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51. 发明专利

JP2007116132A Method of manufacturing substrate 审中-公开
标题翻译：制造基板的方法
公开(公告)号：JP2007116132A
公开(公告)日：2007-05-10
申请号：JP2006254975
申请日：2006-09-20
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： KUGLER THOMAS , LI SHUNPU , NEWSOME CHRISTOPHER , RUSSEL DAVID
IPC分类号： H05K3/10 , B41C1/10 , B41M3/00 , B41N1/08 , B41N1/14 , H01L29/786 , H01L51/00 , H05K3/12 , H05K3/38
CPC分类号： B41C1/10 , B41C1/1066 , B41N1/08 , B41N1/14 , H01L51/0004 , H05K3/1208 , H05K3/386 , H05K2201/0209 , H05K2201/0212 , H05K2203/1173
摘要： PROBLEM TO BE SOLVED: To provide a substrate having a good wetting contrast.
SOLUTION: A substrate has a wetting contrast. The surface area of at least one part of the wetting contrast is derived from a surface polymer layer comprising embedded particles, so it is rough. Since this surface roughness affects the surface characteristics of the substrate, especially hydrophilicity and/or oleophilicity, it is important. According to a first method of the present invention, a substrate having a surface comprising adjacent regions with different hydrophilicity and/or oleophilicity is manufactured. This method is provided with a step for forming a pattern of a first composition comprising a polymer matrix and particles of a substance other than the polymer matrix on a substrate precursor. Furthermore, a method of manufacturing a microelectronic member is provided with a step for arranging electronically functional materials on the substrate having a wetting contrast.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有良好润湿对比度的基底。解决方案：基板具有润湿对比度。润湿对比度的至少一部分的表面积来自包含嵌入颗粒的表面聚合物层，因此它是粗糙的。由于该表面粗糙度影响基材的表面特性，特别是亲水性和/或亲油性，所以重要的是。根据本发明的第一种方法，制造具有包括具有不同亲水性和/或亲油性的相邻区域的表面的基材。该方法具有在基板前体上形成包含聚合物基质和除了聚合物基质之外的物质的颗粒的第一组合物的图案的步骤。此外，制造微电子部件的方法具有将电子功能材料布置在具有润湿对比度的基板上的步骤。版权所有（C）2007，JPO＆INPIT

52. 发明专利

JP2007055224A Lithographic printing original plate, lithographic printing method and package of lithographic printing original plate precursors 审中-公开
标题翻译：平版印刷原版，平版印刷方法和印刷原版印前封面
公开(公告)号：JP2007055224A
公开(公告)日：2007-03-08
申请号：JP2006017883
申请日：2006-01-26
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： MITSUMOTO TOMOYOSHI , OSHIMA YASUHITO
IPC分类号： B41N3/00 , B41N1/14 , B65D85/00 , G03F7/00 , G03F7/004 , G03F7/11
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/04 , B41C2201/06 , B41C2201/10 , B41C2201/12 , B41C2201/14 , B41C2210/04 , B41C2210/08 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41M5/465 , B41N1/08 , B41N1/14 , G03F7/0012 , G03F7/002 , G03F7/11
摘要： PROBLEM TO BE SOLVED: To offer a package of lithographic printing original plates of on-press development type, an on-press development type lithographic printing original plate which excels in on-press developability and printing plate durability, and an on-press development type or unprocessed type (no negative-development type) lithographic printing original plate precursor which excels in the plate visibility after exposure, in printing plate durability and has few maculatures. SOLUTION: A packaged 6 of lithographic printing original plate 3, wherein an image-recording layer or a protective layer of the outermost surface layer contains an inorganic layered compound. A lithographic printing original plate precursor having a protective layer containing an inorganic layered compound, and an image-recording layer containing a binder polymer. And a lithographic printing original plate having a protective layer containing an inorganic layered compound, and an image-recording layer containing an infrared absorber and an iodonium compound. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种印刷机显影型的平版印刷原版印刷机，具有优异的印刷显影性和印版耐久性的印刷机显影型平版印刷原版，印刷显影类型或未加工型（无负显影型）平版印刷原版前体，其曝光后的印版可视性优异，印版耐久性好，具有较小的印刷性。解决方案：平版印刷原版3的封装6，其中最外表面层的图像记录层或保护层含有无机层状化合物。具有含有无机层状化合物的保护层的平版印刷原版原版和含有粘合剂聚合物的图像记录层。以及具有含有无机层状化合物的保护层的平版印刷原版和含有红外吸收剂和碘化合物的图像记录层。版权所有（C）2007，JPO＆INPIT

