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1. 发明专利

JP2017092157A プラズマ処理装置部品のクリーニング方法及びクリーニング装置审中-公开
公开(公告)号：JP2017092157A
公开(公告)日：2017-05-25
申请号：JP2015217956
申请日：2015-11-05
申请人：栗田工業株式会社 , Kurita Water Ind Ltd
发明人： NUMAO YOSHIYUKI , NAGAI TATSUO
IPC分类号： H01L21/3065
摘要：【課題】クリーニング時における上部電極などの損耗を抑制することができるとともに、プラズマによるYF3などのフッ化物の付着物を効率よく短時間で除去することの可能なプラズマ処理装置部品のクリーニング方法を提供する。【解決手段】プラズマ容器1内の下部電極2上にプラズマ処理装置部品たる被処理部材Sを載置したら減圧装置を起動して排気口6から吸引し、プラズマ容器1内を減圧する。次に図示しない噴霧機構を起動してガス導入管5から水蒸気を含む処理ガスWを上部電極3側から供給するとともにRF電源4を用いて高周波を印加することで水蒸気を含む処理ガスWをプラズマ化する。このプラズマ化した処理ガスWにより被処理部材Sをクリーニングする。【選択図】図1

2. 发明专利

JP2008085150A Cleaning method 审中-公开
标题翻译：清洁方法
公开(公告)号：JP2008085150A
公开(公告)日：2008-04-10
申请号：JP2006264788
申请日：2006-09-28
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： UCHIDA MINORU , NAGAI TATSUO
IPC分类号： H01L21/027 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a cleaning method for sufficiently cleaning a semiconductor substrate and the like on which a micro-pattern is formed.
SOLUTION: Prior to bringing a cleaning liquid (chemical 60) into contact with an object (a semiconductor substrate 50) for cleaning, vacuum deairing, contacting surfactant and an osmotic solution, and deairing through supersonic are performed to improve surface wettability of the object. With the wettability improved, the cleaning liquid gets into concave parts of the pattern on the semiconductor substrate, etc., where a micro-pattern is formed, and as a result, poor cleaning caused by inappropriate wettability is circumvented, attaining a good cleaning effect. In addition, applying pressure with a cleaning liquid in contact with a cleaned object after wettability improvement enables the cleaning liquid to be effectively impregnated up to micro-depressions of the cleaned object, thus further enhancing the cleaning effect.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于充分清洁其上形成有微图案的半导体衬底等的清洁方法。解决方案：在将清洁液（化学物质60）与用于清洁的物体（半导体基板50）接触之前，进行真空脱气，表面活性剂和渗透溶液接触，以及通过超音速脱气，以改善表面润湿性物体。随着润湿性的提高，清洗液进入形成有微图案的半导体基板等上的图案的凹部，结果，避免了由不适当的润湿性引起的不良清洗，达到良好的清洁效果。此外，在润湿性改善后，用与清洁物体接触的清洁液体施加压力使得清洗液能够有效地浸渍到被清洁物体的微凹陷处，从而进一步提高清洁效果。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2007266477A Semiconductor substrate cleaning system 审中-公开
标题翻译：半导体基板清洗系统
公开(公告)号：JP2007266477A
公开(公告)日：2007-10-11
申请号：JP2006091899
申请日：2006-03-29
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： NAGAI TATSUO , IKEMIYA NORITO , YAMAKAWA HARUYOSHI
IPC分类号： H01L21/027 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To remove a resist suspended solid that shifts to a cleaning liquid and cannot be decomposed easily from the cleaning liquid effectively when cleaning a semiconductor substrate.
