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21. 发明专利

JP2013218901A Sample holding device and sample analysis device 有权
标题翻译：样品保持装置和样品分析装置
公开(公告)号：JP2013218901A
公开(公告)日：2013-10-24
申请号：JP2012088918
申请日：2012-04-10
申请人： Jeol Ltd , 日本電子株式会社
发明人： SUZUKI TOSHIAKI , MATSUSHIMA HIDEKI
IPC分类号： H01J37/20 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide a sample holding device capable of performing crystal orientation analysis of a sample without taking time and effort.SOLUTION: In performing EBSD measurement of a sample, an operator extracts a sample table 1 with sample 13 fixed from a first hole 7, and inserts the sample table into a second hole 8. In this state, a sample analysis surface 13a is inclined by 70° with respect to a horizontal plane. When sample holder 6 is attached to a sample stage of an electron beam irradiation device having an option axis in a vertical direction, a satisfactory backscattering electron diffraction pattern can be acquired without performing inclination adjustment of the sample stage.
摘要翻译：要解决的问题：提供一种能够在不花费时间和精力的情况下进行样品的晶体取向分析的样品保持装置。解决方案：在进行样品的EBSD测量中，操作者从第一个样品13固定的样品13提取样品台1 孔7，并将样品台插入第二孔8.在该状态下，样品分析表面13a相对于水平面倾斜70°。当样品保持器6附着到具有垂直方向的选择轴的电子束照射装置的样品台时，可以获得令人满意的反向散射电子衍射图案，而不进行样品台的倾斜调节。

22. 发明专利

JP2013210376A Silicon drift type x-ray detector 有权
标题翻译：硅类型X射线探测器
公开(公告)号：JP2013210376A
公开(公告)日：2013-10-10
申请号：JP2013100981
申请日：2013-05-13
申请人： Jeol Ltd , 日本電子株式会社
发明人： WATANABE TOSHIYOSHI , MIYATAKE KOJI
IPC分类号： G01T1/24 , G01N23/225 , H01J37/244
CPC分类号： H01J37/244 , G01T1/2928 , H01J37/252 , H01J2237/24415 , H01L31/115
摘要： PROBLEM TO BE SOLVED: To prevent an electron beam for irradiating a sample in a transmission electron microscope to which a silicon drift detector is attached from being influenced by a magnetic field generated from a Peltier element.SOLUTION: The silicon drift detector includes a heat conductor with a length determined based on a distance required for separating the Peltier element from an X-ray detection element between an electrode terminal plate of the silicon drift detector and the Peltier element in order to prevent influence of a magnetic field generated from the Peltier element on an electron beam of the transmission electron microscope.
摘要翻译：要解决的问题：为了防止在安装有硅漂移检测器的透射电子显微镜中照射样品的电子束受到由珀耳帖元件产生的磁场的影响。解决方案：硅漂移检测器包括热导体其长度根据在硅漂移检测器的电极端子板和珀耳帖元件之间分离珀耳帖元件与X射线检测元件所需的距离而确定，以防止由珀尔帖元件产生的磁场的影响透射电子显微镜的电子束。

23. 发明专利

JP2013152798A Electron beam apparatus 有权
标题翻译：电子束设备
公开(公告)号：JP2013152798A
公开(公告)日：2013-08-08
申请号：JP2012011911
申请日：2012-01-24
申请人： Jeol Ltd , 日本電子株式会社
发明人： KAZUMORI HIROYOSHI
IPC分类号： H01J37/252 , H01J37/244
摘要： PROBLEM TO BE SOLVED: To detect a characteristic X-ray from a sample well with high sensitivity, when performing X-ray analysis in the surface region of a sample, by decreasing the acceleration voltage of an electron beam and setting a short working distance.SOLUTION: The electron beam apparatus includes an electron beam source 1 for discharging an electron beam 20 toward a sample 11, an object lens 3 for focusing the electron beam 20 discharged from the electron beam source 1 on the sample 11, a deflector 4 for deflecting the electron beam 20, and an X-ray detector 7 for detecting a characteristic X-ray 22 generated from the sample 11 when it is irradiated with the electron beam 20. An X-ray condensing element 10 is disposed in the electron beam passing region 3b of the object lens 3 at an end on the side facing the sample 11, and the X-ray detector 7 is disposed at a position on the side opposite from the side where the sample 11 is located while holding the object lens 3 therebetween.
摘要翻译：要解决的问题：为了从样品的表面区域进行X射线分析，通过降低电子束的加速电压并设定短的工作距离，从高灵敏度的样品阱中检测特征X射线。解决方案：电子束装置包括用于向样品11放电电子束20的电子束源1，用于将从电子束源1排出的电子束20聚焦在样品11上的物镜3，用于偏转的偏转器4 电子束20和X射线检测器7，用于在用电子束20照射时检测从样品11产生的特征X射线22.X射线聚光元件10设置在电子束通过区域 3b的物体在面向样品11的一侧的端部，并且X射线检测器7设置在与样品11所在的一侧相对的一侧的位置处，同时将物镜3保持在其中 n。

