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1. 发明专利

JP2003347276A Plasma treatment method and method for manufacturing semiconductor device 审中-公开
标题翻译：用于制造半导体器件的等离子体处理方法和方法
公开(公告)号：JP2003347276A
公开(公告)日：2003-12-05
申请号：JP2003188275
申请日：2003-06-30
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： KITSUNAI HIROYUKI , TSUMAKI NOBUO , TSUNODA SHIGERU , NOJIRI KAZUO , TAKAHASHI NUSHITO
IPC分类号： H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a dry cleaning method which can remove a deposited film sticking on the internal wall of a semiconductor device, i.e., a generation source of dust.
SOLUTION: In a dry cleaning process, a process of removing a compound of an ion spattered body of a device internal member material or the device internal material and etching gas in addition to a process of removing etching reaction products. Dusts generated by peeling the deposited film can be prevented from being generated as the number of processed wafers increases to improve the yield of a manufacturing process and also improve the operation rate of the manufacturing apparatus.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种干燥方法，其可以去除粘附在半导体器件的内壁上的沉积膜，即产生灰尘源。解决方案：在干洗过程中，除了除去蚀刻反应产物的过程之外，除去装置内部构件材料的离子溅射体或器件内部材料和蚀刻气体的化合物的处理。随着处理晶片的数量增加，可以防止由于剥离沉积膜而产生的灰尘，从而提高制造工艺的产量并且还提高制造装置的操作速度。版权所有（C）2004，JPO

2. 发明专利

JP2002093676A REMOTE DIAGNOSTIC SYSTEM AND REMOTE DIAGNOSTIC METHOD OF SEMICONDUCTOR PRODUCTION SYSTEM 失效
公开(公告)号：JP2002093676A
公开(公告)日：2002-03-29
申请号：JP2000284871
申请日：2000-09-20
申请人： HITACHI LTD
发明人： TAKAHASHI NUSHITO , TSUMAKI NOBUO , YAMAMOTO HIDEYUKI
IPC分类号： H01L21/02 , G05B23/02
摘要： PROBLEM TO BE SOLVED: To provide remote diagnostic system and diagnostic method in which both requirements of keeping secrecy of information at the time of remote diagnosis of a facility and prevention of increase in economical loss are harmonized. SOLUTION: A diagnostic unit provided by a third party through a communication network is connected with a semiconductor production system and a diagnostic terminal in order to diagnose the semiconductor production system. In such a remote diagnostic system for semiconductor production system, the diagnostic unit comprises at least one diagnostic program performing diagnostic processing of the semiconductor production system, and a control section for starting the diagnostic program through access of a specific user granted with an access right. The terminal transmits requested data to the diagnostic unit at the time of diagnosis and receives results of diagnosis therefrom.

3. 发明专利

JPH11283963A SEMICONDUCTOR MANUFACTURING DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME 失效
公开(公告)号：JPH11283963A
公开(公告)日：1999-10-15
申请号：JP8191598
申请日：1998-03-27
申请人： HITACHI LTD
发明人： SUZUKI SHINICHI , KITSUNAI HIROYUKI , TSUMAKI NOBUO , KATSUYAMA MASANORI , NISHI HIROO
IPC分类号： H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To prevent the generation of abnormal discharges due to an electrode or the like at the etching of a silicon oxide film or the like and to eliminate foreign substances which are generated by the abnormal discharges or the like. SOLUTION: This semiconductor manufacturing device is one of a structure, wherein an upper electrode (electrode) 1 having holes 5 for gas feed is installed on a wafer, a treatment of the wafer is performed and in this case, the electrode 1 has a silicon electrode plate 2 and an aluminium electrode plate 3 and the plates 2 and 3 are fixed by an alloy film 4 which is present between the plates 2 and 3.