SOLUTION: A semiconductor substrate cleaning system comprises: a clogging detection means 201 for arranging, in parallel, a plurality of filters 200a, 200b for capturing a resist shifted to the cleaning liquid by cleaning the semiconductor substrate, in a cleaning liquid transfer path 15 for transferring the cleaning liquid discharged from the cleaning device for cleaning the semiconductor substrate, and for detecting clogging in the filter; and a liquid leakage control means 220 for stopping liquid leakage to the filter in which clogging is detected and leaks liquid to other filters, when clogging is detected in one of the filters by the clogging detection means. As a result, the resist suspended solid generated by cleaning the semiconductor substrate is removed from the cleaning liquid effectively, and the filters are maintained without stopping the operation of the system, thus continuing a stable degree of cleaning.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：在清洗半导体衬底时，要去除转移到清洗液体上并且不能有效地从清洗液中分解的抗蚀剂悬浮固体。解决方案：半导体衬底清洁系统包括：堵塞检测装置201，用于并行布置多个过滤器200a，200b，用于通过清洁半导体衬底捕获移动到清洁液体的抗蚀剂，在清洁液体转移用于传送从用于清洁半导体衬底的清洁装置排出的清洁液体并且用于检测过滤器中的堵塞的路径15; 以及液体泄漏控制装置220，用于当通过堵塞检测装置在一个过滤器中检测到堵塞时，阻止液体泄漏到其中检测到堵塞的过滤器并将液体泄漏到其它过滤器。结果，通过清洁半导体衬底产生的抗蚀剂悬浮固体被有效地从清洁液体中除去，并且保持过滤器而不停止系统的操作，从而持续稳定的清洁程度。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2007253076A Decoloring method and decoloring agent for colored waste water 审中-公开
标题翻译：用于彩色废水的分散方法和脱色剂
公开(公告)号：JP2007253076A
公开(公告)日：2007-10-04
申请号：JP2006081280
申请日：2006-03-23
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： UCHIHO AKIRA , NAGAI TATSUO , YAMASHITA TOMOJI , WAKANA TOSHIAKI
IPC分类号： C02F1/70 , C02F1/46
摘要： PROBLEM TO BE SOLVED: To provide a decoloring method for colored waste water by which the colored waste water can effectively be decolored by using a small amount of a decoloring agent and by a simple process and production amount of sludge by the treatment is small, and to provide the decoloring agent.
SOLUTION: In the decoloring method of the colored waste water, tetraoxo ferrate (VI) is added to the colored waste water. The decoloring agent contains the tetraoxo ferrate (VI).
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供彩色废水的脱色方法，通过使用少量的脱色剂可以有效地对有色废水进行脱色，并且通过简单的处理和通过处理产生的污泥量来提供脱色方法小，并提供脱色剂。
解决方案：在有色废水的脱色方法中，将四氧化高铁酸盐（VI）加入到有色废水中。脱色剂含有高铁酸四氧化物（VI）。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2007103518A Cleaning equipment and method 审中-公开
标题翻译：清洁设备和方法
公开(公告)号：JP2007103518A
公开(公告)日：2007-04-19
申请号：JP2005289240
申请日：2005-09-30
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： IKEMIYA NORITO , NAGAI TATSUO , YAMAKAWA HARUYOSHI
IPC分类号： H01L21/304 , B08B3/08 , B08B3/10 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To clean an electronic material substrate requiring a highly clean surface such as a silicon wafer, a glass substrate for liquid crystal, a photomask substrate and the like efficiently and surely, in a cleaning system employing a sulfuric acid.
