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    • 31. 发明专利
    • REFLECTION PREVENTING FILM
    • JPS63113501A
    • 1988-05-18
    • JP25840986
    • 1986-10-31
    • CANON KK
    • TANIGUCHI YASUSHITORIGOE MAKOTO
    • G02B1/11G02B1/115
    • PURPOSE:To minimize the reflection factor in wavelength of an excimer laser and a laser of a visible - near infrared area, by laminating an intermediate refractive index substance layer, a low refractive index substance layer, a high refractive index substance layer, and a low refractive index substance layer, as a first layer, a second layer, a third layer, and a fourth layer, respectively, in said order on a base body, and specifying the film thickness of each layer. CONSTITUTION:An intermediate refractive index substance layer 10, a low refractive index substance layer 11, a high refractive index substance layer 12, and a low refractive index substance layer 13 are laminated as the first layer, the second layer, the third layer, and the fourth layer, respectively, in said order on a base body 9 for allowing a light beam whose wavelength is >=160nm to transmit through, by which a reflection preventive film used in wavelength of an excimer laser and wavelength of an area of 470nm-800nm is formed. Also, an optical film thickness of the first layer, an optical film thickness of the second layer, an optical film thickness of the third layer, and an optical film thickness of the fourth layer are set to 0.5lambda0/4
    • 32. 发明专利
    • PROJECTION EXPOSURE DEVICE
    • JPS6235619A
    • 1987-02-16
    • JP17420885
    • 1985-08-09
    • CANON KK
    • TORIGOE MAKOTOKANO ICHIROIIJIMA MAMORUOMORI TARO
    • H01L21/30G03F7/20H01L21/027
    • PURPOSE:To accelerate the responding speed by a method wherein an optical correcting means changing distortion of a projection optical system transmitting exposure light which is distortedly deformed from a plane perpendicular to an optical axis is arranged in an optical path of the projection optical system. CONSTITUTION:The exposure light from a light source lamp 11 arranged in front of a reflecting mirror 9 irradiates a mask 13 as the first object. The light passing through the mask 13 image-forms the pattern of mask 13 on a wafer 15 as the second object by a projector lens 14 to print the mask pattern on a photoresist on the wafer 15. A parallel plane glass 1 as a main part of optical correction element is arranged on an optical path between the projection lens 14 and the mask 15. When the optical correction element is distortedly deformed, the distortion is changed corresponding to the deformation to make the directions in distortion change multiple by selecting the direction of deformation. Through these procedures, the responding speed can be accelerated.
    • 33. 发明专利
    • ILLUMINATING OPTICAL DEVICE
    • JPS60166951A
    • 1985-08-30
    • JP2189784
    • 1984-02-10
    • CANON KK
    • TORIGOE MAKOTO
    • F21V5/04G03F7/20H01L21/027
    • PURPOSE:To control the spreading angle of luminous fluxes and to improve the utilizing efficiency and exposing efficiency of luminous fluxes by forming laser light having a short coherence length to plural divergent luminous fluxes by a light integrator and making the diverging origin thereof and a front side focal plane approximately coincident with each other. CONSTITUTION:Laser light 2 of the parallel luminous fluxes from an excimer laser body 1 is made into plural divergent luminous fluxes by a light integrator 4 and the main rays thereof are again made into parallel luminous fluxes by a collimator lens 5. Said fluxes irradiate a surface 3 to be irradiated in the position of the focal plane of the lens 5. The irradiating diameter and spreading angle A of the light on the surface 3 can be controlled to desired sizes by selecting adequately the individual lens diameters of the integrator 4, the diameter over the entire part thereof and the focal length of the lens 5 by which the utilizing efficiency and exposing efficiency of the luminous fluxes are improved.