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    • 11. 发明专利
    • Substrate for semiconductor device and its manufacturing method
    • 半导体器件基板及其制造方法
    • JP2006269774A
    • 2006-10-05
    • JP2005086106
    • 2005-03-24
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • OTANI KATSUMIYOSHIDA TAKAYUKIYAGO MASATOSHISUZUKI HIROAKIFURUYA KEISUKE
    • H01L23/12
    • PROBLEM TO BE SOLVED: To adjust the electric characteristics of wiring without increasing the outer shape size of a semiconductor device.
      SOLUTION: For this substrate for the semiconductor device, linear wiring 6 is formed on one and the other surfaces of an insulation base material 1, and a semiconductor chip is loaded on the insulation base material 1. On the inner peripheral surface of a through-hole 2 passing through the insulation base material 1, helical wiring 3 electrically connecting the linear wiring 6 on one and the other surfaces is provided. Thus, an inductance without the need of a large wiring region is provided, and the substrate for the semiconductor device capable of controlling the electric characteristics of the semiconductor device for high frequency signals by the inductance without increasing the outer shape size is provided.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:在不增加半导体器件的外形尺寸的情况下调整布线的电特性。 解决方案:对于这种用于半导体器件的衬底,线性布线6形成在绝缘基底材料1的一个表面和另一个表面上,半导体芯片被装载在绝缘基底材料1上。在内周面 设置穿过绝缘基材1的通孔2,在一个面和另一个表面上电连接线性布线6的螺旋布线3。 因此,提供了不需要大布线区域的电感,并且提供了能够通过电感来控制用于高频信号的半导体器件的电特性而不增加外形尺寸的半导体器件用基板。 版权所有(C)2007,JPO&INPIT
    • 12. 发明专利
    • Semiconductor device and manufacturing method thereof
    • 半导体器件及其制造方法
    • JP2006261142A
    • 2006-09-28
    • JP2005072119
    • 2005-03-15
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • FURUYA KEISUKEYOSHIDA TAKAYUKISUZUKI HIROAKIOTANI KATSUMI
    • H01L23/12
    • H01L2224/16225H01L2224/48095H01L2224/49171H01L2924/15311H01L2924/181H01L2924/00014H01L2924/00012
    • PROBLEM TO BE SOLVED: To provide a small and highly reliable semiconductor device mounted with a semiconductor element with a number of pins. SOLUTION: In the semiconductor device, at least single set of semiconductor elements 2, 3 is mounted on one surface of a wiring board and external connection terminals such as solder balls 7 are formed on the other surface. In this device, the wiring board 1 is provided with a first wiring region 9 having a wiring patterns 5 connected to the semiconductor elements 2, 3 and the solder balls 7; a second wiring region 11 having pads 12 for electric characteristic test which is provided on the external periphery of the first wiring region 9 with a slit 10 sandwiched, and is electrically connected to the semiconductor elements 2, 3 on the same surface as the mounting surface of the semiconductor elements 2, 3. With this configuration, an electronic characteristic test can be executed for all terminals of the semiconductor elements 2, 3 via the solder balls 7 and the test pads 12. After the test, the second wiring region 11 may be removed. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供安装有具有多个引脚的半导体元件的小而高可靠性的半导体器件。 解决方案:在半导体器件中,至少一组半导体元件2,3安装在布线板的一个表面上,而在另一个表面上形成诸如焊球7的外部连接端子。 在该装置中,布线基板1具备:第一布线区域9,其具有与半导体元件2,3和焊球7连接的布线图案5; 第二布线区域11具有用于电特性测试的焊盘12,该第二布线区域11设置在第一布线区域9的外周上,其间夹有狭缝10,并且在与安装表面相同的表面上与半导体元件2,3电连接 通过这种结构,可以通过焊球7和测试焊盘12对半导体元件2,3的所有端子执行电子特性测试。在测试之后,第二布线区域11可以 被删除 版权所有(C)2006,JPO&NCIPI
    • 13. 发明专利
    • Semiconductor device and manufacturing method thereof
    • 半导体器件及其制造方法
    • JP2005317737A
    • 2005-11-10
    • JP2004133403
    • 2004-04-28
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • MATSUMOTO KATSUYOSHIYOSHIDA TAKAYUKIMATSUMURA KAZUHIKOKAINO NORIYUKIKAWABATA TAKESHI
    • H01L23/12H01L21/56H01L21/60
    • H01L2224/16225H01L2224/32225H01L2224/73204H01L2924/15311H01L2924/00
