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1. 发明专利

JP2015003493A 透明導電膜付構造体および素子、電子機器审中-公开
标题翻译：透明导电薄膜结构，元件和电子设备
公开(公告)号：JP2015003493A
公开(公告)日：2015-01-08
申请号：JP2013131536
申请日：2013-06-24
申请人：東ソー株式会社 , Tosoh Corp
发明人： AKIIKE RYO , KURAMOCHI TOSHIHITO , TAMANO KIMIAKI
IPC分类号： B32B7/02 , C23C14/08 , G06F3/041 , H01B5/14 , H01B13/00
摘要：【課題】本発明の目的は、低温プロセスで20nm〜40nm程度の極薄膜において低抵抗を達成できる透明導電膜付構造体を用いた素子および当該素子を用いた電子機器を提供することにある。【解決手段】透過率が400nm〜800nmの波長域において平均86%以上であり、シート抵抗が150&OHgr;/□以下である透明導電膜および、当該透明導電膜を支える基材を含んでなることを特徴とする構造体。【選択図】図2
摘要翻译：要解决的问题：提供一种使用透明导电膜提供的结构的元件，其可以在低温工艺中使用20至40nm超薄膜和使用该元件的电子设备来实现低电阻。解决方案：结构包括透明导电膜，其平均透射率在400-800nm的波长范围内，平均透射率为86％以上，薄层电阻率为150＆OHgr / sq。或更少的支撑透明导电膜的基板。

2. 发明专利

JP2003165058A POLISHING COMPACT AND POLISHING SURFACE PLATE USING THE SAME 审中-公开
公开(公告)号：JP2003165058A
公开(公告)日：2003-06-10
申请号：JP2001363271
申请日：2001-11-28
申请人： TOSOH CORP , TOSOH QUARTZ CORP
发明人： KURAMOCHI TOSHIHITO , TAKATO SHUJI , KONDO SATORU , KUDO MASAYUKI , YOKOMIZO YUKO , ASANO MUTSUMI
IPC分类号： B24B37/12 , B24D3/02 , B24D3/18 , C04B35/10 , G11B5/84 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing compact and a polishing surface plate using the same, applicable mainly to the pre-finish process (lapping) of substrate materials or optical materials and capable of achieving a prescribed precision level in their surfaces at higher speeds and with stability. SOLUTION: The polishing compact and the polishing surface plate using the same mainly comprise a zirconia compact containing alumina and a stabilizer and has an abrasive part 2 that polishes and a non-abrasive part 3, and there are specified rates between area and porosity in the parts 2, 3. In the part 2, 60% or more of the inorganic grains are 5 μm or less in diameter, 60% or more of the alumina grains are 5 μm or less in diameter, and 60% or more of the stabilizer-containing zirconia grains are 5 μm or less in diameter. A equation 0.25≤X/(X+Y)≤0.95 holds, where the rate of the area of the alumina grains is X and that of the stabilizer-containing zirconia grains is Y. COPYRIGHT: (C)2003,JPO

3. 发明专利

JPH11226862A GRINDING DEVICE AND GRINDING METHOD 失效
公开(公告)号：JPH11226862A
公开(公告)日：1999-08-24
申请号：JP2968598
申请日：1998-02-12
申请人： TOSOH CORP
发明人： KURAMOCHI TOSHIHITO , KUBOTA YOSHITAKA
IPC分类号： B24B37/00 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To achieve efficient grinding work by using a surface plate for grinding consisting of a formed body for grinding which is composed of a specific compound and has a bulk density, BET specific surface area, and average grain diameter in specific scopes and an accompanying member. SOLUTION: A surface plate part of a grinding device is mainly made of silica (silicon dioxide) and consists of a formed body for grinding 2 having a bulk density of 0.2 to 1.5 g/cm , BET specific surface area of 10 to 400 m /g, and average grain diameter of 0.001 to 0.5 μm and an accompanying member 6. At the time of grinding, it can be applied to a grinding and machining process of a substrate material, etc., using grinding fluid containing no free abrasive grains because a surface of the formed body for grinding 2 is a rough surface due to silica powders which are a material thereof and a material to be ground 1 comes into contact with the rough surface directly. Furthermore, the number of particles of the formed body which drop is reduced greatly, and a problem of waste liquid is eliminated. Moreover, the durability of the grinding device can be increased in the grinding and machining process because the strength of the formed body for grinding is high.

4. 发明专利

JPH10264015A POLISHING COMPACT AND POLISHING SURFACE TABLE AND POLISHING METHOD USING IT 失效
公开(公告)号：JPH10264015A
公开(公告)日：1998-10-06
申请号：JP20039497
申请日：1997-07-25
申请人： TOSOH CORP
发明人： KURAMOCHI TOSHIHITO , KUBOTA YOSHITAKA
IPC分类号： B24B37/12 , B24B37/14 , B24D3/00 , C04B35/14 , B24B37/04
摘要： PROBLEM TO BE SOLVED: To reduce the problem of waste liquid and polish polished material efficiently to the same finished degree as a conventional method or better by setting the bulk density, BET specific surface area and average grain diameter of a polishing compact mainly composed of silica, respectively to specific numerial ranges. SOLUTION: As a range of bulk density of a polishing compact formed of silica containing a silica component at about 90 wt.% or more of the whole quantity, a range of 0.2 g/cm to 1.5 g/cm is desirable to hold the shape of the polishing compact during polishing and to efficiently obtain the smooth surface of polished material. As a range of BET specific surface area, a range of 10 m /g to 400 m /g is desirable to hold the shape of the polishing compact and to obtain the smooth surface of the polished material. As a range of average grain diameter, a range of 0.001 μm to 0.5 μm is desirable to facilitate forming a porous body and to obtain the smooth surface of the polished material. A polishing solution not containing free abrasive grains can thereby be used so as to reduce the problem of waste liquid.

