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51. 发明专利

JPH07149504A A-SITE SUBSTITUTED BROWN MILLERITE TYPE COMPOUND 失效
公开(公告)号：JPH07149504A
公开(公告)日：1995-06-13
申请号：JP29361993
申请日：1993-11-24
申请人： TOSOH CORP
发明人： MORI TOSHIYUKI , KURAMOCHI TOSHIHITO , YAMAMURA HIROSHI
IPC分类号： C01B13/14 , C01G1/00 , H01B1/06
摘要： PURPOSE:To provide a A-site substituted brown millerite type compound which can be applied to a variety of electronic materials including cells and gas sensors because it has a large number of oxygen defects and enables to obtain a solid electrolyte utilizing the actions of the defects. CONSTITUTION:The compound is a brown millerite type which is represented by the formula: A2B2O5 where A comprises a trivalent metal and a monovalent metal and has divalence on the average; B is a metal having less than 1 angstrom ionic radius and trivalence.

52. 发明专利

JPH0730167A BIMORPH PIEZOELECTRIC ELEMENT 失效
公开(公告)号：JPH0730167A
公开(公告)日：1995-01-31
申请号：JP16991793
申请日：1993-07-09
申请人： TOSOH CORP
发明人： OKAMURA TOSHIHIKO , OSADA HIRONARI , KUDO MASAYUKI , KOIKE TOMOKAZU , KURAMOCHI TOSHIHITO
IPC分类号： F04B9/00 , H01L41/09
摘要： PURPOSE:To prevent the characteristic of an element from being lowered and to prevent the element from being destroyed even when a steam sterilization treatment or the like is executed by a method wherein a piezoelectric substance is provided with the Curie temperature at a specific temperature or higher and a material at a glass transition temperature or higher is used as an adhesive. CONSTITUTION:The Curie temperature of a piezoelectric substance is set at 200 deg.C or higher, preferably at 220 deg.C or higher. When the Curie temperature is lower than 200 deg.C, the polarization of the piezoelectric substance is loosened when heat is applied in a sterlization treatment or the like. In addition, it is preferably that the dielectric constant of the piezoelectric substance is at 1500 or higher and that an electromechanical coupling coefficient kp is at 0.5 or higher. When the dielectric constant of the piezoelectric substance is lower than 1500 and the electromechanical coupling coefficient kp is smaller than 0.5, the characteristic of an element is lowered. When a material as specified in the above is used, the characteristic of the element is not lowered and the element is not destroyed even when a steam sterilization treatment or the like is executed.

53. 发明专利

JP2019001681A 窒化ガリウム粒子およびその製造方法审中-公开
公开(公告)号：JP2019001681A
公开(公告)日：2019-01-10
申请号：JP2017117465
申请日：2017-06-15
申请人： TOSOH CORP
发明人： MESHIDA MASAMI , KURAMOCHI TOSHIHITO
IPC分类号： C01B21/06 , C04B35/58 , C23C14/34
摘要：【課題】高密度、高強度な窒化ガリウムのスパッタリングターゲットが作製可能な酸素含有量が少なく成形性の高い窒化ガリウム粒子を提供する。【解決手段】酸化ガリウムと窒化ガリウムの混合粉末を1000〜1100℃の温度で、時間当たりのアンモニア反応量が投入したガリウム量に対し1倍モル以上の割合になるように反応させることにより、酸素含有量が1atm%以下であり、一次粒子の平均粒子径が5μm以上であり、粒度分布の最小粒子から10面積%の範囲の粒子径(10%粒子径)が3μm以下である窒化ガリウム粒子を得る。【選択図】なし