SOLUTION: This cleaning equipment comprises a pressurization vessel 1 containing a cleaned material (a semiconductor substrate 30) and cleaning the cleaned material by making it touch to a heated sulfuric acid solution 4. Preferably, the cleaning equipment comprises a means (SPM decomposition tub 15) for decomposing contaminants removed from the cleaned material in the pressurization vessel 1 and shifted to the sulfuric acid solution 4. Principally organic substances adhering to the cleaned material can be removed certainly by making the heated sulfuric acid solution 4 touch to the cleaned material in a pressurized atmosphere, and contaminants removed from the cleaned material and shifted to the sulfuric acid solution can be decomposed certainly in another process.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：在使用硫酸的清洁系统中，为了清洁需要高度清洁表面的电子材料基板，例如硅晶片，液晶玻璃基板，光掩模基板等，。解决方案：该清洁设备包括含有清洁材料（半导体衬底30）的加压容器1，并通过使其与加热的硫酸溶液4接触来清洁被清洁的材料。优选地，清洁设备包括一种装置分解桶15），用于分解从加压容器1中清洁的材料中去除的污染物并转移到硫酸溶液4.主要是通过使加热的硫酸溶液4接触到清洁的物质，可以清除粘附到清洁的材料上的有机物质在加压气氛中的材料和从清洁的材料中移出并转移到硫酸溶液中的污染物可以在另一个过程中被肯定地分解。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2007059603A Sulfuric acid recycling type cleaning system 审中-公开
标题翻译：硫酸回收型清洗系统
公开(公告)号：JP2007059603A
公开(公告)日：2007-03-08
申请号：JP2005242743
申请日：2005-08-24
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： IKEMIYA NORITO , NAGAI TATSUO , YAMAKAWA HARUYOSHI
IPC分类号： H01L21/304 , B08B3/02 , B08B3/08 , B08B3/10 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To improve throughput while obtaining a cleaning system which can continue cleaning, in a cleaning system using persulfate ions.
SOLUTION: The sulfuric acid recycling type cleaning system comprises: a single wafer process cleaning equipment 1 for cleaning a material 30 to be cleaned by using a persulfuric acid solution as a cleaning fluid; electrolysis reaction tubs 20 and 25 for reproducing the persulfuric acid solution by generating persulfate ions from sulfuric acid ions contained in the solution by an electrolysis reaction; circulation lines 10a, 10b, 11a and 11b for circulating the persulfuric acid solution between a cleaning tub 1 and the electrolysis reaction tubs 20 and 25 which generate; and an ultraviolet-ray irradiation means 5 for irradiating ultraviolet-ray to the material 30 to be cleaned. Since a sulfuric acid solution is repeatedly used, the persulfuric acid solution can be reused in an on-site way for cleaning by utilizing an electrolysis reaction device. When cleaning, the generation of the sulfuric acid radicals is promoted while being irradiated by ultraviolet-ray to the cleaning solution, resulting in the improvement in the cleaning effect. It becomes possible to shorten working hours and to improve the throughput.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：在使用过硫酸根离子的清洁系统中，为获得能够继续清洗的清洁系统提高产量。解决方案：硫酸循环型清洗系统包括：单晶硅工艺清洗设备1，用于通过使用过硫酸溶液作为清洗液来清洗待清洗的材料30; 电解反应槽20和25，用于通过电解反应从溶液中所含的硫酸离子产生过硫酸根离子来再现过硫酸溶液; 循环管路10a，10b，11a，11b，用于使过硫酸溶液在洗涤桶1和产生的电解反应槽20和25之间循环; 以及用于向待清洁的材料30照射紫外线的紫外线照射装置5。由于重复使用硫酸溶液，所以可以通过利用电解反应装置，将现有的过硫酸溶液以现场的方式进行清洗。当清洗时，通过紫外线照射到清洗溶液中促进了硫酸根的产生，从而提高了清洗效果。可以缩短工作时间并提高吞吐量。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2007051340A Sulfuric acid recycle type persulfuric acid feeder 有权
标题翻译：硫酸回收型磷酸供料器
公开(公告)号：JP2007051340A
公开(公告)日：2007-03-01
申请号：JP2005237687
申请日：2005-08-18
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： IKEMIYA NORITO , NAGAI TATSUO , YAMAKAWA HARUYOSHI
