专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明专利

JP2005112782A Mixed liquid production system 审中-公开
标题翻译：混合液体生产系统
公开(公告)号：JP2005112782A
公开(公告)日：2005-04-28
申请号：JP2003348955
申请日：2003-10-08
申请人： Hitachi Industries Co Ltd , Hitachi Ltd , 株式会社日立インダストリイズ , 株式会社日立製作所
发明人： KOIDE AKIRA , MIYAKE AKIRA , ITO YASUO , ENDO KIJU
IPC分类号： A61K8/02 , A61K8/00 , B01F5/04 , B01F5/06 , B01F13/00 , B01F13/10 , B65B3/26 , B65C3/08 , B65C9/46 , B67C3/02 , B67D1/00 , B67D7/02 , B67D7/74 , A61K7/00
CPC分类号： B01F13/0066 , B01F5/0453 , B01F5/0456 , B01F5/0458 , B01F5/0475 , B01F5/0646 , B01F5/0647 , B01F13/1055 , B01F2215/0031 , B65C3/08 , B65C9/46 , B67D1/0044 , B67D1/005 , B67D7/02 , B67D7/743
摘要： PROBLEM TO BE SOLVED: To provide a mixed liquid production system compatible with a plurality of kinds of products and small-lot production for producing and offering products optimum to customers.
SOLUTION: This system comprises an input section to be inputted with information intended for offering a mixed liquid, a feedstock storage system for storing a plurality of feedstocks for the mixed liquid, a product information system functioning to select both the kinds and quantities of the stored feedstocks from the information inputted above, a liquid feed section where the feedstocks thus selected are unloaded from the feedstock storage system, a mixing section where the feedstocks fed from the liquid feed section are mixed together, an injection section where the resultant mixed liquid is injected into liquid cosmetic containers, an input section to be inputted with items to be written on labels on the cosmetic containers, a printing section for printing the items thus inputted on the labels, and a label-forming section for applying the labels on the cosmetic containers. In this system, the printing operation at the printing section is started prior to completing injecting the mixed liquid at the injection section.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供与多种产品兼容的混合液体生产系统和小批量生产，用于生产和提供最适合客户的产品。解决方案：该系统包括要输入旨在提供混合液体的信息的输入部分，用于存储用于混合液体的多个原料的原料储存系统，用于选择种类和数量的产品信息系统从上述输入的信息得到的储存原料的液体供给部分，其中从原料储存系统卸载这样选择的原料的液体供给部分，将从液体供给部分供给的原料混合在一起的混合部分，将液体注入到液体化妆品容器中，输入要被写入化妆品容器的标签上的物品的输入部分，用于将如此输入的物品印在标签上的打印部分，以及用于将标签上标签的标签形成部分化妆品容器。在该系统中，在注入部分完成注入混合液体之前，开始打印部分的打印操作。版权所有（C）2005，JPO＆NCIPI

42. 发明专利

JP2004025159A Reaction apparatus and mixing system 有权
公开(公告)号：JP2004025159A
公开(公告)日：2004-01-29
申请号：JP2002294711
申请日：2002-10-08
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SANO MICHIYUKI , MIYAKE AKIRA , KOIDE AKIRA , SAHO NORIHIDE , KONO AKIOMI , HARADA TAKESHI
IPC分类号： B01F3/04 , B01F3/08 , B01J10/00
摘要： PROBLEM TO BE SOLVED: To obtain a stable gas-liquid mixing ratio and to increase the gas-liquid reaction speed in a reaction apparatus. SOLUTION: The reaction apparatus is equipped with a liquid supply flow channel 1 having a fine flow channel cross-sectional area for supplying a liquid pressurized by a pressure means 32, a gas supply flow channel 2 having a fine flow channel cross-sectional area for supplying the gas, a gas-liquid two-phase flow channel 3 communicating with the confluent part of the liquid supply flow channel 1 and the gas supply flow channel 2 to allow a gas-liquid two-phase fluid to flow, the air bubble reaction flow channel 4 communicating with the outlet of the gas-liquid two-phase flow channel 3, a liquid discharge flow channel 13 for discharging the fluid of the air bubble reaction channel 4 and a gas discharge flow channel 6 for discharging the gas separated from the air bubble reaction channel 4. COPYRIGHT: (C)2004,JPO

