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    • 71. 发明专利
    • Video display device, rear projection screen used therefor, fresnel lens sheet and its manufacturing method
    • 视频显示设备,其后投影屏幕,FRESNEL镜片及其制造方法
    • JP2005091541A
    • 2005-04-07
    • JP2003322430
    • 2003-09-16
    • Hitachi Ltd株式会社日立製作所
    • YOSHIKAWA HIROKIOISHI SATORUHIRATA KOJIIMAFUKU DAISUKE
    • G02B3/08G03B21/10G03B21/62H04N5/74
    • PROBLEM TO BE SOLVED: To provide technique which is suitable for shortening the depth of a video display device, without significantly impairing the image quality (brightness) of a display video on a screen. SOLUTION: A total reflection type prism part (10), emitting an incident light beam as an emitted light beam having a specified emitting angle by a total reflection phenomenon after a 1st refraction phenomenon, is provided in a range where the incident angle of a projected video projected from an optical component on the Fresnel lens sheet (6), constituting the rear projection screen, is at least ≥ about 40° on the video generating source side of the Fresnel lens sheet (6), and a refraction type prism part (11), emitting the incident light beam as the emitted light beam having a specified emitting angle by a 2nd refraction phenomenon, is provided in a range facing a part where the total reflection type prism part is not provided on the video observation side of the Fresnel lens sheet. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供适合于缩短视频显示设备的深度的技术,而不会显着损害屏幕上的显示视频的图像质量(亮度)。 解决方案:在第一折射现象之后,通过全反射现象发射入射光束作为具有特定发射角的发射光束的全反射型棱镜部分(10)设置在入射角 构成背投屏幕的菲涅耳透镜片(6)上的光学部件投影的投影视频在菲涅耳透镜片(6)的视频发生源侧至少≥40°,折射型 棱镜部分(11)在与全反射型棱镜部分没有设置在视频观察侧的部分相对的范围内被提供,该入射光束作为具有指定的发射角的第二折射现象的发射光束发射。 的菲涅尔透镜片。 版权所有(C)2005,JPO&NCIPI
    • 72. 发明专利
    • Projection type display device
    • 投影型显示设备
    • JP2005043395A
    • 2005-02-17
    • JP2003199575
    • 2003-07-22
    • Hitachi Ltd株式会社日立製作所
    • TANITSU MASAHIKOHIRATA KOJI
    • G02B5/30G02F1/13G03B21/00H04N9/31
    • PROBLEM TO BE SOLVED: To provide a projection type display device in which good color balance and a high amount of luminous flux (high luminance) are simultaneously realized while maintaining color temperature high during white color reproducing, and also to provide a back surface projection type display device using the projection type display device.
      SOLUTION: When red color display is to be conducted, a dichroic mirror is provided with characteristics wherein white color luminous flux is separated into red color luminous flux and green color/blue color luminous flux, and the green color luminous flux and the blue color luminous flux are transmitted to the red color luminous flux side to a certain extent so as to be mixed with the red color luminous flux. Moreover, a red color trimming filter is provided with a spectral transmissivity characteristics to cut green color luminous flux (including yellow color luminous flux) and to transmit an amount of blue color luminous flux.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供一种投影型显示装置,其中在白色再现期间保持色温高的同时实现良好的色彩平衡和大量的光通量(高亮度),并且还提供背面 表面投影型显示装置。

      解决方案:当要进行红色显示时,分色镜具有白色光通量分为红色光通量和绿色/蓝色光通量的特性,绿色光通量和 将蓝色光通量一定程度地传输到红色光通量侧,以便与红色光通量混合。 此外,红色修整滤光器具有切割绿色光通量(包括黄色光通量)的光谱透射特性并透射蓝色光通量。 版权所有(C)2005,JPO&NCIPI

    • 73. 发明专利
    • Projection display device and back projection display device using same
    • 投影显示装置和使用相同的投影显示装置
    • JP2005037564A
    • 2005-02-10
    • JP2003198848
    • 2003-07-18
    • Hitachi Ltd株式会社日立製作所
    • HIRATA KOJITANITSU MASAHIKO
    • G02B27/18G02F1/133G03B21/00G03B21/10H04N5/66H04N5/74H04N9/31
    • H04N9/3105
    • PROBLEM TO BE SOLVED: To achieve high image quality and high reliability in a projection video display device. SOLUTION: In the display device, color purity is improved by cutting a yellow component from red and green ones, and also the balance of light energy among three colors is made well by inserting a reflection type attenuating filter which reflects light in a green optical path. Furthermore, an optical phase difference compensating plate is provided in the green optical path so as to improve contrast performance, and simultaneously two optical parts to which ultraviolet reflection coating is applied are arranged in a blue optical path and an ultraviolet absorbing filter is provided on the incident side of a blue liquid crystal panel in order to realize the prolongation of the life of a video display element. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了在投影视频显示装置中实现高图像质量和高可靠性。 解决方案:在显示装置中,通过从红色和绿色切割黄色成分来提高色纯度,并且通过将反射型衰减滤光器插入到反射型衰减滤光片中,可以很好地得到三种颜色之间的光能平衡 绿色光路。 此外,在绿色光路中设置光学相位差补偿板,以提高对比度性能,并且同时将两个施加有紫外线反射涂层的光学部件布置在蓝色光路中,并且紫外线吸收滤光器设置在 为了实现视频显示元件的寿命的延长,蓝色液晶面板的入射侧。 版权所有(C)2005,JPO&NCIPI
    • 79. 发明专利
    • METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
    • JP2003203969A
    • 2003-07-18
    • JP2002001899
    • 2002-01-09
    • HITACHI LTDHITACHI ULSI SYS CO LTD
    • OTA HIROSHIHIRATA KOJIKIKAWA TAKESHI
    • H01L21/331H01L21/338H01L21/76H01L29/737H01L29/778H01L29/812
    • PROBLEM TO BE SOLVED: To solve the problem in the case of isolation of semiconductor elements, such as deterioration of characteristics due to deterioration in crystallinity, increase of leakage current due to contact of an active layer with electrode metal, and step cut of the electrode metal and wiring metal in a step difference part. SOLUTION: In a method for forming an active layer in an element part of a semiconductor wafer by using an ion implanting method or a diffusion method, or an element isolation method of a semiconductor element, by increasing electrical resistance of a part except an element part after the active layer is formed over the whole semiconductor wafer, this method for manufacturing a semiconductor device includes a process for forming the active layer on a semiconductor substrate, a process for forming a spacer layer for lift-off on an upper layer of the active layer, a process for anisotropically working the spacer layer, a process for working a semiconductor layer containing the active layer, by using the spacer layer or mask material for working the spacer layer as a mask, a process for directivity-depositing an insulating film on the spacer layer and on the entire surface of an exposed semiconductor layer, and a process for eliminating the spacer layer, by using an etching agent for etching and eliminating only the spacer layer. COPYRIGHT: (C)2003,JPO