53. 发明专利

JP2006123545A Lithographic printing plate comprising porous non-anodic layer 有权
标题翻译：包含多孔非阳极层的平版印刷版
公开(公告)号：JP2006123545A
公开(公告)日：2006-05-18
申请号：JP2005290245
申请日：2005-10-03
申请人： Acktar Ltd , アクターリミテッド
发明人： KATSIR DINA , FINKELSTEIN ZVI , ZARNITSKY YURI
IPC分类号： B41N1/10 , B41N1/14 , G03F7/00 , G03F7/09 , G03F7/11
CPC分类号： B41N1/08 , G03F7/11
摘要： PROBLEM TO BE SOLVED: To offer a substrate which can provide a good printing quality even without a graining processing and a printing plate using the ungrained substrate. SOLUTION: A printing plate comprises a metal substrate, a porus non-anodic ungrained coating, having a thickness within the range of about 0.1 to about 30 μm and comprising at least one of metals, metal oxides and admixtures their, and an image recording layer, provided that where the porous coating consists essentially of oxide only, it comprises at lease one oxide of copper, magnesium, cadmium, aluminum, zirconium, hafnium, thorium, chromium, tungsten, molybdenum and/or cobalt and further provided that where the porous coating consists essentially of alumina only, it comprises specified pores. The invention also relates to an article of manufacture having a nanometric porous surface layer comprising at least one of metals, metal oxides and mixture their, which comprises pores in the surface layer having a width in a range of 0-100 nm, and wherein a major number of pores in this range have a width in a band of about 1 to about 30 nm. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供即使没有粗化处理也能提供良好的印刷质量的基材和使用未研磨的基材的印刷版。解决方案：印版包括金属基底，孔隙非阳极未研磨的涂层，其厚度在约0.1至约30μm的范围内，并且包括金属，金属氧化物和其混合物中的至少一种，以及图像记录层，只要多孔涂层基本上仅由氧化物组成，其至少包含铜，镁，镉，铝，锆，铪，钍，铬，钨，钼和/或钴的至少一种氧化物，并且还提供其中多孔涂层基本上仅由氧化铝组成，其包含指定的孔。本发明还涉及一种具有纳米多孔表面层的制品，该纳米多孔表面层包括金属，金属氧化物和它们的混合物中的至少一种，其包含表面层中具有在0-100nm范围内的宽度的孔，并且其中在该范围内的主要孔数具有约1至约30nm的带宽。版权所有（C）2006，JPO＆NCIPI

54. 发明专利

JP2005262530A Support for lithographic printing form and lithographic printing form original plate 有权
标题翻译：立体印刷版和平版印刷版原版支持
公开(公告)号：JP2005262530A
公开(公告)日：2005-09-29
申请号：JP2004075759
申请日：2004-03-17
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： MATSUURA MUTSUMI , SAWADA HIROKAZU , UESUGI AKIO
IPC分类号： G03F7/09 , B41N1/08 , B41N3/00 , B41N3/03 , C25D11/04 , G03F7/00
CPC分类号： B41N1/08 , B41N1/083 , B41N3/03 , C25F3/04
摘要： PROBLEM TO BE SOLVED: To provide a support for a lithographic printing form having a favorable resistance to dirt and an extremely excellent printing durability. SOLUTION: This support for the lithographic printing form has at least 5.0 protrusions each having a height above a center line of at least 0.70 μm and an equivalent circular diameter of at least 20 μm under the state being measured within the range of 400 μm×400 μm on a surface with a three-dimensional non-contact surface roughness meter and at least 800 concavities each having a depth below the center line at least 0.50 μm and the equivalent circular diameter of at least 2.0 μm under the state being measured within the range of 400 μm×400 μm on the surface with the three-dimensional non-contact surface roughness meter. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供对具有良好的耐污性和非常优异的印刷耐久性的平版印刷版的支撑体。解决方案：对于平版印刷版的这种支持，在400度范围内测量的状态下，至少有5.0个凸起，每个凸起的高度高于至少0.70μm的中心线和至少20μm的等效圆直径在具有三维非接触表面粗糙度计的表面上具有至少800个凹槽，在测量状态下具有至少0.50μm的中心线深度至少为2.0μm的等效圆直径的至少800个凹槽在表面具有400μm×400μm的范围内的三维非接触表面粗糙度计。版权所有（C）2005，JPO＆NCIPI

