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61. 发明专利

JPS61231184A DEVICE FOR WORKING LOCAL POSITION 失效
公开(公告)号：JPS61231184A
公开(公告)日：1986-10-15
申请号：JP7382185
申请日：1985-04-08
申请人： HITACHI LTD
发明人： IMURA MIDORI , MORIJIRI AKASHI , HANAZONO MASANOBU , OGINO HIROYUKI
IPC分类号： C23C18/14 , C23C18/16 , C23C18/31 , C23F1/08 , H05K3/22
摘要： PURPOSE:To work only an extremely small working necessary part accurately, by detecting said part by rod lenses to position laser beam machining device, and working the part locally while sealing working liquid. CONSTITUTION:The extremely small working necessary part 12 is detected by the rod lenses 8, 9, to arrange processing apparatus so that irradiation center of a laser beam 10 is positioned to the part 12 of a material 11 to be worked. Next, working liquid is introduced from an introducing pipe 7 to fill space surrounded by an inner tube 3 to bring the part 12 to contact therewith, exhausted from a piping 6 through a space surrounded by an inner tube 2, air is allowed to flow as sealing fluid through a space surrounded by an outer tube 1, to work the part 12 by the light 10. Thereat, denoting pressure of processing liquid in the tube 3 as P3, that between the tubes 3 and 2 as P2, that of sealing fluid between the tubes 1 and 2 as P1, a relation of P1>P3>P2 is maintained. In this way, contamination of the other parts due to working liquid is prevented.

62. 发明专利

JPS61228488A DISPLAY PANEL 失效
公开(公告)号：JPS61228488A
公开(公告)日：1986-10-11
申请号：JP6658085
申请日：1985-04-01
申请人： HITACHI LTD
发明人： FUYAMA MORIAKI , TAMURA KATSU , FUNIYU MASAO , NUNOKAWA ISAO , HANAZONO MASANOBU
IPC分类号： H05B33/06 , G09F9/00 , G09F9/30 , H05K3/28 , H05K3/34

63. 发明专利

JPS61176196A WIRING BOARD FOR MODULE 失效
公开(公告)号：JPS61176196A
公开(公告)日：1986-08-07
申请号：JP1688785
申请日：1985-01-31
申请人： HITACHI LTD
发明人： KAWABE TAKASHI , MIURA OSAMU , HARA SHINICHI , HANAZONO MASANOBU , MIYAZAKI KUNIO , OTSUKA KANJI , NUMATA SHUNICHI
IPC分类号： H05K3/46 , B32B7/02 , B32B15/08

64. 发明专利

JPS61159623A LIQUID-CRYSTAL DISPLAY DEVICE 失效
公开(公告)号：JPS61159623A
公开(公告)日：1986-07-19
申请号：JP23085
申请日：1985-01-07
申请人： HITACHI LTD
发明人： KOZONO YUZO , ASHIDA EIJI , KONUMA AKIRA , HANAZONO MASANOBU
IPC分类号： G02F1/1343 , G02F1/133 , G02F1/1335 , G09F9/00
摘要： PURPOSE:To improve contrast and visual angle characteristic by forming electrodes on one side in common use as a reflection film to a black surface. CONSTITUTION:A high heat conduction layer 9, a heat insulating layer 10 and heating electrodes 11 are laminated atop one glass substrate 1 and transparent electrodes 5 are disposed on the other glass substrate 6. A liquid crystal layer having a smectic phase is sandwiched via an oriented film 3 between the electrodes 11 and the transparent electrodes 5. The intersected points of the heating electrodes 11 and the transparent electrodes 5 form picture elements, thus forming a matrix shape as a whole. The electrodes 11 are, for example, an Al alloy composed by adding Cu and Si to Al and are incorporated with an oxide which is an insulator to have the black surface.

65. 发明专利

JPS6190496A Manufacture of multilayer interconnection substrate 失效
公开(公告)号：JPS6190496A
公开(公告)日：1986-05-08
申请号：JP21135584
申请日：1984-10-11
申请人： Hitachi Ltd
发明人： IMURA MIDORI , MORIJIRI MAKOTO , HANAZONO MASANOBU
IPC分类号： H05K3/46 , H05K3/40
CPC分类号： C23C18/1612 , C23C18/161

66. 发明专利

JPS60106689A LASER WORKING DEVICE 失效
公开(公告)号：JPS60106689A
公开(公告)日：1985-06-12
申请号：JP21393183
申请日：1983-11-16
申请人： HITACHI LTD
发明人： IMURA MIDORI , MORIJIRI MAKOTO , HANAZONO MASANOBU , WAI SHINICHI
IPC分类号： B23K26/12 , B23K26/14
摘要： PURPOSE:To prevent positional deviation of a radiation energy beam and to enable formation and correction of a fine pattern with a device for condensing said beam to a work in a soln. by covering the soln. surface with a cover through which said beam is transmitted. CONSTITUTION:A base material 1 which is a ceramic substrate is put into a plating liquid 5 (for example, electroless copper plating liquid) and the radiation energy beam 8 emitted from an emission source 6 is condensed via a condenser lens 7 onto a work. The energy density of the beam 8 is kept below the density at which the material 1 is subjected to plating. The beam 8 is thereupon scanned and a desired pattern conforming to the scanning is formed on the material 1. The liquid 5 is held covered by a cover 13 through which the beam 8 is transmitted. The liquid surface condition is thus always constant and the positional deviation when the beam 8 enters the liquid 5 is prevented without generation of out-of-focus. As a result, the formation and correction of the fine pattern on the base material 1 are made possible.

