专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明专利

JP2010058194A Method for manufacturing polishing pad 有权
标题翻译：制造抛光垫的方法
公开(公告)号：JP2010058194A
公开(公告)日：2010-03-18
申请号：JP2008224599
申请日：2008-09-02
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： ITOYAMA MITSUNORI , TAKAHASHI DAISUKE , MIYAZAWA FUMIO
IPC分类号： B24B37/24 , C08G18/10 , C08J9/12 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a polishing pad, capable of correcting the degree of abrasion, and stabilizing polishing performance. SOLUTION: The polishing pad 1 includes an urethane sheet 2 in foam structure having a polishing plane P. The urethan sheet 2 is formed by mixing polyisocyanate compound, polyol compound, water, polyamine compound, and nonreactive gas. Blending quantity of the respective components are controlled in such a way that a value F defined as F=-13.8×HSC-726×R+773×D-7.95A+1516 is within a range of 100-200, wherein HSC is the content of hard segments, R is the equivalence ratio of the total of the hydroxyl group of polyol compound and the amino group of the polyamine compound to the isocyanate group of the polyisocyanate compound, D is the bulk density, and A is the hardness. The value F correlates with the easiness of abrasion on the polishing plane P. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够校正磨损程度和稳定抛光性能的抛光垫的制造方法。抛光垫1包括具有抛光面P的泡沫结构的聚氨酯片2.聚氨酯片2通过混合多异氰酸酯化合物，多元醇化合物，水，多胺化合物和非反应性气体而形成。以F = -13.8×HSC-726×R + 773×D-7.95A + 1516定义的值F在100-200的范围内控制各成分的混合量，其中HSC为硬链段的含量，R是多元醇化合物的羟基与多胺化合物的氨基与多异氰酸酯化合物的异氰酸酯基的总数的当量比，D是堆积密度，A是硬度。值F与抛光平面P的磨损容易度有关。版权所有（C）2010，JPO＆INPIT

22. 发明专利

JP2010005747A Polishing pad and its manufacturing method 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2010005747A
公开(公告)日：2010-01-14
申请号：JP2008168707
申请日：2008-06-27
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , ITOYAMA MITSUNORI
IPC分类号： B24B37/20 , B24B37/24 , B24B37/26 , C08J5/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad capable of improving flatness of an object to be polished while preventing occurrence of polishing flaws and improving a polishing rate even if polishing particles cannot enter inside through a polishing surface. SOLUTION: The polishing pad 10 comprises a urethane sheet 2 formed of polyurethane resin. The urethane sheet 2 has the polishing surface P for polishing an object to be polished. The urethane sheet 2 has no opening through which abrasive grains can pass formed on the polishing surface P so that the abrasive grains cannot enter inside the urethane sheet 2 through the polishing surface P. A hysteresis loss ratio of the urethane sheet 2 is specified in a range of 5-40%. Even if the polishing surface P of the urethane sheet 2 is deformed by the abrasive grains in a polishing liquid during the polishing, its deformation can be restored in a short period of time, making the abrasive grains easy to move. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种即使抛光颗粒不能通过抛光表面进入内部，能够提高抛光物体的平整度，同时防止抛光缺陷的发生和提高抛光速率的抛光垫。解决方案：抛光垫10包括由聚氨酯树脂形成的聚氨酯片材2。聚氨酯片材2具有用于抛光待抛光物体的抛光面P。氨基甲酸酯片2在研磨面P上没有可以形成磨粒的开口，使得磨粒不能通过研磨面P进入聚氨酯片2的内部。氨基甲酸酯片2的滞后损失率在范围5-40％。即使在抛光期间聚氨酯片材2的研磨面P被研磨液中的磨粒变形，也能够在短时间内恢复其变形，使磨粒容易移动。版权所有（C）2010，JPO＆INPIT

23. 发明专利

JP2010005746A Polishing pad and its manufacturing method 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2010005746A
公开(公告)日：2010-01-14
申请号：JP2008168661
申请日：2008-06-27
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , ITOYAMA MITSUNORI
IPC分类号： B24B37/20 , B24B37/24 , B24B37/26 , C08J5/14
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad capable of preventing occurrence of polishing flaws and improving a polishing rate even if polishing particles cannot enter inside through a polishing surface. SOLUTION: The polishing pad 10 comprises a urethane sheet 2 formed of polyurethane resin. The urethane sheet 2 has the polishing surface P for polishing an object to be polished. The urethane sheet 2 has no opening through which abrasive grains can pass formed on the polishing surface P so that the abrasive grains cannot enter inside the urethane sheet 2 through the polishing surface P. An impact resilience coefficient of the urethane sheet 2 is specified in a range of 2-30%. Even if the polishing surface P of the urethane sheet 2 is deformed by the abrasive grains in a polishing liquid during the polishing, its deformation restoring force is reduced, and the abrasive grains can be easily kept. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：即使抛光颗粒不能通过抛光表面进入内部，提供能够防止抛光瑕疵的发生和提高抛光速率的抛光垫。解决方案：抛光垫10包括由聚氨酯树脂形成的聚氨酯片2。聚氨酯片材2具有用于抛光待抛光物体的抛光面P。氨基甲酸酯片2在研磨面P上没有磨粒形成的开口，磨粒不能通过研磨面P进入聚氨酯片2的内部。聚氨酯片2的冲击弹性系数在范围2-30％。即使在研磨过程中，由于研磨液中的磨粒使聚氨酯片材2的研磨面P发生变形，因此其变形恢复力降低，能够容易地保持磨粒。版权所有（C）2010，JPO＆INPIT

