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11. 发明专利

JP2003077879A Substrate treatment equipment and substrate treatment method 有权
标题翻译：基板处理设备和基板处理方法
公开(公告)号：JP2003077879A
公开(公告)日：2003-03-14
申请号：JP2001268487
申请日：2001-09-05
申请人： Ebara Corp , 株式会社荏原製作所
发明人： SAITO TAKAYUKI , SUZUKI TSUKURU , MAKITA YUJI , YAMADA KAORU , SHIRAKASHI MICHIHIKO , ITO KENYA
IPC分类号： C25D17/00 , H01L21/00 , H01L21/304 , H01L21/306
CPC分类号： H01L21/6708 , H01L21/67051
摘要： PROBLEM TO BE SOLVED: To provide substrate treatment equipment where the treatment of the peripheral edge part of a substrate is enabled effectively while the substrate is protected by supplying a comparatively small amount of gas. SOLUTION: This substrate treatment equipment is provided with chuck parts 1a, 1b which hold and rotate a substrate W, a chamber 14 which can be hermetically sealed and accommodates the chuck parts 1a, 1d and in which gas inlet ports 9, 3a for introducing gas are formed, a treatment part 2 which etches or cleans the peripheral edge part of the substrate W while the substrate W is rotated by using the chuck parts 1a, 1d, and a first supplying path 3c which supplies first liquid to the treatment part 2.
摘要翻译：要解决的问题：提供一种基板处理设备，其中通过提供相对少量的气体保护基板，能够有效地实现基板的周边部分的处理。解决方案：该基板处理设备设置有夹持和旋转基板W的卡盘部分1a，1b，可以气密密封并容纳卡盘部分1a，1d的腔室14，其中用于引入气体的气体入口9,3a 形成有通过使用卡盘部1a，1d以及向处理部2供给第一液体的第一供给路径3c来蚀刻或清洗基板W的周缘部的处理部2。

12. 发明专利

JPH09328315A RECOVERY OF GERMANIUM 失效
公开(公告)号：JPH09328315A
公开(公告)日：1997-12-22
申请号：JP15912896
申请日：1996-05-31
申请人： EBARA CORP , ASAI GERMANIUM KENKYUSHO KK
发明人： NAGAI HIROSHI , SAITO TAKAYUKI , UCHIDA TAKASHI , ICHIMURA TAKASHI , TAKAHASHI YUKIO
IPC分类号： C02F1/02 , B09B3/00 , C01G17/02 , C08G63/82 , C08G63/86
摘要： PROBLEM TO BE SOLVED: To provide a method for economically recovering germanium used as a catalyst for producing polyethylene terephthalate in a reutilizable purity by using a simple apparatus. SOLUTION: This method for recovering germanium used as a catalyst from a waste rejected when producing polyethylene terephthalate or a polyester consisting essentially thereof comprises initially inicinerating the waste, then distilling the resultant ash with hydrochloric acid, recovering a condensate containing germanium tetrachloride, separating the germanium tetrachloride from the recovered condensate, hydrolyzing the prepared germanium tetrachloride and affording germanium dioxide. In the method, the obtained germanium dioxide can be roasted to remove impurities. The condensate after separating the germanium tetrachloride is reovered by circulation thereof and the resultant hydrolyzate after separating the germanium dioxide can be electrodialyzed to recover the germanium dioxide and hydrochloric acid.