    • PROBLEM TO BE SOLVED: To prevent an electrode which is not electrically connected from being left when a semiconductor device is mounted on a flat motherboard as the curvature quantity of the semiconductor device increases. SOLUTION: The semiconductor device has an external terminal 5 for connection with an external circuit on one surface and the opposite-side surface of a semiconductor substrate 2 where a semiconductor element 1 is mounted. The semiconductor element 1 and one surface of the semiconductor substrate 2 are opposed to each other and electrically connected together through metal projections 7, underfill resin 4 is arranged between the semiconductor element 1 and semiconductor substrate 2, and resin layers 6 are provided on the opposite surface of the semiconductor substrate 2. Consequently, when thermal stress operates owing to temperature variation, curvature caused by the underfill resin 4 is generated in the opposite directions to the curvature caused by the resin layers 6 on the surface of the semiconductor substrate 2 where the external electrode 5 is present, thereby reducing the curvature quantity of the semiconductor device. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了防止半导体器件安装在平板母板上时没有电连接的电极留在半导体器件的曲率上增加。 解决方案:半导体器件具有外部端子5,用于与安装半导体元件1的半导体衬底2的一个表面上的外部电路和相对侧表面连接。 半导体元件1和半导体基板2的一个表面彼此相对并且通过金属突起7电连接在一起,底部填充树脂4被布置在半导体元件1和半导体基板2之间,树脂层6设置在相对的 因此,当由于温度变化而发生热应力时,由底部填充树脂4引起的曲率在与半导体衬底2的表面上的树脂层6所引起的曲率相反的方向上产生,其中 存在外部电极5,从而减小半导体器件的曲率。 版权所有(C)2006,JPO&NCIPI
    • 17. 发明专利
    • Semiconductor device and its manufacturing method
    • 半导体器件及其制造方法
    • JP2006024656A
    • 2006-01-26
    • JP2004199948
    • 2004-07-07
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • MATSUMURA KAZUHIKOYOSHIDA TAKAYUKI
    • H01L21/60
    • H01L24/73H01L2224/16225H01L2224/32225H01L2224/48091H01L2224/48227H01L2224/48465H01L2224/73204H01L2224/83102H01L2224/92125H01L2924/01019H01L2924/01029H01L2924/01079H01L2924/00014H01L2924/00H01L2924/00012
    • PROBLEM TO BE SOLVED: To provide a semiconductor device which will not have cracks or liftings, even if such a brittle material as a Low-k one is used for the insulation film of a semiconductor chip, and to provide its manufacturing method. SOLUTION: In the semiconductor device, the semiconductor chip 1 is mounted on a mount body, such as a substrate 5 formed with electrode patterns 6, and is fixed to the internal bottom face of a recessed support frame 10 by the back surface opposite from the electrode surface thereof. The end of the support frame 10 is fixed to the electrode surface of the substrate 5. Accordingly, solder bumps 4 formed on Al electrodes 2 of the semiconductor chip 1 and the corresponding electrode patterns 6 are arranged to face each other at a prescribed space apart from each other. The solder bumps 4 and electrode patterns 6, arranged facing each other, are electrically connected by an easily deformable conductive resin 11 arranged in the space in between. Since the solder bumps 4 and the electrode patterns 6 are electrically connected by the conductive resin 11, under a state such that the semiconductor chip 1 hangs in midair, stress generated in the connecting portions between the solder bumps 4 and the electrode patterns 6 due to thermal expansion and shrinkage of the substrate 5, etc. can be relaxed the deformation of the conductive resin 11, resulting in prevention of the concentration of stress in the periphery of the bumps and thereby preventing destruction due to stress of an insulation film 1a of the semiconductor chip 1. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了提供一种不会产生裂纹或提升的半导体器件,即使使用诸如Low-k的这种脆性材料用于半导体芯片的绝缘膜,并且提供其制造方法 。 解决方案:在半导体器件中,半导体芯片1安装在诸如形成有电极图案6的基板5的安装体上,并且通过背面固定到凹形支撑框架10的内底面 与其电极表面相对。 支撑框架10的端部被固定到基板5的电极表面。因此,形成在半导体芯片1的Al电极2上的焊料凸点4和相应的电极图案6被布置为以规定的间隔彼此面对 从彼此。 彼此相对配置的焊料凸块4和电极图案6通过布置在其间的空间中的容易变形的导电树脂11电连接。 由于焊锡凸块4和电极图案6通过导电树脂11电连接,所以在半导体芯片1悬空的状态下,由于焊料凸点4和电极图案6之间的连接部分产生的应力由于 可以缓和基板5等的热膨胀和收缩导致导电树脂11的变形,从而防止凸块周围的应力集中,从而防止由于绝缘膜1a的应力引起的破坏 半导体芯片1.版权所有(C)2006年,JPO&NCIPI
    • 18. 发明专利
    • Semiconductor device and electrode manufacturing method therefor
    • 半导体器件及其电极制造方法
    • JP2005260134A
    • 2005-09-22
    • JP2004072535
    • 2004-03-15
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • MATSUMURA KAZUHIKOYOSHIDA TAKAYUKIOCHI YUTAKAMIYAZAKI HIROYUKI
    • H01L21/60
    • H01L2224/11H01L2924/00012
    • PROBLEM TO BE SOLVED: To prevent a failure in the normal operation of a chip in which the failure occurs when contact resistance increases between a UBM (Under Barrier Metal) or a rewiring metal on the electrode of the semiconductor chip and an oxide film on the surface of an electrode.