67. 发明专利

JPS6049964A THERMAL HEAD AND MANUFACTURE THEREOF 失效
公开(公告)号：JPS6049964A
公开(公告)日：1985-03-19
申请号：JP15785683
申请日：1983-08-31
申请人： HITACHI LTD
发明人： FUYAMA MORIAKI , TAMURA KATSU , NUNOKAWA ISAO , FUNIYUU MASAO , HANAZONO MASANOBU , MIYAKE HIROSHI , SATOU AKIRA
IPC分类号： H01C17/12 , B41J2/335 , H01L49/00
摘要： PURPOSE:To obtain a highly reliable thermal head eliminating poor grounding by forming an insulator by sputtering method with a heat generating resistor and/or a conductive metal wire held at an earth potential. CONSTITUTION:An undercoat film 2 is formed entirely on an alumina substrate 1 as insulating substrate and then, a 0.1mum thick heat generating resistor 3 made of a Cr-Si alloy and a 1.5mum Al conductors 4 and 6 are formed in a specified pattern. Then, an auxiliary electrode terminal 8 is formed in a specified pattern. The substrate 12 thus laminated and patterned is set on a sputtering device 9 and SiO2 as insulator 5 is formed at the thickness of about 3.5mum by sputtering method. In addition, Si3N4 is formed at the thickness of 1.0-2.0mum by plasma CVD method thereon and a contact through hole is formed in the Si3N4/SiO2 double-layer film.

68. 发明专利

JPS5877019A THIN FILM MAGNETIC HEAD 失效
公开(公告)号：JPS5877019A
公开(公告)日：1983-05-10
申请号：JP16646082
申请日：1982-09-27
申请人： HITACHI LTD
发明人： HANAZONO MASANOBU , TAMURA KATSU , ASAI OSAMU , NEMOTO KEITAROU , GOUHARA YOSHIO
IPC分类号： G11B5/31
摘要： PURPOSE:To avoid the disconnection of a conductor film and the short circuit between the conductor film and a magnetic film, by extending an insulated film formed between a lower magnetic film and the conductor film up to an area where the conductor film is formed on a substrate and having a substantially flat surface of the insulated film where the conductor film is formed. CONSTITUTION:A lower magnetic film 2 is formed on a substrate 1 and then covered by an organic resin film 3. The film 3 has a larger thickness than the film 2 to avoid the unevenness of film surface between the area having the film 2 and the area having no film 2. A conductor film 4 is formed on the film 3 with a partial cross with the film 2. An end 51 of an upper magnetic film 5 has a contact with an end of the film 2 through a window part of the film 3; while the other end 52 is set opposite to the other end of the film 2 via a magnetic gap G. In such way, the films 2 and 4 are formed. The film 5 has a magnetic gap at a part like the film 2 and crosses a coil formed with the film 4 and forms a magnetic circuit.

69. 发明专利

JPS573212A FORMING METHOD FOR MULTILAYER FILM FOR ELECTRONIC CIRCUIT 失效
公开(公告)号：JPS573212A
公开(公告)日：1982-01-08
申请号：JP7563280
申请日：1980-06-06
申请人： HITACHI LTD
发明人： HANAZONO MASANOBU , AKIYAMA HIROSHI , HARA SHINICHI , SAKIMURA MITSUO , KAWAKAMI HIROJI
IPC分类号： G11B5/31 , G11B5/127 , G11B5/17 , G11B5/12
摘要： PURPOSE:To obtain a high-precision multilayered film free from a shift in position by forming a mask with a smaller window than the opening of an intermediate layer on a substrate through the intermediate layer, and then by forming the multilayered film by alternating vapor deposition and ion plating. CONSTITUTION:For the formation of a multilayered film consisting of alternately stacked conductor films 13 and insulating films 14, for example, polyimide resin 11 is applied over a substrate 1 to about 5mum and after it is cured, and about 0.3mum thickness film of Mo12 is vapor-deposited. The Mo film 12 is photoetched to form an accurate pattern. In an atmosphere of O2, sputtering is carried out to cut into the resin film 11. Under high vacuum, a conductor 13 is vapor-deposited from above and on it, and insulating film 14 is stacked by ion plating. This operation is repeated to obtain a multilayered film. Thus, the high-precision multilayered film free from a shift in position is obtained.

70. 发明专利

JPS5616674A FORMING METHOD FOR TRANSPARENT ELECTRICALLY CONDUCTIVE FILM PATTERN OF INDIUM OXIDE AND TIN OXIDE 失效
公开(公告)号：JPS5616674A
公开(公告)日：1981-02-17
申请号：JP9039879
申请日：1979-07-18
申请人： HITACHI LTD
发明人： SHINJIRI MAKOTO , HANAZONO MASANOBU , TAMURA TSUYOSHI , URA MITSURU
IPC分类号： C23F1/30 , C23F1/00
摘要： PURPOSE:To form a minute pattern with high dimensional accuracy by covering the pattern forming portion of an electrically conductive film with resin type ink and etching the naked portion of the film with hydrobromic acid. CONSTITUTION:The resin-base ink is printed on an electrically conductive film consisting of indium oxide and tin oxide as a substrate by screen printing or other method to cover the pattern forming portion of the film. This substrate is then dipped in an about 47% aqueous soln. of hydrobromic acid kept at about 45 deg.C to etch the naked portion of the film. By this method the extent of side etching is reduced to enhance the dimensional accuracy, and a minute pattern can be formed stably.

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