会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 33. 发明专利
    • Amorphous silicon carbide/amorophous silicon hetero junction optoelectric element
    • 非晶硅碳化硅/非晶硅硅异质结型光电元件
    • JPS57126175A
    • 1982-08-05
    • JP1231381
    • 1981-01-29
    • Kanegafuchi Chem Ind Co Ltd
    • HAMAKAWA YOSHIHIROOOWADA YOSHIHISA
    • H01L31/04H01L21/205H01L31/075H01L31/20
    • H01L31/204H01L31/075H01L31/20H01L31/202Y02E10/548Y02P70/521
    • PURPOSE:To obtain high optoelectric conversion efficiency when a hetero junction optoelectric element is to be formed by a method wherein a thin film doped with amorphous silicon carbide is ued at least for one side of the P type layer or the N type layer of a P-I-N junction. CONSTITUTION:When the hetero junction optoelectric element is to be formed, the element having the form to be injected with light from the P type layer side is constituted of glass 19, a transparent electrode 20, a P type a-Si1-xCx layer 21, an I type a- Si layer 22, an N type a-Si layer 23, and an electrode 24 from the injecting side of light. When light is to be injected in the N type layer side, the element is constituted of a transparent electrode 29, an N type a-Si1-xCx layer 28, an I type a-Si layer 27, a P type a-Si layer 26, and an electrode substrate 25 from the light injecting side. In this constitution, the layer indicated with a general expression of a-Si1-xCx layer is the layer doped with amorphous silicon carbide, x is selected as 0.05-0.95, and electric conductivity is made as 10 -10 OMEGAcm . Moreover silane, silane fluoride, hydrocarbon, hydrocarbon fluoride, etc., is used as the material, and is formed to have thickness of 30-300Angstrom by plasma decomposition, etc.
    • 目的:为了通过以下方法形成异质结光电元件以获得高的光电转换效率:其中掺杂有非晶碳化硅的薄膜至少在P型层的一侧或PIN型的N型层 交界处 构成:当要形成异质结光电元件时,具有从P型层侧注入光的形式的元件由玻璃19,透明电极20,P型a-Si1-xCx层21 ,I型a-Si层22,N型a-Si层23和从注入侧的电极24。 当在N型层侧注入光时,该元件由透明电极29,N型a-Si 1-x C x层28,I型a-Si层27,P型a-Si层 26,以及来自光注入侧的电极基板25。 在这种结构中,用a-Si1-xCx层的一般表示表示的层是掺杂有非晶碳化硅的层,x选择为0.05-0.95,并且导电率为10 -8 -10 -1, 7> OMEGAcm <-1>。 此外,使用硅烷,硅烷氟化物,烃,烃氟化物等作为材料,通过等离子体分解等形成为30〜300埃的厚度。