13. 发明专利

JPH09210943A SENSING DEVICE FOR NEGATIVE ION IN WATER 失效
公开(公告)号：JPH09210943A
公开(公告)日：1997-08-15
申请号：JP16668596
申请日：1996-06-07
申请人： EBARA CORP
发明人： NAKATSU MASATO , NAKANISHI OSAMU , FUKUNAGA AKIRA , SAITO TAKAYUKI , NAGANAMI KANROKU
IPC分类号： G01N1/10 , G01M3/16 , G01M3/18 , G01N27/06 , G01N33/18
摘要： PROBLEM TO BE SOLVED: To provide a sensing device for negative ions in water, which can make accurate measurement by simple manipulation without requiring the replacement of ion exchange resin, etc., and which serves as a low-cost salt sensing device. SOLUTION: A negative ion sensing device concerned is furnished with a dealkalization chamber 4 which is located between the positive electrode chamber 1 and negative electrode chamber 2 of an electric continuous ion exchange device and filled with a cation exchange body partitioned by two cation exchange film 3. A water introducing path and a process water exhaust path are arranged in these chambers 1, 2, 4, and a measuring instrument 5 for the specific resistance or electroconductivity of the process water is installed on the process water exhaust path 11 leading from the dealkalization chamber 4. Cation exchange film(s) is provided between the positive electrode chamber and negative electrode chamber, and a measuring instrument for the specific resistance or electroconductivity of the process water is installed on the process water exhaust path leading from the positive electrode chamber.

14. 发明专利

JPH06106004A METHOD FOR REMOVING DISSOLVED OXYGEN 失效
公开(公告)号：JPH06106004A
公开(公告)日：1994-04-19
申请号：JP5876192
申请日：1992-02-13
申请人： EBARA INFILCO , EBARA CORP , EBARA RES CO LTD
发明人： KUBOTA YOKO , SAITO TAKAYUKI , NAKAJIMA TAKESHI
IPC分类号： B01D19/00 , C02F1/20 , C02F1/32 , C02F1/58
摘要： PURPOSE:To improve the mixed state of water with a mixed gas of hydrogen and an inert gas in equipment to increase the contact efficiency of hydrogen with oxygen and to efficiently remove dissolved oxygen in water by irradiating ultraviolet rays in the presence of bubbles of the mixed gas of hydrogen and the inert gas. CONSTITUTION:Water to be treated 14 is introduced into equipment from an inflow port 4 that is opened to the upper sidewall of equipment jacket 1. A mixed gas 16 of hydrogen and an inert gas (example: nitrogen) is introduced into a vessel from an inflow port 6 through a diffuser 7. While the water to be treated 14 and the mixed gas 16 are brought into countercurrent contact with each other, ultraviolet rays irradiates inside the vessel from UV lamps 2 inserted into synthetic quartz protecting tubes 3 to improve the mixed state of water with the mixed gas in the vessel, causing the contact efficiency of hydrogen with oxygen to be increased, allowing the dissolved oxygen in water to be efficiently removed, permitting the treated water to flow out from an outflow port 5. The outflow water is introduced into a mixed bed ion exchange column 12 by a pressurizing pump 17 and treated by an ultrafilter 13 to make it pure water 15. A hydrogen contg. gas that has been brought into contact with water is transferred to a purge vessel 9 through a purge pipe 8.

15. 发明专利

JPH05329470A CLEAN WATER PRODUCING DEVICE 失效
公开(公告)号：JPH05329470A
公开(公告)日：1993-12-14
申请号：JP16009192
申请日：1992-05-28
申请人： EBARA CORP
发明人： NAGAI HIROSHI , IKEDA YUKIO , SAITO TAKAYUKI
IPC分类号： C02F1/00 , B01D19/00 , C02F1/20 , C02F1/28 , C02F1/32 , C02F1/42 , C02F1/44 , C02F1/70 , C02F9/00
摘要： PURPOSE:To supply ultrapure water even to the remote point of use and to minimize the amt. of water to be returned from the point of use. CONSTITUTION:The pure water 3 from a primary pure water producing device 2 is further purified by a subsystem 4 to obtain ultrapure water 5, the ultrapure water is sent to the points of use 12p, 12q and 12r through a main supply pipe 6, etc., and the points of use 12p, 12q and 12r are connected to the subsystem 4 with a return pipe 15, etc., to constitute the clean water producing device. Further, an ultrapure water producing device 8 is provided close to the points of use 12p, 12q and 12r connected to the main supply pipe 6, etc., and the supply pipes 11p, 11q and 11r are respectively connected to the two or more points of use 12p, 12q and 12r from the device 8.