4. 发明专利

JPH10233434A ELECTROSTATIC ADSORBENT AND ADSORBER 失效
公开(公告)号：JPH10233434A
公开(公告)日：1998-09-02
申请号：JP3755997
申请日：1997-02-21
申请人： HITACHI LTD
发明人： SHIMAMURA AZUSA , TSUMAKI NOBUO , OTAKA TADASHI
IPC分类号： B25J15/06 , H01L21/68 , H01L21/683
摘要： PROBLEM TO BE SOLVED: To suppress the foreign matter adherence to the specimen back, by a method wherein a projection and a recession to be the contact part and non- contact part with adsorbed element are formed on the adsorbing surface of electrostatic adsorbent so as to utilize the adsorption force of the non-contact part to be the recession for adsorbing the adsorbed elements. SOLUTION: An arm main body 2 made of a dielectric using one end thereof as an adsorbing part is provided on an electrostatic adsorbent so as to fix electrode plates 6, 6' connecting to a lead wire 9 on the non-adsorbing surface side of the adsorbing part of the arm main body 2. Next, projections 4 to be the contact parts with a adsorbed element 1 are formed on the adsorbing surface of the adsorbing part of the arm main body 2 while the other parts excluding the projections 4 are formed into the recessions 5 to be the non-contact parts. In such a constitution, the adsorbed element 1 is adsorbed into the adsorbing surface of the adsorbing part for abutting against the projections 4 to be fixed and held, thereby using the recessions 5 by the action of the static electricity generated by the potential difference between the adsorbed element 1 and the electrode plates 6, 6'.

5. 发明专利

JPH09293454A MANUFACTURE OF CATHODE-RAY TUBE 失效
公开(公告)号：JPH09293454A
公开(公告)日：1997-11-11
申请号：JP10683796
申请日：1996-04-26
申请人： HITACHI LTD
发明人： YAMANE MIYUKI , TSUMAKI NOBUO , SAITO NOBORU
IPC分类号： H01J9/26
摘要： PROBLEM TO BE SOLVED: To shorten the process time so as to enhance production efficiency and reduce consumed energy during processes by irradiating a panel with a laser beam in a panel baking process during the cathode-ray tube manufacturing, process followed by a heat treatment. SOLUTION: An organic matter 7 contained in slurry of a fluorescent film 6 formed at the inner face of a panel 5 is first burnt in a heat treatment, followed by heating and decomposing in a panel baking process. An infrared laser 9 irradiates the entire face of the panel 5, in which an aluminum deposited film 8 is formed on the resultant film 6 via an organic suspension 7, followed by heating at a predetermined temperature. In the dedusting atmosphere, it is possible to prevent foreign matters from adhering to the films 6, 8 formed on the panel 5. Consequently, the foreign matters adhering to the inside of the panel due to machining or a shock during a cathode-ray tube manufacturing process can be peeled off, thereby preventing a hole of a shadow mask from clogging. After light irradiation by the laser 9, a process for cooling the panel 5 is performed in the atmosphere of nitrogen gas or dry inactive gas, thus reducing unnecessary gas to be adsorbed by the panel 5.

6. 发明专利

JPH08321447A WAFER PROCESSING METHOD WITH FOREIGN MATTER ELIMINATING FUNCTION 失效
公开(公告)号：JPH08321447A
公开(公告)日：1996-12-03
申请号：JP12621695
申请日：1995-05-25
申请人： HITACHI LTD
发明人： SUGANO SEIICHIRO , USUI TAKETO , IKEGAWA MASATO , KAJI TETSUNORI , TAKAHASHI NUSHITO , TSUMAKI NOBUO
IPC分类号： H01L21/677 , H01L21/02 , H01L21/67 , H01L21/68
摘要： PURPOSE: To transfer foreign matters existing on a contact face on a rear face of a wafer to a plate-like member and thereby eliminate the foregin matters and then prevent a disconnection and the deterioration in performance of an element due to the foregin matters by conducting the same operations as in a usual wafer processing using the plate-like member of such an area as to cover a member which is brought into contact with the rear face of the wafer in the usual operations. CONSTITUTION: After processing one rot or 25 pieces of processed wafers or processing a plurality of rots, the same operations as in a usual wafer processing are done with an unprocessed dummy wafer 9. In the operations, however, etching is not conducted and noble gas is introduced and bias voltage is not applied lest the dummy wafer 9 should be sputtered. However, when the processed wafer is carried into an etching equipment and is attracted by static electricity suction, foreign matters attaching to the processed wafer now attach to a rear face of the dummy wafer 9 and then they are carried away from an unload chamber 20 together with the dummy wafer 9. By this method, a system becomes a clean one with the reduced number of foreign matters on a rear face of a processed wafer.

