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41. 发明专利

JPS61210050A POLYPRENYL COMPOUND 失效
公开(公告)号：JPS61210050A
公开(公告)日：1986-09-18
申请号：JP5054485
申请日：1985-03-15
申请人： EISAI CO LTD
发明人： NAKAMOTO KOJI , SUZUKI TAKESHI , ABE SHINYA , HAYASHI KENJI , KAJIWARA SHOJI , YAMATSU ISAO , OTSUKA KAZUMASA , SHIOJIRI HIROYUKI
IPC分类号： A61K31/16 , A61K31/165 , A61K31/19 , A61P3/06 , A61P9/10 , C07C51/00 , C07C57/30 , C07C57/42 , C07C61/39 , C07C63/04 , C07C63/64 , C07C67/00 , C07C233/17 , C07C233/23 , C07C233/69 , C07C237/08 , C07C237/20 , C07C237/22
摘要： NEW MATERIAL:The polyprenyl compound of formula I [all of A, B, Y and Z are H, or A and B or Y and Z together form a single bond; n is 0-2; X is group of formula II (both K and L are H or K and L together form a single bond), CH2 or (CH2)2; m is 0 or 1; R is OH, group of formula III (R and R are H or lower alkyl; p is 1 or 2), NH-(CH2)q-OH (q is 1 or 2), etc.] and its salt. EXAMPLE:4-(2',6',10'-Trimethylundecyl)phenylacetic acid. USE:It has excellent hypocholesteric action, and is useful as an hypocholesteric agent and remedy for arteriosclerosis. PREPARATION:A compound of formula I wherein m is 0 and R is OH can be produced, e.g. by reacting the compound of formula IV with the compound of formula V (n is 0-2) in the presence of a catalyst, is a solvent at room temperature -100 deg.C, and hydrolyzing the reaction product.

43. 发明专利

JP2020201480A 感放射線性組成物、パターン形成方法及び化合物审中-公开
公开(公告)号：JP2020201480A
公开(公告)日：2020-12-17
申请号：JP2020090841
申请日：2020-05-25
申请人： JSR株式会社 , コーネル・ユニバーシティー , CORNELL UNIVERSITY
发明人：酒井一憲 , オーバークリストファーケー.
IPC分类号： G03F7/025 , G03F7/004 , C07C63/04 , C07C63/64 , C07C65/21 , C07C255/41 , C07C211/05 , C07C233/09 , C07C211/07 , C07C211/08 , C07C255/25 , C07F3/06 , C07F15/04 , C07F15/06 , C09K3/00 , G03F7/20 , G03F7/027
摘要：【課題】解像性及び感度に優れる感放射線性組成物の提供を目的とする。【解決手段】本発明は、金属原子及び配位子を有する化合物と、溶媒とを含有し、上記配位子が、下記式(1)で表される第1化合物及び下記式(2)で表される第2化合物からなる群より選ばれる少なくとも1種に由来する感放射線性組成物である。下記式(1)中、X 1 は、置換若しくは非置換のエテニル基又は置換若しくは非置換のエチニル基である。Y 1 は、−NR A R B 又は−COOHである。下記式(2)中、X 2 は、炭素数1〜20の1価のハロゲン化炭化水素基、炭素数1〜20の1価のオキシ有機基、置換若しくは非置換の炭素数6〜20のアリール基、シアノ基又はハロゲン原子である。Y 2 は、−NR A R B 又は−COOHである。【選択図】なし

44. 发明专利

JP2012250969A Carboxylic acid compound, base generator, and photosensitive resin composition containing the base generator 有权
标题翻译：羧基酸化合物，基因发生器和含基因发生器的感光树脂组合物
公开(公告)号：JP2012250969A
公开(公告)日：2012-12-20
申请号：JP2011196094
申请日：2011-09-08
申请人： Tokyo Univ Of Science , 学校法人東京理科大学
发明人： ARIMITSU KOJI
IPC分类号： C07C63/64 , C07D487/04 , C07D487/08 , C09K3/00 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a carboxylic acid compound which has excellent reaction efficiency without generating carbon dioxide when generating a base, a base generator and a photosensitive resin composition containing the base generator.SOLUTION: The carboxylic acid compound acts as the base generator for which carboxylic acid causes photocyclization reaction by light irradiation to generate the base, and when it is applied to a base reactive compound such as an epoxy compound, since a base generating reaction is sequentially generated, the reaction efficiency is excellent, and carbon dioxide is not generated when generating the base. Also, the photosensitive resin composition can provide a cured film of high product characteristics and product values without generating irregularities on the cured film by bubbles of the carbon dioxide. The photosensitive resin composition which demonstrates such an effect is suitably usable for a highly sensitive photo curing material or a resist material or the like for instance.
摘要翻译：要解决的问题：提供一种当生成碱时产生二氧化碳的反应效率优异的羧酸化合物，含有碱发生剂的基底发生剂和感光性树脂组合物。解决方案：羧酸化合物用作羧酸通过光照射引起光环化反应的碱产生剂，以产生碱，并且当其应用于底物反应性化合物如环氧化合物时，由于产生碱产生反应反应效率优异，生成碱时不产生二氧化碳。此外，感光性树脂组合物可以提供高产品特性和产品值的固化膜，而不会由于二氧化碳的气泡而在固化膜上产生不规则性。具有这种效果的感光性树脂组合物，例如适用于高灵敏度的光固化材料或抗蚀剂材料等。版权所有（C）2013，JPO＆INPIT

