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1. 发明专利

JP2004148277A Chemical reaction apparatus 有权
公开(公告)号：JP2004148277A
公开(公告)日：2004-05-27
申请号：JP2002319638
申请日：2002-11-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SANO MICHIYUKI , MIYAKE AKIRA , KOIDE AKIRA , HARADA TAKESHI
IPC分类号： B01F3/08 , B01F5/00 , B01F5/04 , B01F5/06 , B01F13/00 , B01J19/00 , B01L3/00 , G01N35/08
CPC分类号： B01F13/0062 , B01F3/0807 , B01F5/0453 , B01F5/0682 , B01F13/0066 , B01F2005/0031 , B01J19/0093 , B01J2219/00837 , B01J2219/0084 , B01J2219/00891 , B01J2219/00923 , B01L3/5027 , B01L2200/0636 , G01N35/08 , Y10T137/2224 , Y10T137/2564 , Y10T436/255
摘要： PROBLEM TO BE SOLVED: To greatly increase the reaction efficiency between a gas and a liquid in a chemical reaction apparatus by increasing the area of the interface between the gas and the liquid through producing fine bubbles using the gas and the liquid both having a very small volume. SOLUTION: The chemical reaction apparatus 50 has a sheath flow forming part 10 which forms two mutually immiscible fluids into two or more sheath flows wherein each of the two fluids being alternately arranged side by side, two or more inlets 1, 2 through which two fluids flow into the sheath flow forming part 10 respectively, contraction parts 11 in which the two or more sheath flows formed within the sheath flow forming part are contracted simultaneously, and reaction flow paths 21, 22 which communicate with the contraction parts 11 and have a flow path width smaller than that of the sheath flow forming part 10. COPYRIGHT: (C)2004,JPO

2. 发明专利

JP2002214194A ELECTROPHORETIC DEVICE 失效
公开(公告)号：JP2002214194A
公开(公告)日：2002-07-31
申请号：JP2001010980
申请日：2001-01-19
申请人： HITACHI LTD
发明人： YAMAKAWA HIRONOBU , MIYAKE AKIRA , SASAKI YASUHIKO , KOIDE AKIRA
IPC分类号： G01N21/64 , B81B1/00 , G01N27/447 , G01N35/08 , G01N37/00
摘要： PROBLEM TO BE SOLVED: To overcome the problem for detection precision caused by the influence of an excitation light in detection in a conventional electrophoretic device for emitting the excitation light from the lower surface of a migrating passage to the upper surface in a detection part, exposing a separated sample to the light to generate a fluorescence, and detecting the fluorescence on the upper surface side. SOLUTION: This electrophoretic device comprises a means for vertically emitting the excitation light to a passage with good wall surface smoothness formed within a plate by use of a transparent member from the passage bottom or upper surface direction and detecting the fluorescent emission of the sample from the passage side surface direction or means for reversely detecting emitting from the passage side surface direction and detecting the fluorescent emission from the passage bottom or upper surface. According to this, the background light or stray light can be minimized to enhance the detection precision.

3. 发明专利

JP2001135562A LITHOGRAPHY SYSTEM 失效
公开(公告)号：JP2001135562A
公开(公告)日：2001-05-18
申请号：JP31473999
申请日：1999-11-05
申请人： HITACHI LTD
发明人： WATABE SHIGEO , MIYAKE AKIRA , KOIDE AKIRA , KONO AKIOMI
IPC分类号： H01L21/027 , G02B26/08 , G03F1/00 , G03F1/68 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To solve a problem of a conventional lithography system that a plurality of masks or reticles are aligned while being replaced when a plurality of patterns are exposure recorded while being superposed on a wafer and thereby the yield decreases due to superposition accuracy of the patterns to cause lowering of throughput of exposure recording. SOLUTION: In place of a reticle or a mask written over a plurality of sheets, one or a plurality of reflection spatial optical modulation elements indicating a brightness pattern equivalent to the pattern written on each reticle or mask is arranged. Selective reflection surface of the spatial optical modulation element is irradiated with light from the light source of a lithography system and the numerical aperture of irradiating light is matched with that of a projection lens for the reflection spatial optical modulation element. Furthermore, variation with time of the brightness pattern indicated by the reflection spatial optical modulation element is synchronized with the movement of a silicon wafer with regard to the conjugate ratio of the pattern on the silicon wafer and the projection lens.

