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    • 21. 发明专利
    • PHOTOCONDUCTOR AND ITS PRODUCTION
    • JPS6486149A
    • 1989-03-30
    • JP24254087
    • 1987-09-29
    • TOSHIBA CORPTOSHIBA INTELLIGENT TECH
    • KAGA HIDEKAZUIKESUE TATSUYA
    • C23C16/30C23C16/44C23C16/50G03G5/08G03G5/082H01L31/08
    • PURPOSE:To prevent generation of flow in a picture image, to improve the quality of the image, and to stabilize the characteristics of a photosensitive body by forming an intermediate layer comprising optional amorphous material layers wherein the surface of the amorphous material layers are smoothened. CONSTITUTION:A surface of an intermediate layer 37 is smoothened by polishing in a midway of film forming stage of plural amorphous material layers 36-38, and all film forming processes are completed thereafter. Thus, the surface roughness of a photosensitive body 34 is improved and the surface area of the photosensitive body 34 is reduced substantially. The absolute amt. of deposition of materials produced by Corona discharge is reduced, and removal of the deposited material produced by the Corona discharge is facilitated, so deterioration of surface resistance due to long time use is avoided. Moreover, exposure of free bonds formed by the polishing on the surface of the photosensitive body 34 is prevented because a surface protecting layer 38 contg. C atoms. and having high carrier transfer characteristic and high potential retaining effect is formed on the front polished photoconductive layer 37. Thus, the characteristics of the photosensitive body are improved, generation of flow in the picture image is prevented, and the quality of image is improved.
    • 22. 发明专利
    • PHOTOCONDUCTOR AND ITS PRODUCTION
    • JPS6486148A
    • 1989-03-30
    • JP24253787
    • 1987-09-29
    • TOSHIBA CORPTOSHIBA INTELLIGENT TECH
    • KAGA HIDEKAZUIKESUE TATSUYA
    • G03G5/08C23C16/30C23C16/50G03G5/082H01L31/08
    • PURPOSE:To prevent generation of flow in a picture image and to improve the quality of the image by forming an intermediate layer comprising optional amorphous material layers wherein the surface is smoothened and free bonds formed by the smoothening are bonded to H atoms. or to other free bonds to each other. CONSTITUTION:The surface of an intermediate layer 37 is smoothened in the midway of forming films of plural amorphous material layers 36-38 by polishing, and all film forming processes are carried out thereafter. When free bonds laid bare on the surface of a photoconductive layer 37 during polishing are bonded to O atoms. in the air or to OH groups, generation of flow in the picture image would be caused. But the generation of flow in the picture image due to oxidation is prevented because the polishing is executed in vacuum and free bonds are bonded primarily to each other. Moreover, the chargeability of the photosensitive body 34 is improved since a surface protecting layer 38 contains C in order to enhance carrier transfer property and potential retaining effect. By this constitution, the characteristics of the photosensitive body are improved, generation of flow in the picture image is prevented, and the quality of the image is improved.
    • 23. 发明专利
    • ELECTROPHOTOGRAPHIC SENSITIVE BODY
    • JPS63311259A
    • 1988-12-20
    • JP14663687
    • 1987-06-12
    • TOSHIBA CORP
    • KAGA HIDEKAZU
    • G03G5/08G03G5/082
    • PURPOSE:To prevent an electrophotographic sensitive body from causing flow of image by constituting the electrophotographic sensitive body of an electroconductive substrate and an a-Si layer formed thereon, and giving a smooth polished surface having a specified surface roughness to the a-Si layer. CONSTITUTION:A charge injection inhibiting layer 2, a photoconductive layer 3, and a surface protecting layer 4 are formed successively on an elec troconductive substrate 1. Thus, an amorphous material layer (a-Si layer) contg. Si is formed on the substrate 1. Said a-Si layer has a smooth polished layer having 0.2mum Rmax, namely below 0.08mm L surface roughness. Accordingly, sites for adsorbing and depositing products of corona discharge are reduced, so the amt. of adsorption and deposition are reduced. At the same time, removal of the adsorbed material and deposited material by a mechanical means for removal such as cleaning blade method is facilitated. By this constitution, a photosensitive body is prevented from causing flow of image.
