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1. 发明专利

JP2008130503A Atmospheric pressure plasma jet apparatus 有权
标题翻译：大气压力等离子喷射装置
公开(公告)号：JP2008130503A
公开(公告)日：2008-06-05
申请号：JP2006317241
申请日：2006-11-24
申请人： Nippon Plasmatreat Kk , Toyota Gakuen , 学校法人トヨタ学園 , 日本プラズマトリート株式会社
发明人： HARA TAMIO , TAKEMURA YUICHIRO , TSURUMOTO YASUHIKO
IPC分类号： H05H1/24
摘要： PROBLEM TO BE SOLVED: To provide an atmospheric pressure plasma jet apparatus capable of lengthening the plasma plume that can efficiently reform the surface irrespective of the surface shape of the material.
SOLUTION: An atmospheric pressure plasma jet generating means 3 generates an atmospheric pressure plasma jet 25, by using a raw material gas composed of a single kind of gas, or two or more kinds of gases that hardly react with one another in a plasma. The upper part 31 and the lower part 33 of a processing chamber as inclusion preventing means prevents an ambient gas from being included into the atmospheric pressure plasma get 25.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够延长能够有效地改变表面的等离子体羽流的大气压等离子体喷射装置，而与材料的表面形状无关。解决方案：大气压等离子体射流产生装置3通过使用由单种气体构成的原料气体或两种或更多种在几乎不发生反应的气体中产生大气压等离子体射流25 等离子体。作为包含防止装置的处理室的上部31和下部33防止环境气体被包含在大气压等离子体中。25.版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2010132469A Method and apparatus for producing nitrogen compound 有权
标题翻译：用于生产氮化合物的方法和装置
公开(公告)号：JP2010132469A
公开(公告)日：2010-06-17
申请号：JP2008307549
申请日：2008-12-02
申请人： Nippon Plasmatreat Kk , Toyota Gakuen , 学校法人トヨタ学園 , 日本プラズマトリート株式会社
发明人： HARA TAMIO , KUBOTA YUSUKE , KOGA KAZUTAKA
IPC分类号： C01C1/04 , C01B21/22 , C01B21/32 , C01B21/34 , C01B21/36 , C01B21/38 , C01B21/50
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for producing a nitrogen compound where the nitrogen compound is produced without a high temperature and high pressure environment and a metal complex.
SOLUTION: In the method for producing the nitrogen compound from nitrogen and a raw material substance except nitrogen, it is characterized in that the nitrogen compound is produced by generating the plasma of a gas containing nitrogen and the raw material substance. When hydrogen is used as the raw material substance, ammonia is produced as the nitrogen compound. When oxygen is used as the raw material substance, NOx is produced as the nitrogen compound.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：待解决的问题：提供一种制备氮化合物的方法和装置，其中氮化合物在没有高温高压环境下生产，而金属络合物。解决方案：在氮气和除氮以外的原料物质的氮化合物的制造方法中，其特征在于，通过产生含氮气体和原料物质的等离子体来制造氮化合物。当使用氢作为原料物质时，产生氨作为氮化合物。当使用氧作为原料物质时，产生氮作为氮化合物。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2009202087A Nitridation method 有权
标题翻译：硝化方法
公开(公告)号：JP2009202087A
公开(公告)日：2009-09-10
申请号：JP2008046171
申请日：2008-02-27
申请人： Nippon Plasmatreat Kk , Toyota Gakuen , 学校法人トヨタ学園 , 日本プラズマトリート株式会社
发明人： HARA TAMIO , ICHIKI RYUSUKE , KUBOTA YUSUKE , IKEZAWA SHUNJIRO , SHANKAR PARAJULEE , TSURUMOTO YASUHIKO
IPC分类号： B01J27/24 , B01J19/08 , B01J35/02 , B01J37/34
摘要： PROBLEM TO BE SOLVED: To provide a nitridation method (a method for nitriding a material) having low environmental loads and high efficiency. SOLUTION: The nitridation method comprises a step of irradiating a material (a glass substrate 30 having a TiO 2 film 32 on the surface thereof) with an atmospheric-pressure plasma jet 2 generated by using a gaseous raw material 40 containing nitrogen at the least. Nitrogen molecules are not only ionized but also efficiently dissociated to produce nitrogen atoms of high concentration by a high-voltage pulse discharge inside the atmospheric-pressure plasma jet 2. When the surface of the material is irradiated with the atmospheric-pressure plasma jet 2 generated by using the gaseous raw material 40 (even air can be used) containing nitrogen at the least, the surface of the material is nitrided in a short period of time by nitrogen atoms of high concentration contained in a plasma flame. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供具有低环境负荷和高效率的氮化方法（氮化材料的方法）。解决方案：氮化方法包括用大气压等离子体射流2照射材料（其表面上具有TiO 2 SB 膜32的玻璃基板30）的步骤，其通过使用至少含氮的气态原料40。氮分子不仅被电离，而且通过在大气压等离子体射流2内部的高压脉冲放电，有效地解离以产生高浓度的氮原子。当材料的表面被产生的大气压等离子体射流2照射时通过使用至少含有氮的气态原料40（均匀的空气），材料的表面在等离子体火焰中包含的高浓度的氮原子在短时间内被氮化。版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2007252981A Plasma-liquid reactor 审中-公开
标题翻译：等离子体液体反应器
公开(公告)号：JP2007252981A
