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    • 53. 发明专利
    • SOLID IMAGE PICKUP DEVICE
    • JP2000324398A
    • 2000-11-24
    • JP13335199
    • 1999-05-13
    • SHARP KK
    • KUDO HIROAKI
    • H04N5/335H04N5/341H04N5/353H04N5/357H04N5/363H04N5/369H04N5/374
    • PROBLEM TO BE SOLVED: To obtain uniform pictures without any lateral band-shaped noise in a shutter operation by operating a reset operation for the shutter of another pixel line in a period different from a reading operation period regardless of a reset pulse to be applied at the time of reading in a horizontal blanking period. SOLUTION: A reset operation for the shutter of another pixel line is operated in a period different from a reading operation period regardless of a reset pulse to be applied at the time of reading in a horizontal blanking period. For example, an amplification type solid image pickup device 100 is provided with a first vertical scanning circuit 109 and a second vertical scanning circuit 110 or the like. Then, in the second vertical scanning circuit 110, the rest operation for the shutter is operated when a reset pulse (for the shutter) is turned into a high level in a period different form a reading period in a normal exposure period. That is, an exposure period can be freely selected in the normal exposure period by controlling the reset pulse (for the shutter).
    • 55. 发明专利
    • AMPLIFICATION-TYPE SOLID-STATE IMAGE SENSING DEVICE
    • JPH09246516A
    • 1997-09-19
    • JP5657896
    • 1996-03-13
    • SHARP KK
    • KUMAGAI KAZUYAKUDO HIROAKI
    • H01L27/146H04N5/335H04N5/355H04N5/369H04N5/372H04N5/3745
    • PROBLEM TO BE SOLVED: To provide an amplification-type solid-state image sensing device which is easily enhanced in density, number of pixels, and an S/N ratio and capable of reading out signals at a high speed. SOLUTION: An amplification-type solid-state image sensing device is composed of amplification-type solid-state image sensing elements which are arranged in matrix and each possessed of a function that photoelectric conversion charge is stored through a first gate region 2, and a potential variation under the first gate region 2 modulated with signal charge stored in the first gate region 2 is outputted as signal and a reset function that signal charge stored in the first gate region 2 is moved to a substrate and exhausted. Pixel signal outputs which are read out are fed to an output impedance conversion circuit (source follower circuit) 33 equipped with a series circuit of a drive transistor 31 and a load transistor 32, and an image output voltage is taken out through the output terminal 34 of the output impedance conversion circuit 33, so that an accurate signal output free from a distortion of signal waveform and of high speed can be obtained.
    • 58. 发明专利
    • SEMICONDUCTOR LASER
    • JPH0697575A
    • 1994-04-08
    • JP24507992
    • 1992-09-14
    • SHARP KK
    • TAKIGUCHI HARUHISAINOGUCHI KAZUHIKOKUDO HIROAKISUGAWARA SATOSHITANETANI MOTOTAKA
    • H01S5/00H01S5/20H01S5/22H01S5/223H01S5/323H01S3/18
    • PURPOSE:To enable the current constriction capacity to be increased furthermore, the difference in the equivalent refractive indexes inside and outside of a striped trench to be adjusted within a wide range by a method wherein laser beam transmitting layers in addition to a laser beam absorbing layer is to be provided in a photocurrent confirement means so as to adjust the mixed crystal ratio and the thickness of these laser beam transmitting layers. CONSTITUTION:The semiconductor laser is provided with a semiconductor substrate 101, a laminated structure formed on the semiconductor substrate 101 and a current light confirement means 150 formed on the laminated structure 140. The current light confirement means 150 is provided with two multilayer light confirement parts (current light confirement layers) 151a and b as well as a striped trench so as to spatially separate the parts 151a from 151b. 152. The forbidden band widths of laser beam transmitting layers 107 and 109 are specified to be wider than that of an active layer 103 so that the laser beams may transmit these layers 107, 109. Furthermore, the forbidden band width of a laser beam absorbing layer 108 is specified to be narrower than that of the active layer 103 so that the layer 108 may absorb the laser beams.
    • 60. 发明专利
    • SEMICONDUCTOR LASER ELEMENT AND MANUFACTURE THEREOF
    • JPH03217068A
    • 1991-09-24
    • JP1333390
    • 1990-01-22
    • SHARP KK
    • SUGAWARA SATOSHITAKIGUCHI HARUHISAKUDO HIROAKISAKANE CHITOSE
    • H01S5/00
    • PURPOSE:To enable two types of laser light whose deflection direction differs mutually to be applied and obtain a laser element suitable for light source for an optic-related equipment such as a light source for measuring light by providing lamination structures with an active region on the upper surface and side surface of a stripe-shaped ridge structure which is formed on a semiconductor substrate and by providing a buried layer covering them. CONSTITUTION:The title item has a semiconductor substrate 1, a stripe-shaped ridge structure 11 which is formed on the semiconductor substrate 1, a first lamination structure 10a which is provided on the upper surface of the ridge structure 11 and has an active region 4, a second lamination structure 10b which is provided on one side surface of the ridge structure 11 and has an active region, a third lamination structure 10c which is provided on the other side surface of the ridge structure 11 and has an active region, a buried layer 6 covering the first to third lamination structures 10a-10c, a first electrode 8a which is formed on the buried layer 6 and is electrically connected to the second lamination structure 10b, a second electrode 8b which is formed on the buried layer 6 and is electrically connected to the third lamination structure 10c, and a third electrode 8c which is formed on the buried layer 6 and is electrically connected to the third lamination structure 10c.