      SOLUTION: A semiconductor device has a bump formed on the electrode of the semiconductor chip via the UBM, or on a metal wire that is formed on the electrode forming surface of the semiconductor chip and electrically connected to the electrode of the semiconductor chip. The semiconductor device also has a select circuit 21 which is on a line connecting the electrode of the signal terminal 20 of the semiconductor chip to a buffer circuit for a signal terminal, and connected to the GND or a power supply. A voltage higher than the breakdown voltage of the metal oxide film is applied to the metal oxide film of an electrode material which is formed in the interface between the electrode of the semiconductor chip and the UBM or the rewiring metal, to break the metal oxide film.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题为了防止在半导体芯片的电极上的UBM(障碍金属)或重新布线金属之间的接触电阻增加时发生故障的芯片的正常工作失败,以及氧化物 电极表面上的膜。 解决方案:半导体器件具有通过UBM形成在半导体芯片的电极上的凸块,或者形成在半导体芯片的电极形成表面上并电连接到半导体芯片的电极的金属线上 。 半导体器件还具有选择电路21,该电路21将半导体芯片的信号端子20的电极与信号端子的缓冲电路连接,并连接到GND或电源。 将高于金属氧化物膜的击穿电压的电压施加到形成在半导体芯片的电极与UBM或重新布线金属之间的界面中的电极材料的金属氧化物膜上,以破坏金属氧化物膜 。 版权所有(C)2005,JPO&NCIPI
    • 20. 发明专利
    • Semiconductor device and method for manufacturing the same
    • 半导体器件及其制造方法
    • JP2005033061A
    • 2005-02-03
    • JP2003271964
    • 2003-07-08
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • KAINO NORIYUKIYOSHIDA TAKAYUKIMATSUMURA KAZUHIKOMATSUMOTO KATSUYOSHIKAWABATA TAKESHI
    • H01L23/12H01L21/60
    • H01L2224/11
    • PROBLEM TO BE SOLVED: To provide a semiconductor device for realizing the pitch narrowing of wiring corresponding to high density mounting by an inexpensive means and to provide a method for manufacturing it. SOLUTION: A partial insulating resin layer 4 is provided with an insulating resin layer 4a in an upper layer formed so as to be extended from an insulating resin layer 4b in a lower layer. In an anisotropic deposition process, a portion 10 where metal is not deposited under the shadow of metallic irradiation is formed on resin just under the extended part of the upper layer resin so that an insulating distance can be arranged with a vertical wiring interval. Thus, it is possible to provide a semiconductor device constituted of narrow pitch and highly dense metallic wiring 7a without making it necessary to arrange any horizontal insulating distance between wiring. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供一种半导体器件,用于通过廉价的方法实现对应于高密度安装的布线的间距变窄,并提供其制造方法。 解决方案:部分绝缘树脂层4在上层中设置有绝缘树脂层4a,其形成为从下层中的绝缘树脂层4b延伸。 在各向异性沉积工艺中,在刚好在上层树脂的延伸部分的树脂上的树脂上形成在金属照射阴影下不沉积金属的部分10,使得可以以垂直布线间隔布置绝缘距离。 因此,可以提供由窄间距和高致密金属布线7a构成的半导体器件,而不需要在布线之间布置任何水平绝缘距离。 版权所有(C)2005,JPO&NCIPI