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    • 34. 发明专利
    • METHOD FOR PROCESSING SILVER HALIDE PHOTOGRAPHIC SENSITIVE MATERIAL
    • JPH01106050A
    • 1989-04-24
    • JP26287287
    • 1987-10-20
    • FUJI PHOTO FILM CO LTD
    • NAKAMURA TAKASHIISHIMARU SHINGO
    • G03C5/29G03C1/04G03C1/76G03C5/26G03C7/30
    • PURPOSE:To effectively suppress the generation of uneven development and uneven fixing, etc., even in case of a rapid processing at a high temperature by providing a nonphotosensitive hydrophilic colloidal layer having a specified condition between a supporting body and a photosensitive emulsion layer. CONSTITUTION:The nonphotosensitive hydrophilic colloidal layer is provided between the supporting body and the photosensitive emulsion layer existed in the nearest position to the supporting body. The thickness of the hydrophilic colloidal layer is 0.1-2 times the total thickness of the photosensitive emulsion layer existed on the upper layer of said colloidal layer and an another layer, and the treating temp. of at least one layer of the photosensitive emulsion layer and the hydrophilic colloidal layer is >=45 deg.C. When the one layer of the photosensitive emulsion layer is mounted on the supporting body, the nonphotosensitive hydrophilic colloidal layer is provided between said emulsion layer and the supporting body. When two or more layers of the photosensitive emulsion layers are mounted on the supporting body, said colloidal layer is provided between the emulsion layer existed in the nearest position to the supporting body and said body. Thus, the generation of processing unevenness such as the uneven development and the uneven fixing is effectively suppressed, even in case of the rapid processing at the high temperature.
    • 39. 发明专利
    • Photosensitive silver halide material
    • 感光银卤素材料
    • JPS5926733A
    • 1984-02-13
    • JP13661282
    • 1982-08-05
    • Fuji Photo Film Co Ltd
    • SUGIMOTO NAOHIKOKOJIMA TETSUOISHIMARU SHINGO
    • G03C1/85G03C1/04G03C1/06G03C1/76G03C1/815
    • G03C1/8155Y10S430/132
    • PURPOSE: To prevent the formation of a static mark by forming a hydrophilic colloidal layer contg. a specified ultraviolet-ray absorbing polymer latex between a support and a silver halide emulsion layer.
      CONSTITUTION: A hydrophilic colloidal layer contg. an ultraviolet-ray absorbing (co)polymer latex is formed between a support and a silver halide emulsion layer or on the side of the support opposite to the emulsion layer. The latex has a repeating unit derived from a monomer represented by formula I (where R is H, 1W4C lower alkyl or Cl; X is -COO-, phenylene or the like; A is 1W20C alkylene or 6W20C arylene; Y is -COO-, -CONH- or the like; each of (m) and (n) is 0 or 1; Q is an ultraviolet-ray absorbing group represented by formula II or III; each of R
      1 and R
      2 is H, 1W20C alkyl or the like, yet R
      1 and R
      2 are not simultaneously H; R
      3 is cyano, -SO
      2 R
      5 or the like; R
      4 is -COOR
      6 or the like; each of R
      5 and R
      6 is 1W20C alkyl or the like; each of R
      11 WR
      15 is H, halogen, hydroxy or the like; R
      16 is H or 1W20C alkyl; R
      17 is -COOR
      19 , -SO
      2 R
      19 or the like; R
      18 is -COOR
      20 , -SO
      2 R
      20 or the like; and each of R
      19 and R
      20 is 1W20C alkyl or 6W20C aryl).
      COPYRIGHT: (C)1984,JPO&Japio
    • 目的:通过形成亲水性胶体层来防止静电痕迹的形成。 在载体和卤化银乳剂层之间的指定的紫外线吸收聚合物胶乳。 构成:亲水胶体层 在载体和卤化银乳剂层之间或在与乳剂层相对的载体侧上形成紫外线吸收(共)聚合物胶乳。 胶乳具有衍生自由式I表示的单体的重复单元(其中R为H,1-4C低级烷基或Cl; X为-COO-,亚苯基等; A为1-20C亚烷基或6-20C亚芳基 ; Y为-COO-,-CONH-等;(m)和(n)各自为0或1; Q为由式II或III表示的紫外线吸收基团; R 1和R 2各自为H ,1-20C烷基等,但R1和R2不同时为H; R3为氰基,-SO2R5等; R4为-COOR6等; R5和R6分别为1-20C烷基等; R11-R15各自为H,卤素,羟基等; R16为H或1-20C烷基; R17为-COOR19,-SO2R19等; R18为-COOR20,-SO2R20等; R19 R20为1-20C烷基或6-20C芳基)。