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51. 发明专利

JP2013202775A Polishing pad and method for manufacturing polishing pad 有权
标题翻译：抛光垫和制造抛光垫的方法
公开(公告)号：JP2013202775A
公开(公告)日：2013-10-07
申请号：JP2012077416
申请日：2012-03-29
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： TATENO TEPPEI , MIYASAKA HIROHITO , MATSUOKA TATSUMA , KANAZAWA KAE , MIYAZAWA FUMIO
IPC分类号： B24B37/24 , B24B37/26 , H01L21/304
CPC分类号： B24B37/24 , B24B37/26
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a finishing polishing pad which can polish with few polishing scratches, and can form a stable film, and the polishing pad thereof.SOLUTION: In a polishing pad having a polyurethane resin film on a deposition substrate as a polishing layer, the polishing layer is composed of a polishing slurry holding part and a polishing slurry flow path part, the polishing slurry holding part has bubbles, and meanwhile the polishing slurry flow path part has no bubbles. Further, the polishing layer includes 0.5-6 mass% of hydrophobic spherical silica with respect to the total mass of the polyurethane resin film. The problem is solved by this polishing pad.
摘要翻译：要解决的问题：提供一种能够抛光少量抛光划痕并可形成稳定膜的抛光抛光垫的制造方法及其抛光垫。解决方案：在具有沉积物的聚氨酯树脂膜的抛光垫中作为研磨层的基板，研磨层由抛光浆料保持部和研磨浆流路部构成，研磨浆保持部具有气泡，同时抛光浆流路部没有气泡。此外，抛光层相对于聚氨酯树脂膜的总质量含有0.5-6质量％的疏水性球形二氧化硅。这个抛光垫解决了这个问题。

52. 发明专利

JP2013132741A Polishing pad and method for manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2013132741A
公开(公告)日：2013-07-08
申请号：JP2011286574
申请日：2011-12-27
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： KURIHARA HIROSHI , MIYAZAWA FUMIO
IPC分类号： B24B37/24 , B05D3/10 , B05D7/24 , C08J5/14 , C08J9/28 , H01L21/304
CPC分类号： C08J7/047 , B24B37/24 , B24D11/003 , C08J2367/00 , C08J2475/04 , C08J2475/06 , C08J2475/08
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad containing minute air bubbles almost uniform in thickness direction and provided with an opening part already without requiring an opening process such as surface grinding, and a method of manufacturing the same.SOLUTION: The method of manufacturing a polishing pad includes a step (1) in which a mixture solution containing polyurethane resin and organic solvent is applied on a film forming base material, a step (2) in which the polyurethane resin is, after the application step, exposed to the atmosphere of temperature of 10-80°C and relative humidity of 65-100% for two minutes or longer, and a step (3) in which the polyurethane resin is submerged in congealing liquid for coagulation.
摘要翻译：要解决的问题：提供一种在厚度方向上具有几乎均匀的微小气泡的抛光垫，并且具有开口部分，而不需要诸如表面研磨的开孔方法及其制造方法。制造方法研磨垫包括在成膜基材上涂布含有聚氨酯树脂和有机溶剂的混合溶液的工序（1），涂布工序后的聚氨酯树脂暴露在大气中的工序（2）的温度为10-80℃，相对湿度为65-100％的条件下进行2分钟或更长时间;以及步骤（3），其中聚氨酯树脂浸没在用于凝固的凝结液中。

53. 发明专利

JP2012096344A Polishing pad, and method of manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2012096344A
公开(公告)日：2012-05-24
申请号：JP2010248715
申请日：2010-11-05
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： TATENO TEPPEI , MIYAZAWA FUMIO
IPC分类号： B24B37/26 , B24B37/24 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad for giving scratchless polishing surface of an object to be polished.SOLUTION: The polishing pad 10 has a urethane sheet 2 formed by a wet-coagulation process. The urethane sheet 2 has protrusions 5, and recesses 6 between the protrusions 5, on one side surface. Surfaces of the protrusions 5 constitute a polishing surface P. In the protrusion 5, a plurality of foams 3 with the maximum diameter acquired by cross-section observation in a range of 50-300 μm are formed and a large number of fine holes 4 with the maximum diameter in a range of 1 to 10 μm are formed between the foams 3. Open holes 3a, 4a are formed on the polishing surface P. Open holes 3a are crushed when forming the recesses 6 by thermal emboss process and open holes 4a are contracted in their diameters or closed at a surface of the recesses 6. Retention of polishing liquid or polishing sludge is suppressed in the recesses 6, and the polishing liquid is circulation-supplied and the polishing sludge is exhausted through the recesses 6.
摘要翻译：要解决的问题：提供一种用于提供待抛光对象的无划伤抛光表面的抛光垫。解决方案：抛光垫10具有通过湿式凝结工艺形成的聚氨酯片材2。聚氨酯片2在一个侧表面上具有突起5和突起5之间的凹部6。突起5的表面构成研磨面P.在突起部5中，形成有通过横截面观察获得的最大直径的多个泡沫3在50〜300μm的范围内，并且形成多个具有在泡沫3之间形成1〜10μm范围内的最大直径。在研磨面P上形成开孔3a，4a。通过热压花加工形成凹部6时，开孔3a被破碎，开孔4a为在凹部6中抑制了研磨液或研磨污泥的保留，并且研磨液循环供给，研磨废液通过凹部6排出。版权所有（C）2012，JPO＆INPIT

