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    • 47. 发明专利
    • HEAT SHIELDING GLASS
    • JPH04182329A
    • 1992-06-29
    • JP31075990
    • 1990-11-16
    • NIPPON SHEET GLASS CO LTD
    • KAWAGUCHI ATSUSHIMUROMACHI TAKASHINAKAI HIDEMI
    • C03C17/34
    • PURPOSE:To improve the wear resistance of the heat shielding glass by coating a glass sheet with a heat shielding film and coating the film with a mixture of the oxide or oxynitride of the metal among specified three kinds of metals and the oxide or oxynitride of ZrB2. CONSTITUTION:A transparent glass sheet 24 is set in the vacuum vessel 1 of a sputtering chamber 8, and the vessel is evacuated to a specified vacuum. An Ar-O2 gaseous mixture is introduced into the first sputtering chamber 8, a power is impressed on the target of the metal among Ti, Sn and Cr fixed on a cathode, and the sheet 24 is traveled and coated with an SnO2 film. The sheet is transferred to the second sputtering chamber 8, and the SnO2 film is coated with a TiO2 film to form a heat shielding film 23. The sheet is then transferred to the third sputtering chamber 8, a power is impressed on a ZrB2 target contg. 1-10wt.% Ti in an Ar-O2 gaseous mixture to form a protective film 22 consisting of ZrBxOy and TiO2 on the film 23, and a heat shielding glass 22 is obtained.
    • 49. 发明专利
    • METHOD FOR COATING FILM AND COATING DEVICE
    • JPH03115561A
    • 1991-05-16
    • JP25337489
    • 1989-09-28
    • NIPPON SHEET GLASS CO LTD
    • OGINO ETSUOKUSANO EIJINAKAI HIDEMIENJOJI KATSUHISA
    • C23C14/24H01L21/203H01L21/31
    • PURPOSE:To allow the coating of a base body while lowering the partial pressure of the reactive gas in an atmosphere by accelerating the electrons generated from an acceleration type plasma electron beam source to bring the electrons into collision against the reactive gas, thereby generating plasma having high reactivity. CONSTITUTION:After the inside of a vacuum chamber 1 is reduced in pressure, an inert gas is introduced from a pipe 4 to maintain a prescribed pressure in the vacuum chamber 1. Gaseous Ar is then introduced into a hot cathode 10 in the acceleration type plasma electron beam source 19 and an electric current is supplied to the hot cathode 10 to induce the plasma 10 between the cathode and a 2nd anode 15. The plasma 18 is made into sheet-like plasma by an air core coil 14 and a permanent magnet 13 and gaseous O2 (0.1Pa partial pressure) is supplied into the plasma 18 from a pipe 16. After the current is supplied to a cathode 2 for arc discharge in this state, a trigger electrode 8 is energized to generate an arc discharge and to evaporate a material 3 to be evaporated. The vapor is passed in the plasma 18, by which the film is formed on the base body 17. The surface of the large-area base body 17 is coated with the thin film having an electrical insulating property at a high coating rate.