24. 发明专利

JP2009279749A Polishing pad 有权
标题翻译：抛光垫
公开(公告)号：JP2009279749A
公开(公告)日：2009-12-03
申请号：JP2009047783
申请日：2009-03-02
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , ITOYAMA MITSUNORI , TAKAHASHI DAISUKE , TAKADA NAOKI
IPC分类号： B24B37/24 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad capable of uniforming foaming structure. SOLUTION: The polishing pad 1 has a polyurethane sheet 2 with the foaming structure. The polyurethane sheet 2 has an isocyanate-group containing compound as a main component, and has a polishing surface P to abut to a polished object via slurry in the polishing process. Hemispherical particulates 3 with resin shells are approximately regularly and evenly dispersed on the polyurethane sheet 2. A hollow cavity is formed at the center of each shell, and a foaming component is disposed in the cavity of the particulate 3. Pores 6 are approximately regularly and evenly formed of the foaming component disposed in the cavities of the particulates 3 in the polyurethane sheet 2. The particulates 3 are enclosed in the pores 6. The pores 6 are formed of gases generated from the foaming component. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供能够均匀发泡结构的抛光垫。解决方案：抛光垫1具有发泡结构的聚氨酯片材2。聚氨酯片材2具有含异氰酸酯基的化合物作为主要成分，并且在抛光工序中具有通过浆料与研磨对象物接合的研磨面P. 具有树脂壳的半球形颗粒3近似均匀地分散在聚氨酯片材2上。在每个壳体的中心处形成中空腔，并且发泡部件设置在颗粒3的空腔中。孔6近似规则地和由布置在聚氨酯片2中的微粒3的空腔中的发泡组分均匀地形成。微粒3被包封在孔6中。孔6由发泡组分产生的气体形成。版权所有（C）2010，JPO＆INPIT

25. 发明专利

JP2009250862A Manufacturing method of cartridge filling column for solid phase extraction 有权
标题翻译：用于固相萃取的柱塞填充柱的制造方法
公开(公告)号：JP2009250862A
公开(公告)日：2009-10-29
申请号：JP2008101258
申请日：2008-04-09
申请人： Fujibo Holdings Inc , Wako Pure Chem Ind Ltd , 和光純薬工業株式会社 , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , ITOYAMA MITSUNORI , OGUMA MEGUMI
IPC分类号： G01N30/56 , B23K20/10
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of a cartridge filling column for solid phase extraction that has a large number of theoretical stages, reduces unnecessary gaps so as to exhibit stable performance, and prevents leakage of the liquid to be detected.
SOLUTION: In this manufacturing method of the cartridge filling column for solid-phase extraction, a lower filter 9 is inserted into a cylindrical material filling room 10 of a cylinder vessel 2 for column formation, made of thermoplastic synthetic resin, filled with powder filling material 11; an upper filter 8 and a cylinder vessel cap 3 for column formation made of thermoplastic synthetic resin are attached to the cylinder vessel 2 for column formation; then the cylinder vessel 2 for column formation and cylinder vessel cap 3 for column formation are integrated, while vibration is applied to an under-pressure filling column 1 by an ultrasonic welder 13. A welding projecting part 5, containing a sufficient amount of resin for welding, is arranged on the welding surface of one of the cylinder vessel 2 for column formation and cylinder vessel cap 3 for column formation so as to surround it, and the distance L20-L22 between the welding surfaces, when the projecting part 5 is brought into contact with the other welding part before the welding is set in a range of 0.6-5.0 mm.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供具有大量理论级的固相萃取的填料柱的制造方法，减少不必要的间隙以表现出稳定的性能，并且防止待检测液体的泄漏。解决方案：在用于固相萃取的筒填充柱的这种制造方法中，将下过滤器9插入到由热塑性合成树脂制成的圆柱形容器2的柱形容器2的圆柱形填料室10中，填充有粉末填充材料11; 上部过滤器8和由热塑性合成树脂制成的用于柱形成的气缸容器盖3附接到用于柱形成的气缸容器2; 然后用于柱形成的气缸容器2和用于柱形成的气缸容器盖3被一体化，同时通过超声波焊接机13将振动施加到低压填充柱1上。焊接突出部分5包含足够量的用于焊接时，设置在用于柱形成的气缸容器2和用于柱形成的气缸容器盖3之间的一个的焊接表面上，并且当将突出部5带入时，焊接表面之间的距离L20-L22 在焊接设定在0.6〜5.0mm的范围内与其他焊接部接触。版权所有（C）2010，JPO＆INPIT