24. 发明专利

JP2013127859A Test sample measuring instrument and test sample measuring instrument control method 审中-公开
标题翻译：测试样品测量仪器和测试样品测量仪器控制方法
公开(公告)号：JP2013127859A
公开(公告)日：2013-06-27
申请号：JP2011276211
申请日：2011-12-16
申请人： Nagoya Institute Of Technology , 国立大学法人名古屋工業大学 , Jeol Ltd , 日本電子株式会社
发明人： KAMIYA SHOJI , SATO TAKASHI , SHISHIDO NOBUYUKI , NOKUO TAKESHI , NAGASAWA TADAHIRO
IPC分类号： H01J37/28 , G01N23/225 , H01J37/20 , H01J37/22
摘要： PROBLEM TO BE SOLVED: To provide a test sample measuring instrument and a test sample measuring instrument control method which can accurately align the tip of an indenter with the measurement point of a test sample without relying on the skill of the user.SOLUTION: The movement amount of the tip of an indenter 20 on a scan image when the indenter 20 is tilted by a prescribed angle while the tip of the indenter 20 and an inclined axis TA are aligned on the scan image is found, and a distance L between the tip of the indenter 20 and the inclined axis TA is calculated on the basis of the movement amount thus found. The movement amount of the measurement point of a sample S on the scan image when the sample S is tilted by a prescribed angle while the measurement point of the sample S and the inclined axis TA are aligned on the scan image is found, and a distance m between the measurement point of the sample S and the inclined axis TA is calculated on the basis of the movement amount thus found. The tip of the indenter 20 and the measurement point of the sample S are aligned with each other on the basis of the distance L and the distance m.
摘要翻译：要解决的问题：提供测试样品测量仪器和测试样品测量仪器控制方法，其可以精确地将压头的尖端与测试样品的测量点精确对准，而不依赖于用户的技能。解决方案：发现当压头20的尖端和倾斜轴TA在扫描图像上对准时，当压头20倾斜指定角度时，压头20的尖端在扫描图像上的移动量，并且基于这样找到的移动量来计算压头20的尖端与倾斜轴线TA之间的距离L. 找到当样本S和倾斜轴TA的测量点在扫描图像上对准时样本S倾斜预定角度时的扫描图像上的样本S的测量点的移动量，并且距离基于这样求出的移动量来计算样本S的测量点与倾斜轴TA之间的m。基于距离L和距离m，压头20的前端和样本S的测量点彼此对准。版权所有（C）2013，JPO＆INPIT

25. 发明专利

JP2013118304A Charged particle beam lithography method and charged particle beam lithography device 审中-公开
标题翻译：充电颗粒光束光刻方法和充电颗粒光束光刻设备
公开(公告)号：JP2013118304A
公开(公告)日：2013-06-13
申请号：JP2011265492
申请日：2011-12-05
申请人： Jeol Ltd , 日本電子株式会社
发明人： FUSE RIKIE , KAWASE YUICHI , WAKATSUKI TETSUYOSHI
IPC分类号： H01L21/027 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To suppress a decrease in availability of a charged particle beam lithography device.SOLUTION: The charged particle beam lithography device is provided with means of performing proximity effect correction operation of an external processing device and shot division in advance, and then generating shot order correction value data in which proximity effect correction values by shots are arranged in order based upon shot division data and a result of the proximity effect correction operation.
摘要翻译：要解决的问题：抑制带电粒子束光刻装置的可用性的降低。带电粒子束光刻设备提供了预先执行外部处理设备的接近效应校正操作和镜头分割的装置，然后产生其中布置有接近效应校正值的镜头顺序校正值数据基于拍摄分割数据和邻近效果校正操作的结果。版权所有（C）2013，JPO＆INPIT

