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21. 发明专利

JP4448782B2 Positive resist composition and pattern forming method using the same 有权
公开(公告)号：JP4448782B2
公开(公告)日：2010-04-14
申请号：JP2005045654
申请日：2005-02-22
申请人：富士フイルム株式会社
发明人：慎一漢那 , 博美神田 , 陽樹稲部
IPC分类号： G03F7/039 , C08F16/22 , C08F20/26 , C08F32/08 , G03F7/38 , H01L21/027

22. 发明专利

JP4383371B2 The resist film and a pattern forming method using the same 有权
公开(公告)号：JP4383371B2
公开(公告)日：2009-12-16
申请号：JP2005057633
申请日：2005-03-02
申请人：富士フイルム株式会社
发明人：慎一漢那 , 博美神田 , 陽樹稲部 , 表高橋
IPC分类号： G03F7/38 , H01L21/027

23. 发明专利

JP5570832B2 Colored curable composition, color filter and a method for producing the same, as well as the solid-state imaging device 有权
公开(公告)号：JP5570832B2
公开(公告)日：2014-08-13
申请号：JP2010019378
申请日：2010-01-29
申请人：富士フイルム株式会社
发明人：和也尾田 , 雅臣牧野 , 純一伊藤 , 裕樹水川 , 将吉川 , 健太牛島 , 慎一漢那 , 陽樹稲部
IPC分类号： G03F7/004 , C09B23/00 , C09B67/20 , C09B67/46 , G02B5/20 , G03F7/031

24. 发明专利

JP5155541B2 Method of manufacturing an insulating film-forming composition, the insulating film forming composition produced by the production method, the insulating film and the electronic device 有权
公开(公告)号：JP5155541B2
公开(公告)日：2013-03-06
申请号：JP2006257963
申请日：2006-09-22
申请人：富士フイルム株式会社
发明人：陽樹稲部
IPC分类号： C09D149/00 , H01L21/312
CPC分类号： C09D183/04 , C08G77/045

25. 发明专利

JP4865663B2 Composition for forming an insulating film 有权
公开(公告)号：JP4865663B2
公开(公告)日：2012-02-01
申请号：JP2007253891
申请日：2007-09-28
申请人：富士フイルム株式会社
发明人：陽樹稲部
IPC分类号： H01L21/312 , C08G61/12 , H01L21/768 , H01L23/522
CPC分类号： H01L23/5329 , C08G61/02 , C08G61/10 , C08G61/12 , C08G2261/312 , H01L21/312 , H01L21/316 , H01L2924/0002 , H05K1/0326 , H05K3/4676 , H01L2924/00
摘要： It is an object of the present invention to provide a composition capable of forming an insulating film which is endowed with a low dielectric constant, heat resistance, chemical resistance and a high mechanical strength that enables the insulating film to withstand CMP, and which, when an inorganic insulating film layer is provided thereon as an overlying layer, has a high adherence thereto. The composition for forming an insulating film contains polyphenylene, wherein the polyphenylene in an insulating film formed from the composition has a number of carbon atoms (C) and a number of oxygen atoms (O) which together satisfy a condition O/(C+O)≧0.050. With the composition, the above object is attained.

26. 发明专利

JP4861767B2 The positive resist composition and pattern forming method using the same 有权
公开(公告)号：JP4861767B2
公开(公告)日：2012-01-25
申请号：JP2006198897
申请日：2006-07-21
申请人：富士フイルム株式会社
发明人：慎一漢那 , 博美神田 , 陽樹稲部
IPC分类号： G03F7/039 , G03F7/004 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/091 , G03F7/16 , G03F7/168 , G03F7/2041 , G03F7/30 , G03F7/322 , G03F7/38 , G03F7/40
摘要： A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.

27. 发明专利

JP4695941B2 Positive resist composition and pattern forming method using the same 有权
标题翻译：空值
公开(公告)号：JP4695941B2
公开(公告)日：2011-06-08
申请号：JP2005238734
申请日：2005-08-19
申请人：富士フイルム株式会社
发明人：邦彦児玉 , 博美神田 , 陽樹稲部
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0395 , G03F7/0397 , G03F7/2041 , Y10S430/122 , Y10S430/126

28. 发明专利

JP4524207B2 Positive resist composition and pattern forming method using the same 有权
标题翻译：空值
公开(公告)号：JP4524207B2
公开(公告)日：2010-08-11
申请号：JP2005057634
申请日：2005-03-02
申请人：富士フイルム株式会社
发明人：慎一漢那 , 博美神田 , 陽樹稲部
IPC分类号： G03F7/039
摘要： PROBLEM TO BE SOLVED: To provide a resist which shows little deterioration in the sensitivity when applied to liquid immersion exposure compared to dry exposure and causes extremely little elution of an acid into an immersion liquid, and which is suitable for liquid immersion exposure. SOLUTION: The positive resist composition for liquid immersion exposure contains (A) a resin the solubility of which with an alkali developing solution is increased by an effect of an acid, and (B) a compound which generates an acid by irradiation with active rays or radiation. When the composition is applied to form a coating film on a substrate, the composition exhibits a static contact angle of ≥72° to pure water and a static contact angle of ≤70° to an alkali developing solution. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种抗蚀剂，当与干式曝光相比，当应用于浸液曝光时，其灵敏度几乎没有劣化，并且导致酸极少地浸入浸渍液中，并且适用于液浸曝光。解决方案：用于液浸曝光的正型抗蚀剂组合物含有（A）通过酸的作用使其与碱性显影液的溶解度增加的树脂，（B）通过照射产生酸的化合物活跃的射线或辐射。当组合物用于在基材上形成涂膜时，该组合物与纯水呈静态接触角≥72°，与显影液的静态接触角≤70°。版权所有（C）2006，JPO＆NCIPI

29. 发明专利

JP4377174B2 Positive resist composition 有权
公开(公告)号：JP4377174B2
公开(公告)日：2009-12-02
申请号：JP2003280237
申请日：2003-07-25
申请人：富士フイルム株式会社
发明人：知也佐々木 , 陽樹稲部
IPC分类号： G03F7/039 , C08F20/28 , G03C1/76 , G03F7/004 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/108 , Y10S430/111 , Y10S430/115

30. 发明专利

JP4365235B2 The resist composition and pattern forming method using the same 有权
公开(公告)号：JP4365235B2
公开(公告)日：2009-11-18
申请号：JP2004044764
申请日：2004-02-20
申请人：富士フイルム株式会社
发明人：慎一漢那 , 博美神田 , 陽樹稲部 , 表高橋
IPC分类号： G03F7/004 , G03F7/027 , G03F7/039 , G03F7/20 , H01L21/027

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