55. 发明专利

JP2004199073A Hydroxy-amino thermally cured undercoat for 193nm lithography 审中-公开
标题翻译：用于193NM光刻的羟基 - 氨基酸热固化底漆
公开(公告)号：JP2004199073A
公开(公告)日：2004-07-15
申请号：JP2003419662
申请日：2003-12-17
申请人： Arch Specialty Chemicals Inc , アーチ・スペシャルティ・ケミカルズ・インコーポレイテッドOlin Microelectronic Chemicals,Inc.
发明人： FOSTER PATRICK , SLATER SYDNEY GEORGE , STEINHAUSLER THOMAS , BLAKENEY ANDREW J , BIAFORE JOHN JOSEPH
IPC分类号： G03F7/11 , B41C1/10 , B41M5/36 , B41N1/08 , B41N1/14 , C08F4/04 , C08F8/32 , C08F12/22 , C08F220/28 , C08K5/3492 , C08K5/42 , C08L29/02 , C08L29/08 , C09D125/08 , C09D125/18 , G03C1/492 , G03C1/76 , G03F7/039 , G03F7/075 , G03F7/09 , G03F7/26 , G03F7/40 , H01L21/027
CPC分类号： G03F7/11 , B41C1/1008 , B41C1/1016 , B41C2201/04 , B41C2201/14 , B41C2210/02 , B41C2210/06 , B41C2210/24 , B41N1/08 , B41N1/14 , C08F4/04 , C08F8/32 , C08F212/08 , C08F212/14 , C08F216/18 , C08K5/34922 , C08K5/42 , C08L57/10 , C09D125/08 , C09D125/18 , G03F7/0392 , G03F7/0758 , G03F7/091 , G03F7/094 , Y10T428/31667 , Y10T428/31855 , C08L25/08 , C08F220/18
摘要： PROBLEM TO BE SOLVED: To provide a thermally cured undercoat composition for deep UV lithography and to provide an undercoat curable at a temperature lower than 50°C in a shorter period of time than 3 minutes, insoluble with the solvent for the overcoat resist, minimizing the reflective effect and having a comparable etching rate to that of a novolac resin.
SOLUTION: A radiation-sensitive resist material is applied on the thermally cured under coat comprising a thermally curable composition containing a hydroxyl-containing polymer, an amino crosslinking agent and a thermal acid generator. The hydroxyl-containing polymer consists of 30 to 60 mol of hydroxystyrene monomer unit and 40 to 70 mol of isobornyl (meth)acrylate monomer unit.
COPYRIGHT: (C)2004,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于深UV光刻的热固化底涂层组合物，并且在比3分钟更短的时间内在低于50℃的温度下提供底涂层可固化，不溶于外涂层的溶剂抗蚀剂，使反射效果最小化并具有与酚醛清漆树脂相当的蚀刻速率。解决方案：将辐射敏感抗蚀剂材料涂覆在包含含羟基聚合物，氨基交联剂和热酸发生剂的可热固化组合物的热固化底涂层上。含羟基的聚合物由30-60摩尔羟基苯乙烯单体单元和40-70摩尔（甲基）丙烯酸异冰片酯单体组成。版权所有（C）2004，JPO＆NCIPI

