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    • 31. 发明专利
    • Organic material-containing water treating apparatus and its operation method
    • 有机材料含水处理装置及其操作方法
    • JP2006281041A
    • 2006-10-19
    • JP2005102032
    • 2005-03-31
    • Kurita Water Ind Ltd栗田工業株式会社
    • NAGAI TATSUOUSHIYAMA TAEKO
    • C02F1/78C02F1/28C02F1/42
    • PROBLEM TO BE SOLVED: To provide an organic material-containing water treating apparatus and its operation method by which reaction efficiency of ozone can be sufficiently increased when organic material-containing water is treated by ozone and further consumption of active carbon by gaseous ozone can be suppressed to reduce the used amount of active carbon.
      SOLUTION: The organic material-containing water treating apparatus has an ozone reaction tower in which a gas-liquid mixed flow composed of the organic material-containing water and ozone-containing gas is made to pass upward through an adsorbent packed layer. The adsorbent packed layer comprises an active carbon packed layer and an inorganic adsorbent packed layer which is provided below the active carbon packed layer and composed of an inorganic adsorbent except the active carbon.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种含有机材料的水处理装置及其操作方法,其中当含有臭氧的有机物质的水被臭氧处理并且通过气体进一步消耗活性炭时可以充分地增加臭氧的反应效率 可以抑制臭氧以减少活性炭的使用量。 解决方案:含有机材料的水处理装置具有臭氧反应塔,其中由含有机材料的水和含臭氧的气体组成的气液混合流向上通过吸附剂填充层。 吸附剂填充层包括活性炭填充层和无机吸附剂填充层,其设置在活性炭填充层的下方,由活性炭除外的无机吸附剂构成。 版权所有(C)2007,JPO&INPIT
    • 32. 发明专利
    • Sulfuric-acid-recycling type cleaning system and operating method therefor
    • 硫酸回收型清洗系统及其操作方法
    • JP2006111943A
    • 2006-04-27
    • JP2004302401
    • 2004-10-18
    • Kurita Water Ind Ltd栗田工業株式会社
    • IKEMIYA NORITOYAMAKAWA HARUYOSHINAGAI TATSUO
    • C25B1/30C25B1/22C25B11/12H01L21/304
    • PROBLEM TO BE SOLVED: To provide a cleaning system using persulfuric acid, which improves a cleaning effect by increasing the concentration of persulfuric acid with the use of an electrolytic reaction, and prevents the depletion of an electrode used for the electrolytic reaction. SOLUTION: This cleaning system comprises: a plurality of cleaning tanks 1a and 1b for cleaning a material 30 to be cleaned with a persulfuric acid solution 2; an electrolytic reaction unit 10 for regenerating the persulfuric acid solution 2 through the electrolytic reaction; and circulation lines 4a, 5a, 4b and 5b for circulating the persulfuric acid solution 2 between the cleaning tanks 1a and 1b and the electrolytic reaction tank 10. The operating method comprises the steps of: when cleaning the material 30 to be cleaned in one cleaning tank, electrolyzing the solution while circulating it between the other cleaning tank and the electrolytic reaction unit 10 to regenerate the solution so as to have an adequate concentration of persulfuric acid for cleaning. The operating method also includes preventing a contaminant peeled from the cleaned material 30 during cleaning from flowing into the electrolytic reaction unit 10 to deplete the electrode. The operating method also includes alternately carrying out the cleaning step and the regenerating step in a plurality of the cleaning tanks, to increase the treatment efficiency. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种使用过硫酸的清洗系统,其通过使用电解反应增加过硫酸的浓度来改善清洗效果,并且防止用于电解反应的电极的耗尽。 解决方案:该清洁系统包括:多个清洁槽1a和1b,用于清洁用过硫酸溶液2清洗的材料30; 用于通过电解反应再生过硫酸溶液2的电解反应单元10; 以及用于使清洗槽1a和1b与电解反应槽10之间的过硫酸溶液2循环的循环管线4a,5a,4b和5b。操作方法包括以下步骤:当在一次清洁中清洁要清洗的材料30时 在溶液中电解溶液,同时在另一个清洗槽和电解反应单元10之间循环,使溶液再生,从而具有足够浓度的过硫酸进行清洗。 操作方法还包括防止在清洁期间从清洁的材料30中剥离的污染物流入电解反应单元10以消耗电极。 操作方法还包括在多个清洗槽中交替地执行清洁步骤和再生步骤,以提高处理效率。 版权所有(C)2006,JPO&NCIPI
    • 33. 发明专利
    • Scaling preventing method
    • 缩放预防方法
    • JP2005279550A
    • 2005-10-13
    • JP2004099966
    • 2004-03-30
    • Kurita Water Ind Ltd栗田工業株式会社
    • NAGAI TATSUOKUWANO HIROAKIKOMORI HIDEYUKIOMI SHINZO
    • C02F5/00C02F1/46C02F5/08C02F5/10
    • PROBLEM TO BE SOLVED: To provide a scaling preventing method by which the deposition of scale based on ions of metals such as calcium and magnesium dissolved in the water to be treated can be prevented.
