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51. 发明专利

JPS6122237A Apparatus for inspecting appearance of object 失效
标题翻译：检查对象外观的装置
公开(公告)号：JPS6122237A
公开(公告)日：1986-01-30
申请号：JP10373985
申请日：1985-05-17
申请人： Hitachi Ltd
发明人： NAKAGAWA KIYOSHI , KAGEYAMA JIYOUICHIROU , EGUCHI KAZUHIKO , NAKAJIMA SHIGEAKI
IPC分类号： G01N21/88 , G01B11/24 , G01N21/956 , G03F1/84 , H01L21/027 , H01L21/66
CPC分类号： G01N21/95607
摘要： PURPOSE:To enhance the reliability of inspection while making it possible to perform high speed inspection, by comparing pattern information, which formed the basis of the fabrication of a mask pattern, with the mask pattern. CONSTITUTION:The reference pattern from a magnetic tape 18 storing an information signal showing a pattern to be baked to a photomask is two-dimensionally regenerated in memory 9 while converted to a binary signal and, at the same time, a mask pattern to be inspected is regenerated in memory 8 and both signals are compared in a comparing circuit. If the mask pattern to be inspected has a flaw 19, the contents of the memories 8, 9 come to non-coincidence at the part corresponding to the position where the flaw is present to generate a non-coincident signal. Whereupon, a measuring machine detects the coordinates where said flaw is present and the coordinates signal is processed by CPU to be displayed on a recording display part as data. By this method, the confirmation of the flaw existence can be performed rapidly.
摘要翻译：目的：为了提高检查的可靠性，通过将形成掩模图案的基础的图案信息与掩模图案进行比较，可以进行高速检查。构成：存储将要烘烤的图案的信息信号的光盘18的参考图案在存储器9中二维地再生，同时被转换为二进制信号，同时将要检查的掩模图案在存储器8中再生，并且在比较电路中比较两个信号。如果要检查的掩模图案具有缺陷19，则存储器8,9的内容在与存在缺陷的位置相对应的部分处不一致，以产生非重合信号。因此，测量机器检测出存在所述缺陷的坐标，并且由CPU处理坐标信号以在记录显示部件上显示作为数据。通过这种方法，可以快速地进行缺陷存在的确认。

52. 发明专利

JPS6118143A Pattern inspection method 失效
标题翻译：模式检验方法
公开(公告)号：JPS6118143A
公开(公告)日：1986-01-27
申请号：JP13719084
申请日：1984-07-04
申请人： Hitachi Ltd
发明人： NAKAGAWA KIYOSHI
IPC分类号： G01N21/88 , G01N21/93 , G01N21/956 , G03F1/84 , H01L21/027 , H01L21/66
CPC分类号： H01L22/00
摘要： PURPOSE:To compare the bidimensional signals in the desired directions on a plane in order to detect difference in the patterns and inspect adequacy of pattern by sequentially storing the pattern signals obtained through scanning in the single plane and arranging such signals in the other directions on the plane. CONSTITUTION:The width dimensions d2, d3 of patterns P2, P3 are digitally detected as a number of element components of detection elements 7, 8 namely as a number of element components in the direction Y of plane corresponding to pattern width by scanning the detection elements 7, 8 in the direction X of plane at a right angle to the longitudinal direction thereof on the chips 2, 3 and such digital values are sequentially detected in the direction X on the plane. Such detected signals are respectively stored in the memories 11, 12. By obtaining the detected signals through repeated scanning in the direction X on the plane, the bidimensional digital pattern signals can be obtained at the pattern pattern recognition circuits 13, 14 and these signals are supplied to the comparators respectively. These are herein compared for each corresponding pattern and thereby difference of patterns can be detected.
摘要翻译：目的：比较平面上所需方向上的二维信号，以便通过将扫描获得的图形信号顺序地存储在单个平面上，并在其他方向上布置这些信号，以检测图案的差异并检查图案的充分性飞机构成：图形P2，P3的宽度尺寸d2，d3被数字地检测为检测元件7,8的元件分量的数量，即作为通过扫描检测元件的与图案宽度相对应的平面的方向Y上的元件数量的数量在芯片2,3上与其纵向方向成直角的平面方向X上的这些数字值沿着X方向依次被检测。这样的检测信号分别存储在存储器11,12中。通过在平面上沿X方向重复扫描获得检测信号，可以在图案图案识别电路13,14获得二维数字图形信号，这些信号是分别提供给比较器。这些对于每个对应的图案进行比较，从而可以检测图案的差异。

