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42. 发明专利

JP3975290B2 Excavation surplus soil and sludge separation processing method and apparatus 失效
公开(公告)号：JP3975290B2
公开(公告)日：2007-09-12
申请号：JP5431196
申请日：1996-03-12
申请人：有限会社深澤建材
发明人：一之深澤
IPC分类号： B03B5/68 , C02F11/12 , B01D36/04

43. 发明专利

JP2004243168A Method for removing foreign matter such as wood waste from gravel 审中-公开
公开(公告)号：JP2004243168A
公开(公告)日：2004-09-02
申请号：JP2003033660
申请日：2003-02-12
申请人： Masao Fujita , Ichiro Matsukura , 一郎松倉 , 政雄藤田
发明人： FUJITA MASAO , MATSUKURA ICHIRO
IPC分类号： E02F7/00 , B03B5/68 , B07B4/02
摘要： PROBLEM TO BE SOLVED: To provide a method for removing foreign matters such as wood waste from gravel by which waste such as wood waste can be surely removed without requiring a large facility with good working property and little amount of water.
SOLUTION: A jetting apparatus of water or air is disposed under the drop port of gravel and water or air is horizontally jetted to the dropping gravel while a fixed amount of the gravel is concentratedly and continuously dropped through the drop port to blow off the waste such as wood waste mixed in the gravel into one direction to separate the waste from the gravel. Thus, waste such as wood waste can be surely removed without requiring a large facility with good working property and a relatively small amount power and water, and a ready-mixed concrete material of high quality can be rapidly obtained at a low cost.
COPYRIGHT: (C)2004,JPO&NCIPI

44. 发明专利

JPH11123342A DEVICE FOR CARRYING GRIT IN GRIT CHAMBER 失效
公开(公告)号：JPH11123342A
公开(公告)日：1999-05-11
申请号：JP30786497
申请日：1997-10-21
申请人： ITO SEISAKUSHO
发明人： ITO HIROSHI , ITO KYOJI
IPC分类号： B01D21/18 , B03B5/68
摘要： PROBLEM TO BE SOLVED: To provide the titled device which does not need a large-scale mechanical apparatus and has little friction and is easily maintained and can perform classification by carrying the grit to the discharging side while the grit is cleaned. SOLUTION: In a grit chamber in which sand is settled and classified from muddy sludge, etc., a plurality of nozzle parts 24 are arranged in parallel at an interval front and back and left and right on the bottom parts of chevron channels in the grit chamber 1 and are faced forward to the plurality of lines and distribution pipes 23 of a water feeding device 2 are connected with the nozzle parts 24 so as to jet water from each nozzle part 24 and flow adjusting plates 3 crossing at right angles the discharging direction are provided to the distribution pipes 23 arranged in parallel and the grit is carried to the discharging side in the front direction by blowing forward the grit at the position by jetting water in the front direction from each nozzle part 24.

45. 发明专利

JPH03148825A JET SCRUBBER 失效
公开(公告)号：JPH03148825A
公开(公告)日：1991-06-25
申请号：JP28745089
申请日：1989-11-06
申请人： EBARA CORP
发明人： TAKAO SHOSUKE , YOKOI KEIJI , MINAMI YOSHIO
IPC分类号： B08B3/02 , B03B5/68 , B08B1/00 , B08B3/12 , C30B33/00 , H01L21/304
摘要： PURPOSE:To prevent removed contaminants from adhering or remaining on a wafer by a method wherein the surface to be cleaned of the wafer is held facing downward, an injection nozzle is faced upward to inject a liquid and the surface is cleaned. CONSTITUTION:A wafer 2 is held on a chuck 3 by attraction or the like facing downward and a nozzle 12 is positioned under the lower part of the wafer 2. The nozzle 12 is incorporated in a screw 17 in such a way that it can be transferred to the left or the right on the center line of the wafer 12 and is connected to a motor 16. If the nozzle 12 is transferred to the left or the right, the wafer is rotated. Thereby, an upward jet which is injected from the nozzle 12 collides with the whole surface on the lower side of the wafer 2 and removed contaminants fall along with the wafer of the jet and can be prevented from remaining on the lower surface S of the wafer 2 as they are adhered on the lower surface S.

46. 发明专利

JPH03139832A JET SCRUBBER 失效
公开(公告)号：JPH03139832A
公开(公告)日：1991-06-14
申请号：JP27613089
申请日：1989-10-25
申请人： EBARA CORP
发明人： TAKAO SHOSUKE , YOKOI KEIJI , MINAMI YOSHIO
IPC分类号： B08B3/10 , B03B5/68 , H01L21/304
摘要： PURPOSE:To exhibit sufficient cleaning capability regardless of the type of contaminant by watertightly forming a structure for containing a wafer, a chuck and a nozzle, incorporating water inside it, and mounting the wafer, the chuck for hooding the wafer, and the exit of the nozzle for injecting high pressure water under the water level. CONSTITUTION:High pressure water to be injected from the exit O of a nozzle 1 is fed to the surface of a wafer 2 through the wafer W in a structure 7, and cavitation bubbles are generated by friction with static water W therebetween. The bubbles are ruptured when they reach the surface of the wafer 3 separated by a predetermined distance from the exit O of the nozzle 1 to generate a large impact pressure. Various contaminants on the wafer are removed by the impact pressure. In this case, in order to easily generate the bubbles, the water W is degassed, or the water is heated. Thus, the structure 7 is formed with a cover 14 in a sealing construction, the inside is evacuated, or a heater 26 is installed therein.

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