IPC分类号： C25B15/02 , B08B3/08 , C25B1/30 , G03F7/42 , H01L21/027 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a persulfuric acid feeder where the concentration of persulfuric acid is sufficiently increased, thus recycling is repeatedly made possible, and an operation having increased safety is made possible. SOLUTION: The feeder is equipped with: a cleaning tank 1 of cleaning the material 30 to be cleaned with a persulfuric acid solution 2 as a cleaning liquid; electrolytic reaction tanks 10a, 10b of producing persulfate acid ions from sulfate ions comprised in the solution by electrolytic reaction, so as to produce a persulfuric acid solution; and circulation lines 4, 4a, 5 of circulating the persulfuric acid solution among the cleaning tank 1, and the electrolytic reaction tanks 10a, 10b. The feeder is further equipped with measurement means 21, 22, 23 for measuring the changing amount of operational physical property showing abnormal value upon an abnormal operation in the electrolytic reaction tanks or the like. The feeder is also equipped with safety devices 25a, 25b, 26 of performing a security operation to the electrolytic reaction tanks or the like upon the abnormal operation. A persulfuric acid solution is recycled and fed to the electrolytic reaction devices. Exact safety control and a security operation upon abnormality are secured. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供过硫酸的浓度充分增加的过硫酸给料器，因此可以重复进行再循环，并且可以实现增加安全性的操作。
解决方案：进料器配有：清洗槽1，用作为清洗液的过硫酸溶液2清洗待清洗的材料30; 通过电解反应从溶液中含有的硫酸根离子生成过硫酸根离子的电解反应槽10a，10b，以产生过硫酸溶液; 以及使清洗槽1中的过硫酸溶液循环的循环管线4,4a，5以及电解反应槽10a，10b。进料器还配备有测量装置21,22,23，用于测量在电解反应罐等中的异常操作时显示异常值的操作物理性能的变化量。进料器还配备有在异常操作时对电解反应罐等进行安全操作的安全装置25a，25b，26。将过硫酸溶液再循环并进料至电解反应装置。确保正确的安全控制和异常时的安全操作。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2007050355A Sulfuric acid recycling type cleaning system 有权
标题翻译：硫酸回收型清洗系统
公开(公告)号：JP2007050355A
公开(公告)日：2007-03-01
申请号：JP2005237671
申请日：2005-08-18
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： IKEMIYA NORITO , NAGAI TATSUO , YAMAKAWA HARUYOSHI
IPC分类号： B08B3/08 , C25B1/30 , C25B11/12 , G03F7/42 , H01L21/027 , H01L21/304
CPC分类号： Y02P20/52
摘要： PROBLEM TO BE SOLVED: To make the concentration of persulfuric acid sufficiently high to be repeatedly recycled, and to determine the life of a solution in a persulfuric acid supply apparatus.
SOLUTION: The sulfuric acid recycling type cleaning system has: a cleaning tank 1 for cleaning a material 30 to be cleaned using a persulfate solution 2 as a cleaning liquid; electrolytic tanks 10a, 10b for electrolyzing the cleaning liquid discharged from the cleaning tank to generate persulfate ions from sulfate ions contained in the cleaning liquid to produce a persulfate solution; and circulation lines 4, 4a, 5, 5a for circulating the persulfate solution between the cleaning tank 1 and the electrolytic tanks 10a, 10b. The system further has impurity amount measuring means 16, 17a-17c, 18 for measuring the amount of impurity accumulated in the persulfate solution accompanied by cleaning. The sulfate solution is repeatedly used to regenerate the persulfate solution using an electrolytic apparatus on site, so as to use it for cleaning. Moreover, the life of the persulfate solution is accurately determined, thereby preventing the cleaning action from being lowered.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：使过硫酸的浓度足够高以重复循环，并确定过硫酸供应装置中的溶液的寿命。解决方案：硫酸循环型清洗系统具有：清洗槽1，用于清洗使用过硫酸盐溶液2作为清洗液体的清洗材料30; 电解槽10a，10b，用于电解从清洗槽排出的清洗液体，以从洗涤液体中所含的硫酸根离子产生过硫酸根离子，生成过硫酸盐溶液; 以及用于在清洗槽1和电解槽10a，10b之间循环过硫酸盐溶液的循环管线4,4a，5,5a。该系统还具有用于测量伴随清洗的在过硫酸盐溶液中积累的杂质量的杂质量测量装置16,17b-17c，18。重复使用硫酸盐溶液，使用现场的电解设备再生过硫酸盐溶液，以用于清洗。此外，能够精确地确定过硫酸盐溶液的寿命，防止清洗动作的降低。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2004267905A Scaling preventing method 审中-公开
公开(公告)号：JP2004267905A
公开(公告)日：2004-09-30
申请号：JP2003061814
申请日：2003-03-07
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： NAGAI TATSUO , KUWANO HIROAKI , KOMORI HIDEYUKI
IPC分类号： C02F5/00 , C02F1/46 , C02F5/10
摘要： PROBLEM TO BE SOLVED: To provide a scaling preventing method capable of preventing the precipitation of scale mainly comprising metal ions such as calcium and magnesium or silica dissolved in water to be treated.