53. 发明专利

JPS59161034A Baking device 失效
标题翻译：烘焙设备
公开(公告)号：JPS59161034A
公开(公告)日：1984-09-11
申请号：JP2851684
申请日：1984-02-20
申请人： Hitachi Ltd
发明人： NAKAGAWA KIYOSHI , DAN MASAHIRO
IPC分类号： H01L21/027 , G03F7/26 , G03F7/40 , H01L21/30
CPC分类号： G03F7/40
摘要： PURPOSE:To perform baking in the dust-free condition by a method wherein a substance to be processed is transferred in the uncontacting condition to a hot plate, and is heated by the hot plate. CONSTITUTION:Photo masks 3 are hooked on pins 5, and are sent in a furnace body 1. The mask 3 is sent in the condition floating a little from the inside of a guide groove 4 according to air blown off from small holes 16, 17, and at the point in time when transferred by one pitch, air is cut off to receive heating of a hot plate 2, and baking of the photo resist surface is performed. Baking is performed during the period up to come to the edge on the outlet side of the furnace body 1 according to intermittent action of the feed pin 5, and the mask is sent out outside of the furnace body 1 holding the uncontacting condition with the guide groove 4. Generation and adhesion of dust according to hot air circulation and taking in and out of the mask from a jig are not generated, and quality of the photo mask is enhanced.
摘要翻译：目的：通过将待处理物质以非接触状态转印到热板上并通过热板加热的方法，在无尘条件下进行烘烤。构成：照相面罩3钩在针5上，并被送到炉体1中。掩模3以从小孔16,17吹出的空气从导槽4的内部稍微漂浮的状态被送出，并且在以一个间距传送的时间点，空气被切断以接受热板2的加热，并且进行光刻胶表面的烘烤。在进料销5的间歇作用下，在炉体1的出口侧的边缘进行烘烤，并且将面罩送出保持非接触状态的炉体1的外部与导向件凹槽4.不会产生根据热风循环产生灰尘并从夹具进出面罩，并且增强了光罩的质量。

54. 发明专利

JPS5998284A PATTERN RECOGNIZING METHOD 失效
公开(公告)号：JPS5998284A
公开(公告)日：1984-06-06
申请号：JP18301783
申请日：1983-10-03
申请人： HITACHI LTD
发明人： NAKAJIMA JIYUUMEI , NAKAGAWA KIYOSHI
IPC分类号： G06T1/00 , G06K9/38
摘要： PURPOSE:To make a pattern binary to recognize it accurately, by changing automatically a threshold to be a reference for detection in accordance with the background where minute dots exist. CONSTITUTION:Detection results of comparators 1H, 1M, and 1L different in threshold voltage are written in corresponding shift registers 2H, 2M, and 2L, and a five bit signal is always held in each shift register. If these five bit detection results have not the same code, the output of an input signal inversion incorporating OR circuit 9 becomes ''0'', and one input terminals of NAND circuits 12-14 are set to ''0'', and one terminals of NAND circuits 15-17 are set to ''1''. It is detected whether any bit of the five bit detection result of the register 2H is ''1'' or not; and if it is all ''0'', the signal of the third bit of the register 2L is transmitted to the external through the circuit 15. If any bit is ''1'', the circuit 17 is selected if any bit of five bits is ''0'', and the circuit 16 is selected if five bits are all ''1''; and the detection result of the third bit of the register 2M is transmitted to the external through the circuit 17 in the former case, and the detection result of the third bit of the register 2M is transmitted to the external through the circuit 16 in case of the latter.

55. 发明专利

JPS5988823A LOCATION ADJUSTING MECHANISM 失效
公开(公告)号：JPS5988823A
公开(公告)日：1984-05-22
申请号：JP19760182
申请日：1982-11-12
申请人： HITACHI OME ELECTRONIC CO , HITACHI LTD
发明人： TAKEBAYASHI JIYUN , NAKAGAWA KIYOSHI
IPC分类号： G05D3/00 , H01L21/027 , H01L21/30 , H01L21/66
摘要： PURPOSE:To easily execute highly accurate location adjustment within a short period of time by fixing a spring plate to a driving section and by clamping the spring plate to a guide section. CONSTITUTION:Spring plates 8 are previously fixed to a driving part 6 with screws 9 and the spring plates 8 are held between the clamping plate 10 and the guide 5. Therefore, a force during clamping is not directly applied to the driving section 6 and any displacement is not generated. Accordingly, location adjustment to each direction of XYZtheta can be carried out by fine adjustment by means of micrometer heads 1-4.

