专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JPH0721957A ELECTRON BEAM EXCITING ION IRRADIATION DEVICE 失效
公开(公告)号：JPH0721957A
公开(公告)日：1995-01-24
申请号：JP8109594
申请日：1994-03-29
申请人： RIKAGAKU KENKYUSHO , KAWASAKI HEAVY IND LTD
发明人： HARA TAMIO , HAMAGAKI MANABU , AOYANAGI KATSUNOBU , TOKAI MASAKUNI , YAMADA TAKESHI , RIYUUJI MAKOTO , HIROSHIMA YASUSHI
IPC分类号： C23F4/00 , H01J27/20 , H01J37/08 , H01J37/305 , H01L21/302 , H01L21/3065
摘要： PURPOSE:To provide an electron beam exciting ion irradiation device in which irradiation amount of electron beams supplied to an electron gun to a target specimen and energy are restrained, current density of ions is increased, kinetic energy of ions is restrained, and dry itching with a high selection ratio can be raced according to design. CONSTITUTION:An ion plasma 19' in a reaction chamber of an ion generation region is formed in a reverse L-shape, electron beam irradiation energy and its amount are restrained, enfluence of a magnetic field on target specimen 16 is decreased, current density of ions is increased, and kinetic energy of ions is restrained, and dry itching of the target specimen 16 is conducted at high speed and in a high selection ratio according to design. Current density of ions 4 irradiated to the target specimen 16 is increased and the kinetic energy is restrained, dry etching with high selection ratio is correctly conducted, ion plasma is uniformized and completely utilized, and a throughput is increased.

2. 发明专利

JPH06280058A DEVICE FOR GENERATING ION PLASMA EXCITED BY ELECTRON BEAM 失效
公开(公告)号：JPH06280058A
公开(公告)日：1994-10-04
申请号：JP9185193
申请日：1993-03-29
申请人： RIKAGAKU KENKYUSHO , KAWASAKI HEAVY IND LTD
发明人： HARA TAMIO , HAMAGAKI MANABU , TOKAI MASAKUNI , YAMADA TAKESHI , RIYUUJI MAKOTO , HIROSHIMA YASUSHI
IPC分类号： C23F4/00 , G21K5/08 , H01J27/20 , H01J37/08 , H01J37/32 , H01L21/302 , H05H1/24
摘要： PURPOSE:To adjust the plasma distribution in the ion forming region of the device for generating the ion plasma excited by electron beams so as to uniformalize the distribution over a wide area. CONSTITUTION:The plasma 19' in the ion forming region 10 is adjusted to the uniformly distributed state over the large area in the transverse direction and also to the distributed density as uniform as possible in, the longitudinal direction, thereby, the adequate construction and arrangement of multipole magnets 16', 16'' are enabled, magnetic fields are thus put into an optimum forming state so that the back multipoles 20' are omitted, and a reverse magnetic field coil 17' is made freely movable in the longitudinal direction, and in addition, the incidence of the electron beams are made plural by disposing electron beam sources in plural positions. The high-density plasma is formed uniformly in the large area in the ion forming region 10 more efficiently than heretofore. Fine dry etching as designed is executed at a high speed with high accuracy in the state of maintaining a high selection ratio of a target sample 14 to a mask material and a substrate material to be etched.

3. 发明专利

JPH06283123A ELECTRON BEAM EXCITATION PLASMA GENERATING DEVICE 失效
公开(公告)号：JPH06283123A
公开(公告)日：1994-10-07
申请号：JP9185093
申请日：1993-03-29
申请人： RIKAGAKU KENKYUSHO , KAWASAKI HEAVY IND LTD
发明人： HARA TAMIO , HAMAGAKI MANABU , YAMADA TAKESHI , ONISHI MASARU , HASEGAWA TAKESHI
IPC分类号： C23F4/00 , G21K5/08 , H01J27/20 , H01J37/08 , H01J37/305 , H01J37/32 , H01L21/302 , H05H1/24
摘要： PURPOSE:To prevent the contamination of an electron beam excitation plasma generating device for fine dry etching and improve the product reliability of a silicone wafer. CONSTITUTION:A high-frequency induction coil 16 is wound on the outside of a discharge tube in the discharge region 2, a high frequency of 13.56MHz is applied, and the gas fed from a port 3 is ionized to form plasma. An electron beam in the plasma is accelerated by an anode 8 in the acceleration region 9 and guided to the plasma generation region 10, the chlorine gas fed into the plasma generation region 10 is ionized, and the ions are radiated to the target sample 14 of a silicone wafer held by a holder 13. When the prescribed fine dry etching is applied, no particles of lanthanum or boron are generated by an electrode-less discharge device 20 in the discharge region 2 unlike the filament of the conventional heated cathode electrode, and the contamination via the dry etching by spattering is prevented.

