会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 21. 发明专利
    • HEAT-SENSITIVE TRANSFER RECORDING INK SHEET
    • JPS621582A
    • 1987-01-07
    • JP14282885
    • 1985-06-28
    • NITTO ELECTRIC IND CO
    • HOTTA YUJIYAMADA SHINJIWADA TATSUOKOJIMA MAKOTO
    • B41M5/382B41M5/40B41M5/44
    • PURPOSE:To prevent blocking by a method wherein a layer of a material prepared by crosslinking and setting specific hydrogen modified polysiloxane with a peroxide is formed on the side whereon a quantity of heat is impressed. CONSTITUTION:Hydrogen modified polysiloxane expressed by general formulas (I-III) and a peroxide as they are, or the ones diluted with an appropriate inactive solvent, are formed on a prescribed place of an ink sheet by a coating means or the like, and then they are crosslinked and set by prescribed treatment. The thickness of the layer, as that of the set material, is 0.02-1mum, or preferably 0.05-0.5mum, A uniform effect can not be expected when the thickness is smaller than 0.02mum, while the sensitivity of the ink sheet lowers undesirably when it is larger than 1mum. As for the ink sheet whereon the aforesaid layer is formed, the one prepared by a method wherein an ink layer prepared from paraffin wax or ester wax having a melting point of about 60-100 deg.C and a coloring material and also form a softening agent and a filler as a thermal conductivity improving agent as occasion calls is provided about 2-20mum thick on a polyester film substrate of a melt transfer type being about 2-12mum thick, is used.
    • 22. 发明专利
    • HEAT-SENSITIVE TRANSFER RECORDING INK SHEET
    • JPS621580A
    • 1987-01-07
    • JP14282685
    • 1985-06-28
    • NITTO ELECTRIC IND CO
    • HOTTA YUJIYAMADA SHINJIWADA TATSUOKOJIMA MAKOTO
    • B41M5/382B41M5/40B41M5/44
    • PURPOSE:To prevent the occurrence of blocking in the case when an ink sheet is formed in a roll or a laminate, by a method wherein a layer of a material prepared by crosslinking and setting specific phenyl modified polysiloxane by active radiations is formed on the side whereon a quantity of heat is impressed. CONSTITUTION:A layer of a material prepared by a method wherein phenyl modified polysiloxane expressed by a general formula (I) is crosslinked and set by active radiations is formed on the side of an ink sheet whereon a quantity of heat is impressed. As for the active radiations to be used, a source of rays such as ultraviolet rays or electron beams can be employed. The layer of the set material of phenyl modified polysiloxane expressed by the general formula (I) is formed on the side of the ink sheet whereon a quantity of heat is impressed, in such a manner that the compound and an optical reaction initiator as they are, or the ones diluted with an appropriate inactive solvent, are formed on the ink sheet by a coating means or the like and then crosslinked and set by applying the active radiations thereto. The thickness of the layer of the set material is 0.02-1mum, or preferably 0.05-0.5mum.
    • 27. 发明专利
    • Photosensitive resin composition
    • 感光树脂组合物
    • JPS59131927A
    • 1984-07-28
    • JP696383
    • 1983-01-18
    • Nitto Electric Ind Co Ltd
    • KOJIMA MAKOTO
    • C08F299/00C08F290/00C08G59/00C08G59/28G03F7/037G03F7/038
    • G03F7/037
    • PURPOSE:To obtain a photosensitive resin compsn. having heat resistance and photosensitivity without causing exposure hindrance during forming a photosensitive coating film by mixing a photopolymn. initiator in a soln. contg. a polyimide precursor having a specified substance added to it. CONSTITUTION:An epoxy compound having a polymerizalbe unsatd. bond having >=0.5 equiv. is added to each one equiv. of acid groups of polyamide acid having >=about 700mol.wt. consisting substantially of repeating units each represented by formula I in which R is a residue of an aliphatic tetracarboxylic acid free from acid groups, and R' is a divalent org. group. Into a soln. contg. the polyimide precursor thus obtained, a polymn. initiator, and when needed, a polymerizable unsatd. compd. are added to obtain a photosensitive resin compsn. transmitting light substantially after drying a coating film and having high photosensitivity. Said polyamide acid is obtained by using an aliphatic tetracarboxylic acid dianhydride and diamine as starting material and reacting them in a solvent substantially inactive on them. The diamine to be used is represented by the general formula H2N-R'-NH2 in which R' is a divalent org., preferably aromatic, group.
    • 目的:获得感光树脂。 具有耐热性和光敏性,而不会在通过混合光聚合形成感光性涂膜时引起曝光障碍。 发起者在soln。 contg。 具有加入其中的特定物质的聚酰亚胺前体。 构成:聚合物不饱和的环氧化合物。 具有> = 0.5当量的键 加入每一个当量。 具有≥约700mol.wt。的聚酰胺酸的酸基。 基本上由式I表示的重复单元组成,其中R是不含酸基的脂族四羧酸的残基,R'是二价组分。 组。 进入soln contg。 由此获得的聚酰亚胺前体,聚合物。 引发剂,当需要时可聚合的不饱和物。 卤素化合物。 加入以获得感光性树脂组合物。 在干燥涂膜后基本上透光并具有高的光敏性。 所述聚酰胺酸通过使用脂肪族四羧酸二酐和二胺作为起始原料而获得,并使它们在基本上不活泼的溶剂中反应。 所用的二胺由通式为H2N-R'-NH2表示,其中R'为二价组分,优选芳族基团。