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    • 43. 发明专利
    • INK-JET RECORDING METHOD AND ITS DEVICE
    • JPH08132724A
    • 1996-05-28
    • JP27322894
    • 1994-11-08
    • CANON KK
    • TAJIKA HIROSHISUGIMOTO HITOSHITORIGOE MAKOTONAGOSHI SHIGEYASU
    • B41J2/01B41J2/015B41J29/00B41M5/00C09D11/00C09D11/322C09D11/326C09D11/328C09D11/38
    • PURPOSE: To stabilize formation of dots, by a method wherein recording is performed at a time when a printing surface side of a recording medium is under a fixed temperature of at least the melting point of wax particle by making use of dispersion ink produced by dispersing the wax particles into water, a solvernt and additive. CONSTITUTION: Particles produced by kneading and attaching dyes to wax particles are dispersed into a solvent consisting mainly of water and used as ink. Since the dyes are not dissolved directly into the solvent, a coating is free from a fear of sticking, and an image which has more high density and sharpness can be provided by improving density of the coating. Recording is performed when a printing surface side of a recording medium has a fixed temperature of at least the melting point of wax particle. Since the solvent and particles are in coexistence in a form wherein they are separated functionally from each other, at a moment when the ink arrives at the upper part of the recording medium, only the solvent is permeated through the recording medium, a particle component is left behind on the upper part of the recording medium, since formation of the dot is performed stably irrespective of a complicated form of a fiber of the recording medium, formation of a character having few feathering is performed when dispersing ink has been stuck to the recording medium.
    • 45. 发明专利
    • PROJECTION ALIGNER
    • JPH06326000A
    • 1994-11-25
    • JP13688693
    • 1993-05-14
    • CANON KK
    • TORIGOE MAKOTOSUZUKI AKIYOSHI
    • G02B13/00G03F7/20G03F9/00H01L21/027H01L21/30
    • PURPOSE:To print a projected pattern image having a stable high resolution by a method wherein a spherical aberration measuring means measures the spherical aberration of a projection optical system and signals derived therefrom are used to control the spherical aberration of the projection optical system so as to control the aberration at a specific value by controlling means. CONSTITUTION:Circuit patterns on a reticle 30 are reduced to a size of 1/5, a reduced image is formed on a wafer 32 on an X-Y-Z stage 34 by a projection optical system 31, and exposure is performed. At this time, the spherical aberration of the projection optical system 31 is measured by spherical aberration measuring means. Based on the amount of this spherical aberration, a pair of optical wedges 43, 44 are driven to change the plate thickness as a parallel plate for a light beam to control the amount of this spherical aberration of the reduction projection lens 31. By such a control of the aberration to a predetermined valve, inclination of pivotal is effectively supported, making it possible to print a projection pattern image having a stable high resolution.
    • 49. 发明专利
    • PROJECTION TYPE EXPOSURE DEVICE
    • JPH0545889A
    • 1993-02-26
    • JP22522091
    • 1991-08-09
    • CANON KK
    • TORIGOE MAKOTO
    • G03F7/20G03F9/00H01L21/027H01L21/30
    • PURPOSE:To obtain a projection type exposure device which is suitable for manufacturing a semiconductor device which realizes high accurate TTL automatic focusing by changing 2 illuminating method for TTL automatic focusing according to the change of the using state of a projection optical system when the illuminating method is changed according to the direction or the line width or the like of a pattern form. CONSTITUTION:This device is provided with a projection optical system 31 which projects the image of the circuit pattern of an original plate 30 illuminated by a secondary beam from a secondary radiation source formed by a beam from a radiation source, an irradiation means which projects the image of the pattern of the plate 30 on a reference surface 81 by the optical system 31 while the surface 81 is moved to an optical axis direction in the optical axis direction of the optical system 31 by a holding means, a detection means 53 which detects the image forming state of the pattern on the surface 81 and an optical system whose illumination optical system 12 is constituted so that the form of the secondary radiation source can be changed and which supplies the secondary radiation source whose form can be changed so as to project the image of the secondary radiation source which is almost identical to the image of the secondary radiation source on the pupil of the optical system 31 by the irradiation means.
    • 50. 发明专利
    • PRODUCTION ALIGNER
    • JPH02126629A
    • 1990-05-15
    • JP28068788
    • 1988-11-07
    • CANON KK
    • TORIGOE MAKOTOINE HIDEKI
    • G03F7/20H01L21/027H01L21/30
    • PURPOSE:To perform focusing in a state that variations of focus because of fluctuations in environmental temperature or atmospheric pressure as well as in oscillation wavelengths of a light source are corrected by measuring heights of respective chips on the face of a wafer with non-sensitizing light of a photoresist and further, by performing focusing of a reference face with an exposure light through a projection optical system after solving problems such as absorption of the photoresist or sensitization. CONSTITUTION:Heights of respective chips or optional chips on a wafer 5 with respect to a reference face 10 located on a wafer chuck 4 are measured by a laser length measuring device 14 that is the first detecting means for the heights in a state that the wafer chuck 4 and the wafer 5 are set on a measuring stage 8 and measured data are memorized in a memory 130. Then the wafer 5 is moved to an exposure stage 6 that is a part of an exposure system while leaving the wafer 5 as it is being attracted by the wafer chuck 4. After that, focusing is performed so that the wafer is positioned on a prescribed face. In such a case, forcusing corresponding to height detection is performed by making use of the reference face 10 with the second detection means 100.