54. 发明专利

JP2015025195A 酸化物焼結体及び酸化物透明導電膜审中-公开
标题翻译：氧化物烧结体和氧化物透明导电膜
公开(公告)号：JP2015025195A
公开(公告)日：2015-02-05
申请号：JP2014048045
申请日：2014-03-11
申请人：東ソー株式会社 , Tosoh Corp
发明人： KURAMOCHI TOSHIHITO , TAMANO KIMIAKI , AKIIKE RYO
IPC分类号： C23C14/34 , C04B35/00 , C23C14/08 , H01B5/14 , H01B13/00
摘要：【課題】製膜や素子製造のプロセスの最高温度を低温に抑えた製造プロセスにおいても十分に低い抵抗率を実現することのできる酸化物焼結体、及びそれにより得られる酸化物透明導電膜を提供することを目的とする。【解決手段】構成元素として、インジウム、ジルコニウム、イットリウム、ハフニウム及び酸素を有する酸化物焼結体であり、インジウム、ジルコニウム、イットリウム及びハフニウムをそれぞれIn、Zr、Y、Hfとしたときに、原子比でZr/(In+Zr+Y+Hf)が0.1〜3.0at%であり、Y/(In+Zr+Y+Hf)が0.005〜0.5at%であり、Hf/(In+Zr+Y+Hf)が0.0002〜0.15at%であることを特徴とする酸化物焼結体。【選択図】なし
摘要翻译：要解决的问题：为了提供一种氧化物烧结体，即使在薄膜生产或元素生产过程中的最高温度在低温下被抑制并且提供氧化物透明的生产过程中也能实现足够低的电阻率在由铟，锆，钇和氧组成的氧化物烧结体中，当铟，锆，钇和铪分别表示为In，Zr，Y和Hf时，Zr /（In + Zr + Y + Hf）为0.1〜3.0原子％，Y /（In + Zr + Y + Hf）为0.005〜0.5原子％，Hf /（In + Zr + Y + Hf）为0.0002〜0.15原子％在原子比方面。

55. 发明专利

JP2014114207A Oxide sintered body, sputtering target using the same and oxide film 审中-公开
标题翻译：氧化物烧结体，使用相同的氧化物膜的溅射靶
公开(公告)号：JP2014114207A
公开(公告)日：2014-06-26
申请号：JP2013238195
申请日：2013-11-18
申请人： Tosoh Corp , 東ソー株式会社
发明人： AKIIKE RYO , KURAMOCHI TOSHIHITO , TAMANO KIMIAKI
IPC分类号： C04B35/453 , C23C14/34 , H01L31/06
CPC分类号： H01L31/072 , C04B35/453 , C04B2235/3201 , C04B2235/3203 , C04B2235/3206 , C04B2235/3208 , C04B2235/3213 , C04B2235/3215 , C04B2235/3224 , C04B2235/3225 , C04B2235/3227 , C04B2235/3229 , C04B2235/3232 , C04B2235/3244 , C04B2235/3251 , C04B2235/3258 , C04B2235/3298 , C04B2235/5409 , C04B2235/5436 , C04B2235/602 , C04B2235/6562 , C04B2235/6565 , C04B2235/6567 , C23C14/08 , C23C14/34 , C23C14/3414 , H01J37/3426 , H01L31/0322 , H01L31/03928 , H01L31/0749 , Y02E10/541 , Y02P70/521
摘要： PROBLEM TO BE SOLVED: To provide an oxide sintered body for a sputtering target to which a specific element can be added from an n-type semiconductor layer to a p-type semiconductor layer surface of a compound thin-film solar cell.SOLUTION: There is provided an oxide sintered body which contains zinc and at least one type of element (X) (provided that a case where magnesium only is added is excluded) which has an ionization potential (Ip) of 4.5 eV≤Ip≤8.0 eV and an atomic radius (d) of 1.20Å≤d≤2.50Å or less, and further has a composition ratio (atomic ratio) of 0.0001≤X/(Zn+X)≤0.20 and a sintered density of 95% or more.
摘要翻译：要解决的问题：提供一种用于溅射靶的氧化物烧结体，可将特定元素从n型半导体层添加到复合薄膜太阳能电池的p型半导体层表面。解决方案：有提供了具有4.5eV≤Ip≤8.0eV的电离电位（Ip）为4.5eV≤Ip≤8.0eV的锌和至少一种元素（X）（只要不包括仅加入镁的情况）的氧化物烧结体，原子半径（d）为1.20Å≤d≤2.50以下，组成比（原子比）为0.0001≤X/（Zn + X）≤0.20，烧结密度为95％以上。