45. 发明专利

JP4961773B2 Aromatic carboxylic acids and acid halides 有权
公开(公告)号：JP4961773B2
公开(公告)日：2012-06-27
申请号：JP2006053837
申请日：2006-02-28
申请人：住友ベークライト株式会社
发明人：幸治小野 , 美帆子松谷
IPC分类号： C07C63/64 , C07C63/66

46. 发明专利

JP4737845B2 New three-dimensional-type organic metal complex and a gas adsorbent 有权
公开(公告)号：JP4737845B2
公开(公告)日：2011-08-03
申请号：JP2001036743
申请日：2001-02-14
申请人：大阪瓦斯株式会社
发明人：建司関
IPC分类号： C07C57/15 , F17C11/00 , C07C51/347 , C07C63/28 , C07C63/333 , C07C63/64 , C07C63/66 , C07D401/14 , C07F1/08 , C10L3/06

47. 发明专利

JP2011037834A New compound, resist composition and method for forming pattern 有权
标题翻译：新化合物，抗蚀剂组合物和形成图案的方法
公开(公告)号：JP2011037834A
公开(公告)日：2011-02-24
申请号：JP2010155687
申请日：2010-07-08
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： ICHIKAWA KOJI , SUGIHARA MASAKO , YAMASHITA HIROKO
IPC分类号： C07C381/12 , C07C25/02 , C07C57/055 , C07C63/64 , C07C69/54 , C08F20/38 , G03F7/004 , G03F7/039
CPC分类号： C08F22/02 , C07C25/18 , C07C57/03 , C07C57/28 , C07C63/64 , C07C63/66 , C07C69/54 , C07C309/17 , C07C381/12 , C07C2603/74 , C08F20/38 , C08F32/08 , G03F7/0045 , G03F7/0397 , G03F7/30 , Y10S430/122 , Y10S430/123
摘要： PROBLEM TO BE SOLVED: To provide a compound capable of forming patterns having excellent pattern resolution and line edge roughness, and to provide a resist composition using the same. SOLUTION: There is provided a compound represented by formula (I-Pb), [wherein, X Pb is a single bond or -O-; R Pb is a single bond, a divalent aliphatic hydrocarbon group, an alicyclic hydrocarbon group or an aromatic hydrocarbon group; methylene groups contained in the aliphatic hydrocarbon group and the alicyclic hydrocarbon group each may be replaced by an oxygen atom or a carbonyl group; Y Pb is a polymerizable group; Z Pb is an organic group; X Pc is a single bond or an alkylene group; R Pc is an aliphatic hydrocarbon group, an alicyclic hydrocarbon group or an aromatic hydrocarbon group which may have one or more substituents; methylene groups contained in the aliphatic hydrocarbon group and the alicyclic hydrocarbon group each may be replaced by oxygen atom or a carbonyl group]. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供能够形成具有优异的图案分辨率和线边缘粗糙度的图案的化合物，并提供使用其的抗蚀剂组合物。提供由式（I-Pb）表示的化合物[其中，X Pb 是单键或-O-; R Pb 是单键，二价脂族烃基，脂环族烃基或芳香族烃基; 脂族烃基和脂环族烃基中所含的亚甲基各自可以被氧原子或羰基取代; Y Pb 是可聚合基团; Z Pb 是有机基团; X Pc 是单键或亚烷基; R P是脂族烃基，脂环族烃基或可具有一个或多个取代基的芳香族烃基; 脂族烃基和脂环族烃基中所含的亚甲基可以被氧原子或羰基取代]。版权所有（C）2011，JPO＆INPIT

48. 发明专利

JP2007056000A Aromatic carboxylic acid and acid halide thereof 有权
标题翻译：芳香羧酸及其卤化物
公开(公告)号：JP2007056000A
公开(公告)日：2007-03-08
申请号：JP2006053837
申请日：2006-02-28
申请人： Sumitomo Bakelite Co Ltd , 住友ベークライト株式会社
发明人： ONO KOJI , MATSUTANI MIHOKO
IPC分类号： C07C63/64
摘要： PROBLEM TO BE SOLVED: To provide a new aromatic carboxylic acid and its acid halide useful as raw materials for highly heat-resistant condensed polymers.
SOLUTION: The aromatic carboxylic acid is represented by the general formula(1)( wherein, Y is H, an alkyl or aromatic group; Ar is an aromatic group; the hydrogen atoms on this aromatic carboxylic acid may be substituted with adamantane structure-containing groups, which may have 1-20C alkyl groups; n is an integer of 1-5; and m is an integer of 1-4 ).
COPYRIGHT: (C)2007,JPO&INPIT

49. 发明专利

JP2006282525A Ionic liquid having benzoic acid derivative as anion 审中-公开
标题翻译：具有苯甲酸衍生物的离子液体作为阴离子
公开(公告)号：JP2006282525A
公开(公告)日：2006-10-19
申请号：JP2005101642
申请日：2005-03-31
申请人： Nisshinbo Ind Inc , 日清紡績株式会社
发明人： MASUDA GEN , KATO YASUYOSHI
IPC分类号： C07C63/06 , C07C63/64 , C07C211/05 , C07C215/08 , C07C217/08 , C07C219/08 , C07D233/58 , C07D295/02
摘要： PROBLEM TO BE SOLVED: To provide an environmentally friendly, neutralized salt type ionic liquid which is in a liquid state at a relatively low temperature and is free of halogen atoms such as fluorine.
SOLUTION: The ionic liquid is obtained by mixing halogen-free benzoic acids and a halogen-free base and is in a liquid state at ≤100°C. A specific example is the neutralized salt type ionic liquid of formula (1).
COPYRIGHT: (C)2007,JPO&INPIT

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