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1. 发明专利

JP2007110004A Chemical supply system 有权
标题翻译：化学供应系统
公开(公告)号：JP2007110004A
公开(公告)日：2007-04-26
申请号：JP2005301439
申请日：2005-10-17
申请人： Ckd Corp , Okutekku:Kk , シーケーディ株式会社 , 株式会社オクテック
发明人： OKUMURA KATSUYA , TOYODA TETSUYA , ITO TOMOHIRO , MURAKUMO HIKARI , SAKAI ATSUYUKI
IPC分类号： H01L21/027 , B05C11/10
CPC分类号： F04B49/08
摘要： PROBLEM TO BE SOLVED: To always properly perform pressure feedback control even if a set value of a working pressure differs according to a change in a type of a chemical or the like, and as a result to accurately control the flow rate of the discharged chemical.
SOLUTION: A pump 11 has a pump chamber 13 and a working chamber 14 partitioned by a diaphragm 12 made of a flexible film, for sucking and discharging the chemical depending on a change in pressure in the working chamber 14. An electro-pneumatic regulator 32 supplies working air to the working chamber 14. In addition, this system is equipped with a plurality of pressure sensors 51 and 63 different in a pressure detection range as pressure detecting means for detecting the pressure of the working air. A controller 40 selectively employs either of detection results of the plurality of sensors 51 and 63 depending on a set pressure value of the working air which is specified each time, for performing the pressure feedback control.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：即使工作压力的设定值根据化学品的类型的变化等而不同，也可以始终适当地执行压力反馈控制，并且因此精确地控制流量排出的化学物质。解决方案：泵11具有由柔性膜制成的隔膜12隔开的泵室13和工作室14，用于根据工作室14内的压力变化来抽吸和排出化学品。气动调节器32将工作空气供给到工作室14.此外，该系统配备有多个压力检测范围不同的压力传感器51,63，作为用于检测工作空气的压力的压力检测单元。控制器40根据每次指定的工作空气的设定压力值选择性地使用多个传感器51和63的检测结果中的任一个，以执行压力反馈控制。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2005240762A Chemical liquid supplying system 有权
标题翻译：化学液体供应系统
公开(公告)号：JP2005240762A
公开(公告)日：2005-09-08
申请号：JP2004054729
申请日：2004-02-27
申请人： Ckd Corp , シーケーディ株式会社
发明人： SUGATA KAZUHIRO , MURAKUMO HIKARI , ITO SHIGENOBU
IPC分类号： F04B49/00 , F04B43/06
摘要： PROBLEM TO BE SOLVED: To provide a chemical liquid supplying system at low cost through simplification of the constitution, capable of eliminating a poor performance of dripping even when a margin is provided for the supply pressure of a compressed gas with the pumping head taken into consideration. SOLUTION: The positions of a first selector valve 14 and a second selector valve 53 are changed over to put the operations in three modes; the compressed air for discharging a photo-resist liquid R is supplied to the working chamber of a pump 13, the working chamber of the pump 13 is held at the atmospheric pressure, and a vacuum pressure is generated for sucking in the liquid R. A shutoff valve 45 is turned into the open position a little bit later than changing-over of the first selector valve 14 into the open position, which reduces the overshoot phenomenon when dripping is started, and the shutoff valve 45 is turned into the closed position a little bit later than changing-over of the first selector valve 14 into the closed position, which reduces the water-hammer phenomenon when the dripping is ended. The first selector valve 14, the second selector valve 53, and the shutoff valve 45 can all be formed in a simple valve constitution of two-position changeover type, and all changeover operations are controlled by a single controller 56. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决的问题：为了通过简化结构，以低成本提供化学液体供给系统，即使在使用泵头的压缩气体的供给压力提供余量的情况下，也能够消除差的滴落性能考虑到解决方案：将第一切换阀14和第二切换阀53的位置切换成三种模式，用于排出光致抗蚀剂液体R的压缩空气被供给到泵13的工作室，泵13的工作室保持在大气压下，产生用于吸入液体R的真空压力。截止阀45比第一切换阀14转换到打开位置稍稍稍后转动到打开位置，这样当开始滴落时减小了过冲现象，并且截止阀45变成关闭位置a 稍稍比将第一切换阀14转换到关闭位置稍稍稍后一点，这降低了当滴落结束时的水击现象。第一选择阀14，第二选择阀53和截止阀45都可以以简单的两位置转换型阀形式形成，并且所有转换操作都由单个控制器56控制。版权所有：（C）2005，JPO＆NCIPI