4. 发明专利

JP2000154783A MICROPUMP AND MANUFACTURE THEREOF 失效
公开(公告)号：JP2000154783A
公开(公告)日：2000-06-06
申请号：JP32475998
申请日：1998-11-16
申请人： HITACHI LTD
发明人： SASAKI YASUHIKO , YOSHIMURA YASUHIRO , KOIDE AKIRA , MIYAKE AKIRA , WATABE SHIGEO , TERAYAMA TAKAO , MIMAKI HIROSHI , ISHIDA YASUHIKO , MORIOKA TOMONARI
IPC分类号： B81C3/00 , F04B43/04
摘要： PROBLEM TO BE SOLVED: To miniaturize a micropump and to prevent a chemical reaction of each member and a working fluid by opposing and overlapping surfaces to be jointed in vacuum or inactive atmosphere and pressurizing and joining the surfaces to be joined after a member forming the micropump is made as a silicon substrate, metallic films are formed on the whole of surfaces to be joined sides and the silicon substrate and the metallic films are cleaned. SOLUTION: In each substrate forming a micropump, monocrystal silicon is made as a base material. After etching working is performed for a chamber and valve substrates 20, 30 at first and thermal oxidation films are formed on the whole surface of each substrate, metallic films are formed on the whole of surfaces to be joined of both substrates and surfaces to be joined are formed. Subsequently, after Ar plasma is irradiated in vacuum, continuously opposed surfaces are opposed in vacuum and joining and positioning are performed, the surfaces are overlapped and the surfaces are joined by heating and pressurizing. Next, metallic films are formed on the whole of each surface to be joined of this joining body and a nozzle substrate 40, surfaces to be joined are formed, surfaces to be joined are joined in the same procedure, metallic films are formed on the whole of each surface to be joined side of this joining body and a diaphragm substrate 10 and surfaces to be joined are joined in the same procedure.

5. 发明专利

JPH1164341A CHEMICAL ANALYZING APPARATUS 失效
公开(公告)号：JPH1164341A
公开(公告)日：1999-03-05
申请号：JP22333497
申请日：1997-08-20
申请人： HITACHI LTD
发明人： MIYAKE AKIRA , KOIDE AKIRA , TAKAGI TAKEO , TERAYAMA TAKAO , NOMURA YASUSHI , MIMAKI HIROSHI
IPC分类号： G01N35/04 , F04B43/04 , G01N35/02 , G01N35/10
摘要： PROBLEM TO BE SOLVED: To provide an apparatus having a simple reagent feed mechanism which can change a feed amount of a reagent easily, by providing a plurality of reagent containers and liquid feed means corresponding to the reagent containers below the reagent containers. SOLUTION: A micropump 54 includes from a suction opening to a discharge opening an entrance valve 543, a pump chamber 547, a diaphragm 546, a vibration plate 545 and an exit valve 544. An a.c. signal is applied to both faces of the vibrating plate 545 from a micropump-controlling part 58 in accordance with the amount of a reagent discharged. As a result, the vibrating plate 545 is driven to warp, thereby vibrating the diaphragm 546 for only a specific number of times (corresponding to the amount of the reagent discharged). A chemical analyzing apparatus having a simple reagent feed mechanism which does not waste the reagent, hardly requires a cleaning liquid, eliminates regular overhaul and cleaning and is easy to change a feed amount of the reagent is obtained.

6. 发明专利

JPH09318656A ELECTROSTATIC CAPACITY TYPE ACCELERATION SENSOR 失效
公开(公告)号：JPH09318656A
公开(公告)日：1997-12-12
申请号：JP13796996
申请日：1996-05-31
申请人： HITACHI LTD
发明人： KOIDE AKIRA , KANAMARU MASATOSHI , SUZUKI KIYOMITSU , HORIE JUNICHI
IPC分类号： G01P15/125
摘要： PROBLEM TO BE SOLVED: To provide a small-sized acceleration sensor having a large absolute value of electrostatic capacity and a small detection error by providing a hole section on a moving electrode in the direction perpendicular to the displacing direction, and arranging fixed electrodes in it in the direction perpendicular to the displacing direction of the moving electrode. SOLUTION: A first fixed electrode 3, a second fixed electrode 4, and a moving electrode 5 are stored in the sealed space formed with an upper base plate 1A, a frame body 2, and a lower base plate 1B, and these electrodes are made of an SOI wafer to widen their electrode areas. Acceleration is obtained from the difference between the electrostatic capacity C1 of a first capacitor formed with the electrodes 5, 3 and the electrostatic capacity C2 of a second capacitor formed with the electrodes 5, 4, and the change of the electrostatic capacity caused by the twist or the like of the moving electrode 5 is offset. A conductive thin film is formed on the upper base plate 1A, many electrodes are electrically integrated, and a stopper regulating the moving range of the moving electrode 5 is provided in a sealed container or thin insulating films are provided on the surfaces of the electrodes as short circuit preventing measures.