56. 发明专利

JP2012092003A Sintered composite oxide, manufacturing method therefor and transparent conductive oxide film obtained using the same 审中-公开
标题翻译：烧结复合氧化物，其制造方法及使用其的透明导电氧化膜
公开(公告)号：JP2012092003A
公开(公告)日：2012-05-17
申请号：JP2011211273
申请日：2011-09-27
申请人： Tosoh Corp , 東ソー株式会社
发明人： KURAMOCHI TOSHIHITO , IIGUSA HITOSHI , SHIBUTAMI TETSUO
IPC分类号： C04B35/453 , C23C14/34
CPC分类号： H01B1/08 , C01G9/02 , C01G23/003 , C01P2002/52 , C01P2006/40 , C04B35/453 , C04B35/6261 , C04B35/6262 , C04B35/62685 , C04B2235/3217 , C04B2235/3232 , C04B2235/3234 , C04B2235/3284 , C04B2235/5409 , C04B2235/5436 , C04B2235/604 , C04B2235/656 , C04B2235/6562 , C04B2235/6565 , C04B2235/6567 , C04B2235/77 , C04B2235/786 , C04B2235/80 , C23C14/08 , C23C14/086 , C23C14/3407 , C23C14/3414 , C23C14/35
摘要： PROBLEM TO BE SOLVED: To provide a sputtering target in which abnormal discharging can be suppressed, and a film forming method and to provide a sintered composite oxide available as such a target.SOLUTION: The sintered composite oxide and a sputtering target comprised of the sintered composite oxide are provided. The sintered composite oxide is comprised of particles each of which is mainly comprised of Zn, Al, Ti and O in atomic ratios of (Al+Ti)/(Zn+Al+Ti)=0.004 to 0.055, Al/(Zn+Al+Ti)=0.002 to 0.025 and Ti/(Zn+Al+Ti)=0.002 to 0.048, mainly contains zinc oxide and has a hexagonal Wurtz structure of an average particle diameter of 20 μm, and particles each of which contains Al and Ti and has a ZnTiO-like structure and/or ZnTiO-like structure with an average particle size of 5 μm or less, and does not contain particles each of which has a zinc-aluminate spinel oxide structure in which Zn and Al form a solid solution.
摘要翻译：要解决的问题：提供可以抑制异常放电的溅射靶和成膜方法，并提供作为靶的烧结复合氧化物。解决方案：提供烧结复合氧化物和由烧结复合氧化物组成的溅射靶。烧结复合氧化物由（Al + Ti）/（Zn + Al + Ti）= 0.004〜0.055的原子比主要由Zn，Al，Ti和O组成的粒子构成，Al /（Zn + Al + Ti）= 0.002〜0.025，Ti /（Zn + Al + Ti）= 0.002〜0.048，主要含有氧化锌，具有平均粒径为20μm的六边形Wurtz结构，并且具有ZnTiO 3 样结构和/或Zn 2 Ti 3 8 状结构体，并且不含有具有锌酸锌尖晶石氧化物结构的粒子，其中Zn和Al 形成固体溶液。版权所有（C）2012，JPO＆INPIT