5. 发明专利

JPH10138386A METHOD FOR BONDING PORPOUS INORGANIC FORMED PRODUCT 失效
公开(公告)号：JPH10138386A
公开(公告)日：1998-05-26
申请号：JP30165396
申请日：1996-11-13
申请人： TOSOH CORP
发明人： KURAMOCHI TOSHIHITO , KUBOTA YOSHITAKA
IPC分类号： B32B7/12 , B32B9/00 , C09J5/00 , C09J9/00
摘要： PROBLEM TO BE SOLVED: To prevent peeling from being generated practically without generating damages of a fissure, a crack, etc., onto a porous inorganic formed product in adhesion and in use by a method wherein an elastic adhesive for which viscosity and curing physical property, etc., are considered is used to bond the porous inorganic formed product to plastic material or the like. SOLUTION: A method is provided wherein a porous inorganic formed product and a structure material are bonded to each other. An adhesion face of the porous inorganic formed product is bonded to an adhesion face of the structure material by use of an elastic adhesive wherein viscosity at 20 deg.C before bonding is 10000 to 1000000 (mPa.S), and elongation after bonding is 10 to 250%. As the porous inorganic formed product, porous molded products molded by use of materials composed of independent constituent or mixed constituents of porous formed product obtained by molding ultrafine powder, for example, porous silica formed product, molded product in which glass wool is mixed in silica, formed product in which calcium silicate is mixed in silica, etc., can be exemplified.

6. 发明专利

JPH092873A FLUORITE-TYPE CERIA-BASED SOLID ELECTROLYTE 失效
公开(公告)号：JPH092873A
公开(公告)日：1997-01-07
申请号：JP128896
申请日：1996-01-09
申请人： TOSOH CORP
发明人： MORI TOSHIYUKI , KURAMOCHI TOSHIHITO , YAMAMURA HIROSHI
IPC分类号： C04B35/50 , C01F17/00 , H01M8/02
摘要： PROBLEM TO BE SOLVED: To obtain the subject solid electrolyte significantly improved in ionic conductivity and the reduction resistance of Ce . SOLUTION: This defective fluorite-type solid electrolyte is expressed by the formula (M1-a Aa )x Ce1-x }O2-y (M is a trivalent rare earth element except Ce; A is a monovalent alkali metal or divalent alkaline earth metal; (a), (x) and (y) are such that 0

7. 发明专利

JPH07151060A PIEZOELECTRIC PUMP 失效
公开(公告)号：JPH07151060A
公开(公告)日：1995-06-13
申请号：JP29787393
申请日：1993-11-29
申请人： TOSOH CORP
发明人： OKAMURA TOSHIHIKO , OSADA HIRONARI , KOIKE TOMOKAZU , KUDO MASAYUKI , KURAMOCHI TOSHIHITO
IPC分类号： F04B43/04
摘要： PURPOSE:To facilitate elimination of air inside a pump chamber in the case that driving is started from the vacant condition by fixing an outer peripheral part of a piezoelectric vibrator by means of a casing provided with a packing, and providing the piezoelectric vibrator with downward inclination from the discharge port side to the suction port side. CONSTITUTION:A piezoelectric vibrator 3 in a piezoelectric pump is prepared by applying electrodes on both surfaces of piezoelectric bodies, applying them to each other with their electrodes being trued up through phosphor bronze plates, and providing a lead wire for an ac current thereto. The piezoelectric vibrator 3 is sealed and supported by the inner peripheral surface of a casing through a fixing packing 4. The casing has a suction port 6 and a discharge port 6', respectively provided with check valves 2, 2'. In such a piezoelectric pump, a portion of an outer peripheral part of the discharge port 6' nearest the packing 4 is formed on a position located by 1mm from an inner end of the packing. A pump chamber has inclination of substantially four degrees, which chamber is prepared by the casing, the piezoelectric vibrator 3 and the fixing packing 4. The side of the discharge port 6 is et higher.

