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    • 23. 发明专利
    • WAVELENGTH CONVERTING DEVICE
    • JPH1168208A
    • 1999-03-09
    • JP21648397
    • 1997-08-11
    • NIPPON TELEGRAPH & TELEPHONE
    • TADOKORO TAKASHIAMANO CHIKARAITO YOSHIO
    • H01S5/06H01S5/50H01S3/103
    • PROBLEM TO BE SOLVED: To provide a wavelength converting device that is capable of converting wavelength of a laser light signal modulated at a rate higher than several Gb/s, by preparing a laser resonator in which plural active medium regions are distributed, and a waveguide from which a light is injected into one of the active medium regions along the direction perpendicular to the direction of the resonance in the active medium region. SOLUTION: A laser resonator 8 that constitutes a laser and a waveguide 9 are prepared to form a nearly T-shape on a substrate 11. The resonator 8 consists of two gain regions 6 and 7, wherein the resonator 6, which serves as an active medium region, is constituted by a compressive-strained multiple quantum-well active region sandwiched by two optical confinement layers 12 and 14, and the gain region 7, which serves as a second active medium region, is constituted by a tensile-strained multiple quantum-well active region sandwiched by the two optical confinement layers 12 and 14. On the other hand, the waveguide 9 is prepared so that a signal light from an external source can propagate in an active layer 13 and is injected into the active layer 13 in the region 6 of the laser resonator 8.
    • 27. 发明专利
    • MANUFACTURE OF COMPOUND SEMICONDUCTOR SUBSTRATE
    • JPH03241822A
    • 1991-10-29
    • JP3925790
    • 1990-02-20
    • NIPPON TELEGRAPH & TELEPHONE
    • TACHIKAWA MASAMIITO YOSHIOAMANO CHIKARAMORI HIDEFUMI
    • H01L29/26H01L21/20
    • PURPOSE:To manufacture the title compound semiconductor substrate capable of feeding longitudinal current from a single crystal semiconductor substrate side to a crystal semiconductor side or vice versa possessing less crystal defects of the semiconductor layer in different composition by a method wherein impurity concentration non-modulated buffer layers are formed by heat-treating impurity concentration modulated buffer layers and so forth. CONSTITUTION:The first crystal semiconductor thin film 3a' and the second crystal semiconductor thin film 3b respectively specific are alternately and successively formed laminarly on a single crystal semiconductor substrate 1 by epitaxial deposition process so as to form impurity concentration modulated buffer layers 3' where the first and second impurity concentrations are successively and alternately changed in the depth direction. Next, a crystal semiconductor 4 in different composition from that of the substrate 1 is formed on the impurity concentration modulated buffer layers 3' also by the epitaxial deposition process. Later, an impurity concentration non-modulated buffer layers 3'' in impurity concentration substantially unchanged in the depth direction as well as in specific conductivity type through the whole thickness are formed by heat-treating said layers 3'.