54. 发明专利

JP2011194508A Polishing pad 有权
标题翻译：抛光垫
公开(公告)号：JP2011194508A
公开(公告)日：2011-10-06
申请号：JP2010063498
申请日：2010-03-19
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , TAKAGI MASATAKA
IPC分类号： B24B37/24 , B82Y10/00 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad capable of preventing scratches and improving flatness accuracy.SOLUTION: The polishing pad 10 includes a resin sheet 2. The resin sheet 2 is formed by a wet coagulation method, and has a polishing surface P for polishing an object to be polished. The resin sheet 2 is formed while numerous fine pores 4 approximately uniformly disperse in resin. The fine pores 4 communicate like a mesh with one another through channels smaller than the fine pore 4 by solvent substitution when deposited by the wet coagulation method, and have a microporous structure. The resin sheet 2 is formed of two kinds of resin compositions whose difference in a SP value differs in a range of 1-3 and has its hydrophilic property controlled. Water absorption time of the resin sheet 2 is controlled to be in a range of 10-60 seconds. Thus, slurry is hardly absorbed.
摘要翻译：要解决的问题：提供一种能够防止划痕并提高平坦度精度的抛光垫。解决方案：抛光垫10包括树脂片2.树脂片2通过湿式凝结法形成，并具有用于抛光抛光物体。形成树脂片2，同时许多细孔4大致均匀地分散在树脂中。通过湿式凝固法沉积时，细孔4通过溶剂取代而通过小于细孔4的通道彼此连通，并且具有微孔结构。树脂片2由两种树脂组合物形成，其SP值的差异在1-3的范围内并且具有其亲水性控制。将树脂片2的吸水时间控制在10〜60秒的范围内。因此，浆料几乎不被吸收。

55. 发明专利

JP2011125934A Polishing pad and method of manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2011125934A
公开(公告)日：2011-06-30
申请号：JP2009283830
申请日：2009-12-15
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： ITOYAMA MITSUNORI , MIYAZAWA FUMIO
IPC分类号： B24B37/24 , B24B37/26 , C08G18/10 , C08G101/00 , C08J5/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a polishing pad flattening a polishing object. SOLUTION: The polishing pad 10 has an urethane sheet 2. The urethane sheet 2 is made of a polyurethane resin, and has a polishing surface P. The urethane sheet 2 is formed by a resin sheet made of polystyrene non-compatible with the polyurethane resin and having regular unevenness by the self-organization of polystyrene as a mold. The regular unevenness of the resin sheet is transferred to the polishing surface P side, with the inverted regular uneven pattern 5 being formed thereon. Flat projecting parts 5b having a substantially same shape with its top surface being flat are arranged on the polishing surface P side at a predetermined spacing, and recesses 5a are formed between the projecting parts 5b. The dispersed state of slurry is unified during the polishing. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于制造使抛光对象平坦化的抛光垫的方法。解决方案：抛光垫10具有聚氨酯片2.聚氨酯片2由聚氨酯树脂制成，并具有抛光表面P.聚氨酯片2由不相容的聚苯乙烯树脂片形成该聚氨酯树脂通过聚苯乙烯作为模具的自组织而具有规则的不均匀性。树脂片的规则的不均匀性被转印到抛光表面P侧，其上形成有倒置的规则的不均匀图案5。具有基本相同形状的平坦突出部分5b，其顶表面是平坦的，以预定间隔布置在抛光表面P侧上，并且在突出部分5b之间形成凹部5a。浆料的分散状态在抛光过程中统一。版权所有（C）2011，JPO＆INPIT

