专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明专利

JP2010192879A Silicon wafer cleaning agent 有权
标题翻译：硅胶清洗剂
公开(公告)号：JP2010192879A
公开(公告)日：2010-09-02
申请号：JP2009293953
申请日：2009-12-25
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： KUMON SOICHI , SAITO MASANORI , SAIO TAKASHI , NANAI HIDETOSHI , AKAMATSU YOSHINORI
IPC分类号： H01L21/304 , C11D7/22 , C11D7/28 , C11D7/32 , C11D7/50 , C11D17/08
摘要： PROBLEM TO BE SOLVED: To provide a silicon wafer cleaning agent for improving a cleaning process easily inducing a pattern collapse in a method for manufacturing a silicon wafer having a fine uneven pattern on the surface. SOLUTION: The silicon wafer cleaning agent includes at least a water-based cleaning liquid, and a water-repellent cleaning liquid for making water-repellent at least the recessed portions of an uneven pattern during a cleaning process. The water-repellent cleaning liquid is a liquid mixedly containing a water-repellent compound which contains a reactive moiety which can chemically bind with Si in the silicon wafer and a hydrophobic group, and an organic solvent containing a nitrogen-containing compound solvent. The water-repellent compound is mixedly contained at 0.1-50 mass% to the total quantity of 100 mass% of the water-repellent cleaning liquid. Furthermore, in the nitrogen-containing compound solvent, an element bound to nitrogen is carbon. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种硅晶片清洗剂，用于改善在表面上具有微细凹凸图案的制造硅晶片的方法中容易引起图案塌陷的清洁过程。解决方案：在清洗过程中，硅晶片清洗剂至少含有一种水基清洗液和至少具有不均匀图案的凹陷部分至少具有疏水性的防水清洗液。防水清洗液是混合含有防水化合物的液体，该防水化合物含有与硅晶片中的Si化学结合的反应性部分和疏水基团，以及含有含氮化合物溶剂的有机溶剂。斥水性化合物与斥水性清洗液的总量为100质量％混合含有0.1-50质量％。此外，在含氮化合物溶剂中，与氮结合的元素是碳。版权所有（C）2010，JPO＆INPIT

12. 发明专利

JP2009297626A Method for forming silica-based coating film and coating liquid 审中-公开
标题翻译：形成二氧化硅涂层膜和涂层液的方法
公开(公告)号：JP2009297626A
公开(公告)日：2009-12-24
申请号：JP2008153640
申请日：2008-06-12
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： KUMON SOICHI , SAIO TAKASHI , AKAMATSU YOSHINORI
IPC分类号： B05D7/24 , C03C17/25 , C09D1/00 , C09D1/04 , C09D183/02 , C09D183/04 , C09D183/06
摘要： PROBLEM TO BE SOLVED: To provide a method which for increasing the efficiency of a method of producing a silica-based coating film by an inkjet coating method by improving a coating liquid so as to suppress generation of clogging in a discharge port. SOLUTION: The coating liquid includes 8-40 wt.% of a solid and a solvent as the balance. The solvent comprises an organic solvent having a boiling point of 130°C or more and an aqueous acid solution. The solid contains a silicon oxide oligomer obtained by hydrolyzing and polycondensing a trialkoxysilane and a tetraalkoxysilane in the solvent containing the aqueous acid solution. The silicon oxide oligomer has a weight average molecular weight of 500-50,000 in terms of polystyrene. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决方案：提供一种通过改进涂布液以提高喷墨涂布法生产二氧化硅基涂膜的方法的效率以抑制排出口堵塞的产生的方法。溶液：涂布液包含8-40重量％的固体和作为余量的溶剂。溶剂包含沸点为130℃以上的有机溶剂和酸水溶液。固体含有通过在含有酸性水溶液的溶剂中水解和缩聚三烷氧基硅烷和四烷氧基硅烷而获得的氧化硅低聚物。氧化硅低聚物的聚苯乙烯换算重均分子量为500〜500,000。版权所有（C）2010，JPO＆INPIT