4. 发明专利

JPH0628991A ELECTRON BEAM EXCITING ION IRRADIATION DEVICE 失效
公开(公告)号：JPH0628991A
公开(公告)日：1994-02-04
申请号：JP27496091
申请日：1991-09-27
申请人： RIKAGAKU KENKYUSHO , KAWASAKI HEAVY IND LTD
发明人： HARA TAMIO , HAMAGAKI MANABU , AOYANAGI KATSUNOBU , YAMADA TAKESHI , RIYUUJI MAKOTO , TOKAI MASAKUNI , KAJIYAMA YOUSUKE
IPC分类号： G21C5/04 , H01J27/20 , H01J37/08 , H01J37/30
摘要： PURPOSE:To generate an ion beam, having a uniform and large current density in a large aperture, by lowering ion energy with the collision of electrons to a specimen such as a wafer prevented in a low energy region in electron beam excitation plasma. CONSTITUTION:In an electron beam excitation ion irradiation device, a cathode 1, an acceleration passive electrode 2 doubling as an anode, an acceleration positive electrode 3, and a specimen installation part 4 are aligned in this order, and a magnetism shutter 21 is installed in this side of the specimen installation part 4. This can make low irradiation ion energy, capable of restraining an electron component, colliding with the surface of a specimen 18 with large kinetic energy, to allow fine dry etching without imparting damage to the specimen 18. Resultingly, reliability for product accuracy can be improved.

5. 发明专利

JPH11271820A Method and device for wavelength conversion using nonlinear optical element, and laser system 失效
标题翻译：使用非线性光学元件和激光系统进行波长转换的方法和装置
公开(公告)号：JPH11271820A
公开(公告)日：1999-10-08
申请号：JP7613998
申请日：1998-03-24
申请人： Nidek Co Ltd , Rikagaku Kenkyusho , 株式会社ニデック , 理化学研究所
发明人： TASHIRO HIDEO , WADA TOMOYUKI , YAMADA TAKESHI
IPC分类号： G02F1/35 , G02F1/37
CPC分类号： G02F1/3501 , G02F2001/3505
摘要： PROBLEM TO BE SOLVED: To stably maintain wavelength conversion characteristics of nonlinear optical crystal for a long period by making laser light incident on cerium lithium borate crystal arranged under a vacuum and performing wavelength conversion.
SOLUTION: The nonlinear optical crystal 12 as a wavelength converting element such as cerium lithium borate crystal is arranged in a metallic vacuum container 11, made of stainless steel, in the wavelength converting device 10. A light beam enters the vacuum container 11 through its input-side optical window 13a having specific transmissivity and has its wavelength converted by interacting with the nonlinear optical crystal 12 and is emitted from the output-side optical window 13b. For the optical windows 13a and 13b, quartz, etc., having no light absorption in a wavelength range of 200 to 3,000 nm is used. A vacuum sealing valve 14 is provided to the upper part of the vacuum container 11. The part formed of the main body of the vacuum container 11, optical windows 13a and 13b, and vacuum sealing valve 14 is sealed with O rings 15a, 15b, and 15c and a vacuum of about 10
0 to 10
2 Torr is held in the vacuum container 11.
COPYRIGHT: (C)1999,JPO
摘要翻译：要解决的问题：通过使入射在真空下布置的硼酸铈锂晶体上进行激光并进行波长转换，来长时间稳定地保持非线性光学晶体的波长转换特性。解决方案：作为波长转换元件如硼酸锂硼酸盐晶体的非线性光学晶体12在波长转换装置10中布置在由不锈钢制成的金属真空容器11中。光束通过其输入端进入真空容器11 具有特定透射率的光学窗口13a，并且通过与非线性光学晶体12相互作用而将其波长转换并从输出侧光学窗口13b发射。对于光学窗口13a和13b，使用在200〜3000nm的波长范围内没有光吸收的石英等。在真空容器11的上部设有真空密封阀14.由真空容器11的主体，光学窗口13a，13b，真空密封阀14构成的部分用O形环15a，15b密封，并且在真空容器11中保持15c至大约10至10 2 Torr的真空。

6. 发明专利

JP2830958B2 失效
公开(公告)号：JP2830958B2
公开(公告)日：1998-12-02
申请号：JP27496091
申请日：1991-09-27
申请人： RIKAGAKU KENKYUSHO , KAWASAKI JUKOGYO KK
发明人： HARA TAMIO , HAMAGAKI MANABU , AOYANAGI KATSUNOBU , YAMADA TAKESHI , RYUJI MAKOTO , TOKAI MASAKUNI , KAJAMA YOSUKE
IPC分类号： G21C5/04 , H01J27/20 , H01J37/08 , H01J37/30