16. 发明专利

JPH05131120A ELECTRIC REGENERATION TYPE DESALTING APPARATUS 失效
公开(公告)号：JPH05131120A
公开(公告)日：1993-05-28
申请号：JP29589291
申请日：1991-11-12
申请人： JAPAN ATOMIC ENERGY RES INST , EBARA CORP
发明人： SUGO TAKANOBU , FUJIWARA KUNIO , KAWAZU HIDEO , SEKIGUCHI HIDEAKI , SAITO TAKAYUKI
IPC分类号： B01D61/48 , B01J43/00 , B01J47/12 , C02F1/469 , C08J5/20
摘要： PURPOSE:To keep stable water quality over a long time, to enable desalting treatment from small capacity to large capacity and to facilitate maintenance and control. CONSTITUTION:In an electric regeneration type desalting apparatus wherein the desalting chamber of an electrodyalizer is packed with an ion exchanger to remove an ion from a liquid, an amphoteric ion exchanger having both of a cation exchange group and an anion exchange group is used as the ion exchanger. The ion exchanger is produced by utilizing radiation graft polymerization. By this constitution, the scaling-up of the desalting apparatus, the simplification of a production process and the stabilization of treated water quality are achieved.

17. 发明专利

JPH0574415A ULTRAVIOLET LAMP 失效
公开(公告)号：JPH0574415A
公开(公告)日：1993-03-26
申请号：JP26139091
申请日：1991-09-13
申请人： EBARA INFILCO , EBARA CORP , EBARA RES CO LTD
发明人： ARIMITSU HIDENOBU , SAITO TAKAYUKI
IPC分类号： H01J61/20
摘要： PURPOSE:To remarkably increase the amount of radiation of ultraviolet of wavelength of not more than 200nm, by sealing As and/or Se in addition to Hg and noble gas, in an emission tube. CONSTITUTION:A pair of electrodes 21, 22 that are opposed to one another, are arranged in a quartz glass tube 1 transmitting ultraviolet rays of a short wavelength. The electrodes 21, 22 are connected to a power source 5 through a lighting device 4 with conductors 31, 32. Hg vapor of 10 -10 Torr, for example, and several Torr of Ar are sealed in the glass tube 1 so as to maintain a discharging condition, while the amounts of As as well as Se are not more than 30% of the amount of sealed Hg, and the ultraviolet rays of the wavelength of not more than 200nm can thus effectively be generated.

18. 发明专利

JPH0458528A CLEANING TREATMENT METHOD 失效
公开(公告)号：JPH0458528A
公开(公告)日：1992-02-25
申请号：JP16851090
申请日：1990-06-28
申请人： EBARA RES CO LTD , EBARA CORP , EBARA INFILCO
发明人： IWASE YOKO , SAITO TAKAYUKI , NAKAJIMA TAKESHI , SHIMA HIROYUKI
IPC分类号： B08B3/10 , H01L21/304
摘要： PURPOSE:To execute a cleaning treatment which can prevent the surface of a material to be treated such as a semiconductor wafer of the like from being oxidized spontaneously by a method wherein the material to be treated is irradiated with ultraviolet rays in a state that the material to be treated is immersed in water in which hydrogen has been dissolved. CONSTITUTION:Hydrogen 2 is dissolved in water from a water-supply port 1 via a gas-permeable film 4 in a hydrogen dissolution apparatus 3 on the upstream side of a cleaning treatment tank 5. A hydrogen-dissolving water supply port 6, an overflow mechanism 7, a drainage port 8, an ultraviolet light source 9 and a holding mechanism 10 of an object to be treated are fitted to at the cleaning treatment tank 5; and a single-wafer treatment is executed. A low- pressure mercury lamp is used as the ultraviolet light source 9 considering an irradiation wavelength or the like; light radiated from the low-pressure mercury lamp efficiently activates hydrogen in the water near the surface of the object to be treated; and a treatment by the activated hydrogen is executed efficiently. Thereby, it is possible to execute a cleaning treatment which can prevent the surface of the object to be treated such as a semiconductor wafer or the like from being oxidized spontaneously.