43. 发明专利

JP2002355798A MICROPUMP, MICROMIXER, MICROMACHINE DEVICE, MICRO MOVABLE MIRROR AND OPTICAL SWITCH 失效
公开(公告)号：JP2002355798A
公开(公告)日：2002-12-10
申请号：JP2001167707
申请日：2001-06-04
申请人： HITACHI LTD , HITACHI ULSI SYS CO LTD
发明人： KOIDE AKIRA , SATO TOMOMI , TANABE SHINICHI , MIYAKE AKIRA
IPC分类号： G02B26/08 , B81B3/00 , B81C1/00 , F04B9/00 , F04B43/02 , F04B43/04 , F04B53/10
摘要： PROBLEM TO BE SOLVED: To provide a micromachine that is inexpensive and disposable by using an epoxy-based photosensitive resin and easily ensuring an increased wall thickness without lamination, and a manufacturing method thereof. SOLUTION: A micromachine device comprises an epoxy-based photosensitive resin itself as a structural material. A semiconductor photolithography technique can prepare by batch treating three-dimensional structure of resin without an assembly process to thereby facilitate microminiaturization and complication of a resin device and reduce cost. Enabled integration with a processing circuit can repress a problem of, for example, stray capacity to enable incorporation of a device such as a high precision sensor.

44. 发明专利

JP2001132646A DIAPHRAGM PUMP 失效
公开(公告)号：JP2001132646A
公开(公告)日：2001-05-18
申请号：JP31909799
申请日：1999-11-10
申请人： HITACHI LTD
发明人： KATO SO , MIYAKE AKIRA , KOIDE AKIRA , SASAKI YASUHIKO , TERAYAMA TAKAO
IPC分类号： F04B43/02
摘要： PROBLEM TO BE SOLVED: To provide a diaphragm pump capable of enhancing accuracy of liquid feed. SOLUTION: A diaphragm 13, a driving means to reciprocally displace the diaphragm 13, a pressure compartment 7 partially partitioned by the diaphragm 13, a means 29 of measuring the displacement of the diaphragm 13, and a control means 19 to control the displacement of the diaphragm 13 based on a value detected by the means 29 of measuring the displacement are provided. Thereby, the control part 19 can control the driving means 15 so that the displacement of the diaphragm 13 gets proper to have a designated liquid feed based on the value measured by the means 29 of measuring the displacement, and accuracy of the liquid feed can be enhanced.

45. 发明专利

JP2000021698A MANUFACTURE OF SILICON DEVICE 失效
公开(公告)号：JP2000021698A
公开(公告)日：2000-01-21
申请号：JP18798998
申请日：1998-07-03
申请人： HITACHI LTD
发明人： HOSOGANE ATSUSHI , KOIDE AKIRA , KANAMARU MASATOSHI , AKASHI TERUHISA , KITAZAWA TOSHIO , TAKEMORI HIDEAKI
IPC分类号： H01L21/306 , H01L21/02
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing an Si device, wherein the crystal direction of an Si wafer is detected very accurately and then recesses or holes required for the Si device are formed by anisoptropic etching. SOLUTION: This is a manufacturing process of an Si device, wherein a reference direction for processing an Si wafer 4, which has an orientation flat having a (100) surface and a nominal direction is detected, and then recesses of a specified shape are formed on the surface of the Si wafer 4 using this reference direction by anisotropic etching and then a section of the Si wafer 4, including the recesses are cut out as an Si device. In this case, (a) an Si nitride film 5 is formed on the surface of the Si wafer 4, (b) a pattern 1 with alternate long-and-narrow openings 3 and belt-like sections 2 of constant width, an angle between adjacent belt-like sections 2 being 0.1 deg., is formed symmetrically about the line of the nominal direction through photolithography, and (c) the direction in which the hill section of the maximum width from among hills 12 formed along and below each belt-like section 2, when etching the Si wafer 4 through the openings 3 by anisoptropic etching is defined as the reference crystal direction.