57. 发明专利

JP2011231401A Zinc oxide transparent conductive film, method of manufacturing the same, and use of the same 有权
标题翻译：氧化锌透明导电膜，其制造方法及其用途
公开(公告)号：JP2011231401A
公开(公告)日：2011-11-17
申请号：JP2011049942
申请日：2011-03-08
申请人： Tosoh Corp , 東ソー株式会社
发明人： AKIIKE RYO , KURAMOCHI TOSHIHITO , IIGUSA HITOSHI
IPC分类号： C23C14/08 , C23C14/58 , H01B5/14 , H01B13/00 , H01L31/04 , H01L31/10
CPC分类号： C23C14/5873 , C23C14/08 , C23C14/086 , C23C14/34 , Y10T428/24355
摘要： PROBLEM TO BE SOLVED: To provide a transparent conducive film and a method of manufacturing the same of which a microstructure of a surface texture is precisely controlled so as to achieve high light scattering power and suppress a temperature in manufacturing processes.SOLUTION: The zinc oxide transparent conductive film contains Ti and Al at an atomic ratio of 0.001≤Ti/(Zn+Al+Ti)≤0.079, 0.001≤Al/(Zn+Al+Ti)≤0.079, and in addition, 0.01≤(Ti+Al)/(Zn+Al+Ti)≤0.08 by surface-treating a heated substrate by sputtering using a zinc oxide target. The zinc oxide transparent conductive film has center line average surface roughness of 30-200 nm, has concave lens-shaped textures of different sizes on its surface, and an average value of widths of the textures is between 100 nm and 10 μm. The transparent conductive film is used for an electronic element, optical element, or a solar cell.
摘要翻译：要解决的问题：提供一种透明导电膜及其制造方法，其中精细地控制表面纹理的微观结构，以获得高的光散射功率并抑制制造工艺中的温度。解决方案：氧化锌透明导电膜包含原子比为0.001≤Ti/（Zn + Al + Ti）≤0.079,0.001Al/（Zn + Al + Ti）≤0.079的Ti和Al，并且通过使用氧化锌靶通过溅射对被加热的基板进行表面处理，添加0.01≤（Ti + Al）/（Zn + Al + Ti）≤0.08。氧化锌透明导电膜的中心线平均表面粗糙度为30-200nm，其表面具有不同尺寸的凹透镜形状的结构，并且纹理的平均宽度在100nm和10μm之间。透明导电膜用于电子元件，光学元件或太阳能电池。版权所有（C）2012，JPO＆INPIT

58. 发明专利

JP2011037679A Multiple oxide sintered compact, sputtering target, multiple oxide amorphous film and production method thereof, and multiple oxide crystalline film and production method thereof 审中-公开
标题翻译：多种氧化物烧结紧凑型，溅射目标，多种氧化物非晶膜及其生产方法，以及多种氧化物晶体膜及其生产方法
公开(公告)号：JP2011037679A
公开(公告)日：2011-02-24
申请号：JP2009187772
申请日：2009-08-13
申请人： Tosoh Corp , 東ソー株式会社
发明人： KURAMOCHI TOSHIHITO , MATSUMARU KEITARO , SHIBUTAMI TETSUO
IPC分类号： C04B35/457 , C23C14/34 , H01B5/14 , H01B13/00
摘要： PROBLEM TO BE SOLVED: To provide a multiple oxide crystalline film low in resistivity and excellent in light transmittance. SOLUTION: The multiple oxide sintered compact is mainly composed of indium, strontium and oxygen, where ratios of the number of atoms of tin and strontium to the total number of atoms of indium, strontium and tin in the multiple oxide sintered compact are 0-0.3 and 0.0001-0.05, respectively, the relative density is 97% or more, and the mean particle size is 7 μm or less. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供电阻率低且透光率优异的多重氧化物结晶膜。解决方案：多重氧化物烧结体主要由铟，锶和氧组成，其中锡和锶的原子数与多重氧化物烧结体中铟，锶和锡的原子总数之比为 0-0.3和0.0001-0.05，相对密度为97％以上，平均粒径为7μm以下。版权所有（C）2011，JPO＆INPIT