    • 24. 发明专利
    • ELECTROPHOTOGRAPHIC DEVICE
    • JPS62226177A
    • 1987-10-05
    • JP6792686
    • 1986-03-26
    • TOSHIBA CORP
    • YAMAZAKI MUTSUKIKAGA HIDEKAZU
    • G03G5/08G03G21/00
    • PURPOSE:To prevent light for destaticization from leaking to an electrostatically charged area on a photosensitive body by an electrostatic charging means and to prevent the electrostatic charging potential in the charged area on the photosensitive area from dropping by providing a light shield member between a destaticization means and the charging means. CONSTITUTION:The charged area 13 in the surface of the photosensitive body 1 is charged electrostatically by an electrostatic charger 3 while a drum 2 is rotated and an electrostatic image is formed on the surface of the photosensitive body 1 by image exposure 12; and toner 5 is supplied from a developing device 6 to the surface of the photosensitive body 1 to develop the electrostatic latent image, which is transferred to transfer paper 11 by a transfer charger 7. Then, toner 5 remaining on the surface of the photosensitive body 1 is removed by a cleaner 8 and the surface of the photosensitive body 1 is irradiated with light from a destaticizing lamp and destaticized statically. In this case, the light shield plate 10 is provided between the destaticizing lamp 9 and charger 3. Therefore, light emitted by the destaticizing lamp 9 is prevented from the reaching the charged area 13 formed on the photosensitive body 1 by the charger 3 and the charging potential of the charged area on the photosensitive body 1 is prevented from dropping.
    • 25. 发明专利
    • ELECTROPHOTOGRAPHIC DEVICE
    • JPS62226176A
    • 1987-10-05
    • JP6792586
    • 1986-03-26
    • TOSHIBA CORP
    • YAMAZAKI MUTSUKIKAGA HIDEKAZU
    • G03G5/08G03G21/00G03G21/06
    • PURPOSE:To extend the time required from destaticization to the next electrostatic charging and to suppress a drop in the electrostatic charging potential of a photosensitive body by destaticizing the photosensitive body by a destaticization means before cleaning the surface of the photosensitive body by a cleaning means. CONSTITUTION:An electrostatically charged area 13 on the surface of the photosensitive body is charged electrostatically by the electrostatic charger while a drum 2 is rotated, and then an electrostatic image is formed on the surface of the photosensitive body 1 by image exposure 12; and toner 5 is supplied from a developing device 6 to develop the electrostatic latent image, which is transferred to transfer paper 11 by a transfer charger 7. Then, the surface of the photosensitive body 1 is irradiated with light from a destaticizing lamp and then toner 5 remaining on the surface of the photosensitive body 1 is removed by a cleaning blade 8. In this case, the surface of the photosensitive body 1 is destaticized before cleaned. Consequently, the time required from the destaticization of the photosensitive body 1 to the charging is extended, the majority of carriers generated on the photosensitive body 1 by light irradiation are coupled up to the electrostatically charged area 13, and the possibility of a decrease in electrostatic charging potential in the next charging is reduced.
    • 26. 发明专利
    • ELECTROPHOTOGRAPHIC SENSITIVE BODY
    • JPS6299761A
    • 1987-05-09
    • JP23980585
    • 1985-10-26
    • TOSHIBA CORP
    • YOSHIZAWA HIDEJIKAGA HIDEKAZUMITANI WATARUYAMAZAKI MUTSUKI
    • G03G5/08G03G5/082
    • PURPOSE:To obtain the photoconductive material which is capable of being produced with ease, and has a high resistance and excellent electrostatic chargeability, and has high photosensitive characteristics in ranges of a visible ray and a near infra-red ray by forming a blocking layer of an amorphous silicon or a microcrystalline silicon and a photoconductive layer of a laminating body composed of the N-type amorphous silicon contg. a hydrogen and the microcrystalline silicon respectively. CONSTITUTION:The blocking layer 103 composed of muC-Si or a-Si contg. the silicon atom as a base material and contg. the hydrogen atom and at least one or more atoms selected from a carbon, an oxygen and a nitrogen atoms and the photoconductive layer 102 are laminated on a conductive substrate body 101 made of aluminium. The photoconductive layer 102 is produced by laminating the N-type amorphous silicon a-Si layer 104 contg. the silicon atom as the base material and contg. the hydrogen atom, and the microcrystalline silicon muC-Si layer 105 contg. the silicon atom as the base material and contg. the hydrogen atom and at least one or more atoms selected from the carbon, the oxygen and the nitrogen atoms. Thus, the titled body capable of preventing to transfer the electrostatic charge having an reversed polarity against that of the charge which is charged at the charging step for the body from the substrate 101 to the photoconductive layer 102, and having an improved electrostatic charging capacity is obtd.
