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    • 23. 发明专利
    • FILM TREATMENT DEVICE
    • JPS57173837A
    • 1982-10-26
    • JP5955181
    • 1981-04-20
    • OLYMPUS OPTICAL CO
    • HARA TADAYOSHI
    • G03D3/04
    • PURPOSE:To improve and stabilize film quality after finishing by stirring treating liquid well, by providing a bubble generator consisting of porous material having numberless fine gaps in a treating bath. CONSTITUTION:Plural film treating baths 2 are provided side by side in a thermostatic chamber 1, and at the bottom of each bath 2 of film treating devices through which water regulated for temp. by a heat exchanger 5 controlled by a controlling part 6 is brought in from an inlet pipe 4 and delivered out to the exchanger 5 through an outlet pipe 4, bubble generators 7 in which e.g. cylindrical bodies 7a are constituted of porous materials having numberless fine gaps and gas is brought into an inside cavity 7b through a communicating pipe 8 and generates fine bubbles, is provided. Gas is delivered to each bubble generator 7 through a regulator 15, a flowmeter 14 and a valve 13 from a cylinder 16, through a manifold 11 from a main pipe 12 and through a vent pipe 9 from each needle valve 10. By such a way, films which are suspended in the baths 2 for treatment are treated uniformly and have always stabilized finish.
    • 26. 发明专利
    • PHOTO MASK DEVELOPING AND ETCHING DEVICE
    • JPS55105249A
    • 1980-08-12
    • JP1225479
    • 1979-02-07
    • HITACHI LTD
    • SATOU NOBUOMORI YOSHIHARUMITANI MASAO
    • G03D3/04G03F7/30
    • PURPOSE:To eliminate the uneven processing and the deposition of bubbles which occur at the developing, etching and rinsing of photo masks and achieve the higher quality of the photo masks by using a processing liquid stirring plate during etching. CONSTITUTION:A developing solution is supplied from a feed nozzle 17 to the photo mask 5 in a processing cell 18. The developing solution contacts the projecting parts of a processing liquid stirring plate 7 and fills in the processing cell 18 while forming small reflux regions in the neighborhood proximate to the processing surface of the photo mask 5. A level switch 13 detects this and sends an electric signal to a control unit 11 which in turn closes a solenoid valve 14 thereby stopping the supply of the processing liquid. Next, the developing solution in the processing cell is circulated by a pump 16 in the circulating line consisting of a discharge port 10 for stirring and a filter 15 for the specified time. After the specified time, the developing solution in the processing cell 18 is discharged. In this way, the uneven processing of the photo mask and the deposition of bubbles may be eliminated and quality improved.