46. 发明专利

JPH10110681A MICROPUMP AND PUMP SYSTEM 失效
公开(公告)号：JPH10110681A
公开(公告)日：1998-04-28
申请号：JP26417196
申请日：1996-10-04
申请人： HITACHI LTD
发明人： KANAMARU MASATOSHI , KOIDE AKIRA , KONO AKIOMI , MIYAKE AKIRA
IPC分类号： F04B43/02 , F04B43/04
摘要： PROBLEM TO BE SOLVED: To reduce influence of processing accuracy of components on performance of a micropump which discharges a minute flow amount. SOLUTION: A micropump has a first substrate 1 made of silicone and having a diaphragm 8 at least whose one part is oscillated, and a second substrate 2 also made of silicone and connected oppositely to the substrate 1. A pressure chamber 3 is formed on the second substrate oppositely to the diaphragm 8. A nozzle 11 lead to the pressure chamber 3 has a flow passage width made narrower as it is directed to the pressure chamber 3. A nozzle 11A lead to the pressure chamber 3 has a flow passage width made narrower as it is directed to the pressure chamber 3. A pair of projections 12, 12A which elongate in parallel with nozzle center line are formed on the nozzles 11 and 11a at their narrowest portions, while their forms projected to a surface parallel to a diaphragm surface extend inner wall surfaces of the nozzles 11 and 11A.

47. 发明专利

JPH09292409A ACCELEROMETER 失效
公开(公告)号：JPH09292409A
公开(公告)日：1997-11-11
申请号：JP10683296
申请日：1996-04-26
申请人： HITACHI LTD , HITACHI CAR ENG CO LTD
发明人： SUZUKI KIYOMITSU , MATSUMOTO MASAHIRO , SHIMADA SATOSHI , ONUKI HITOSHI , KOIDE AKIRA , MOCHIZUKI YASUHIRO , ICHIKAWA NORIO , HORIE JUNICHI , NAKAZAWA TERUMI , KUBOTA MASANORI , HANZAWA KEIJI
IPC分类号： G01P15/125 , G01P15/08 , G01P15/18 , H01L29/84
摘要： PROBLEM TO BE SOLVED: To obtain an accelerometer which is low-cost, whose mass-productivity and reliability are enhanced and whose surface mounting operation is performed easily by a method, wherein a cap is bonded onto mumerous G microsensors formed on a silicon wafer and a detection part is arranged in an airtight space. SOLUTION: An acceleration detection part 2 and a signal processing circuit part 3 are formed on a silicon plate 1, and a cap 13 is bonded by an adhesive 4 onto the silicon plate 1, in such a way that both are arranged inside an airtight space. In the detection part 2, a movable mask 8 which comprises slits 7 is supported by four beams 6, and end parts on one side of the beams 6 are formed so as to be fixed and bonded into the silicon plate 1 by fixation ends 5. Then, in the circuit part 3, a change on sizes of gaps 14, 15 conesponsing to the magnitude of an acceleration Gz is converted into an output signal which is proportional to the acceleration. Then, since the space 43 surrounding the detection part 2 is maintained airtight, it is possible top prevent dust particles from creeping into a gap part when a G microsensor is diced on a silicon wafer. In addition, when pads 9 are formed on the silicon plate 1, the surface mounting operation of an accelerometer to various substrates can be performed easily.