13. 发明专利

JP2009256432A Preservation method for urethane resin precursor chemical 审中-公开
标题翻译： URETHANE RESIN前体化学品的保存方法
公开(公告)号：JP2009256432A
公开(公告)日：2009-11-05
申请号：JP2008105482
申请日：2008-04-15
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： NOMURA TAKUSHI , HAMAGUCHI SHIGEO , AKAMATSU YOSHINORI
IPC分类号： C08G18/40 , C09K3/18
摘要： PROBLEM TO BE SOLVED: To provide a method for preserving a urethane resin precursor chemical containing an isocyanate compound and a polyol used in synthesis of the urethane resin preferable for forming the urethane resin precursor chemical containing the isocyanate compound and the polyol used in the synthesis of the urethane resin, in particular, on a transparent substrate as a thin film to make an anti-fog cover film for a long period of time.
SOLUTION: In the preservation method for the urethane resin precursor chemical, the liquid containing the isocyanate compound and the polyol as the urethan resin precursor chemical for forming the anti-fog cover film comprising the urethane resin on the transparent substrate is preserved in the state of 20°C or lower.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决问题的方法：提供一种保存聚氨酯树脂前体化学品的方法，所述化学品含有用于合成聚氨酯树脂的异氰酸酯化合物和多元醇，优选用于形成含有异氰酸酯化合物的聚氨酯树脂前体化学品和用于特别是在作为薄膜的透明基板上合成聚氨酯树脂，以长时间形成防雾覆盖膜。解决方案：在聚氨酯树脂前体化学品的保存方法中，将含有异氰酸酯化合物的液体和作为用于形成在透明基材上的聚氨酯树脂的防雾覆盖膜的聚氨酯树脂前体化学品的多元醇保存在状态为20°C以下。版权所有（C）2010，JPO＆INPIT

14. 发明专利

JP2006290923A Method for producing waterdrop slidable article 有权
标题翻译：生产水滑动物品的方法
公开(公告)号：JP2006290923A
公开(公告)日：2006-10-26
申请号：JP2005109348
申请日：2005-04-06
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： SAITO MASANORI , HAMAGUCHI SHIGEO , AKAMATSU YOSHINORI
IPC分类号： C09K3/18 , B05D7/24 , C03C17/30 , C09D183/02 , C09D183/08 , C09D183/16
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a droplet slidable article having excellent droplet sliding property, mud water polishing resistance and light resistance. SOLUTION: The method for producing a droplet slidable article comprises a process for coating a substrate with a solution having a silicon compound containing four functional groups, binding the silicon compound with the substrate and forming a primer layer provided with a silanol group derived from the silicon compound and a process for forming a waterdrop slidable coating film, with which the primer layer is coated with a treatment agent obtained by mixing a straight-chain polydimethylsiloxane that has at least two or three hydrolyzable functional groups only at one terminal and 20-50 average repeating unit number of dimethylsiloxane units (Si(CH 3 ) 2 O) (1.3-1.7 by common logarithm) with a fluoroalkylsilane that has a hydrolyzable functional group and 1-12 fluorocarbon units (CF 2 or CF 3 ) and a solution containing an organic solvent, an acid and water and the coating film is solidified. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有优异的液滴滑动性，耐泥水抛光性和耐光性的液滴滑动制品的制造方法。解决方案：用于制造液滴可滑动制品的方法包括用具有含有四个官能团的硅化合物的溶液涂覆基材的方法，将硅化合物与基材结合并形成提供有硅烷醇基团的底漆层从硅化合物和形成水滴滑动涂膜的方法，用底涂层涂覆通过混合仅在一个末端具有至少两个或三个可水解官能团的直链聚二甲基硅氧烷获得的处理剂和20个 -50具有可水解官能团的氟代烷基硅烷的平均重复单元数（Si（CH 3 SB 3）SB SB 2 O 2）（1.3-1.7） 1-12碳氟化合物单元（CF 2 或CF 3 ），并将含有有机溶剂，酸和水的溶液和涂膜固化。版权所有（C）2007，JPO＆INPIT

15. 发明专利

JP2004323250A Method of forming droplet slidable filming and coating liquid for forming droplet slidable coating film 有权
公开(公告)号：JP2004323250A
公开(公告)日：2004-11-18
申请号：JP2003116153
申请日：2003-04-21
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： KUMON SOICHI , HATANAKA KANAME , AKAMATSU YOSHINORI , HAMAGUCHI SHIGEO , KURAMASU HARUKI , ARAI HIROAKI
IPC分类号： C03C17/30
摘要： PROBLEM TO BE SOLVED: To provide a method of forming a droplet slidable filmings useful for a glass for vehicle or a glass for building and having high water droplet slipping and falling down property.
SOLUTION: The method of forming a droplet slidable coating film has a process for adding water and an acid catalyst into a solution consisting of 3 components of alkoxy silane, alkoxyl group terminated dimethyl silicone and fluoroalkyl silane and an organic solvent to hydrolyze and condensation-polymerize 3 components simultaneously to prepare a pre-coating liquid. The concentration of alkoxyl silane in the hydrolysis and poly-condensation is 0.1-0.8 mol/kg to total quantity of 3 components, the organic solvent, water and the acid catalyst.
COPYRIGHT: (C)2005,JPO&NCIPI

