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    • 42. 发明专利
    • Wiring substrate for mounting semiconductor, semiconductor package, and its manufacturing method
    • 用于安装半导体的接线基板,半导体封装及其制造方法
    • JP2007096337A
    • 2007-04-12
    • JP2006313640
    • 2006-11-20
    • Nec CorpNec Electronics CorpNecエレクトロニクス株式会社日本電気株式会社
    • MURAI HIDEYAORITO NAONORIFUNAYA TAKUOKIKUCHI KATSUYAMAMICHI SHINTAROBABA KAZUHIROHONDA KOICHIHO KEIICHIROMATSUI KOJIMIYAZAKI SHINICHI
    • H01L23/12H05K3/46
    • PROBLEM TO BE SOLVED: To provide a wiring substrate for mounting semiconductor which is effective for the high integration of a semiconductor device, high speed, or increase in terminal by multifunction, and the narrow pitch of a distance between terminals, in which the semiconductor device can be mounted with high density and high accuracy specifically on the both surfaces of a substrate, and which is excellent also in reliability, its manufacturing method, and a semiconductor package.
      SOLUTION: A wiring substrate 5 for mounting semiconductor is a wiring substrate comprising at least an insulating film 1, wiring 2 formed in the insulating film 1, and a plurality of electrode pads 4 conducted by the wiring 2 and a via 3. The electrode pad 4 is prepared on the front and back surfaces of the insulating film 1 such that the front surface is exposed. At least a part of the side surface of the electrode pad is embedded in the insulating film 1. The insulating film 1 can be formed by forming the electrode pads 4 on two sheets of metal plates, laminating the insulating layer and the wiring on the electrode pad 4 and each metal plate, pasting the insulating layer together and unifying the layer, and removing the metal plate.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:为了提供一种半导体装置的布线基板,其有效用于半导体器件的高集成度,高速度或多功能的端子增加,以及端子之间的距离的窄间距,其中 半导体器件可以特别地在基板的两个表面上高密度和高精度地安装,并且在可靠性,其制造方法和半导体封装中也是优异的。 解决方案:用于安装半导体的布线基板5是至少包括绝缘膜1,形成在绝缘膜1中的布线2和由布线2和通孔3传导的多个电极焊盘4的布线基板。 在绝缘膜1的前表面和后表面上制备电极焊盘4,使得前表面露出。 电极焊盘的侧面的至少一部分嵌入在绝缘膜1中。绝缘膜1可以通过在两片金属板上形成电极焊盘4而形成,在电极上层压绝缘层和布线 垫4和每个金属板,将绝缘层粘贴在一起并使层合并,并移除金属板。 版权所有(C)2007,JPO&INPIT
    • 44. 发明专利
    • Semiconductor device
    • 半导体器件
    • JP2006032600A
    • 2006-02-02
    • JP2004208375
    • 2004-07-15
    • Nec CorpNec Electronics CorpNecエレクトロニクス株式会社日本電気株式会社
    • KIKUCHI KATSUYAMAMICHI SHINTAROMURAI HIDEYAHONDA KOICHISOEJIMA KOJIMIYAZAKI SHINICHI
    • H01L23/522H01L21/3205H01L21/768H01L21/822H01L23/12H01L23/52H01L27/04
    • H01L23/528H01L23/3114H01L23/5286H01L2924/0002H01L2924/3011H01L2924/00
    • PROBLEM TO BE SOLVED: To provide a semiconductor device which has an enormous wiring structure to mitigate stress generated in a fine wiring structure, and operates at a large drive current and a high frequency with high reliability.