56. 发明专利

JP2004185017A Hydroxy-amino thermally cured undercoat for 193nm lithography 有权
公开(公告)号：JP2004185017A
公开(公告)日：2004-07-02
申请号：JP2003419661
申请日：2003-12-17
申请人： Arch Specialty Chemicals Inc , アーチ・スペシャルティ・ケミカルズ・インコーポレイテッドOlin Microelectronic Chemicals,Inc.
发明人： FOSTER PATRICK , SLATER SYDNEY GEORGE , STEINHAUSLER THOMAS , BLAKENEY ANDREW J , BIAFORE JOHN JOSEPH
IPC分类号： G03F7/11 , B41C1/10 , B41M5/36 , B41N1/08 , B41N1/14 , C08F4/04 , C08F8/32 , C08F12/22 , C08F220/28 , C08K5/3492 , C08K5/42 , C08L29/02 , C08L29/08 , C09D125/08 , C09D125/18 , G03C1/492 , G03C1/76 , G03F7/039 , G03F7/075 , G03F7/09 , G03F7/26 , G03F7/40 , H01L21/027
CPC分类号： G03F7/11 , B41C1/1008 , B41C1/1016 , B41C2201/04 , B41C2201/14 , B41C2210/02 , B41C2210/06 , B41C2210/24 , B41N1/08 , B41N1/14 , C08F4/04 , C08F8/32 , C08F212/08 , C08F212/14 , C08F216/18 , C08K5/34922 , C08K5/42 , C08L57/10 , C09D125/08 , C09D125/18 , G03F7/0392 , G03F7/0758 , G03F7/091 , G03F7/094 , Y10T428/31667 , Y10T428/31855 , C08L25/08 , C08F220/18
摘要： PROBLEM TO BE SOLVED: To provide a thermally cured polymer composition which is useful as an undercoat layer for a chemically amplified bilayer resist system, and to provide an optical lithographic substrate coated with the same.
SOLUTION: The thermally cured polymer composition is composed of a hydroxyl-containing polymer, an amino cross-linking agent, and a thermal acid generator, according to the general formula in Formula 1.
COPYRIGHT: (C)2004,JPO&NCIPI

57. 发明专利

JP2004106200A Support for lithographic printing plate, its manufacturing method, and lithographic printing original plate 审中-公开
公开(公告)号：JP2004106200A
公开(公告)日：2004-04-08
申请号：JP2002268169
申请日：2002-09-13
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： SASAKI HIDETO , HOTTA HISASHI
IPC分类号： G03F7/09 , B41N1/00 , B41N1/08 , B41N3/00 , B41N3/03 , B41N3/08 , C25D11/18 , G03F7/00 , G03F7/11
CPC分类号： B41N3/006 , B41N1/00 , B41N1/08 , B41N3/03 , B41N3/08 , Y10S430/145 , Y10S430/165
摘要： PROBLEM TO BE SOLVED: To provide a support for a lithographic printing plate which is excellent in both stain resistance and printing resistance as the lithographic printing plate and is used as a lithographic printing original plate, and its manufacturing method. SOLUTION: The support for a lithographic printing plate is treated with an aqueous solution containing one or more kinds of divalent or polyvalent cations having a concentration of 0.0001 mol/L to 0.02 mol/L. COPYRIGHT: (C)2004,JPO