公开(公告)日：2007-10-04
申请号：JP2006077192
申请日：2006-03-20
申请人： Nippon Plasmatreat Kk , Toyota Gakuen , 学校法人トヨタ学園 , 日本プラズマトリート株式会社
发明人： HARA TAMIO , TAKEMURA YUICHIRO
IPC分类号： B01J19/08 , H05H1/24
摘要： PROBLEM TO BE SOLVED: To provide a plasma-liquid reactor which realizes a strong interaction of the plasma of a desired gas with various liquids, and accelerates the chemical reaction of solutes in the liquids. SOLUTION: The plasma-liquid reactor is provided with a plasma generating means for generating the plasma in the atmosphere, a holding means for holding the liquids to be reacted and a contact means forcedly making the liquids held in the holding means into contact with the plasma generated in the plasma generating means, and generates the interaction of the plasma with the liquids. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种等离子体 - 液体反应器，其实现所需气体的等离子体与各种液体的强相互作用，并且加速液体中溶质的化学反应。解决方案：等离子体 - 液体反应器设置有用于在大气中产生等离子体的等离子体产生装置，用于保持待反应的液体的保持装置和强制使保持在保持装置中的液体接触的接触装置等离子体产生装置中产生的等离子体产生等离子体与液体的相互作用。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2012038469A Atmospheric pressure plasma jet apparatus 有权
标题翻译：大气压力等离子喷射设备
公开(公告)号：JP2012038469A
公开(公告)日：2012-02-23
申请号：JP2010175611
申请日：2010-08-04
申请人： Nihon Plasmatreat Inc Co Ltd , Toyota Gakuen , 学校法人トヨタ学園 , 日本プラズマトリート株式会社
发明人： HARA TAMIO , OSHIMA NOBUAKI
IPC分类号： H05H1/24
摘要： PROBLEM TO BE SOLVED: To provide an atmospheric pressure plasma jet apparatus that processes a material of large lateral width in a short time at low cost.SOLUTION: The atmospheric pressure plasma jet apparatus includes atmospheric pressure plasma jet generation means 3 for generating an atmospheric pressure plasma jet using a material gas consisting of a single gaseous species or two or more gaseous species which are unlikely to chemically react with each other in plasma, and a nozzle 5 which jets plasma plumes of the atmospheric pressure plasma jet, the nozzle 5 including an exit-side opening 25 which is sectioned in a thin and long slit shape, and also internally having a diffusion member 29 which spreads the plasma plumes in a length direction of the slit shape.
摘要翻译：要解决的问题：提供一种以低成本在短时间内处理横宽宽的材料的大气压等离子体喷射装置。解决方案：大气压等离子体喷射装置包括大气压等离子体射流生成装置3，用于使用由单一气态物质或两种或更多种气体物质组成的材料气体产生大气压等离子体射流，这些物质不可能与每种气体物质发生化学反应等离子体中的另一个，以及喷射大气压等离子体射流的等离子体羽流的喷嘴5，喷嘴5包括分段为薄且长的狭缝形状的出口侧开口25，并且内部还具有扩散部件29 等离子体在狭缝形状的长度方向上膨胀。版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2013082976A Nitriding treatment method 有权
标题翻译：硝化处理方法
公开(公告)号：JP2013082976A
公开(公告)日：2013-05-09
申请号：JP2011224275
申请日：2011-10-11
申请人： Toyota Gakuen , 学校法人トヨタ学園 , Gifu Prefecture , 岐阜県 , Feather Safety Razor Co Ltd , フェザー安全剃刀株式会社
发明人： HARA TAMIO , OSHIMA NOBUAKI , YAMAGUCHI TAKASHI , OGAWA HIROSHIGE , HOSONO KOTA , OTSU TAKASHI , MURAI MASAAKI , FUJIMURA KAZUKI
IPC分类号： C23C8/36 , C23C8/38 , H01J37/077 , H05H1/24
摘要： PROBLEM TO BE SOLVED: To provide a nitriding treatment method capable of increasing hardness of a surface and improving durability while maintaining characteristics of toughness or the like that a nitriding treatment target object has.SOLUTION: The nitriding treatment method is used for performing nitriding treatment by irradiating a surface of a nitriding treatment target object 16 with nitrogen plasma and forming a thin diffusion layer of nitrogen atoms on the surface of the nitriding treatment target object 16. For instance, an electron beam is pulled out from argon plasma 21, nitrogen plasma 24 is generated from a nitrogen gas by the electron beam, the nitrogen atoms are diffused from the surface of the nitriding treatment target object 16 to the inside by the nitrogen plasma 24, and the diffusion layer of the nitrogen atoms having a thickness of 10 μm or less is formed. It is preferable that a temperature of the nitriding treatment is 350-600°C, and it is preferable that the time of the nitriding treatment is 1-8 hours. Also, it is preferable that a bias voltage to be applied to the nitriding treatment target object 16 is -50 to -5 V.
摘要翻译：待解决的问题：提供能够提高表面硬度并提高耐久性的氮化处理方法，同时保持氮化处理对象物具有的韧性等的特性。解决方案：氮化处理方法用于通过用氮等离子体照射氮化处理对象物16的表面并在氮化处理对象物16的表面上形成薄的氮原子扩散层来进行氮化处理。对于例如，从氩等离子体21中拉出电子束，通过电子束从氮气产生氮等离子体24，通过氮等离子体24将氮原子从氮化处理对象物16的表面扩散到内部形成厚度为10μm以下的氮原子的扩散层。氮化处理的温度优选为350〜600℃，优选氮化处理时间为1-8小时。此外，优选施加于氮化处理对象物16的偏置电压为-50〜-5V。版权所有（C）2013，JPO＆INPIT