7. 发明专利

JPH0745484A STRUCTURAL BODY 失效
公开(公告)号：JPH0745484A
公开(公告)日：1995-02-14
申请号：JP18581693
申请日：1993-07-28
申请人： HITACHI LTD , HITACHI AUTOMOTIVE ENG
发明人： HAYASHI MASAHIDE , KOIDE AKIRA , EBINE HIROMICHI
IPC分类号： H01L21/02 , B81C99/00
摘要： PURPOSE:To provide a numbering method for identifying the structural bodies using either isotropic or anisotropic etching by numbering each chip using binary method in order to identify the position of chips formed on a water. CONSTITUTION:A single crystal silicon substrate 1 is sectioned finely into chips 2 onto which binary identification frames, corresponding in number to the total number of chips, are formed. When the total number of chips is 70, for example, frames for seven digits of 1, 2, 4, 8, 16, 32, and 64 are prepared and the digits 101, 102, 103, 104, 105, 106, and 107 are assigned, from left to right, to 64, 32, 16, 8, 4, 2, and 1. When the numeral of some digit is required, an unetched region ('1' in case of binary number) is formed in the frame thus formed. When the numeral of some digit is not required, an etching region('0' in case of binary number) is formed. The chips 2 have thereby the chip number up to '48'.

8. 发明专利

JPH06213654A PROBE FOR SURFACE OBSERVATION 失效
公开(公告)号：JPH06213654A
公开(公告)日：1994-08-05
申请号：JP385693
申请日：1993-01-13
申请人： HITACHI LTD
发明人： SHIKIDA MITSUHIRO , SATO KAZUO , TANAKA SHINJI , KOIDE AKIRA
IPC分类号： C23F1/00 , G01B21/30 , G01Q60/38 , G01Q60/54
摘要： PURPOSE:To provide a probe of high productivity by making a part or the whole of the constituting material of a probe out of silicon doped with impurity over a specified quantity. CONSTITUTION:A part or the whole of the material is made of silicon doped over 10 atom/cm, and by controlling the ion implantation direction against a silicon substrate, ion acceleration voltage, the shape of a mask for ion implantation, ion distribution, and the like for forming the prototype of a probe 1 and a cantilever 2, the angle between the cantilever 2 and the probe 1, the length, diameter, sectional shape, and radius of curvature of a probe part can be optionally set. Further, the probe 1 and the lever 2 are formed out of monocrystal silicon, and hence the radius of curvature of the extreme part of the probe 1 can be easily set under 50nm by removing a silicon oxide film after oxidizing the probe. The manufacture of the probe is excellent in repeatability and productivity because processes such as ion beam working and adhesion with resin are not contained in it.

9. 发明专利

JPH0580069A SEMICONDUCTOR ACCELERATION SENSOR AND AIR BAG SYSTEM 失效
公开(公告)号：JPH0580069A
公开(公告)日：1993-03-30
申请号：JP24146091
申请日：1991-09-20
申请人： HITACHI LTD
发明人： YOKOTA YOSHIHIRO , KOIDE AKIRA
IPC分类号： G01P15/12 , B60R21/0136 , B60R21/16 , G01P15/18
摘要： PURPOSE:To obtain a semiconductor acceleration sensor which can satisfy any of conditions of impact resistance and mass producibility by allowing the sensor to adapt sufficiently to the detection for large acceleration as given in the collision of vehicles. CONSTITUTION:Single crystal silicon 1 is worked to form a frame part 2 (fixed part) and a mass part 3, which are linked together with an integral combination body (elastic support body) of a beam part 4 and a diaphragm part 6. The beam part 4 is built by forming a part of the diaphragm part 6 thick. A distortion is detected with a piezo-electric resistance element 6 formed with the diffusion of the beam part 4 as associated with the displacement of the mass part 3. Or, the mass part 3 is made as mobile electrode and a fixed electrode is arranged as opposed thereto to capture a displacement of the mass part 3 responding to the acceleration from a change in the electrostatic capacitance between the electrodes.

10. 发明专利

JPH0526903A CAPACITANCE TYPE ACCELERATION SENSOR AND AIR BAG SYSTEM 失效
公开(公告)号：JPH0526903A
公开(公告)日：1993-02-05
申请号：JP18459591
申请日：1991-07-24
申请人： HITACHI LTD
发明人： TSUCHIYA SHIGEKI , SUZUKI KIYOMITSU , MATSUMOTO MASAHIRO , MIKI MASAYUKI , KOIDE AKIRA
IPC分类号： B60R21/16 , G01P1/00 , G01P15/125
摘要： PURPOSE:To improve the responsiveness of a capacitance type acceleration sensor which is used for air bag system or others. CONSTITUTION:A plurality of grooves 7 crossing one another are provided on the electrode surface of a movable electrode 4 which is disposed between fixed electrodes 5 and 6 so that it is opposed to these electrodes through gaps, and the end part of each groove 7 is so opened as to face a space S outside a part of opposition between the movable electrode and the fixed electrodes. The grooves 7 may be provided also on the side of the fixed electrodes 5 and 6. By making the opening of each groove 7 face the outside space S, the ventilation of the inside and outside parts between the fixed electrodes and the movable electrode is made excellent, an air damper formed between the gaps of the electrodes when the movable electrode 4 operates is reduced, and a response speed of the movable electrode is increased.

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