48. 发明专利

JPH07183543A ACCELERATION SENSOR 失效
公开(公告)号：JPH07183543A
公开(公告)日：1995-07-21
申请号：JP32403193
申请日：1993-12-22
申请人： HITACHI LTD
发明人： MATSUMOTO MASAHIRO , SUZUKI KIYOMITSU , MIKI MASAYUKI , UKAI SEIICHI , SATO KAZUO , KOIDE AKIRA
IPC分类号： G01P15/125 , C23F1/00 , G01P15/08 , H01L21/306 , H01L29/84
摘要： PURPOSE:To provide a semiconductor capacity-type acceleration sensor which is free from the effect of dust and moisture, small in chip area, and less affected by a stray capacitance by a method wherein a gap between a movable electrode and a stationary electrode is hermetically sealed up, the movable electrode and the stationary electrode are formed simple in shape, and the movable electrode, the stationary electrode, and an electronic circuit are arranged on the same substrate. CONSTITUTION:An acceleration sensor is composed of a glass layer 101 and silicon layers 103 and 105, wherein the glass layer 101 and the silicon layer 103 are bonded together through the intermediary of a polysilicon 102, and the silicon layers 103 and 105 are bonded together through the intermediary of an oxide film 104. A movable electrode 107 which swings in the lengthwise direction of the sensor by acceleration and stationary electrodes 106 and 108 arranged confronting the movable electrode 107 are provided to the silicon layer 103 by cutting grooves in it vertical to its surface through an etching process. An electronic circuit 109 which detects an electrostatic capacity is formed in the silicon layer 103 of the same substrate.

49. 发明专利

JPH05302684A 失效
公开(公告)号：JPH05302684A
公开(公告)日：1993-11-16
申请号：JP13662292
申请日：1992-05-28
申请人： HITACHI LTD
发明人： SHIKIDA MITSUHIRO , KAWAMURA YOSHIO , SATO KAZUO , TANAKA SHINJI , KOIDE AKIRA , HORIUCHI YASUAKI , MIYATA TOSHIMITSU , FUJISAKI YOSHIHISA
IPC分类号： F16K31/02 , F04B43/04 , F15C5/00 , F16K99/00 , H01L21/205
摘要： PURPOSE:To provide a gas valve for a semiconductor manufacturing device which is suitable for forming a semiconductor thin film precisely at a high speed. CONSTITUTION:A metallic film 1 having one or more movable inflectional surfaces is arranged in a container containing a gas supply opening 15, gas exit openings 13, an exhaust opening 14 and electrodes 12 and 12'. Control voltage is impressed between the electrodes 12 and 12' and the metallic film 1 to move the variation surfaces, and the plurality of opening parts 13 and 14 are opened/closed by means of the film 1. Thereby, since a semiconductor element manufacturing technology is used in the container, the metallic film 1 and so on, a small valve can be constituted, so that it can be applied to a semiconductor manufacturing device to form a semiconductor element thin film accurately at high speed.

50. 发明专利

JPH05142249A THREE DIMENSIONAL ACCELERATION SENSOR 失效
公开(公告)号：JPH05142249A
公开(公告)日：1993-06-08
申请号：JP30151491
申请日：1991-11-18
申请人： HITACHI LTD
发明人： YOKOTA YOSHIHIRO , KOIDE AKIRA , MATSUMOTO MASAHIRO , HAYASHI MASAHIDE
IPC分类号： B60R21/0136 , B60R21/16 , B81B3/00 , G01P15/125 , G01P15/18
摘要： PURPOSE:To obtain a three dimensional acceleration sensor capable of detecting very small acceleration to large one due to crash reaching 100G. CONSTITUTION:Monocrystal silicone 1 is fabricated to form a diaphragm part (B) 4 connecting a frame part 3 and a mass part 5, a diaphragm (A) 6 connecting the mass part 5 and the center 9 and a beam part 10. By detecting the change in capacity between electrode parts 7 facing to the mass part 5 which is displaced by acceleration to the mass part 5, the direction and the level of impressed acceleration are judged by a circuit constituting the sensor. The acceleration is detected by a circuit connected to a terminal part 8.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式