      SOLUTION: This scaling preventing method for preventing scale from being deposited from the water to be treated comprises a step to produce a fine particle of carbonate of the metal ion dissolved in the water to be treated by electrolyzing the water to be treated. In the concrete, the water to be treated is made to pass between an anode 5 and a cathode 6 of a fine particle producing apparatus 2 so that the fine particle of a scale component is produced in a high pH region near the cathode 6. It is preferable that a scaling preventing chemical in a tank 8 is injected continuously by a chemical pump 9 after the fine particle of the scale component is produced in a chamber 4. The Reynolds number of the water passing between the electrodes 5 and 6 is 100-2,000.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种防垢方法,通过该方法可以防止基于待处理的水中溶解的钙和镁等金属离子的氧化皮沉积。 解决方案:用于防止水垢从被处理水中沉积的防垢方法包括通过电解待处理水来生成溶解在待处理水中的金属离子的碳酸盐细颗粒的步骤。 具体而言,使待处理的水通过细粒生成装置2的阳极5和阴极6之间,使得在阴极6附近的高pH区域产生氧化皮成分的微粒。 优选地,在室4中产生标尺部件的微粒之后,通过化学泵9连续地注入罐8中的防结垢化学物质。电极5和6之间通过的水的雷诺数为100〜 2000。 版权所有(C)2006,JPO&NCIPI
    • 34. 发明专利
    • Scale prevention apparatus
    • 规模预防装置
    • JP2005238023A
    • 2005-09-08
    • JP2004048136
    • 2004-02-24
    • Kurita Water Ind Ltd栗田工業株式会社
    • NAGAI TATSUOKUWANO HIROAKIKOMORI HIDEYUKI
    • F28F19/01C02F1/46C02F5/00C23F13/00
    • PROBLEM TO BE SOLVED: To provide a scale prevention apparatus by which scale growth is surely prevented even at a part where a flow rate is slow in a circulation cooling water line or a boiler line or the like. SOLUTION: In a 1st electrolysis section 11, a zone surrounded by a diaphragm 8 is formed near an anode 4 and metallic particles 6 are filled in this zone. In a 2nd electrolysis section 12, a water flowing space where no particle is filled is formed between the anode 4 and the cathode 5. Scale of a particulate shape is produced at cathode sides in both the 1st electrolysis section 11 and the 2nd electrolysis section 12 and the particulate is made to flow in the circulation cooling water line while being mixed with the cooling water. Zinc ions or aluminum ions are eluted out from the metallic particle 6 and the ions are adsorbed by the particulate. Thereby especially activity of a growing point (a kink) of the particulate falls and the particulate is prevented from excessively growing. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了提供一种防垢装置,即使在循环冷却水管线或锅炉管线等中的流量慢的部分,也可以防止水垢生长。 解决方案:在第一电解部分11中,在阳极4附近形成由隔膜8包围的区域,并且金属颗粒6填充在该区域中。 在第二电解部分12中,在阳极4和阴极5之间形成没有填充颗粒的水流空间。在第一电解部分11和第二电解部分12的阴极侧产生颗粒形状的尺度 并使颗粒在与冷却水混合的同时在循环冷却水线中流动。 锌离子或铝离子从金属颗粒6中洗出,离子被颗粒吸附。 因此,特别是颗粒的生长点(扭结)的活性降低,并且防止颗粒过度生长。 版权所有(C)2005,JPO&NCIPI
    • 35. 发明专利
    • Scale prevention device
    • 规模预防装置
    • JP2005211831A
    • 2005-08-11
    • JP2004023761
    • 2004-01-30
    • Kurita Water Ind Ltd栗田工業株式会社
    • KOMORI HIDEYUKIKUWANO HIROAKINAGAI TATSUO
    • B01D39/16B01D39/20C02F1/461C02F5/00C02F5/10
    • PROBLEM TO BE SOLVED: To provide a scale prevention device which is capable of stably preventing scale deposition and prevents carbonaceous fine particles from being incorporated into treated water. SOLUTION: A cylindrical chamber 4 of this scale prevention device 2 is disposed via flanges 1a, 3a, 4a between pipes 1, 3 for allowing cooling water, boiler water, or the like, to pass therethrough. In the cylindrical chamber 4, electrode chambers 16, 17 and a water flow space 18 between the electrode chambers are formed by a pair of porous membranes 13, 14. An electrode 11 is arranged in the electrode chamber 16 and an electrode 12 is arranged in the electrode chamber 17. The particulate carbonaceous material 20 such as coke is packed in the respective electrode chambers 16, 17. The electrodes 11, 12 are energized by a power source 7. A scale prevention component such as a mellitic acid is produced by anodic oxidation. Because the porous membranes 13, 14 are disposed, fine particles produced upon the production reaction are not incorporated during water passage. COPYRIGHT: (C)2005,JPO&NCIPI