16. 发明专利

JP2004203632A Sol-gel film having convex, concave or irregular surface shape, its manufacturing method and coating liquid 有权
公开(公告)号：JP2004203632A
公开(公告)日：2004-07-22
申请号：JP2002371414
申请日：2002-12-24
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： KUMON SOICHI , AKAMATSU YOSHINORI
IPC分类号： C03C17/30 , C09D1/00 , C09D183/02 , C09D183/04
摘要： PROBLEM TO BE SOLVED: To provide a sol-gel film which has a high strength, has a convex, concave, or irregular surface shape controllable as desired, and can be applied to various functional films.
SOLUTION: The sol-gel film is made of a composition comprising a silica and a dimethyl silicone derivative and has the convex, concave, or irregular surface. The dimethyl silicone derivative has an average degree of polymerization of 5-2,000. A coating liquid for forming the sol-gel film is provided which comprises a solvent, a silica sol, and an alkoxyl-terminated dimethyl silicone derivative having an average degree of polymerization of 5-2,000.
COPYRIGHT: (C)2004,JPO&NCIPI

17. 发明专利

JP2004122106A High droplet slidable coat and method for forming the same 有权
公开(公告)号：JP2004122106A
公开(公告)日：2004-04-22
申请号：JP2003113085
申请日：2003-04-17
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： AKAMATSU YOSHINORI , KUMON SOICHI , HATANAKA KANAME , KURAMASU HARUKI , ARAI HIROAKI , HAMAGUCHI SHIGEO
IPC分类号： B05D7/24 , B05D7/00 , C03C17/30
摘要： PROBLEM TO BE SOLVED: To provide a high droplet slidable coat having muddy-water-abrasion resistance suitable for use in especially a window glass of a vehicle, an excellent abrasion resistance against a wiper or the like, high water repellency and an excellent droplet slidable property (waterdrop slipping property).
SOLUTION: The high droplet slidable coat is formed by coating a substrate with a coating liquid obtained by mixing an alkoxy group-terminated dimethyl silicone with a fluoroalkylsilane in a silica matrix. The coat is formed by mixing the alkoxy group terminated dimethyl silicone with a silica sol to be the silica matrix at a ratio of 0.1-10wt% of the silicone to the silica sol in terms of silica.
COPYRIGHT: (C)2004,JPO

18. 发明专利

JP2003026448A Sol-gel film and method for manufacturing the same 有权
标题翻译：溶胶凝胶膜及其制造方法
公开(公告)号：JP2003026448A
公开(公告)日：2003-01-29
申请号：JP2001212956
申请日：2001-07-13
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： AKAMATSU YOSHINORI , KUMON SOICHI
IPC分类号： B60J1/00 , C03C17/30 , C09K3/18
摘要： PROBLEM TO BE SOLVED: To easily form a high-strength film with a uniform pit-like or projecting and recessing surface shape, at a lower temperature.
SOLUTION: A substrate surface is coated with a mixed sol consisting of a silica sol obtained by hydrolyzing and polycondensing an alkoxysilane as a matrix component of a coating film and a silane-reacted dimethylsilicone which is a reaction composition produced by urethane bonding a dimethylsilicone with terminal silanols having ≤200 average degree of polymerization to an isocyanate group containing organoalkoxysilane (the number of alkoxy groups being 1-3, the number of methylene groups connecting terminal isocyanate groups and Si being 0-5).
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：在较低温度下容易地形成具有均匀凹坑状或凸出和凹陷表面形状的高强度膜。解决方案：将基板表面涂布在由作为涂膜的基体成分的烷氧基硅烷水解缩聚得到的硅溶胶和由二甲基硅氧烷与末端氨基甲酸酯键合而成的反应组合物的硅烷反应的二甲基硅氧烷所组成的混合溶胶中具有与异氰酸酯基的有机烷氧基硅烷具有<= 200平均聚合度的硅烷醇（烷氧基的数量为1-3，连接末端异氰酸酯基团的亚甲基的数目和Si为0-5）。

