专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

71. 发明专利

JP2013118060A Charged particle beam device 审中-公开
标题翻译：充电颗粒光束装置
公开(公告)号：JP2013118060A
公开(公告)日：2013-06-13
申请号：JP2011264124
申请日：2011-12-01
申请人： Canon Inc , キヤノン株式会社
发明人： ARITA KEIICHI , SHINOHARA MASAHITO
IPC分类号： H01J37/04 , H01J37/305
CPC分类号： H01J37/30 , B82Y10/00 , B82Y40/00 , G21K5/10 , H01J3/26 , H01J29/70 , H01J37/244 , H01J37/3174 , H01J37/3177 , H01J2237/24542 , H01J2237/30433 , H01J2237/3175
摘要： PROBLEM TO BE SOLVED: To provide a technique advantageous in reducing a measurement error due to a positional shift of a knife edge.SOLUTION: A charged particle beam device including an irradiation unit for irradiating a subject with a plurality of charged particles beams includes: a measuring instrument for measuring characteristics of the plurality of charged particle beams; and a control unit. The measuring instrument includes: a plate which has a plurality of knife edges; and a sensor which detects charged particle beams entering through the plate. The control unit scans one charged particle beams selected from the plurality of charged particle beams relative to the measuring instrument so that the one charged particle beam crosses at least two knife edges among the plurality of knife edges, and generates correction information for correcting a measurement error of the measuring instrument due to deformation of the plate based upon output of the sensor during the scanning.
摘要翻译：要解决的问题：提供有利于减少由于刀刃的位置偏移引起的测量误差的技术。解决方案：包括用于用多个带电粒子束照射对象的照射单元的带电粒子束装置包括：用于测量多个带电粒子束的特性的测量仪器; 和控制单元。测量仪器包括：具有多个刀刃的板; 以及检测通过板进入的带电粒子束的传感器。控制单元相对于测量仪器扫描从多个带电粒子束中选出的一个带电粒子束，使得一个带电粒子束与多个刀刃之间的至少两个刀刃交叉，并产生用于校正测量误差的校正信息由于在扫描期间基于传感器的输出而导致板的变形而导致的测量仪器。版权所有（C）2013，JPO＆INPIT

74. 发明专利

JP4557682B2 Electron beam lithography system, the deflection amplifier, and the electron beam writing method 有权
公开(公告)号：JP4557682B2
公开(公告)日：2010-10-06
申请号：JP2004325503
申请日：2004-11-09
申请人：株式会社東芝
发明人：哲郎中杉 , 紀昭佐々木 , 和雄俵山 , 拓見太田 , 健小柴 , 達彦東木 , 央之水野 , 俊幸馬越
IPC分类号： H01L21/027 , G03F7/20 , H01J37/147 , H01J37/20 , H01J37/305
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J2237/15 , H01J2237/30433

76. 发明专利

JP2004228074A System and method for electron beam and array writing head 有权
公开(公告)号：JP2004228074A
公开(公告)日：2004-08-12
申请号：JP2004001454
申请日：2004-01-06
申请人： Internatl Business Mach Corp , インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation
发明人： BUKOFSKY SCOTT J , CHEN BOMY A , EAMES SARA J , WU QIANG
IPC分类号： H01J37/073 , H01J1/304 , H01J37/305 , H01J37/317 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/0635 , H01J2237/30433
摘要： PROBLEM TO BE SOLVED: To provide an E beam system for storing calibration data and using a hyper-parallel array of electron sources assembled by an integrated circuit technology as well as a system for each beam to control individual beams, by using the calibration data. SOLUTION: The E beam system stores the calibration data by using a flash EPROM and generates one set of super-parallel beams with a scale of 1,000 beams by receiving on/off signals directed by an address system of a memory array with each electron source mounted on the memory array as a geometrical array to trace a memory array structure. COPYRIGHT: (C)2004,JPO&NCIPI

77. 发明专利

JP2003506724A Calibration of the scanning electron microscope 有权
公开(公告)号：JP2003506724A
公开(公告)日：2003-02-18
申请号：JP2001516219
申请日：2000-08-11
申请人：ケーエルエー−テンカーテクノロジィースコーポレイション
发明人：ジェイソンシーイー , デイビッドエムグッドステイン , ローレンスエスハードン , ウェイドンリュ
IPC分类号： G01B15/00 , G01Q30/02 , G01Q40/00 , H01J37/02 , H01J37/20 , H01J37/28 , H01L21/66
CPC分类号： H01J37/026 , H01J37/28 , H01J2237/2816 , H01J2237/30433
摘要： (57)【要約】走査電子顕微鏡（ＳＥＭ）は、周知のＣＤを有する較正ウエハに関し、最初にその顕微鏡を較正することにより、ウエハの測定臨界寸法（ＣＤ）の局所荷電の影響に備えて較正される。ウエハ上の局所荷電は局所着陸エネルギー（ＬＬＥ）として測定してもよく、測定ウエハおよび較正ウエハに対するＬＬＥの比率に基づく換算係数を使用して測定ウエハに対する測定ＣＤを補正する。

78. 发明专利

JPS59178730A Transfer method of pattern 失效
标题翻译：图案转移方法
公开(公告)号：JPS59178730A
公开(公告)日：1984-10-11
申请号：JP5291083
申请日：1983-03-29
申请人： Toshiba Corp
发明人： GOTOU MINEO , SANO SHIYUNICHI
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： B82Y10/00 , G03F7/70433 , G03F7/706 , H01J2237/30433 , H01L21/30
摘要： PURPOSE:To improve pattern-forming efficiency, by using a pattern, which is formed so as to compensate the transfer distortion yielded on a wafer. CONSTITUTION:Cross marks for measuring are arranged on a mask at a constant interval. A pattern is transferred on a wafer 7, and the measuring mask is formed in this way. Then, the positions of the marks formed on the wafer 7 are measured by using an optical-wavelength measuring device utilizing laser light. Based on the measured transfer distortion, a transfer pattern is formed on a transfer mask 3. At this time, the data of the measured transfer distortion is interpolated. The amount of correction for every minute region, which is obtained by dividing the pattern in a mesh state, is computed by a computer. The position of the graphic data in the minute region is corrected by the amount of correction in every region. By using the corrected data formed in this way, a transfer pattern 3a is formed on the mask 3.
摘要翻译：目的：通过使用形成为补偿晶片上产生的转印失真的图案来提高图案形成效率。构成：用于测量的十字标记以一定的间隔布置在掩模上。在晶片7上转印图案，并以这种方式形成测量掩模。然后，使用利用激光的光波长测量装置测量形成在晶片7上的标记的位置。基于测量的传输失真，在传送掩模3上形成传送图案。此时，内插测量的传输失真的数据。通过计算机计算通过以网格状态划分图案而获得的每个微小区域的校正量。微小区域中的图形数据的位置通过每个区域的校正量来校正。通过使用以这种方式形成的校正数据，在掩模3上形成转印图案3a。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式