    • 27. 发明专利
    • Photoconductor
    • 光电子器件
    • JPS61105551A
    • 1986-05-23
    • JP22599084
    • 1984-10-29
    • Toshiba Corp
    • KAGA HIDEKAZU
    • G03G5/05G03G5/08G03G5/14
    • G03G5/08
    • PURPOSE:To enable optional and dynamic variation of absorption wavelength region by forming a photosensitive layer contg. a binary amorphous material made of C and Ge on a conductive substrate, and changing these contents. CONSTITUTION:The binary amorphous material made of C and Ge without using Si can be dynamically changed in the absorption ends of the absorption wavelength region by changing the content ratio of C to Ge. Since the amorphous Ge carbide can be generally changed by 1-3.5eV as the optical forbidden band width, the whole wavelength region necessary for the photosensitive material from the near 1R rays to the near UV rays can be covered. When the photosensitive body 21 is formed in a CVD device 9, a conductive substrate 11 cleaned of grease with trichloroethylene is placed on a susceptor 13 in a reactor 10, electric discharge is caused in an atm. of argon fed from a gas feed system 17 to deposit a carrier injection barrier layer 22, and then, to form a carrier generating layer 23 and a carrier transfer layer 24, and finally a surface layer 25, in succession.
    • 目的:通过形成感光层来实现吸收波长区域的可选和动态变化。 在导电基板上由C和Ge制成的二元无定形材料,并且改变这些内容。 构成:通过改变C与Ge的含量比,可以在不使用Si的C和Ge制成的二元无定形材料在吸收波长区域的吸收端上动态变化。 由于非晶Ge碳化物通常可以以1-3.5eV的形式被改变为光学禁带宽度,所以可以覆盖感光材料从近红外线到近紫外线所需的整个波长区域。 当感光体21形成在CVD装置9中时,将用三氯乙烯清洗的润滑脂的导电基板11放置在反应器10的基座13上,从而在大气压下产生放电。 从气体供给系统17供给氩以沉积载流子注入阻挡层22,然后依次形成载流子生成层23和载流子转移层24,最后形成表面层25。
    • 28. 发明专利
    • Electrophotographic sensitive body
    • 电子感应敏感体
    • JPS6163850A
    • 1986-04-02
    • JP18453484
    • 1984-09-05
    • Toshiba Corp
    • KAGA HIDEKAZU
    • G03G5/043G03G5/08G03G5/14
    • G03G5/08
    • PURPOSE:To obtain an electrophotographic sensitive body which has substantial photosensitivity particularly to long wavelength light such as laser light and obviates the generation of interference fringes by providing coarse boundary faces in parallel or coaxially with the surface into the photoconductive layer on a conductive substrate. CONSTITUTION:For example, Se is first deposited by evaporation on the conductive substrate 11 and the boundary face 13 thereof is roughened by wet or dry process etching or mechanical treatment in the stage of forming the photoconductive layer on said substrate. The photoconductive layer consisting of an Se-Te alloy is then thinly laminated thereon so that the surface 14 of the laminated photoconductive layer 12 reflects the rough surface of the layer 13. The laminated photoconductive layer 22 of which the boundary face between the layers 22-01 and 22-2 is roughened and the surface 24 of the layer 22-2 is also roughened is otherwise formed in the stage of forming a carrier transfer layer 221 and carrier generating layer 22-2 in this order on the base 21 surface. The apparent decrease in the photosensitivity with the coherent light such as laser light in particular owing to the interference between the light incident to the photosensitive bodies 10, 20 and the light reflected from the layer boundary faces 13, 14, 23, 234 is prevented by forming the photoconductive layer in the above mentioned manner. The electrophotographic sensitive body having substantial photosensitivity is thus obtd.