3. 发明专利

JP2010134812A Pressure control device and flow control device 有权
标题翻译：压力控制装置和流量控制装置
公开(公告)号：JP2010134812A
公开(公告)日：2010-06-17
申请号：JP2008311740
申请日：2008-12-08
申请人： Ckd Corp , シーケーディ株式会社
发明人： KAGOHASHI HIROSHI , KATO TAKASHI , MURAKUMO HIKARI
IPC分类号： G05D16/20 , F16K31/06 , G05D7/06
CPC分类号： G05D16/2053 , G05D7/0635
摘要： PROBLEM TO BE SOLVED: To provide a pressure control device capable of promptly making deviation between detected pressure and target pressure of gas small when the deviation becomes large, and to provide a flow control device which uses gas with the controlled pressure. SOLUTION: An electro-pneumatic regulator 40 is provided with: an electromagnetic valve 43 for air supply which is connected to a supply source of the air and whose opening/closing drive is performed by a pulse signal having a predetermined period; and an electromagnetic valve 44 for discharge which is connected to a downstream of the electromagnetic valve 43 and whose opening/closing drive is performed by a pulse signal having a predetermined period. In order to make the detected pressure of the air to be derived to an air passage 35 by a pressure sensor 72 into the target pressure, the pulse signals which drive the electromagnetic valves 43, 44 in each period are generated by a PID operation based on the deviation between the detected pressure and the target pressure of the air, and the pulse signals to be generated by the PID operation are changed so as to make the deviation small in the periods when the electromagnetic valves 43, 44 are driven on condition that the deviation between the detected pressure and the target pressure of the air is equal to or more than a determined value. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种当偏差变大时能够迅速地使检测压力和气体的目标压力之间的偏差小的压力控制装置，并且提供使用具有受控压力的气体的流量控制装置。电动气动调节器40具有：空气供给用的电磁阀43，其连接到空气的供给源，并且通过具有预定周期的脉冲信号进行开/关驱动; 以及用于排出的电磁阀44，其连接到电磁阀43的下游，并且通过具有预定周期的脉冲信号进行打开/关闭驱动。为了使通过压力传感器72将空气通道35的检测压力导出到目标压力中，通过基于以下的PID运算生成在每个周期中驱动电磁阀43,44的脉冲信号检测到的压力与空气的目标压力之间的偏差以及由PID运算产生的脉冲信号发生变化，使得在电磁阀43,44被驱动的时段内偏差较小，条件是检测压力和空气的目标压力之间的偏差等于或大于确定值。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2004138178A Fluid supply controller 有权
公开(公告)号：JP2004138178A
公开(公告)日：2004-05-13
申请号：JP2002304167
申请日：2002-10-18
申请人： Ckd Corp , シーケーディ株式会社
发明人： MURAKUMO HIKARI , TOYODA TETSUYA , KAGOHASHI HIROSHI , SUZUKI NOBUYA
IPC分类号： F16K23/00 , F17D3/01
摘要： PROBLEM TO BE SOLVED: To provide a fluid supply controller to control a fluid supply system having an electropneumatic proportional valve to supply the pilot air to a pneumatic type pilot valve, in which no ill influence is given on the peripheral apparatus by eliminating any unstable operation when the power is put on to the fluid supply controller.
SOLUTION: The electropneumatic proportional valve 7 to supply the pilot air, for example to a suckback valve 3, is started with the power supplied by turning on a power switch S1 through a timer relay switch T and a relay switch K1 at the time T14 later than the time T13 when a control signal to instruct the suckback amount according to the initial setting from a CPU part 21 and a D/A conversion part 22 is fed to an analog output part 23 (approximately two seconds after the time T11 when the power supply is put on).
COPYRIGHT: (C)2004,JPO

