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    • 12. 发明专利
    • Antireflection film
    • 抗反射膜
    • JP2006154837A
    • 2006-06-15
    • JP2005359390
    • 2005-12-13
    • Dainippon Printing Co Ltd大日本印刷株式会社
    • NAKAMURA NORINAGAYAMASHITA NATSUKOOTA YURIEOKA MOTOHIRO
    • G02B1/11B32B7/02B32B27/20G02B5/30G02F1/1335
    • PROBLEM TO BE SOLVED: To provide an antireflection film which can be easily manufactured, gives a hard performance such as scratch resistance and weatherability to the uppermost layer of the antireflection film and can prevent the occurrence of cracking on the uppermost layer even for a deformation of a transparent plastic substrate film. SOLUTION: In the antireflection film, a low refractive index layer 3 essentially consisting of ionizing radiation curable resin composition which includes superfine particles having particle diameter of ≥5 nm and ≤50 nm and refractive index of ≥1.35 and ≤1.45 is formed directly or via other layer on the transparent plastic substrate film 1 as the surface layer. Therein, the low refractive index layer 3 has a refractive index lower than the refractive index of the under layer with which the low refractive index layer 3 is in contact directly and the low refractive index layer 3 is constituted such that the superfine particles are included by ≥30 pts.wt. and ≤300 pts.wt. with respect to ionizing radiation curable resin 100 pts.wt. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了提供可以容易地制造的抗反射膜,对防反射膜的最上层提供耐划伤性和耐候性等硬性,并且能够防止在最上层发生龟裂,即使 透明塑料基材薄膜的变形。 解决方案:在防反射膜中,形成基本上由电离辐射固化树脂组合物组成的低折射率层3,其包括粒径为≥5nm和≤50nm的超细颗粒,折射率为≥1.35和≤1.45。 直接或经由作为表面层的透明塑料基材膜1上的其它层。 其中,低折射率层3的折射率低于低折射率层3直接接触的下层的折射率,低折射率层3构成为超细颗粒包含在 ≥30重量 和≤300pts.wt 相对于电离辐射固化树脂100重量份 版权所有(C)2006,JPO&NCIPI