56. 发明专利

JPS596538A Defect inspector 失效
标题翻译：缺陷检查员
公开(公告)号：JPS596538A
公开(公告)日：1984-01-13
申请号：JP11543482
申请日：1982-07-05
申请人： Hitachi Ltd
发明人： KAWASHIMA HIDEAKI , NAKAGAWA KIYOSHI
IPC分类号： G01N21/88 , G01N21/93 , G01N21/956 , G03F1/84 , H01L21/027 , H01L21/66 , H01L21/30
CPC分类号： G03F1/84
摘要： PURPOSE:To prevent the deterioration of workability of a defect inspection by a method wherein detector systems are arranged at the vertex of a triangle, and at the place where two chips only are juxtaposed with each other, another chip being arranged at another place is made as the partner of comparison. CONSTITUTION:When the objective lens 11 and the sensor 12 correspond to the chip C, a change-over switch 13 operates automatically to connect the sensor 12 to a comparator 10 through an amplifier 8, and the sensor 4 is cut off from the comparator 10. While, because the objective lens 1 and the sensor 3 correspond to the pattern A at the other vertex of the triangle, the chip C on one side of the part where only the two chips are juxtaposed obtains the chip A as the partner of comparison. Inspection beams 5 to perform raster scanning are irradiated respectively to the respective chips A, C transmitting through the lenses 1, 11, while the beams are not transmitted through the patterns formed with a metal film, the beams transmit the mask 9 only at the outsides of the patterns, and the transmitted beams 6 carrying pattern informations are detected by the sensors 3, 12. The sensors 3, 12 apply the detected signals to a comparator 10 through the amplifiers 7, 8, and the comparator 10 discriminates and determines the difference signal thereof as a defect. Accordingly, the comparison inspection can be attained even when only the two chips are juxtaposed to each other.
摘要翻译：目的：为了防止缺陷检查的可操作性的劣化，其中检测器系统布置在三角形的顶点处，并且在两个芯片仅彼此并置的位置处，另一个芯片被布置在另一个位置作为比较对手。构成：当物镜11和传感器12对应于芯片C时，转换开关13自动运行，通过放大器8将传感器12连接到比较器10，并且传感器4与比较器10断开而由于物镜1和传感器3对应于三角形的另一个顶点处的图案A，所以只有两个芯片并置的部分的一侧的芯片C获得作为比较对象的芯片A 。分别对通过透镜1,11发送的各个芯片A，C照射用于进行光栅扫描的检查光束5，同时光束不透过形成有金属膜的图案，光束仅在外侧传送掩模9 并且由传感器3,12检测携带图案信息的发送束6.传感器3,12通过放大器7,8将检测到的信号施加到比较器10，并且比较器10鉴别并确定差值信号作为缺陷。因此，即使只有两个芯片彼此并列，也可以进行比较检查。

57. 发明专利

JPS58192326A Inspection device for external appearance 失效
标题翻译：外部外观检查装置
公开(公告)号：JPS58192326A
公开(公告)日：1983-11-09
申请号：JP7533682
申请日：1982-05-07
申请人： Hitachi Ltd
发明人： NAKAGAWA KIYOSHI , KAWASHIMA HIDEAKI
IPC分类号： G01N21/88 , G01N21/93 , G01N21/956 , G03F1/84 , H01L21/027 , H01L21/30 , H01L21/66
CPC分类号： H01L21/30
摘要： PURPOSE:To inspect external appearance rapidly with high accuracy by setting up scan mirrors between two bodies to be inspected and each image sensor, while synchronously driving the mirrors and detecting the external appearance patterns of the bodies to be inspected. CONSTITUTION:A base 5 is moved, and pellets 1a, 1b on a wafer 1 are placed into the fields of view of each lens 6. When the scan mirror 9 is turned 10, the inclinations of mirrors corresponding to each lens change secularly, the position of imaging detected by several image sensor 11 moves, and the whole imaging surface is scanned and detected. Scan is executed synchronized in both pellets because the mirrors 9c, 9a are turned integrally. Accordingly, outputs from both sensors 11 are compared 12, difference is detected 13, and the difference of both patterns can be decided. When an angle of revolution is measured 15 and a synchronous signal is inputted to a detecting circuit 13, only the pattern surfaces of the pellets are extracted accurately, and inspection resulting in no noise is allowed. When the external appearance is inspected, the base 5 of heavy weight need not be driven, inspection can be accelerated and continuous signals are extracted, and external appearance can be inspected with high accuracy.
摘要翻译：目的：通过在要检查的两个物体和每个图像传感器之间设置扫描镜，同时驱动镜子并检测被检体的外观图案，以高精度快速检查外观。构成：底座5移动，晶片1上的小球1a，1b被放置在每个透镜6的视野内。当扫描镜9转动10时，与每个透镜对应的反射镜倾斜变化，由几个图像传感器11检测到的成像位置移动，并且整个成像表面被扫描和检测。由于反射镜9c，9a整体地转动，所以在两个颗粒中执行扫描同步。因此，比较来自两个传感器11的输出12，检测出差异13，并且可以确定两种图案的差异。当测量旋转角15并且将同步信号输入到检测电路13时，仅精确地提取颗粒的图案表面，并且允许不产生噪声的检查。外观检查时，不需要驱动重型基座5，加速检查，提取连续信号，高精度地检查外观。