26. 发明专利

JP2013096900A Transmission electron microscope and observation method of transmission electron micrographic image 审中-公开
标题翻译：传输电子显微镜和透射电子显微镜图像观测方法
公开(公告)号：JP2013096900A
公开(公告)日：2013-05-20
申请号：JP2011241274
申请日：2011-11-02
申请人： Jeol Ltd , 日本電子株式会社
发明人： YAMAZAKI KAZUYA
IPC分类号： G01N23/201 , H01J37/26
CPC分类号： H01J37/22 , H01J37/26 , H01J2237/2802 , H01J2237/2804
摘要： PROBLEM TO BE SOLVED: To provide a transmission electron microscope in which influences of a magnetic field on a specimen can be reduced when observing a transmission electron micrographic image.SOLUTION: A transmission electron microscope 100 comprises: an electron beam source 2; an illumination lens 4; an objective lens 6; a second objective lens 8; a selected-area aperture 16; a projection lens 10; a detector 12; and a control section which controls at least the illumination lens 4, the second objective lens 8, and the projection lens 10. A first plane 17 is positioned between the second objective lens 8 and the projection lens 10, and the control section 22 performs first processing for controlling the illumination lens 4 to illuminate a specimen S with electron beams L, controlling the second objective lens 8 to image a diffraction pattern of the specimen S on the first plane 17, and controlling the projection lens 10 to form a transmission electron micrographic image of the specimen S imaged by the second objective lens 8 on a second plane (photo-detection section 13).
摘要翻译：要解决的问题：提供一种透射电子显微镜，其中当观察透射电子显微图像时，能够减小对试样的磁场的影响。透射电子显微镜100包括：电子束源2; 照明透镜4; 物镜6; 第二物镜8; 选择区域孔16; 投影透镜10; 检测器12; 以及至少控制照明透镜4，第二物镜8和投影透镜10的控制部。第一平面17位于第二物镜8和投影透镜10之间，控制部22首先进行用于控制照明透镜4以电子束L照射样本S的处理，控制第二物镜8以在第一平面17上成像样本S的衍射图案，并且控制投影透镜10以形成透射电子显微镜通过第二物镜8在第二平面（光检测部13）上成像的检体S的图像。版权所有（C）2013，JPO＆INPIT

27. 发明专利

JP2013044638A Image generation device, image generation method, and program 有权
标题翻译：图像生成装置，图像生成方法和程序
公开(公告)号：JP2013044638A
公开(公告)日：2013-03-04
申请号：JP2011182459
申请日：2011-08-24
申请人： Univ Of Electro-Communications , 国立大学法人電気通信大学 , Jeol Ltd , 日本電子株式会社
发明人： KOSAKA SHINICHI , TERAMOTO KANAE , KOIKE HIDEKI
IPC分类号： G01N27/62
CPC分类号： G06K9/00523 , G06F19/16 , G06F19/26 , G06K9/0055
摘要： PROBLEM TO BE SOLVED: To provide an image generation device which can facilitate analysis of a substance having repetition structure.SOLUTION: An image generation device 100 generates an image for analyzing a substance having repetition structure. The image generation device 100 comprises: an ionic strength data acquisition unit 11 for acquiring ionic strength data of a substance including information of ionic strength for a mass-to-charge ratio; mass information acquisition unit 12 for acquiring mass information in unit of repetition of the substance; an arrangement unit 13 for arranging the ionic strength data by predetermined range of the mass-to-charge ratio on the basis of mass information in unit of repetition of the substance; and an image generation unit 14 for generating an image on the basis of the arranged ionic strength data.
摘要翻译：要解决的问题：提供一种能够有助于分析具有重复结构的物质的图像生成装置。解决方案：图像生成装置100生成用于分析具有重复结构的物质的图像。图像产生装置100包括：离子强度数据获取单元11，用于获取包含质荷比的离子强度信息的物质的离子强度数据; 质量信息获取单元12，用于以物质的重复为单位获取质量信息; 排列单元13，用于基于质量信息以物质的重复为单位布置离子强度数据按质量比计的预定范围; 以及用于基于排列的离子强度数据生成图像的图像生成单元14。版权所有（C）2013，JPO＆INPIT