58. 发明专利

JP2003341250A Printing plate material 有权
标题翻译：印刷板材
公开(公告)号：JP2003341250A
公开(公告)日：2003-12-03
申请号：JP2002157217
申请日：2002-05-30
申请人： Konica Minolta Holdings Inc , コニカミノルタホールディングス株式会社
发明人： MORI TAKAHIRO
IPC分类号： G03F7/004 , B41C1/10 , B41N1/08 , B41N1/14 , G03F7/00 , G03F7/11
CPC分类号： B41N1/14 , B41C1/1025 , B41C1/1033 , B41C2210/04 , B41C2210/08 , B41C2210/24 , B41N1/08
摘要： PROBLEM TO BE SOLVED: To provide a printing plate material capable of using various base materials each having a hydrophilic layer requiring no special developing treatment, suitable for CTR and showing an adaptable good printing capacity and having a tough coating layer having sufficient printing durability even in printing by using quality paper.
SOLUTION: In the printing plate material having a lower layer and a porous hydrophilic layer on a substrate in this order, the lower layer contains 30 mass% or more of metal oxide fine particles (A) with a particle size of 1-20 nm and the thickness of the lower layer is 0.1-5.0 μm and the lower layer has cracks with a gap of below 1 μm.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种能够使用各种基材的印版材料，其各自具有不需要特殊显影处理的亲水层，适合于CTR并显示出适应性良好的印刷能力，并且具有足够印刷的坚硬涂层即使在使用优质纸打印时也是如此。解决方案：在基板上依次具有下层和多孔亲水层的印版材料中，下层含有30质量％以上的粒径为1〜3μm的金属氧化物微粒（A） 20nm，下层的厚度为0.1-5.0μm，下层具有间隙小于1μm的裂纹。版权所有（C）2004，JPO

59. 发明专利

JP3359647B2 The lithographic affinity modulatory methods and printing member created by it 失效
公开(公告)号：JP3359647B2
公开(公告)日：2002-12-24
申请号：JP50439399
申请日：1998-04-21
申请人：プレステク,インコーポレイテッド
发明人：エリス，アーネスト，ダブリュー
IPC分类号： B41C1/10 , B41N1/08 , B41N1/14
CPC分类号： B41C1/10 , B41N1/08

60. 发明专利

JPS5931192A Support for planographic printing plate 失效
标题翻译：支持平面印刷板
公开(公告)号：JPS5931192A
公开(公告)日：1984-02-20
申请号：JP11464382
申请日：1982-06-30
申请人： Konishiroku Photo Ind Co Ltd
发明人： SUZUKI NORIHITO , YAMAMOTO TAKESHI , AOKI TOORU , IWAKI KAZUO
IPC分类号： B41N1/10 , B41M1/10 , B41N1/08
CPC分类号： B41M1/10 , B41N1/08
摘要： PURPOSE: To obtain a support for a planographic printing plate excellent in latitude of developability and printing durability, by using an iron material with center line average roughness of 0.1W3μm as an iron material on which a cromium electrodeposition layer is formed.
CONSTITUTION: As an iron material used as a base material, a plate shaped one which may be made of an iron alloy such as carbon steel or special steel other than pure iron and subjected to surface roughening treatment so as to bring the center line average roughness (Ra) thereof to 0.1W3μm is used. Surface roughening may be performed by either one of a mechanical method, a chemical method and an electrolytic method. A chromium electrodeposition layer having protruded parts formed on the iron material has, for example, polygonal crystal substance and/or the agglomerate thereof and pref. has a thickness of 0.01W 10μm and can be formed by a method wherein the iron material is subjected to electrolytic treatment in a plating liquid having the ratio of Cr
6+ ion concn. and sulfate ion concn. of 75W18 at current density of 100A/dm
2 or less and a temp. of 40°C or less for 30sec or more.
COPYRIGHT: (C)1984,JPO&Japio
摘要翻译：目的：为了获得显影性和印刷耐久性优良的平版印刷版的支撑体，通过使用中心线平均粗糙度为0.1-3μm的铁材作为其上形成有电晕沉积层的铁材料。构成：作为基材的铁质材料，可以由铁合金例如碳钢或纯铁以外的特殊钢制成，并进行表面粗糙化处理，以使中心线平均粗糙度（Ra）为0.1-3μm。表面粗糙化可以通过机械法，化学法和电解法中的任一种进行。具有形成在铁材上的突出部分的铬电沉积层例如具有多边形结晶物质和/或其聚集体并且是预制的。的厚度为0.01〜10μm，可以通过以下方法形成铁材：在Cr <6+>离子浓度比例的电镀液中进行电解处理。和硫酸根离子浓度电流密度为100A / dm 2以下，温度为75〜18℃。 40℃以下30秒以上。

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