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    • 43. 发明专利
    • DIELECTRIC BARRIER ELECTRIC DISCHARGE LAMP LIGHTING EQUIPMENT
    • JP2002352985A
    • 2002-12-06
    • JP2001157077
    • 2001-05-25
    • USHIO ELECTRIC INC
    • HIRAOKA TAKAHIROOKAMOTO MASASHI
    • H05B41/24H01J65/00H05B41/28
    • PROBLEM TO BE SOLVED: To prevent lowering of the radiation intensity of illumination accompanying the lapse of utilization time, not only for maintaining luminescence efficiency, in dielectric barrier electric discharge lamp lighting equipment. SOLUTION: This dielectric barrier electric discharge lamp lighting equipment consists of a dielectric barrier electric discharge lamp 2, which is filled with a gas for electric discharge, which generates excimer molecules by dielectric barrier electric discharge, and has electrodes (4, 5) for making the electric discharge phenomenon induced in this gas for electric discharge, and dielectrics (6, 7), and electricity supply equipment 1 for impressing the high voltage to this dielectric barrier electric discharge lamp 2. The electric supply equipment 1 impresses high voltage of almost periodic waveform to the barrier electric discharge lamp 2 via a booster transformer (10). At voltage polarity changing of the next dielectric barrier electric discharging, after the completion of one dielectric barrier electric discharge, impressed voltage waveform is first made to generate a steep overshoot, and after it, by having has an oscillating wave form which the ratio of a difference of a 2nd peak point and a 3rd peak point to the difference of a 1st peak point and the second peak point is 30% or less. The oscillating wave form substantially does not exist.
    • 46. 发明专利
    • PERIPHERAL EXPOSING SYSTEM
    • JP2002343709A
    • 2002-11-29
    • JP2001151037
    • 2001-05-21
    • USHIO ELECTRIC INC
    • SATO MASANORISHINDO YUTAKA
    • G03F7/20G03F9/00H01L21/027
    • PROBLEM TO BE SOLVED: To provide a peripheral exposing system in which an irradiating region at the notch part of a wafer is prevented from moving in V-shape to expose a region in the wafer not required to be exposed. SOLUTION: The peripheral exposing system for irradiating the peripheral part of a wafer, provided with a notch at the outer circumferential part thereof, with exposing light while turning the wafer comprises a wafer edge detecting means moving mechanism for moving the sensor light projecting/receiving section substantially in the central direction of the wafer, and a control section for controlling the wafer edge detecting means moving mechanism such that the edge part of the wafer is irradiated with a constant quantity of sensor light and for controlling an irradiating region moving mechanism to move by the same amount as an wafer edge detecting means. When a signal indicating the start of the notch is received by the wafer edge detecting means, operation of the exposing light irradiating region moving mechanism is interrupted and the operation is resumed upon elapsing a specified time or upon receiving a signal indicating the end of the notch.
    • 49. 发明专利
    • LIGHT SOURCE EQUIPMENT
    • JP2002270386A
    • 2002-09-20
    • JP2001070474
    • 2001-03-13
    • USHIO ELECTRIC INC
    • OKAMOTO MASASHINAKAYAMA MINEOTAKATANI IZUMI
    • G03B21/14H01J61/54H01J61/88H05B41/04H05B41/19H05B41/288H05B41/38
    • PROBLEM TO BE SOLVED: To prevent heat loss, enlargement of a size, difficulty of re-starting, noise, and insulation destruction. SOLUTION: Light source equipment consists of an electric discharge lamp Ld, which contains mercury of 0.15 mg or more per capacity 1 cubic millimeter of electric discharging space, while being oppositely arranged with one pair of electrodes E1 and E2 for main electric discharging, whose electrode interval is 2.5 mm or less, and which is arranged with an auxiliary electrodes Et other than the electrode for main electric discharge so that it may not touch the electric discharge space for main electric discharge, and a starter Ue, which generates high voltage between the above auxiliary electrodes Et and any of an electric supply circuit Bx for supplying electric discharge current to the electrode E1, E2 for main electric discharge or the electrodes E1 and E2 of the both electrodes for the main electric discharge, wherein, the starter Ue constitutes light source equipment so that it may have capability to generate voltage 2 to 5 times the voltage necessary for making the lamp at a room temperature state the main electric discharging.