26. 发明专利

JP2013208696A Sheet for polishing pad, manufacturing method thereof, polishing pad, manufacturing method thereof, and polishing method 有权
标题翻译：抛光垫板及其制造方法，抛光垫片及其制造方法及抛光方法
公开(公告)号：JP2013208696A
公开(公告)日：2013-10-10
申请号：JP2012082356
申请日：2012-03-30
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , KUME TAKAHIRO , OKADA SHINJI
IPC分类号： B24B37/24 , B24B37/26 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a sheet for a polishing pad capable of maintaining productivity of a polished product high and making surface quality of the polished product excellent.SOLUTION: A sheet for a polishing pad includes a resin sheet having a plurality of air bubbles having an elongate area formed. The sheet is formed such that, among the plurality of air bubbles appearing on a section parallel to a thickness direction of the resin sheet, a longitudinal direction of the elongate area in 50% or more air bubbles with the number of air bubbles as reference is tilted by 10-65° in a constant direction with respect to an in-plane direction of the resin sheet and emboss grooves are formed on a principal plane of the resin sheet.
摘要翻译：要解决的问题：提供一种能够使抛光产品的生产率高的抛光垫片，并且使抛光产品的表面质量优异。抛光垫片包括具有多个气泡的树脂片具有形成的细长区域。片材形成为使得在与树脂片材的厚度方向平行的部分上出现的多个气泡中，以50％以上的气泡为基准的50％以上的气泡的长度方向的长度方向为相对于树脂片的面内方向在恒定方向上倾斜10-65°，并且在树脂片的主平面上形成凸纹。

27. 发明专利

JP2013193181A Sheet for polishing pad, method for manufacturing the same, polishing pad, method for manufacturing the same, and polishing method 有权
标题翻译：抛光垫板，其制造方法，抛光垫，其制造方法和抛光方法
公开(公告)号：JP2013193181A
公开(公告)日：2013-09-30
申请号：JP2012064249
申请日：2012-03-21
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： KANAZAWA KAE , MIYAZAWA FUMIO , MIYASAKA HIROHITO , TATENO TEPPEI , MATSUOKA TATSUMA
IPC分类号： B24B37/26 , B24B37/24 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a sheet for polishing pad capable of sufficiently suppressing the reduction of a circulating volume of slurry and reducing the wear of the polishing pad.SOLUTION: A sheet for a polishing pad includes a polishing layer that includes a plurality of polishing regions with polishing surfaces abutted to an object to be polished and polishes the object to be polished with the polishing surface. In the sheet for the polishing pad, the plurality of polishing regions are arranged to be separated from each other in the in-plane direction of the polishing layer. The polishing region has a polygonal shape in which the projection plane in the thickness direction of the polishing layer has only an obtuse angle, or an aggregate shape of the polygonal shape having only the obtuse angle. Furthermore, the polishing region has a convex curve or a corner cutting surface between a sidewall surface opposing the advancing direction of the object to be polished and the polishing surface.
摘要翻译：要解决的问题：提供一种能够充分抑制浆料的循环体积的减少并减少抛光垫的磨损的抛光垫片。解决方案：用于抛光垫的片材包括：抛光层，其包括多个具有抛光表面的抛光区域与待抛光的物体相邻，并用抛光表面抛光被抛光物体。在用于抛光垫的片材中，多个抛光区域被布置成在抛光层的面内方向上彼此分离。抛光区域具有其中抛光层的厚度方向上的投影平面仅具有钝角的多边形形状或仅具有钝角的多边形的聚集体形状。此外，抛光区域具有与被研磨对象的前进方向相对的侧壁面与研磨面之间的凸曲线或角切割面。