    • 目的:为了获得特别是对长波长光如激光具有实质的光敏性的电子照相感光体,通过在导电性基体上的光电导层中与表面平行或同轴地设置粗糙的边界面,消除干涉条纹的产生。 构成:例如,首先通过蒸镀将Se沉积在导电性基材11上,并且通过在形成所述基材上的光电导层的阶段中的湿法或干法蚀刻或机械处理使其边界面13粗糙化。 然后将由Se-Te合金构成的光电导层薄层叠,使得层叠的光电导层12的表面14反射层13的粗糙表面。层22之间的边界面的层叠光电导层22, 另外,在基底21表面上依次形成载体转印层221和载体生成层22-2的阶段,使得层22-2的表面24也被粗糙化,并且层22-2的表面24也被粗糙化。 特别是由于入射到感光体10,20的光之间的干涉和从层边界面13,14,23,234反射的光的相干光如激光的光敏性的明显降低被通过 以上述方式形成光电导层。 因此具有实质的光敏性的电子照相感光体。
    • 29. 发明专利
    • Photoconductive member
    • 光电会员
    • JPS59185344A
    • 1984-10-20
    • JP6132583
    • 1983-04-06
    • Toshiba Corp
    • YAMAZAKI MUTSUKIKAGA HIDEKAZU
    • G03G5/08G03G5/043
    • G03G5/0433
    • PURPOSE:To provide high potential retentivity and to prevent residual potential from being produced by successively forming two amorphous blocking layers each having a specified thickness and contg. a IIIA or VA group atom in the periodic table between a photoconductive layer of amorphous silicon (a-Si) on a support and the support. CONSTITUTION:When an electrophotographic sensitive body having a photoconductive a-Si layer 4 on an electrically conductive support 1 is manufactured, the 1st blocking layer 2 of a-Si having 0.5-2.5mum thickness and the 2nd blocking layer 3 of a-SiO2 having 0.1-9mum thickness are successively formed on the support 1. The layers 2, 3 contain preferably H or halogen, and it is preferable that a small amount of B or P is incorporated to regulate the specific resistance of the layer 2 to OMEGAcm and that of the layer 3 to >=10 OMEGAcm. A protective layer 5 of a-Si contg. O, H, N or C is then formed on the layer 4. Thus, a sensitive body having high potential by electrostatic charge and no residual potential after exposure is obtd. This sensitive body has high resistance to bias for development and a long life.
    • 目的:提供高电位的保持性,并通过连续地形成具有特定厚度的两个非晶形阻挡层来防止残留电势的产生。 在载体上的非晶硅(a-Si)的光电导层和载体之间的周期表中的IIIA或VA族原子。 构成:当制造在导电载体1上具有感光a-Si层4的电子照相感光体时,具有0.5-2.5μm厚度的a-Si的第一阻挡层2和a-SiO 2的第二阻挡层3具有 在支撑体1上依次形成0.1-9μm的厚度。层2,3优选含有H或卤素,并且优选加入少量B或P以调节层2的电阻率至<= 10 &lt; 9&gt; OMEGAcm&gt;层3至> = 10 9欧米加。 a-Si的保护层5 然后在层4上形成O,H,N或C。因此,可以看到通过静电电荷具有高电位并且在曝光后没有残留电位的敏感体。 这种敏感的身体对发展的偏见很强,使用寿命长。
    • 30. 发明专利
    • Amorphous silicon photosensitive body
    • 非晶硅感光体
    • JPS59131941A
    • 1984-07-28
    • JP689683
    • 1983-01-19
    • Toshiba Corp
    • UENO TAKESHIYAMAZAKI MUTSUKIKAGA HIDEKAZU
    • G03G5/08
    • G03G5/08
    • PURPOSE:To provide a single-layered photosensitive layer which has small strain of the layer and can be laminated quickly by incorporating an element which controls the valence electron of the photosensitive layer and an element which varies an optical forbidden band and dielectric constant in the amorphous silicon photosensitive layer. CONSTITUTION:The 1st element which controls the valence electron of an amorphous silicon photosensitive layer is, for example, IIIB group elements and VB group elements, and the 2nd element which varies an optical forbidden band and dielectric constant and decreases the strain of the layer is, for example, C, N, O, etc. A conductive substrate 6 is mounted in a reaction vessel 2, and gaseous raw material having, for example, SiH4, Si2H6, etc., gas contg. the 1st and 2nd elements, and gaseous carrier such as H2 or the like are blown from an electrode 14 and plasma gas is generated by glow discharge between the electrode 14 and the substrate 6 to form the layer having such concn. gradient that the content of the elements is higher near the boundary with the substrate 6 and is smaller as said electrode and substrate separate.
    • 目的:提供具有小的应变层的单层感光层,并且可以通过结合控制感光层的价电子的元素和在非晶体中改变光学禁带和介电常数的元素来快速层压 硅光敏层。 构成:控制非晶硅感光层的价电子的第一元素是例如IIIB族元素和VB族元素,并且改变光学禁带和介电常数并降低层的应变的第二元素是 例如C,N,O等。导电性基板6安装在反应容器2中,并且具有例如SiH 4,Si 2 H 6等的气体原料, 第一和第二元件以及诸如H 2等的气态载体从电极14吹出,并且通过在电极14和基板6之间的辉光放电产生等离子体气体,以形成具有这种结构的层。 元件的含量在与衬底6的边界附近更高的梯度,并且随着所述电极和衬底分离而更小。