    • 解决的问题:提供一种能够稳定地防止垢沉积并防止碳质微粒被并入处理水中的防垢装置。 解决方案:该防垢装置2的圆筒形室4通过管道1,3之间的凸缘1a,3a,4a设置,以允许冷却水,锅炉水等通过。 在圆筒形室4中,电极室16,17和水流空间18由一对多孔膜13,14形成。电极11布置在电极室16中,电极12布置在 电极室17.诸如焦炭的颗粒碳质材料20被包装在相应的电极室16,17中。电极11,12由电源7激励。防止水垢的成分例如苯六甲酸通过阳极 氧化。 由于设置多孔膜13,14,所以在通水时不产生在生产反应时产生的微粒。 版权所有(C)2005,JPO&NCIPI
    • 36. 发明专利
    • Scale prevention apparatus
    • 规模预防装置
    • JP2005046812A
    • 2005-02-24
    • JP2003284052
    • 2003-07-31
    • Kurita Water Ind Ltd栗田工業株式会社
    • NAGAI TATSUOKUWANO HIROAKIKOMORI HIDEYUKI
    • C02F5/00C02F1/46
    • PROBLEM TO BE SOLVED: To provide a scale prevention apparatus capable of stably preventing the precipitation of scale mainly comprising metal ions such as calcium and magnesium or silica which are dissolved in water to be treated. SOLUTION: The scale prevention apparatus electrolyzes water, produces fine particles of carbonates of the metal ions dissolved in the water and produces a scale preventing chemical agent by the electrolysis. Cathodes 11a-11d and anodes 12a-12d are disposed in multistage in the water passage direction and non-conductive particles 9 and carbonaceous material particles as conductive particles 8 are packed between both of them. The more the boundary surface between the particles 8, 9 comes to the downstream side, the more it parts from the cathodes 11a-11d. A scale preventing component such as mellitic acid is produced by the oxidation reaction of the carbonaceous material. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供能够稳定地防止主要包含溶解在待处理水中的金属离子如钙和镁或二氧化硅的垢的防垢装置。 解决方案:防垢装置电解水,产生溶解在水中的金属离子的碳酸盐细颗粒,并通过电解产生防止化学试剂的垢。 阴极11a-11d和阳极12a-12d在水通道方向上以多级布置,并且非导电颗粒9和作为导电颗粒8的碳质材料颗粒被包装在它们之间。 颗粒8,9之间的边界表面越接近下游侧,则阴极11a-11d的部分越多。 通过碳质材料的氧化反应产生防止水垢的组分如苯六甲酸。 版权所有(C)2005,JPO&NCIPI
    • 37. 发明专利
    • Substrate cleaning liquid, and substrate cleaning method
    • 基板清洗液和基板清洗方法
    • JP2014120533A
    • 2014-06-30
    • JP2012272843
    • 2012-12-13
    • Kurita Water Ind Ltd栗田工業株式会社
    • IDA JUNICHINAGAI TATSUO
    • H01L21/306
    • C11D11/0047C11D7/08H01L21/31111
    • PROBLEM TO BE SOLVED: To selectively perform etching of silicon nitride by cleaning liquid when cleaning a substrate having silicon nitride and silicon oxide on the substrate.SOLUTION: A substrate cleaning liquid is used for cleaning a substrate having silicon nitride and silicon oxide on the same substrate and in which at least a part of one or both of the silicon nitride and the silicon oxide is exposed. The cleaning liquid containing electrolytic sulfuric acid that is generated by electrolysis of phosphoric acid and sulfuric acid and that preferably contains persulfuric acid of a concentration of 1.0-8.0 g/L, and containing water, is made contact with the substrate preferably at 165°C or more and less than a boiling point to perform selective etching of silicon nitride on the substrate. Consequently, silicon nitride is effectively etched while suppressing etching of silicon oxide, and a semiconductor substrate with such a high integration degree that a pattern line width is 37 nm or less can be successfully cleaned.