7. 发明专利

JP2000001853A BEDROCK PROTECTION METHOD AND DEVICE 失效
公开(公告)号：JP2000001853A
公开(公告)日：2000-01-07
申请号：JP16541898
申请日：1998-06-12
申请人： KAWASAKI HEAVY IND LTD
发明人： YAMADA TAKESHI , IKEMOTO KIWA , KIMURA TAKESHI , TSUJITA CHIKAFUMI , NAKAZAWA MUTSUHIRO
IPC分类号： E02D9/00 , B24C5/00
摘要： PROBLEM TO BE SOLVED: To make it possible to protect a bedrock in the case remaining pile, etc., in the ground are cut off by means of a water jet. SOLUTION: In the case an H-shaped steel pile 2 remaining in the ground is cut off to remove, an abrasive water jet jetted from a water jet nozzle 5 is used. Since the H-shaped steel pile 2 contains an H-shaped steel 4 in concrete 3, it is very hard to cut off the pile by another method. After the H-shaped steel pile 2 is cut off, a bedrock protection jig 6 is provided in order that a bedrock 1 is prevented from being damaged by the water jet. The bedrock protection jig 6 having sectional construction as shown in (b) provides a ceramic plate 14 to part coming into contact with a jet of the water jet, and since it has abrasion and wear resistance, the bedrock 1 can be protected.

8. 发明专利

JP2000000767A FEEDING METHOD FOR ABRASIVE 失效
公开(公告)号：JP2000000767A
公开(公告)日：2000-01-07
申请号：JP16729398
申请日：1998-06-15
申请人： KAWASAKI HEAVY IND LTD
发明人： YAMADA TAKESHI , IKEMOTO KIWA , YAMAGUCHI MASAMICHI , KIMURA TAKESHI
IPC分类号： B24C7/00 , B26F3/00
摘要： PROBLEM TO BE SOLVED: To facilitate the reuse of an abrasive by recovery of the abrasive by an abrasive water jet having the abrasive is mixed in a water jet. SOLUTION: An abrasive fed to an abrasive nozzle 21 is stored in a wet state in an abrasive tank 20. When an on-off valve 20 is opened and the wet abrasive is dripped through an orifice 23 and fed through an abrasive feed pipe 24 to an abrasive head 21 by air from a compressor 36, even the abrasive in a wet state is easily conveyable. By pressurizing the interior of the abrasive tank 20 by a pressure of air fed by the compressor 36, the abrasive is smoothly dripped from the orifice 23. A used abrasive is collected by a catcher 35 for reutilization. An abrasive in an amount equivalent to that of a consumed abrasive is supplied from a novel abrasive tank 32.

9. 发明专利

JPH11350747A CHIPPING DEVICE 失效
公开(公告)号：JPH11350747A
公开(公告)日：1999-12-21
申请号：JP16232098
申请日：1998-06-10
申请人： KAWASAKI HEAVY IND LTD
发明人： YAMADA TAKESHI , IKEMOTO KIWA , KIMURA TAKESHI
IPC分类号： E01D21/00 , E01D22/00 , E01D24/00 , E04G23/08
摘要： PROBLEM TO BE SOLVED: To provide a chipping device simplifying chipping working and improving workability. SOLUTION: A chipping device has a chipping device body 2, an arm 3 movably provided on the chipping device body 2, a nozzle 6 provided on the edge part 22 of the arm 3 and jetting a fluid jet toward a chipping area 5, and a driving device provided in the chipping device body 2 and moving the arm 3 for the chipping device body 2. A cover 8 covering the chipping area 5 is provided on the chipping device body 2. A sealing member 19 is provided on the opening part 18 of the cover 8 over the whole periphery. Thus, since the chipping device body and the cover 8 are integrally provided, the cover 8 need not be attached separately chipping working can be performed only by performing the position matching of the chipping device 1, and workability is improved.

10. 发明专利

JP2550354B2 失效
公开(公告)号：JP2550354B2
公开(公告)日：1996-11-06
申请号：JP16484987
申请日：1987-07-01
申请人： KAWASAKI HEAVY IND LTD
发明人： MATSUI SHIGEAKI , YAMADA TAKESHI , KIMIE SHIGEKI , ASARI HIROATSU
IPC分类号： E01B25/00 , E01B25/30 , H02K41/00 , H02K41/025

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式