19. 发明专利

JP2013118347A Cleaning method of wafer 审中-公开
标题翻译：清洗方法
公开(公告)号：JP2013118347A
公开(公告)日：2013-06-13
申请号：JP2011274084
申请日：2011-12-15
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： KUMON SOICHI , SAIO TAKASHI , ARATA SHINOBU , SAITO MASANORI , NANAI HIDETOSHI , AKAMATSU YOSHINORI
IPC分类号： H01L21/304
CPC分类号： H01L21/02057 , C11D3/162 , C11D11/0047
摘要： PROBLEM TO BE SOLVED: To provide a cleaning method to improve a cleaning step easily inducing pattern collapse in a manufacturing method of a wafer having an uneven pattern on the surface.SOLUTION: A cleaning method of a wafer having an uneven pattern on the surface comprises at least the steps of: cleaning the wafer with a cleaning liquid; replacing the cleaning liquid kept in a recess part of the wafer after cleaning with a water-repellent chemical liquid; and drying the wafer, where the cleaning liquid comprises 80 mass% or more of a solvent having a boiling-point of 55 to 200°C, and in the replacing step, the temperature of the water-repellent chemical liquid is 40°C or more and below the boiling-point of the water-repellent chemical liquid, for water-repelling of at least the recess part surface.
摘要翻译：要解决的问题：提供一种清洁方法，以改善在表面上具有不均匀图案的晶片的制造方法中容易引起图案塌陷的清洁步骤。解决方案：表面上具有不均匀图案的晶片的清洁方法至少包括以下步骤：用清洗液清洗晶片; 在用憎水化学液体清洗后，更换保存在晶片的凹部内的清洗液; 并干燥晶片，其中清洗液体包含沸点为55-200℃的溶剂的80质量％以上，在替代工序中，防水化学液的温度为40℃，更多和低于防水化学液体的沸点，用于至少凹陷部分表面的排斥。版权所有（C）2013，JPO＆INPIT

20. 发明专利

JP2012009802A Chemical liquid for protective film formation 有权
标题翻译：化学液体用于保护膜形成
公开(公告)号：JP2012009802A
公开(公告)日：2012-01-12
申请号：JP2010228652
申请日：2010-10-08
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： SAITO MASANORI , ARATA SHINOBU , SAIO TAKASHI , KUMON SOICHI , NANAI HIDETOSHI , AKAMATSU YOSHINORI
IPC分类号： H01L21/304 , C11D1/40
CPC分类号： H01L21/02068 , C11D1/002 , C11D1/004 , C11D1/04 , C11D1/40 , C11D11/0047 , H01L21/02057 , H01L21/0212 , H01L21/027 , H01L21/306 , H01L21/31127
摘要： PROBLEM TO BE SOLVED: To provide chemical liquid for protective film formation, in a semiconductor device manufacturing, improving a washing step in which pattern collapse of a wafer including at least one kind of material selected from a group consisted of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium, and silicon in at least part of fine irregular pattern of the surface tends to be induced.SOLUTION: There is provided chemical liquid for water-repellent protective film formation of a wafer, which is formed with fine irregular pattern on the surface, including water-repellent protective film formation agent for forming water-repellent protective film on at least surfaces of the recessed parts in washing the wafer. The wafer has at least one kind of material selected from a group consisted of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium, and silicon in at least part of the surfaces of the recessed parts of the irregular pattern. The water-repellent protective film formation agent is water insoluble surface active agent.
摘要翻译：要解决的问题：为了提供用于保护膜形成的化学液体，在半导体器件制造中，改进洗涤步骤，其中包括至少一种选自钛，钛，钛，氮化物，钨，铝，铜，锡，氮化钽，钌和硅中的至少一部分细微的不规则图案倾向于被诱导。
解决方案：提供了用于防水保护膜形成的化学液体，其在表面上形成有细微不规则图案，包括至少形成防水保护膜的防水保护膜形成剂在洗涤晶片时凹部的表面。在不规则图案的凹部的至少一部分表面中，晶片具有选自由钛，氮化钛，钨，铝，铜，锡，氮化钽，钌和硅组成的组中的至少一种材料。防水保护膜形成剂是水不溶性表面活性剂。版权所有（C）2012，JPO＆INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式