8. 发明专利

JP2015017017A 複合酸化物焼結体及び酸化物透明導電膜有权
标题翻译：复合氧化物烧结体和氧化物透明导电膜
公开(公告)号：JP2015017017A
公开(公告)日：2015-01-29
申请号：JP2013145677
申请日：2013-07-11
申请人：東ソー株式会社 , Tosoh Corp
发明人： TAMANO KIMIAKI , KURAMOCHI TOSHIHITO , AKIIKE RYO
IPC分类号： C04B35/00 , C23C14/34
摘要：【課題】本発明は、上記の諸問題を鑑み、ITOと同等に低抵抗であり、かつ可視光領域から赤外領域の広い波長領域において低い光吸収特性を有する酸化物透明導電膜を、従来よりも低温の製膜プロセスにおいて、得るための複合酸化物焼結体および酸化物透明導電膜を提供することを目的とする。【解決手段】インジウム、ハフニウム及び酸素を有する複合酸化物焼結体であって、当該焼結体を構成する元素の原子比が、インジウム及びハフニウムをそれぞれIn、Hfとしたときに、原子比でHf/(In+Hf)が0.5〜4.0at%であり、相対密度が97%以上であることを特徴とする複合酸化物焼結体。【選択図】なし
摘要翻译：要解决的问题：提供一种用于获得氧化物透明导电膜的复合氧化物烧结体，其具有与ITO几乎相同的低电阻，并且在从可见光区域到红外区域的宽波长范围内具有低的光吸收性能在低于常规温度的成膜工艺中，并提供氧化物透明导电膜。解决方案：提供一种复合氧化物烧结体，其包含铟，铪和氧，其中当构成烧结体分别定义为In和Hf，Hf /（In + Hf）的原子比为0.5〜4.0原子％，相对密度为97％以上。

9. 发明专利

JP2015005471A 透明積層基材および素子审中-公开
标题翻译：透明层压板和元件
公开(公告)号：JP2015005471A
公开(公告)日：2015-01-08
申请号：JP2013131332
申请日：2013-06-24
申请人：東ソー株式会社 , Tosoh Corp
发明人： TAMANO KIMIAKI , KURAMOCHI TOSHIHITO , AKIIKE RYO
IPC分类号： H01B5/14 , B32B9/00 , H01B13/00 , H01L31/04
CPC分类号： Y02E10/50
摘要：【課題】極薄ガラス透明基材やプラスチック樹脂やプラスチックフィルム等のプラスチック材料からなる透明基材を熱による変形を発生させること無く、透明導電性酸化物層が低い抵抗率と高い透過率を有する透明積層基材を提供することにある。【解決手段】透明基材と酸化インジウムを主成分とする透明導電性酸化物層から構成される透明積層基材において、該透明導電性酸化物層が、酸化インジウム、酸化ジルコニウム、酸化イットリウムからなることを特徴とする透明積層基材。【選択図】なし
摘要翻译：要解决的问题：为了提供一种透明的层叠基板，其中透明导电氧化物层具有低电阻率和高透射率，而不会产生由诸如超薄玻璃透明基板，塑料树脂等塑料材料形成的透明基板的变形，或由于热而引起的塑料膜。解决方案：提供由主要包含氧化铟和透明基板的透明导电氧化物层形成的透明层压基板。透明导电氧化物层由氧化铟，氧化锆和氧化钇形成。

10. 发明专利

JP2014194066A Complex oxide sintered body and oxide transparent conductive film 有权
标题翻译：复合氧化物烧结体和氧化物透明导电膜
公开(公告)号：JP2014194066A
公开(公告)日：2014-10-09
申请号：JP2013164519
申请日：2013-08-07
申请人： Tosoh Corp , 東ソー株式会社
发明人： KURAMOCHI TOSHIHITO , TAMANO KIMIAKI , AKIIKE RYO , IIGUSA HITOSHI
IPC分类号： C23C14/34 , C04B35/00
CPC分类号： H01B1/08 , C04B35/00 , C04B35/01 , C04B35/62695 , C04B2235/3244 , C04B2235/3251 , C04B2235/3286 , C04B2235/5409 , C04B2235/5436 , C04B2235/5445 , C04B2235/656 , C04B2235/6562 , C04B2235/6565 , C04B2235/6567 , C04B2235/6585 , C04B2235/77 , C04B2235/80 , C23C14/086 , C23C14/34 , C23C14/3407 , C23C14/3414 , H01J37/3429 , H01J2237/332
摘要： PROBLEM TO BE SOLVED: To provide a complex oxide sintered body which can provide an oxide transparent conductive film which shows a low light absorption property over a wide wavelength range and has a low resistance, and an oxide transparent conductive film.SOLUTION: In a complex oxide sintered body of which constituent elements are indium, zirconium, hafnium, and oxygen, an atomic ratio of elements constituting the sintered body is Zr/(In+Zr+Hf)=0.05-4.5at%Hf/(In+Zr+Hf)=0.0002-0.15at%, where content of indium, zirconium, and hafnium are In, Zr, and Hf, respectively.
摘要翻译：要解决的问题：提供一种复合氧化物烧结体，其可以提供在宽波长范围内具有低光吸收特性并具有低电阻的氧化物透明导电膜和氧化物透明导电膜。解决方案：在复合物组成元素为铟，锆，铪和氧的氧化物烧结体，构成烧结体的元素的原子比为Zr /（In + Zr + Hf）= 0.05〜4.5at％Hf /（In + Zr + Hf ）= 0.0002-0.15at％，其中铟，锆和铪的含量分别为In，Zr和Hf。

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