7. 发明专利

JP2010040417A Electron beam generating device 有权
标题翻译：电子束生成装置
公开(公告)号：JP2010040417A
公开(公告)日：2010-02-18
申请号：JP2008204159
申请日：2008-08-07
申请人： Toyota Gakuen , Toyota Motor Corp , トヨタ自動車株式会社 , 学校法人トヨタ学園
发明人： HARA TAMIO , ICHIKI RYUSUKE
IPC分类号： H05H1/24 , C23C8/38
摘要： PROBLEM TO BE SOLVED: To reduce a heat load of a porous plate-made electrode by devising a shape of the porous plate-made electrode to achieve the high densification of electron beam excited plasma and service life prolongation of the electrode. SOLUTION: In the electron beam generating device 5, the outer shape of each electrode part 10 held at an electrode holding part of a cooling chamber, shows a rectangular shape. The electrode part 10 includes a porous discharge anode 15, a porous accelerating electrode 16, a first insulating plate 17, a second insulating plate 18, a lead wire 19, and a frame-like metal plate 20. The first insulating plate 17 and the second insulating plate 18 are constituted of a heat-conductive electric insulating material, having a thermal conductivity of 5W/(m×K) or higher. The heat load of the porous discharge anode 15 and the porous accelerating electrode 16 can be reduced, and efficient cooling of the center part of a first center porous part 151 of the porous discharge anode 15, that particularly becomes high temperature. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了通过设计多孔板状电极的形状来减少多孔板状电极的热负荷，以实现电子束激发等离子体的高致密化和电极的使用寿命延长。解决方案：在电子束产生装置5中，保持在冷却室的电极保持部分的每个电极部分10的外形呈矩形。电极部分10包括多孔放电阳极15，多孔加速电极16，第一绝缘板17，第二绝缘板18，引线19和框架状金属板20.第一绝缘板17和第二绝缘板18由热传导率为5W /（m×K）以上的导热电绝缘材料构成。可以减少多孔放电阳极15和多孔促进电极16的热负荷，并且有效地冷却多孔放电阳极15的第一中心多孔部分151的中心部分，特别是变成高温。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2010196129A Method of manufacturing steel material 有权
标题翻译：制造钢材的方法
公开(公告)号：JP2010196129A
公开(公告)日：2010-09-09
申请号：JP2009043784
申请日：2009-02-26
申请人： Toyota Gakuen , Toyota Motor Corp , トヨタ自動車株式会社 , 学校法人トヨタ学園
发明人： MIYAMOTO NORITAKA , ICHIKI RYUSUKE , YOSHIDA MASASHI , HARA TAMIO , OKUMIYA MASAHIRO , TSUNEKAWA YOSHIKI
IPC分类号： C23C8/38 , C21D1/06
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing steel material which permits inexpensive treatment without a severe temperature control for steel material, improves mechanical strength and, at the same time, hardly brings about the deterioration of toughness. SOLUTION: Nitriding gas is turned into plasma by introducing electron beams which are drawn from discharge plasma and are accelerated into the environment of the nitriding gas, and a low-carbon steel material is caused to be brought into contact with the nitriding gas which is turned into the plasma to perform the solid solution of nitrogen atoms of the nitriding gas from the surface into the internal part of the low-carbon steel material. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：待解决的问题：为了提供一种钢材的制造方法，其在不对钢材进行严格的温度控制的情况下便于处理，提高机械强度，并且同时几乎不会导致韧性的劣化。解决方案：通过引入从放电等离子体中吸收的电子束并将其加速到氮化气体的环境中，使氮化气变成等离子体，使低碳钢材料与氮化气接触将其变成等离子体，以将表面的氮化气体的氮原子的固溶体进入低碳钢材料的内部。版权所有（C）2010，JPO＆INPIT