5. 发明专利

JP2009265859A Flow controller 有权
标题翻译：流量控制器
公开(公告)号：JP2009265859A
公开(公告)日：2009-11-12
申请号：JP2008113339
申请日：2008-04-24
申请人： Ckd Corp , シーケーディ株式会社
发明人： KATO TAKASHI , MURAKUMO HIKARI
IPC分类号： G05D7/06
CPC分类号： G05D7/0652
摘要： PROBLEM TO BE SOLVED: To provide a flow controller controlling a flow rate in a wide range without significantly increasing cost.
SOLUTION: A flow control system 10 has: a flow sensor 14 detecting the flow rate of a liquid medicine; and a pilot regulator 20 as a flow control means and a first opening/closing valve 40 permitting or prohibiting passage of a fluid provided in parallel with each other downstream of the flow sensor 14. A downstream end part of a discharge pipe 13 on downstream side of the flow sensor 14 is connected to a first branch pipe 15 and a second branch pipe 16. The first branch pipe 15 is provided with the pilot regulator 20, and the second branch pipe 16 is provided with the first opening/closing valve 40. A controller 30 drives an electropneumatic regulator 18 and a first solenoid valve 19 based on a flow rate value detected by the flow sensor 14 and a target flow rate value, and executes flow rate feedback control such that the fluid flow rate coincides with the target flow rate value.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供控制大范围流量的流量控制器，而不会显着增加成本。解决方案：流量控制系统10具有：流量传感器14，其检测液体药物的流量; 以及作为流量控制装置的先导调节器20和允许或禁止在流量传感器14的下游彼此并联设置的流体通过的第一开闭阀40.下游侧的排出管13的下游端部流量传感器14连接到第一分支管15和第二分支管16.第一分支管15设置有先导调节器20，第二分支管16设置有第一开闭阀40。控制器30基于由流量传感器14检测的流量值和目标流量值来驱动电动气动调节器18和第一电磁阀19，并且执行流量反馈控制，使得流体流量与目标流量一致速率值。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2012160168A Vacuum pressure control apparatus 有权
标题翻译：真空压力控制装置
公开(公告)号：JP2012160168A
公开(公告)日：2012-08-23
申请号：JP2011274087
申请日：2011-12-15
申请人： Ckd Corp , Ckd株式会社
发明人： KONO TETSUJIRO , WATANABE MASAYUKI , MURAKUMO HIKARI
IPC分类号： G05D16/20
摘要： PROBLEM TO BE SOLVED: To provide a vacuum pressure control apparatus in which undershoot of pressure in a vacuum container is prevented without using a heater.SOLUTION: A vacuum pressure control apparatus 8 includes a pilot vacuum proportional open/close valve 18, a pressure sensor 17 and a controller 56. The vacuum proportional open/close valve 18 changes vacuum pressure in a vacuum container by changing an aperture on piping connecting the vacuum container and a vacuum pump and comprises a valve element including an O ring which is abutted with or separated from a valve seat and an air cylinder. The pressure sensor 17 measures the vacuum pressure in the vacuum container. The controller 56 changes an elastic deformation amount of the O ring on the basis of the pressure of the pressure sensor 17 and changes the amount of leakage from the O ring, thereby controlling the pressure in the vacuum container. In the vacuum pressure control apparatus 8, when the pressure in the vacuum container measured by the pressure sensor 17 becomes a fixed or more pressure drop rate, inner pressure of the air cylinder is exhausted.
摘要翻译：要解决的问题：提供一种在不使用加热器的情况下防止真空容器中的压力下冲的真空压力控制装置。解决方案：真空压力控制装置8包括先导式真空比例开关阀18，压力传感器17和控制器56.真空比例开关阀18通过改变真空容器的孔径来改变真空容器中的真空压力在连接真空容器和真空泵的管道上，包括一个阀元件，该阀元件包括与阀座和气缸邻接或分离的O形环。压力传感器17测量真空容器中的真空压力。控制器56基于压力传感器17的压力改变O形环的弹性变形量，并且改变来自O形环的泄漏量，从而控制真空容器中的压力。在真空压力控制装置8中，当由压力传感器17测量的真空容器内的压力变为固定压力或更大的压降时，气缸的内部压力被排出。版权所有（C）2012，JPO＆INPIT

7. 发明专利

JPH1182763A PNEUMATIC DRIVING OPENING/CLOSING CONTROL VALVE AND CONTROLLER THEREOF 失效
公开(公告)号：JPH1182763A
公开(公告)日：1999-03-26
申请号：JP24134197
申请日：1997-09-05
申请人： CKD CORP
发明人： KAGOHASHI HIROSHI , MURAKUMO HIKARI , SUGATA KAZUHIRO , TOMITA HIROSHI , SAKAKIBARA SHIYUUSUKE
IPC分类号： F16K7/00 , F16K23/00 , F16K31/122
摘要： PROBLEM TO BE SOLVED: To enhance operation responsiveness of an air operating valve (AV) and a suck back valve (SV) based on an electropneumatic regulator. SOLUTION: An opening/closing control valve 5 is provided with a valve unit 15 and a regulator unit 16, integrated with each other. The valve unit 15 is provided with an AV 11 and a SV 12 arranged adjacently to each other. The AV 11 and the SV 12 are opened/closed so as to regulate the flow of resist liquid when an action of an air pressure is applied. The regulator unit 16 is provided with a first and a second electropneumatic regulators 13, 14 arranged adjacently to each other. Each of the electropneumatic regulators 13, 14 is electrically driven so as to proportionally regulate an operation pressure working on each of the AV 11 and the SV 12. The valve unit 15 includes a first short passage 46 to apply an operation pressure from the first electropneumatic regulator 13 to the AV 11 in a short distance, and a second short passage 69, to apply an operation pressure from the second electropneumatic regulator 14 to the SV 12 in a short distance.