56. 发明专利

JP2010179431A Manufacturing method of polishing pad 有权
标题翻译：抛光垫的制造方法
公开(公告)号：JP2010179431A
公开(公告)日：2010-08-19
申请号：JP2009026786
申请日：2009-02-06
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： KUME TAKAHIRO , YOSHIDA TAIJI , MIYAZAWA FUMIO
IPC分类号： B24B37/20 , C08J5/14 , C08J9/28
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of a polishing pad retaining a stable polishing rate and reducing waviness. SOLUTION: In an application process, a polyurethane resin solution is applied to a film forming base. In the next vaporization process, the polyurethane resin solution applied to the film forming base is guided into an atmosphere of 50-80°C, and it is subjected to heat treatment for 10-60 minutes. One part of an organic solvent contained in at least a surface layer is vaporized in the polyurethane resin solution guided into the heating atmosphere. Then, in a solidification process, solidification regeneration of the applied polyurethane resin solution subjected to heat treatment is carried out in a solidification liquid. During the solidification regeneration, micro pores (pores 3) are formed substantially evenly and substantially equally without forming micro pores in the polyurethane resin solution. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种保持稳定的抛光速率并减少波纹的抛光垫的制造方法。解决方案：在涂布工艺中，将聚氨酯树脂溶液施加到成膜基材上。在下一个汽化过程中，将施加到成膜基底的聚氨酯树脂溶液引导至50-80℃的气氛中，进行10-60分钟的热处理。至少表面层中含有的一部分有机溶剂在导入加热气氛的聚氨酯树脂溶液中蒸发。然后，在凝固过程中，在凝固液中进行经过热处理的涂布的聚氨酯树脂溶液的固化再生。在固化再生期间，微孔（孔3）基本上均匀且基本上均匀地形成，而不在聚氨酯树脂溶液中形成微孔。版权所有（C）2010，JPO＆INPIT

57. 发明专利

JP2010179422A Manufacturing method of polishing pad 有权
标题翻译：抛光垫的制造方法
公开(公告)号：JP2010179422A
公开(公告)日：2010-08-19
申请号：JP2009026098
申请日：2009-02-06
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： KUME TAKAHIRO , MIYAZAWA FUMIO , FUJII TAKATOSHI
IPC分类号： B24B37/20 , C08J5/14 , C08J9/28
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of a polishing pad exercising polishing performance throughout a long period of time while securing a cushioning property. SOLUTION: The polishing pad is equipped with urethane foam integrally formed by a wet film forming method. In the wet film forming method, a polyurethane resin solution is applied like a sheet substantially evenly on a belt like film forming base in an application process. A PET film having surface smoothness is used in the film forming base. In a dipping process, the polyurethane resin solution applied to the film forming base is dipped in a solidification liquid mainly composed of water. In a stripping process, polyurethane resin during solidification regeneration in the solidification liquid is stripped off the film forming base before completing the solidification regeneration of the polyurethane resin, and the solidification regeneration of the polyurethane resin is completed thereafter. The urethane foam is seamlessly integrally formed, having different foaming structures in both thickness direction sides. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种在确保缓冲性的同时长时间运行抛光性能的抛光垫的制造方法。解决方案：抛光垫配有通过湿式成膜法整体形成的聚氨酯泡沫。在湿式成膜方法中，将聚氨酯树脂溶液在涂布工序中基本均匀地涂布在带状成膜基材上。在成膜基材中使用具有表面光滑度的PET膜。在浸渍处理中，将涂布在成膜基材上的聚氨酯树脂溶液浸渍在主要由水构成的凝固液中。在剥离过程中，在完成聚氨酯树脂的固化再生之前，将固化液中的固化再生期间的聚氨酯树脂从成膜基底剥离，此后完成聚氨酯树脂的固化再生。聚氨酯泡沫无缝地一体形成，在两个厚度方向侧具有不同的发泡结构。版权所有（C）2010，JPO＆INPIT