9. 发明专利

JP2004190055A Aluminum surface nitriding method 审中-公开
公开(公告)号：JP2004190055A
公开(公告)日：2004-07-08
申请号：JP2002356168
申请日：2002-12-09
申请人： Kawasaki Heavy Ind Ltd , Toyota Gakuen , Toyota Motor Corp , トヨタ自動車株式会社 , 学校法人トヨタ学園 , 川崎重工業株式会社
发明人： TSUNEKAWA YOSHIKI , HARA TAMIO , SHOYAMA HIROAKI , BABA AKIHIRO , YANO HITOSHI , KAJIKAWA YOSHIAKI , KASA YOSHITOKU , SUEMITSU TAKESHI , MORI TAKASHI
IPC分类号： C23C8/36 , C23C8/02 , C23C14/00 , C23C14/06 , C23C14/34
摘要： PROBLEM TO BE SOLVED: To provide an aluminum nitriding method for removing an oxide film on a surface of a base aluminum member and depositing a thick aluminum nitride layer by using nitrogen plasma with high concentration.
SOLUTION: An aluminum containing metal 5 is set on a sample stand 34 in a reaction chamber by using an electron beam excitation plasma (EBEP) apparatus to generate plasma in the reaction chamber 3 by electron beams of low voltage and large current, the reaction chamber is evacuated, hydrogen gas is introduced therein, and hydrogen plasma is generated by accelerated electron beams to clean a surface of the metal. Next, substitution is performed to reaction gas containing nitrogen gas to generate reaction plasma by accelerated electron beams. A nitrided aluminum film is deposited on the surface of the metal by generating nitriding reaction while performing sputtering by applying the bias voltage to the metal.
COPYRIGHT: (C)2004,JPO&NCIPI

10. 发明专利

JP2013151587A Film formation method and cutter material obtained by the film formation method 有权
标题翻译：电影形成方法获得的电影形成方法和切割材料
公开(公告)号：JP2013151587A
公开(公告)日：2013-08-08
申请号：JP2012012264
申请日：2012-01-24
申请人： Toyota Gakuen , 学校法人トヨタ学園 , Feather Safety Razor Co Ltd , フェザー安全剃刀株式会社
发明人： HARA TAMIO , MURAI MASAAKI , FUJIMURA KAZUKI
IPC分类号： C09K3/18 , A61B17/3211 , B05D3/04 , B05D5/00 , B26B9/00 , C23C16/513
摘要： PROBLEM TO BE SOLVED: To provide a film formation method that can form a film capable of giving excellent oil repellency and water repellency to a surface of a material by a simple method, and to provide a cutter material obtained by using the film formation method.SOLUTION: In the case of forming a fluorine containing film 24 on a surface of a material 23 such as surgical knives used for surgery, the fluorine containing film 24 is formed on the surface of the material 23 by generating an atmospheric pressure plasma jet 21 by using a raw material gas 17 containing a fluorine compound such as tetrafluoromethane, etc. using an atmospheric pressure plasma jet-generating device 11, and then by irradiating the surface of the material 23 with the atmospheric pressure plasma jet 21. An inert gas such as argon, etc. is contained in the raw material gas 17. It is preferred to hold the temperature of the material 23 at 100°C or below in the case of forming the fluorine containing film 24 on the surface of the material 23.
摘要翻译：要解决的问题：提供能够通过简单的方法形成能够赋予材料表面优异的拒油性和拒水性的膜的成膜方法，并提供通过使用成膜方法获得的切割材料。解决方案：在用于手术的外科手术刀等材料23的表面上形成含氟膜24的情况下，通过利用大气压等离子体喷射器21，在材料23的表面上形成含氟膜24，使用含有氟化合物如四氟甲烷等的原料气体17，使用大气压等离子体喷射发生装置11，然后用大气压等离子体射流21照射材料23的表面。惰性气体如氩等被包含在原料气体17中。在形成含氟膜24的情况下，优选将材料23的温度保持在100℃以下材料表面23。

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