8. 发明专利

JPH10303153A ELECTRONIC CONTROL REGULATOR FOR SEMICONDUCTOR DEVICE 失效
公开(公告)号：JPH10303153A
公开(公告)日：1998-11-13
申请号：JP10549497
申请日：1997-04-23
申请人： CKD CORP
发明人： KAGOHASHI HIROSHI , OSUGI SHIGERU , MURAKUMO HIKARI
IPC分类号： F16K24/04 , F16K31/126 , G05D16/20 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide an electronic control regulator for fluid having high responsiveness to control signals. SOLUTION: In an electronic control regulator, a diaphragm in an air-pilot regulator main valve 15 returns, the valve 15 is closed, and the supply of a pressurized nitrogen gas to a downstream-side flow passage 21 is stopped when the operating air pressure is discharged from an operation pressure control section 17. The pressurized nitrogen gas left in the passage 21 is immediately discharged from the orifice of a bleed port 24 and the responsiveness of the regulator 1 to a pressure drop instruction signal is improved.

9. 发明专利

JP2003241841A VACUUM PRESSURE CONTROL SYSTEM AND CONTROLLER THEREFOR 审中-公开
公开(公告)号：JP2003241841A
公开(公告)日：2003-08-29
申请号：JP2002042838
申请日：2002-02-20
申请人： CKD CORP
发明人： TOYODA TETSUYA , MURAKUMO HIKARI
IPC分类号： F16K31/122 , C23C16/44 , G05D16/20
摘要： PROBLEM TO BE SOLVED: To provide a vacuum pressure control system and a controller capable of bringing a vacuum pressure (a present pressure value) in a vacuum chamber into a target vacuum pressure (a target value) by controlling the vacuum pressure through the use of a vacuum proportional valve without regard to an opening level of an vacuum proportional open/close valve, after changing substantially the vacuum value (the present value) in the vacuum chamber close to the target vacuum pressure value (the target value) through the use of a first electromagnetic valve and a second electromagnetic valve. SOLUTION: If an absolute value of a control deviation between the present pressure value and the target value in the vacuum chamber is larger than the value s (Yes, in a Step 11, or Yes, in a Step 44), an air pressure cylinder of the open/close valve is connected to an exhaust line or a draught line via the first electromagnetic valve and the second electromagnetic valve. If the absolute value is not larger than the value s (No, in the Step 11 and the Step 14), the cylinder is connected to the lines via the vacuum corporation valve. COPYRIGHT: (C)2003,JPO

10. 发明专利

JP2000189782A EXHAUST SWITCHING DEVICE 失效
公开(公告)号：JP2000189782A
公开(公告)日：2000-07-11
申请号：JP37072098
申请日：1998-12-25
申请人： CKD CORP
发明人： MORI YOJI , KAGOHASHI HIROSHI , MATSUOKA YUJI , MURAKUMO HIKARI
IPC分类号： H01L21/302 , B01J3/02 , B01J4/00 , H01L21/205 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To make the entire structure for controlling the flow rate of nitrogen gas to be mixed with a reactive gas to a set value relatively inexpensive and small-sized. SOLUTION: The process gas discharged into an exhaust line 6 from the exhaust pump 3 of a filming device 2 is separated into the combustion supporting gas and combustible gas and sent into a combustion supporting gas scrubber 4 or a combustible gas scrubber 5 through two ranch lines 7 or 8, respectively, by the exhaust switching device 1. The pressure of the process gas flowing in the exhaust line 6 is detected by a first pressure sensor 9 furnished to the line 6, the process gas is allowed to flow or interrupted by the stop valves 10 and 11 arranged separately to the branch lines 7 and 8. A nitrogen purge line 13 extending from a nitrogen tank 12 is connected to the second branch line 8 connected to the combustible gas scrubber 5. The pressure of the nitrogen gas flowing in the nitrogen purge line 13 is detected by a second pressure sensor 14 disposed on the line 13. The concn. of the combustible gas to be sent into the combustible gas scrubber 5 is monitored on the basis of the detection results of the sensors 9 and 14.

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