SOLUTION: In this scaling preventing method for preventing the precipitation of scale from water, water is electrolyzed to form fine particles of carbonates of metal ions dissolved in the water and a scaling preventing chemical agent is added to the water. Water to be treated passes through a gap between the anode 5 and cathode 6 of a fine particle forming device 2. Fine particles of a scale component are formed in the high pH region in the vicinity of the cathode 6. After fine particles of the scale component are formed inside a chamber 4, the scaling preventing chemical agent is continuously injected in a tank 8 by a chemical injection pump 9.
COPYRIGHT: (C)2004,JPO&NCIPI

10. 发明专利

JP2012199295A Electronic material cleaning method and cleaning system 有权
标题翻译：电子材料清洁方法和清洁系统
公开(公告)号：JP2012199295A
公开(公告)日：2012-10-18
申请号：JP2011061007
申请日：2011-03-18
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： NAGAI TATSUO , UCHIDA MINORU
IPC分类号： H01L21/027 , B08B3/08 , G03F1/54 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a method and a system with which cleaning drainage can be effectively sorted out into waste liquid and circulating liquid when sulphuric acid solution including persulfuric acid is circulated and used as cleaning liquid for cleaning electronic materials.SOLUTION: A cleaning method, in which sulphuric acid solution including persulfuric acid is supplied for electronic materials as cleaning liquid so that the cleaning liquid is brought into contact with the electronic materials to clean the electronic materials by every single wafer, and cleaning drainage is circulated in a system to reproduce persulfuric acid for reuse as the cleaning liquid, comprises: circulating the cleaning drainage in the system from cleaning start to a first timing in a period from the cleaning start to cleaning completion for each electronic material; wasting the cleaning drainage out of the system after the first timing until a second timing; and circulating the cleaning drainage in the system after the second timing until cleaning completion so that cleaning drainage with high resist concentration in a certain time zone is wasted out of the system, and cleaning drainage in other time zones is circulated in the system for reuse. Therefore, the cleaning drainage can be effectively sorted out.
摘要翻译：要解决的问题：提供一种方法和系统，当包括过硫酸在内的硫酸溶液循环并用作清洁电子材料的清洗液时，清洗排水可以有效地分选成废液和循环液。解决方案：一种清洁方法，其中向电子材料提供包含过硫酸的硫酸溶液作为清洗液体，以使清洗液与电子材料接触，以便通过每个晶片清洁电子材料，并清洗排水在系统中循环以再生用于再利用的过硫酸作为清洁液体，包括：在清洁开始至每个电子材料的清洁完成期间，将系统中的清洁排水从清洁开始循环到第一时间; 在第一时间到第二时间之后，将清洁排出物排出系统; 并且在第二时间之后使系统中的清洁排水循环直到清洁完成，使得在一定时间段内具有高抗蚀剂浓度的清洗排放物从系统中浪费，并且其它时区中的清洗排水在系统中循环再利用。因此，可以有效地整理清洗排水。版权所有（C）2013，JPO＆INPIT

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