19. 发明专利

JPH03188988A METHOD AND APPARATUS FOR PURIFYING PURE WATER OR ULTRAPURE WATER 失效
公开(公告)号：JPH03188988A
公开(公告)日：1991-08-16
申请号：JP32713589
申请日：1989-12-19
申请人： EBARA RES CO LTD , EBARA INFILCO , EBARA CORP
发明人： SAITO TAKAYUKI , NAKAJIMA TAKESHI , IWASE YOKO , IKEDA YUKIO , SHIMA HIROYUKI
IPC分类号： B01D19/00 , B01D61/00 , C02F1/20 , C02F1/32 , C02F1/42 , C02F1/44 , C02F1/50 , C02F1/70 , C02F1/72 , C02F1/78 , C02F9/00
摘要： PURPOSE:To produce ultrapure water of higher purity by dissolving ozone or hydrogen peroxide in pure water or ultrapure water, irradiating this water with UV, further dissolving hydrogen, further irradiating the water with UV and carrying out treatment with a gas permeable membrane, etc. CONSTITUTION:Ozone or hydrogen peroxide is dissolved in pure water or ultrapure water, this water is irradiated with UV, gaseous hydrogen is further dissolved and the water is further irradiated with UV. The treated water is fed to one of chambers separated with a gas permeable membrane and the other is kept vacuum to degas the treated water. This water is then passed through an ion exchange resin bed composed of H type highly acidic cation exchange resin and OH type highly basic anion exchange resin and ultrafiltration is carried out to finally purify the pure water or ultrapure water. The gas permeable membrane is preferably a porous hydrophobic membrane of silicone rubber, etc., permeable to gases such as O2, N2, H2 and steam but impermeable to water.

20. 发明专利

JP2008198673A Compound electrolytic polishing apparatus 审中-公开
标题翻译：复合电解抛光装置
公开(公告)号：JP2008198673A
公开(公告)日：2008-08-28
申请号：JP2007029898
申请日：2007-02-09
申请人： Ebara Corp , 株式会社荏原製作所
发明人： TAIMA YASUSHI , SUZUKI TSUKURU , KODERA AKIRA , MAKITA YUJI , OBATA ITSUKI , SAITO TAKAYUKI
IPC分类号： H01L21/304 , B23H5/08 , B24B37/00 , B24B53/017
摘要： PROBLEM TO BE SOLVED: To uniformly supply electricity to the surface of a conductive film such as a copper film or the like and reduce a variance of potential distribution on the surface of the conductive film without damaging it, and make it possible to supply electricity to the conductive film in high reliability and conduct compound electrolytic polishing even if a rotary method is adopted. SOLUTION: The compound electrolytic polishing apparatus is provided with a polishing table 100 that has a first electrode 254 connected with one pole of power supply 252 and holds a conductive polishing pad 101; a polishing head 1 that holds a workpiece W by surrounding the outer periphery of the workpiece W having a conductive film with a retainer ring 3 and presses the workpiece W to the polishing face of the polishing pad; a second electrode 264 that is connected with the other pole of the power supply fitted to the opposite surface to the polishing pad of the retainer ring and is in contact with the polishing pad so as to supply electricity to the conductive film of the workpiece through the polishing pad; an electrolyte supply part to supply an electrolyte to the polishing surface of the polishing pad; and a moving mechanism to relatively move the polishing pad and the workpiece held by the polishing head. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了均匀地向诸如铜膜等的导电膜的表面供电，并且减小导电膜的表面上的电位分布的变化而不损坏导电膜，并且使得可以以高可靠性向导电膜供电，即使采用旋转法也可进行复合电解抛光。复合电解抛光装置具有：研磨台100，其具有与电源252的一极连接的第一电极254，并保持导电性抛光垫101; 抛光头1，其通过用具有保持环3围绕具有导电膜的工件W的外周来保持工件W，并将工件W按压到抛光垫的抛光面; 与电源的另一极连接的第二电极264，该另一极与安装在保持环的抛光垫相反的表面上，与抛光垫接触，以便通过该工件的导电膜向该导电膜供电抛光垫; 电解质供给部，其向所述研磨垫的研磨面供给电解质; 以及用于相对移动抛光垫和由抛光头保持的工件的移动机构。版权所有（C）2008，JPO＆INPIT

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