28. 发明专利

JP2013036528A Sliding device 审中-公开
标题翻译：滑动装置
公开(公告)号：JP2013036528A
公开(公告)日：2013-02-21
申请号：JP2011172669
申请日：2011-08-08
申请人： Jeol Ltd , 日本電子株式会社
发明人： YAMAMURA NOBUAKI , TAKIZAWA KENMEI
IPC分类号： F16C29/04
摘要： PROBLEM TO BE SOLVED: To suppress a large shift such as jumping out of a cage from a rail.SOLUTION: The sliding device includes: a pair of first guide rails each fixed to a fixation member and having a V-shaped groove extending in the length direction; a pair of second guide rails each mounted to a moving member in parallel with the pair of first guide rails and having a V-shaped groove opposing to the V-shaped groove of the first guide rail and extending in the length direction; and a plurality of rollers or balls held in the cage between the V-shaped grooves of the first guide rails and the V-shaped grooves of the second guide rails. Preload received by the roller or the ball arranged at a central portion of the cage due to nipping between the first and second guide rails is larger than that of the rollers or the balls arranged at both end of the cage.
摘要翻译：要解决的问题：抑制诸如从轨道跳出保持架的大的偏移。解决方案：滑动装置包括：一对第一导轨，每个第一导轨固定在固定构件上并具有在长度方向上延伸的V形槽; 一对第二导轨，每个第二导轨均与所述一对第一导轨平行地安装在移动构件上，并且具有与所述第一导轨的V形槽相对的V形槽，并且沿长度方向延伸; 以及保持在第一导轨的V形槽和第二导轨的V形槽之间的保持架中的多个辊或滚珠。由于由于夹在第一和第二导轨之间的夹持而布置在保持架的中心部分处的滚子或滚珠所承受的预载荷大于设置在保持架两端的滚子或滚珠的预载荷。版权所有（C）2013，JPO＆INPIT

29. 发明专利

JP2013016370A Transmission electron microscope, defocus amount adjustment method of transmission electron microscope, program, and information storage medium 有权
标题翻译：传输电子显微镜，偏移电子显微镜调整方法，程序和信息存储介质
公开(公告)号：JP2013016370A
公开(公告)日：2013-01-24
申请号：JP2011148887
申请日：2011-07-05
申请人： Jeol Ltd , 日本電子株式会社
发明人： NAKAMURA NATSUKO
IPC分类号： H01J37/21 , H01J37/22
摘要： PROBLEM TO BE SOLVED: To provide a transmission electron microscope, a defocus amount adjustment method, a program, and an information storage medium capable of precisely adjusting defocus amount.SOLUTION: The transmission electron microscope includes an image acquiring part 22 which acquires a transmission electron microscope image, a direction detecting part 24 which generates a Fourier transformation image by applying Fourier transformation on a first transmission electron microscope image that is acquired in such condition as an electron ray is not inclined, for detecting the direction in which a high frequency component increases in the Fourier transformation image, a control signal generation part 26 which generates a control signal for inclining the electron ray that is radiated on a sample in the detection direction, for outputting it to a deflector control device 5, and a defocus amount detecting part 28 which takes a correlation between the first transmission electron microscope image and a second transmission electron microscope image that is acquired under such condition as the electron ray is inclined in the detected direction, to acquire a displacement amount between the first and second transmission electron microscope images, thereby detecting a defocus amount based on the obtained displacement amount.
摘要翻译：要解决的问题：提供能够精确地调节散焦量的透射电子显微镜，散焦量调节方法，程序和信息存储介质。透射电子显微镜包括获取透射电子显微镜图像的图像获取部分22，通过对在其中获取的第一透射电子显微镜图像应用傅立叶变换来生成傅里叶变换图像的方向检测部分24 作为电子射线的条件不倾斜，为了检测傅里叶变换图像中高频分量增加的方向，控制信号产生部分26产生用于倾斜辐射在样品中的电子束的控制信号检测方向，将其输出到偏转器控制装置5;以及散焦量检测部28，其在第一透射电子显微镜图像与在电子束倾斜的条件下获取的第二透射电子显微镜图像之间存在相关性在检测方向上获取位移量b 在第一和第二透射电子显微镜图像之间，从而基于获得的位移量检测散焦量。版权所有（C）2013，JPO＆INPIT

30. 发明专利

JP2012255697A Dyeing agent for electron microscope observation, and dyeing method of sample for electron microscope observation 有权
标题翻译：用于电子显微镜观察的染色剂，以及用于电子显微镜观察的样品的染色方法
公开(公告)号：JP2012255697A
公开(公告)日：2012-12-27
申请号：JP2011128424
申请日：2011-06-08
申请人： Jeol Ltd , 日本電子株式会社
发明人： NAKAKOSHI MASAMICHI , NISHIOKA HIDEO
IPC分类号： G01N1/30 , G01N1/28
摘要： PROBLEM TO BE SOLVED: To provide a dyeing agent for electron microscope observation that is for easy electronic dyeing, and has high dyeing effect.SOLUTION: A dyeing agent for electron microscope observation contains cisplatin.

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