      SOLUTION: A fine wiring structure 12 by laminating a first wiring layer and a first insulating layer alternately is provided on a semiconductor substrate 11, and a first enormous wiring structure 13a is provided by laminating a second wiring layer 15 having a thickness which is twice or more the first wiring layer and a second insulating layer 14, alternately. Further, a second enormous wiring structure 13b is provided on the first enormous wiring structure 13a by laminating a third wiring layer 17 having a thickness which is twice or more the first wiring layer and a third insulating layer 16 having an elastic modulus smaller than the second insulating layer 14 at 25 °C alternately. Thus, stress generated in the semiconductor device after being mounted to a mounting board is effectively mitigated in the first enormous wiring structure 13a and the second enormous wiring structure 13b, and stress applied to the fine wiring structure 12 can be reduced.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种具有巨大布线结构以减轻精细布线结构中产生的应力的半导体器件,并以高可靠性的大驱动电流和高频工作。 解决方案:通过在半导体衬底11上设置层叠第一布线层和第一绝缘层的精细布线结构12,并且通过层叠具有厚度的第二布线层15来提供第一巨大布线结构13a 是第一布线层和第二绝缘层14的两倍以上。 此外,通过层叠第一布线层的两倍以上的厚度的第三布线层17和弹性模量小于第二布线层的第三绝缘层16,在第一布线结构13a上设置第二大布线结构13b 绝缘层14交替地在25℃。 因此,在第一巨大布线结构13a和第二巨大布线结构13b中,在安装到安装板上之后在半导体器件中产生的应力被有效地减轻,并且可以减小施加到精细布线结构12的应力。 版权所有(C)2006,JPO&NCIPI
    • 45. 发明专利
    • Stress relaxation structure and formation method therefor, stress relaxation sheet and manufacturing method therefor, and semiconductor device and electronic equipment
    • 应力松弛结构及其形成方法,应力松弛片及其制造方法及半导体器件及电子设备
    • JP2005039260A
    • 2005-02-10
    • JP2004192446
    • 2004-06-30
    • Nec Corp日本電気株式会社
    • MURAI HIDEYAKIKUCHI KATSUORITO NAONORIBABA KAZUHIRO
    • H01L23/12
    • H01L2224/16225H01L2924/15174
    • PROBLEM TO BE SOLVED: To provide a stress relaxation structure and its formation method that is superior in stress relaxation effects upon thermal stress and improves the reliability of a semiconductor device, and to provide a stress relaxation sheet and its manufacturing method, and a semiconductor device, having the stress relaxation sheet and electronic equipment having the semiconductor device. SOLUTION: The stress relaxation structure, which has a wave-shaped insulating layer 4 that exists between a chip 5, on which a semiconductor device 6 is formed and a mounting substrate 7, has the above problem resolved by making the wiring 3 wave-shaped. In addition, the stress relaxed structure is formed, by forming an insulating layer 4 having a wavy shape that displaces in the thickness direction on a process substrate or a wafer, having a semiconductor element and forming wiring 3 having a wavy shape on the insulating layer. COPYRIGHT: (C)2005,JPO&NCIPI
    • 解决的问题:提供一种应力松弛结构及其在热应力下的应力松弛效果优异的形成方法,提高半导体装置的可靠性,提供应力松弛片及其制造方法, 具有应力松弛片的半导体器件和具有半导体器件的电子设备。 解决方案:在其上形成有半导体器件6的芯片5和安装基板7之间存在波形绝缘层4的应力松弛结构通过使布线3解决了上述问题 波浪形。 此外,通过在具有半导体元件的工艺衬底或晶片上形成具有在厚度方向上移位的波浪形状的绝缘层4,并且在绝缘层上形成具有波状的布线3,形成应力松弛结构 。 版权所有(C)2005,JPO&NCIPI
    • 49. 发明专利
    • MULTILAYER WIRING STRUCTURE
    • JP2003243833A
    • 2003-08-29
    • JP2002040347
    • 2002-02-18
    • NEC CORP
    • KIKUCHI KATSUORITO NAONORI
    • H05K1/11H05K3/46
    • PROBLEM TO BE SOLVED: To provide a multilayer wiring structure having a high via hole connection reliability. SOLUTION: The multilayer wiring structure has a lower layer conductor wiring 12 and an upper layer conductor wiring 14 insulated from each other by an interlayer insulation film 13 provided with a via hole 15 for electrically conducting two conductor wiring layers. The via hole has a lower end opening above both the lower layer conductor wiring and an insulator mounting it, and the upper layer conductor wiring is connected with the lower layer conductor wiring 12 through the insulator 11 exposed into the opening at the lower end of the via hole. The interlayer insulation film 13 has material characteristics selected for the insulator such that the lower end on the surface of the interlayer insulation film constituting the circumferential surface of the via hole touches the insulator at a contact angle not larger than a specified value. The specified contact angle is 90°, the insulator is composed of organic resin and the aspect ratio of the via hole can be set not lower than 0.5 when the interlayer insulation film is composed of fluorene resin. COPYRIGHT: (C)2003,JPO