28. 发明专利

JP2012101333A Polishing pad and method of manufacturing polishing pad 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2012101333A
公开(公告)日：2012-05-31
申请号：JP2010253255
申请日：2010-11-11
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , KURIHARA HIROSHI
IPC分类号： B24B37/24 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad capable of improving a polishing rate and flatness of a polishing object.SOLUTION: The polishing pad 10 is equipped with a resin sheet 2 which is formed by wet solidification method using polyurethane resin of soft resin and polysulfone resin, the polysulfone resin being soluble relative to a solvent in which polyurethane resin is soluble and being harder than polyurethane resin. The resin sheet 2 includes a skin layer 2a, foam resin part 2b in which micro pores 4 are formed, and a spherical resin 3 which is dispersedly formed in the foam resin part 2b. The surface of the skin layer 2a forms a polishing face P. The spherical resin 3 has an average diameter larger than that of the micro pores 4 formed in the foam resin 2b and is formed mainly of polysulfone resin. The spherical resin 3 has higher density as compared with the foam resin part 2b.
摘要翻译：要解决的问题：提供能够提高抛光对象的研磨速度和平坦度的抛光垫。＆lt; P＆gt;解决方案：抛光垫10配备有通过使用软质树脂和聚砜树脂的聚氨酯树脂的湿固化法形成的树脂片2，聚砜树脂相对于其中可溶解聚氨酯树脂的溶剂是可溶的，并且是比聚氨酯树脂硬。树脂片2包括表层2a，其中形成微孔4的泡沫树脂部分2b和分散形成在泡沫树脂部分2b中的球形树脂3。表皮层2a的表面形成抛光面P.球形树脂3的平均直径大于形成在泡沫树脂2b中的微孔4的平均直径，并且主要由聚砜树脂形成。与泡沫树脂部2b相比，球状树脂3的密度高。版权所有（C）2012，JPO＆INPIT

29. 发明专利

JP2011230205A Polishing pad and method for manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2011230205A
公开(公告)日：2011-11-17
申请号：JP2010100566
申请日：2010-04-26
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , KURIHARA HIROSHI
IPC分类号： B24B37/24 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad which can improve a polishing speed and flatness of a polishing object.SOLUTION: The polishing pad 10 includes a resin sheet 2 integrally formed with a soft polyurethane resin and a polysulfone resin harder than the polyurethane resin having solubility to a soluble solvent in a wet coagulation manner. The resin sheet 2 includes a skin layer 2a, a foam resin part 2b in which cells 4 are formed, and spherical parts 3 decentrally formed in the foam resin part 2b. A surface of the skin layer 2a forms a polishing surface P. Many micropores smaller than the cells 4 are formed in the foam resin part 2b between the cells 4. The spherical parts 3 are more precise than the micropores formed in the foam resin part 2b and formed smaller than the cells 4. The spherical parts 3 are denser than the foam resin part 2b.
摘要翻译：要解决的问题：提供可以提高抛光对象的抛光速度和平坦度的抛光垫。解决方案：抛光垫10包括与软聚氨酯树脂一体形成的树脂片2和比聚氨酯树脂更硬的聚砜树脂，其以湿凝结的方式对可溶性溶剂具有溶解性。树脂片2包括表皮层2a，其中形成有细胞4的泡沫树脂部分2b和在泡沫树脂部分2b中分散形成的球形部分3。表皮层2a的表面形成研磨面P.在细胞4之间的泡沫树脂部分2b中形成有小于细胞4的许多微孔。球形部分3比形成在泡沫树脂部分2b中的微孔更精确并且形成为小于单元4.球形部分3比泡沫树脂部分2b更致密。版权所有（C）2012，JPO＆INPIT

30. 发明专利

JP2011212808A Polishing pad and method for manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2011212808A
公开(公告)日：2011-10-27
申请号：JP2010084606
申请日：2010-03-31
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , TAKAGI MASATAKA
IPC分类号： B24B37/24 , C08G18/32 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad capable of improving the flatness of an object to be polished by restraining blocking of an opening on a polishing surface.SOLUTION: The polishing pad 10 has a resin sheet 2 formed of polyurethane polyurea resin with a percentage content HSC of 7-35% of hard segment through urea bonding, by means of the wet solidification method. The resin sheet 2 has a polishing surface Sp and a porous structure composed of fine porosities 3 communicating with each other in a mesh-like manner. The polishing surface Sp is formed with openings 4 in which fine porosities 3 are open. A water absorption rate of the resin sheet 2 is adjusted to 20% or more when immersed in water at 20°C for one hour. The hardness of the resin sheet 2 increases and polishing chips scatter inside of the resin sheet 2 from the openings 4 through the fine porosities 3.
摘要翻译：要解决的问题：提供一种能够通过抑制研磨表面上的开口的阻塞来提高待研磨物体的平坦度的抛光垫。解决方案：抛光垫10具有由聚氨酯聚脲树脂形成的树脂片2，通过湿固化方法，通过尿素粘结将硬链段的HSC百分含量为7-35％。树脂片2具有研磨面Sp和由网孔状彼此连通的细孔3构成的多孔结构体。抛光面Sp形成开口4，细孔3打开。当在20℃的水中浸渍1小时时，树脂片材2的吸水率被调节到20％以上。树脂片材2的硬度增加，并且抛光屑从树脂片材2从开口4穿过细孔3移动。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式