    • 要解决的问题:在清洗基板上具有氮化硅和氧化硅的基板时,通过清洗液体来选择性地进行氮化硅的蚀刻。溶液:基板清洗液用于清洗其上具有氮化硅和氧化硅的基板 衬底,其中暴露氮化硅和氧化硅中的一种或两种的至少一部分。 将含有电解磷酸和硫酸并优选含有浓度为1.0-8.0g / L的过硫酸并含有水的电解硫酸的清洗液与基材优选在165℃下接触 或更多且小于沸点以在衬底上进行氮化硅的选择性蚀刻。 因此,能够有效地蚀刻氮化硅,同时抑制氧化硅的蚀刻,可以成功地清洗具有图案线宽度为37nm以下的集成度高的半导体基板。
    • 38. 发明专利
    • Ultrasonic flowmeter, flow quantity control system, flow quantity measuring method and flow quantity control method
    • 超声波流量计,流量控制系统,流量测量方法和流量数控制方法
    • JP2012078270A
    • 2012-04-19
    • JP2010225441
    • 2010-10-05
    • Honda Electronic Co LtdKurita Water Ind Ltd本多電子株式会社栗田工業株式会社
    • NAGAREDA KENJIMATSUSHITA NAOTAKAYAMAKAWA HARUYOSHINAGAI TATSUO
    • G01F1/66G01F15/02
    • PROBLEM TO BE SOLVED: To provide an ultrasonic flowmeter capable of accurately measuring flow quantity of fluid even if a flowing characteristic of the fluid changes according to temperature or density of the fluid.SOLUTION: An ultrasonic sensor portion 33 in an ultrasonic flowmeter 27 includes a pair of ultrasonic vibrators 41 and 42 that are arranged on the upstream side and on the downstream side in a liquid pressure sending line 44 for flowing a cleaning liquid W1. The flowmeter 27 conducts: a step for measuring travel time of ultrasonic wave transmitted and received between the ultrasonic vibrators 41 and 42; a step for calculating a sonic speed and flow speed of the cleaning liquid W1 through computation based on the travel time of ultrasonic wave; a step for calculating the density of the cleaning liquid W1 through computation based on the sonic speed of the cleaning liquid W1 and a temperature measured by a temperature sensor part 45; a step for correcting the flow speed of the cleaning liquid W1 according to the temperature and density of the cleaning liquid W1; and a step for obtaining flow quantity of the cleaning liquid W1 based on the corrected flow speed.
    • 要解决的问题:提供一种能够精确地测量流体的流量的超声波流量计,即使流体的流动特性根据流体的温度或密度而变化。 解决方案:超声波流量计27中的超声波传感器部分33包括一对超声波振动器41和42,它们布置在用于使清洗液W1流动的液体压力输送管线44的上游侧和下游侧。 流量计27进行以下步骤:测量超声波振子41和42之间发送和接收的超声波的行进时间的步骤; 通过基于超声波的行进时间的计算来计算清洗液W1的声速和流速的步骤; 通过基于清洗液W1的声速和由温度传感器部45测定的温度进行计算来计算清洗液W1的密度的步骤; 根据清洗液W1的温度和密度校正清洗液W1的流速的步骤; 以及基于校正后的流速来求出清洗液W1的流量的步骤。 版权所有(C)2012,JPO&INPIT
    • 39. 发明专利
    • Method and apparatus for determining finish of cleaning process of ion exchange resin
    • 用于确定离子交换树脂清洁工艺完成的方法和装置
    • JP2011072963A
    • 2011-04-14
    • JP2009229607
    • 2009-10-01
    • Kurita Water Ind Ltd栗田工業株式会社
    • IKEMIYA NORITONAGAI TATSUO
    • B01J47/00G01N33/18
    • PROBLEM TO BE SOLVED: To provide a method and an apparatus for satisfactorily determining the finish of a cleaning process of an ion exchange resin.
