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    • 31. 发明专利
    • Photo-sensitive polyamide
    • 光敏聚酰胺
    • JPS617328A
    • 1986-01-14
    • JP12755484
    • 1984-06-22
    • Ube Ind Ltd
    • NAKANO TSUNETOMOYASUNO HIROSHINISHIO ITSUSHIYOU
    • G03F7/004C08F290/00C08F299/00C08F299/02C08G69/00C08G69/26C08G69/32G03C1/73G03F7/027G03F7/038
    • G03F7/0387
    • PURPOSE:To provide a composition composed of a specific dicarboxylic acid component and a specific aromatic diamine component, having excellent solubility in organic solvents and high photo-sensitivity, and giving a photo-set product having high heat-resistance. CONSTITUTION:The objective polyamide can be produced by the copolymerization of (A) a dicarboxylic acid component containing >=90mol%, based on the whole carboxylic acid component, dicarboxylic acid mixture consisting of (i) an aromatic dicarboxylic acid and (ii) an alicyclic or aliphatic dicarboxylic acid at a molar ratio of 2:8-9:1 and (B) an aromatic diamine compound having photo- sensitive group or a mixture of an aromatic diamine having photo-sensitive group and other aromatic diamine compound at a molar ratio of >=3:7. The component A is acid chloride of e.g. terephthalic acid, or chloride of succinic acid, propane-dicarboxylic acid, etc.
    • 目的:提供由特定的二羧酸成分和特定的芳香族二胺成分构成的组合物,在有机溶剂中的溶解性优异,光敏性高,得到耐热性高的光固化剂。 构成:目的聚酰胺可以通过(A)基于整个羧酸组分的含有> = 90mol%的二羧酸组分的共聚制备,二羧酸混合物由(i)芳族二羧酸和(ii) 摩尔比为2:8-9:1的脂环族或脂族二羧酸和(B)具有光敏基团的芳族二胺化合物或具有光敏基团的芳族二胺与其它芳族二胺化合物的混合物的摩尔比 比值> = 3:7。 组分A是例如酰氯。 对苯二甲酸或琥珀酸,丙二羧酸等的氯化物