59. 发明专利

JP2010150107A Multiple oxide sintered compact, method of manufacturing the same, and application of the same 审中-公开
标题翻译：多种氧化物烧结体，其制造方法及其应用
公开(公告)号：JP2010150107A
公开(公告)日：2010-07-08
申请号：JP2008332466
申请日：2008-12-26
申请人： Tosoh Corp , 東ソー株式会社
发明人： KURAMOCHI TOSHIHITO , MASUKO HITOSHI
IPC分类号： C04B35/453 , C04B35/645 , C23C14/08 , H01B1/08
摘要： PROBLEM TO BE SOLVED: To provide a multiple oxide sintered compact in which irregular color of the inside except the surface of a sintered body is controlled. SOLUTION: The multiple oxide sintered compact includes: zinc oxide; and at least one or more sorts of oxides of elements chosen from Al, Ga, B, Nb, In, Y, and Sc, wherein L * a * b * color difference:ΔE * measured in a CIE1976 space between a sintered compact surface part in which a baked surface of the sintered body is removed and a sintered body central part is 3.0 or less, has few irregular color, and is excellent in stability of discharge characteristics or the like. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种其中控制烧结体表面以外的内部不规则颜色的多重氧化物烧结体。解决方案：多重氧化物烧结体包括：氧化锌; 以及选自Al，Ga，B，Nb，In，Y和Sc中的至少一种或多种元素氧化物，其中L * SP SP 在去除烧结体的烧结表面的烧结压实表面部分和烧结体中心部分之间的CIE1976空间中测量的色差ΔE * 为3.0以下，颜色不均匀，放电特性等的稳定性优异。版权所有（C）2010，JPO＆INPIT

60. 发明专利

JP2007176719A Ceramic porous body 审中-公开
标题翻译：陶瓷多孔体
公开(公告)号：JP2007176719A
公开(公告)日：2007-07-12
申请号：JP2005374618
申请日：2005-12-27
申请人： Tosoh Corp , 東ソー株式会社
发明人： KURAMOCHI TOSHIHITO , ASANO MUTSUMI
IPC分类号： C04B38/00 , B24D3/00 , B24D3/18 , C04B35/50
摘要： PROBLEM TO BE SOLVED: To provide a ceramic porous body capable of suppressing the occurrence of defects in a counterpart material (workpiece) to be in contact, when it is used as an abrasive and a slide member.
SOLUTION: The ceramic porous body fulfills all the following conditions: (1) micropore parts having a diameter of ≤1 μm and micropore parts having a diameter of >1 μm are present on the surface of the ceramic porous body, (2) parts except both micropore parts on the surface of the porous body are composed of inorganic particles having an average particle diameter of ≤1 μm, (3) when parts except the micropore parts having a diameter of >1 μm are defined as parts A and the micropore parts having a diameter of >1 μm are defined as parts B, the area of parts A shares 40-80% of the area of the porous body and the area of parts B shares 20-60% of the area of the porous body, (4) the total area of micropore parts having a diameter of ≤1 μm present in parts A shares 15-75% of the total area of parts A, and (5) the surface hardness of the porous body is 80 or below.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种陶瓷多孔体，当用作研磨剂和滑动构件时，能够抑制对方材料（工件）中的缺陷发生接触的陶瓷多孔体。＆lt; P＆gt;解决方案：陶瓷多孔体满足以下条件：（1）直径≤1μm的微孔部分和直径>1μm的微孔部分存在于陶瓷多孔体的表面上，（2 ）除了多孔体表面的两个微孔部分外，均由平均粒径≤1μm的无机粒子构成，（3）除直径>1μm以下的微孔部分以外的部分被定义为部分A和直径>1μm的微孔部分定义为部分B，部分A的面积占多孔体面积的40-80％，部分B的面积占多孔体的面积的20-60％（4）部分A中存在直径≤1μm的微孔部分的总面积占部件A的总面积的15-75％，（5）多孔体的表面硬度为80以下。版权所有（C）2007，JPO＆INPIT

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