7. 发明专利

JPH03234910A FLUID BEARING DEVICE 失效
公开(公告)号：JPH03234910A
公开(公告)日：1991-10-18
申请号：JP2868190
申请日：1990-02-08
申请人： HITACHI LTD
发明人： ITAKURA MAKOTO , SAKAI KAZUO , NEMOTO YASUHIRO , TSUMAKI NOBUO , HIRAYAMA KUNIAKI
IPC分类号： F16C17/02
摘要： PURPOSE:To raise retention of a lubricant by providing annular recessed regions of a larger clearance than that predetermined on the circumference of an inner circumferential surface of an outer cylinder approaching a radial bearing part. CONSTITUTION:Grooves 3a for generation of dynamic pressure is provided in an inner circumferential surface of an outer cylinder 1 and shaft body 6 is housed in a radial bearing part 3 with a little clearance therebetween. An annular recessed region 2 which has a large gap between its inner surface and the outer circumferential surface of the shaft body 6 is provided on the inside circumference close to each end surface of the radial bearing part 3. The recessed region 2 is defined to have the volume equivalent to that of a lubricant to be filled in the radial bearing part 3. As a result, splashing and flowing out of the lubricant can be prevented, always keeping the lubricant in the radial bearing part 3 to obtain a smooth rotation function and lengthen the life.

8. 发明专利

JPH0324316A BEARING DEVICE 失效
公开(公告)号：JPH0324316A
公开(公告)日：1991-02-01
申请号：JP15678089
申请日：1989-06-21
申请人： HITACHI LTD
发明人： TSUMAKI NOBUO , KOIKE TOSHIFUMI , SATO SATOYUKI
IPC分类号： F16C27/00 , F16C33/10
摘要： PURPOSE:To operate in an adequate viscosity by controlling a voltage with application of an electric field to an electrode disposed in a shaft and a bearing so as to control a viscosity of an electroviscous fluid flowing between the shaft and the bearing. CONSTITUTION:A space between a shaft 1 and a bearing 2 is filled with an electroviscous fluid 3 as lubricating oil. A power source 4 is connected to the shaft 1 and bearing 2 serving as an electrode. The shaft 1 and the power source 4 are connected in a rotatable manner. The viscosity of the electroviscous fluid 3 is varied dependently on the output voltage of the power source (voltage controller) 4. There is provided a sensor for detecting a rotational speed of the shaft, a temperature of the electroviscous fluid, and the like, thus controlling the output voltage of the voltage controller on the basis of the detected signal. Therefore, a viscous resistance of a flow in the space between the shaft and the bearing can be freely controlled, and a load capacity and the like can be controlled at real time, thus enabling an operation in a viscosity adequate for a rotational speed.

9. 发明专利

JPH02310868A HEAD SLIDER FOR MAGNETIC DISK 失效
公开(公告)号：JPH02310868A
公开(公告)日：1990-12-26
申请号：JP13137289
申请日：1989-05-26
申请人： HITACHI LTD
发明人： MIZUMOTO MUNEO , YAMAGUCHI YUZO , SONODA TARO , TSUMAKI NOBUO
IPC分类号： G11B21/21
摘要： PURPOSE:To prevent both a magnetic disk and a slider from being damaged by contact between the disk and slider by providing an oil storing room, for which a sliding surface with the magnetic disk is composed of a porous material, and an opening part to ventilate air in this oil storing room and to supply oil. CONSTITUTION:A magnetic head 2 is fitted to a head slider 1. In the slider 1, an oil storing room 3 is provided and for this oil storing room, one part of the sliding surface with the magnetic disk is composed of a porous material 10 at least. The inside of this oil storing room 3 is pressurized and a lubricant 5 in the oil storing room 3 oozes out from the porous material 10 to the sliding surface. Accordingly, for the magnetic head 2, the oil poured into the oil storing room 3 in the head 2 or the lubricant 5 soaking into the porous material 10 of the head 2 oozes out to the lower surface part of the head 2 facing to the surface of the disk and the lower surface part of the head 2 is coated. Thus, even when the head 2 is crushed with the surface of the disk, the head and disk are not damaged and a satisfactory sliding state always is realized.

10. 发明专利

JPH0251079B2 失效
公开(公告)号：JPH0251079B2
公开(公告)日：1990-11-06
申请号：JP12602883
申请日：1983-07-13
申请人： HITACHI LTD
发明人： TSUMAKI NOBUO , UEDA SHINJIRO , NODA KOSUKE , IZUMI HIDEKI , MATSUSHITA OSAMI , OKAWADA TAKESHI
IPC分类号： F16C32/04 , F04D19/04 , F04D29/048 , F04D29/056

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