58. 发明专利

JPS5837364A X-Y STAGE DRIVER 失效
公开(公告)号：JPS5837364A
公开(公告)日：1983-03-04
申请号：JP13408081
申请日：1981-08-28
申请人： HITACHI LTD
发明人： KAWASHIMA HIDEAKI , NAKAGAWA KIYOSHI
IPC分类号： B23Q5/44 , F16H25/20 , F16H53/00 , H01L21/68
摘要： PURPOSE:To lessen the variation in the speed of X-Y stage by providing a guider to guide the movement of a feed screw nut while preventing the rotation of the feed screw nut drive-connected with X-Y stage. CONSTITUTION:In the central part of the upside of a feed screw nut 3, two rotation-preventing bearins 9A and 9B are fixed to the upside of the nut 3 by a bolt 10. The rotation-preventing bearing 9A comes into contact with the projected inside of a guider 11A on the left side of the Fig. to prevent the rotation of the nut 3 toward counterclockwise direction. On the other hand, the rotation- preventing bearing 9B comes into contact with the projected inside of the guider 11B on the right side of Fig. to prevent the rotation of the nut 3 toward clockwise direction. Thus, even when feed screw 2 turns in either direction, no rotatiok occurs in the feed screw nut 3.

59. 发明专利

JPS57211505A POSITION DETECTOR 失效
公开(公告)号：JPS57211505A
公开(公告)日：1982-12-25
申请号：JP9664981
申请日：1981-06-24
申请人： HITACHI LTD
发明人： KAWASHIMA HIDEAKI , NAKAGAWA KIYOSHI
IPC分类号： G01B11/00
摘要： PURPOSE:To detect the position of the origin with ease and high sensitivity by a constitution wherein a pair of lamps and photosensors arranged oppositely on optical axes are provided at a fixed or movable member and an index for intercepting a light is provided between the lamps and photosensors. CONSTITUTION:A pair of lamps 13 and 14 are fixed to a fixed member 11 at an interval in the direction (shown by an arrow) of the movement of a movable member 12, while a pair of photosensors 15 and 16 are fixed oppositely on optical axes respectively. A scale 17 is fixed at a right angle to optical paths. On the othr hand, an index 18 is fixed to the movable member 12, and when the movable member 12 is moved to and positioned at the position of the origin, the lights of the lamps 13 and 14 pass through light-transmitting windows 19 and 20 and reach the photosensors 15 and 16. The light-transmitting windows 19 and 20 are formed in such a manner that they are deviated somewhat outward from the optical axes, and when the movable member 12 is moved upward, an incident light in the photosensor 15 is intercepted and an output of the sensor 15 decreases. When the member 12 is moved downward, the output of the photosensor 16 decreases. Accordingly, the position of the origin is detected with ease and high sensitivity.

60. 发明专利

JPS57194528A METHOD FOR INSPECTION OF MASK 失效
公开(公告)号：JPS57194528A
公开(公告)日：1982-11-30
申请号：JP7920081
申请日：1981-05-27
申请人： HITACHI LTD
发明人： NAKAGAWA KIYOSHI , KAWASHIMA HIDEAKI
IPC分类号： G01N21/88 , G01N21/93 , G01N21/956 , G03F1/84 , H01L21/027 , H01L21/66 , H01L21/30
摘要： PURPOSE:To improve the quality of a mask as well as to increase the yield rate of a wafer by a method wherein an inspection is performed in such a manner that the external appearance of the mask is compared with the designed data by having the coordinates X of the designed pattern data replaced in the reverse order. CONSTITUTION:The optical image of the mask pattern 16 on the mask 14 is converted to an electric signal using an image-pickup element 10 such as a photo diode alley through the intermediary of a lens 12. In this case, n pieces of the photo diode alleys are arranged in a line starting from No.1 to No.n from the left side, which is the reverse order of the mask pattern 16, and the electric signal of the photo diode alley is written in RAM 18 in order from the left to right sides. When the above is read out from the RAM 18, its order becomes same as that of the mask pattern 16 in the coordinates X direction.

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