      SOLUTION: Valves 22B, 23B are closed and valves 2, 22A, 23A, 8 are opened. Ultrapure water flows into an ion exchange resin packed tower 3 to clean the ion exchange resin 3a. Silicon etching causative material such as amine contained in the ion exchange resin 3a is eluted in the ultrapure water. The cleaning liquid flows in a column 20A through the valve 22A to come into contact with a particle 21A of a silicon material. An organic material in the cleaning water is adsorbed on the surface of the particle 21A of the silicon material and hydrogen is released from the surface of the silicon surface. The hydrogen concentration in the cleaning water flowing out from the column 20A is measured using a hydrogen concentration meter 11. In a case that the maximum value is equal to or below a preliminarily set prescribed value, it is determined to finish the cleaning of the ion exchange resin 3a in a time point when the value reaches the maximum value or when a prescribed time elapses from the time point.
      COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:提供一种令人满意地确定离子交换树脂的清洁过程的完成的方法和装置。 阀22B,23B关闭,阀2,22A,23A,8打开。 超纯水流入离子交换树脂填充塔3以清洁离子交换树脂3a。 离子交换树脂3a中所含的硅蚀刻原料如胺被洗脱在超纯水中。 清洗液体通过阀22A在柱20A中流动,与硅材料的粒子21A接触。 清洗水中的有机材料被吸附在硅材料的颗粒21A的表面上,氢从硅表面露出。 使用氢浓度计11测量从列20A流出的清洗水中的氢浓度。在最大值等于或低于预先设定的规定值的情况下,确定完成离子的清洗 在该值达到最大值的时间点,或者从时间起经过了规定时间后的交换树脂3a。 版权所有(C)2011,JPO&INPIT
    • 40. 发明专利
    • Electrolysis method
    • 电解法
    • JP2009167444A
    • 2009-07-30
    • JP2008004529
    • 2008-01-11
    • Kurita Water Ind Ltd栗田工業株式会社
    • UCHIDA MINORUNAGAI TATSUOKANAMORI SHUNICHI
    • C25B1/30C25B11/12
    • C25B1/285G03F7/423
    • PROBLEM TO BE SOLVED: To provide an electrolysis method where the wear of electrodes is prevented as possible, and the electrolysis of a sulfuric acid solution or the like is efficiently performed.
      SOLUTION: In the electrolysis method where an electrolytic solution is passed into an electrolytic cell provided with an anode and a cathode as at least a pair of electrodes, and the electrodes are energized, so as to electrolyze the electrolytic solution, the electrolysis is performed in such a manner that the viscosity of the electrolytic solution is controlled to a range in accordance with a current density upon the energizing. In the case the current density is ≤50 A/dm
      2 , the viscosity of a sulfuric acid solution as the electrolytic solution is controlled to ≤10 cP, in the case the current density is >50 to 75 A/dm
      2 , the viscosity of the sulfuric acid solution is controlled to ≤8 cP, and in the case the current density is >75 to 100 A/dm
      2 , the viscosity of the sulfuric acid solution is controlled to ≤6 cP. In particular, in the case a high concentration sulfuric acid solution is electrolyzed at a high current density by diamond electrodes, the electrolytic treatment can be performed at high efficiency while reducing the wear of the electrodes.
      COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:提供尽可能防止电极磨损的电解方法,并且有效地进行电解硫酸溶液等。 解决方案:在将电解液作为至少一对电极进入设置有阳极和阴极的电解池的电解方法中,电极通电,以电解电解液 以使得电解液的粘度被控制在根据通电时的电流密度的范围的方式进行。 在电流密度≤50A/ dm 2 的情况下,作为电解液的硫酸溶液的粘度被控制为≤10cP,在电流密度> 50〜75的情况下 A / dm <2>,硫酸溶液的粘度控制在≤8cP,在电流密度> 75〜100A / dm 2的情况下, 将硫酸溶液的粘度控制在≤6cP。 特别是在金刚石电极以高电流密度电解高浓度硫酸溶液的情况下,可以高效率地进行电解处理,同时降低电极的磨损。 版权所有(C)2009,JPO&INPIT