连续运转，也能够维持高分解率。版权所有（C）2006，JPO＆NCIPI

90. 发明专利

JP2001075531A METHOD FOR DRIVING DISPLAY PANEL AND ITS DEVICE 失效
公开(公告)号：JP2001075531A
公开(公告)日：2001-03-23
申请号：JP24836699
申请日：1999-09-02
申请人： HITACHI LTD
发明人： SASAKI TAKASHI , ISHIGAKI MASAHARU , KIJIMA YUICHI
IPC分类号： G09G3/20 , G09G3/28 , G09G3/288 , G09G3/291 , G09G3/294 , G09G3/298
摘要： PROBLEM TO BE SOLVED: To reduce the number of a discharge maintaining circuit and to lower the circuit cost by enabling the repetition of discharging by making use of self-discharging by wall electric charges and applying pulses having only a signal polarity to one electrode. SOLUTION: According to a voltage waveform, discharging 7 and 8 is caused in a predischarging period as a reset pulse 1 applied to an X electrode rises and falls (e, f). In a writing discharging period, address discharging 9 is caused only at cells which are applied with a scan pulse 5b at Y electrodes and an address pulse 6 at address electrodes at the same time (f). In a light emission display period, discharging is caused 10 and 11 as a sustaining pulse 3 applied to an X electrode rises and falls (e). At this time, cells which do not have wall electric charges are not discharged with the sustaining pulse 3. The cells where no sustaining discharging is caused have weak discharging with wall electric charge erasing pulses 4 several times to erase wall electric charges (f).

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