58. 发明专利

JP2010090258A Method for selecting polishing sheet for polishing pad 有权
标题翻译：选择抛光垫抛光片的方法
公开(公告)号：JP2010090258A
公开(公告)日：2010-04-22
申请号：JP2008261099
申请日：2008-10-07
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： ITOYAMA MITSUNORI , TAKAHASHI DAISUKE , MIYAZAWA FUMIO
IPC分类号： C08J5/14 , B24B37/20 , B24D3/32 , C08G18/10 , C08G101/00 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a method for selecting a polishing sheet for a polishing pad, so as to appropriate a wear degree and stabilize polishing performances while taking the lifetime into consideration. SOLUTION: The polishing pad has a urethane sheet of a foamed structure having a polishing face. The urethane sheet is selected from sheets prepared by slicing a foamed material comprising a mixture of a polyisocyanate compound, a polyol compound, water and a polyamine compound. A sheet having an F value, which is defined by F=-36.7×HSC-758.8×R+656×D-619×T+2,587, in a range from 100 to 200 is selected as a favorable product. In the above definition, HSC represents a content rate of a hard segment, R represents an equivalent ratio of the total of hydroxy groups in the polyol compound and amino groups in the polyamine compound with respect to isocyanate groups of the polyisocyanate compound, D represents bulk density and T represents a thickness. The F value correlates with easiness of wear on the polishing face while taking the lifetime into consideration. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种选择抛光垫用抛光片的方法，以便在考虑寿命的同时适当磨损度并稳定研磨性能。解决方案：抛光垫具有具有抛光面的发泡结构的聚氨酯片。氨基甲酸酯片选自由包含多异氰酸酯化合物，多元醇化合物，水和多胺化合物的混合物的发泡材料切片制备的片材。作为有利的产物，选择由F = -36.7×HSC-758.8×R + 656×D-619×T + 2,587定义的F值为100〜200的片材。在上述定义中，HSC表示硬链段的含有率，R表示多元醇化合物中的羟基与多胺化合物中的氨基相对于多异氰酸酯化合物的异氰酸酯基的当量比，D表示本体密度和T表示厚度。考虑到寿命，F值与抛光面上的磨损容易性相关。版权所有（C）2010，JPO＆INPIT

59. 发明专利

JP2010082719A Polishing pad and method of manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2010082719A
公开(公告)日：2010-04-15
申请号：JP2008252204
申请日：2008-09-30
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： ITOYAMA MITSUNORI , MIYAZAWA FUMIO
IPC分类号： B24B37/24 , C08G18/00 , C08G18/66 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad capable of ensuring polishing performance even at low pressure polishing machining and enhancing flatness of an object to be polished. SOLUTION: The polishing pad 10 includes an urethane sheet 2 made of polyurethane resin. The urethane sheet 2 is formed by a reaction of a prepolymer and a polyamine compound. The urethane sheet 2 has: a crystal phase formed by a hard segment; an amorphous phase formed by a soft segment; and an interface phase between the crystal phase and the amorphous phase. In the urethane sheet 2, P value obtained by equation: P=22,500-160RI-21*T2I, wherein a component ratio of the interface phase obtained from an FID (free induction decay) signal by pulse NMR (nuclear magnetic resonance) is made to RI and a spin-spin relaxing time is made to T2I, is within a range of 6,000-7,500. Accordingly, hardness A and compression modulus of elasticity are also enhanced. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供即使在低压抛光加工时也能确保抛光性能并提高被抛光物体的平整度的抛光垫。解决方案：抛光垫10包括由聚氨酯树脂制成的聚氨酯片材2。氨基甲酸酯片2通过预聚物和多胺化合物的反应形成。氨基甲酸酯片2具有：由硬链段形成的结晶相; 由软段形成的非晶相; 以及晶相和非晶相之间的界面相。在聚氨酯片材2中，通过P = 22,500-160RI-21 * T2I获得的P值，其中通过脉冲NMR（核磁共振）从FID（自由感应衰减）信号获得的界面相的分量比被制成到RI，并且对T2I进行自旋旋转松弛时间在6,000-7,500的范围内。因此，硬度A和弹性模量也提高。版权所有（C）2010，JPO＆INPIT

60. 发明专利

JP2006207081A Phosphorescent polyurethane polyurea elastic yarn 审中-公开
标题翻译：磷脂聚氨酯弹性纱
公开(公告)号：JP2006207081A
公开(公告)日：2006-08-10
申请号：JP2005023162
申请日：2005-01-31
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , MORISHITA NOBUYA
IPC分类号： D01F6/94
摘要： PROBLEM TO BE SOLVED: To provide a phosphorescent polyurethane polyurea elastic yarn having excellent elasticity characteristics and luminous brightness and excellent designability in hue such as color or color tone and high practicality.
SOLUTION: The phosphorescent polyurethane polyurea elastic yarn is obtained by including a phosphorescent agent in a polyurethane polyurea and carrying out dry spinning or a wet spinning method. The average particle diameter of the phosphorescent agent is 1-5 μm and the content of the phosphorescent agent is 5-15 wt.%. Thereby, the elastic yarn having suppressed unevenness and the sufficient luminous brightness is obtained.
COPYRIGHT: (C)2006,JPO&NCIPI

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