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1. 发明专利

JP2011003920A Purification method of semiconductor polishing slurry 有权
标题翻译：半导体抛光浆的纯化方法
公开(公告)号：JP2011003920A
公开(公告)日：2011-01-06
申请号：JP2010186678
申请日：2010-08-23
申请人： Chubu Kiresuto Kk , Kiresuto Kk , Maruzen Chemicals Co Ltd , Nomura Micro Sci Co Ltd , キレスト株式会社 , 中部キレスト株式会社 , 丸善薬品産業株式会社 , 野村マイクロ・サイエンス株式会社
发明人： ABE TSUGI , NANBU NOBUYOSHI , ITO OSAMU , OGITSU MASAAKI , INOMATA KAZUO
IPC分类号： H01L21/304 , B01J45/00 , B01J47/04 , B01J47/10 , B01J47/12 , B01J47/14 , B24B37/00 , B24B57/00 , B24B57/02 , C02F11/00 , C23F1/46
CPC分类号： B24B37/00 , B01J45/00 , B01J47/127 , B24B57/02 , C23F1/46
摘要： PROBLEM TO BE SOLVED: To restrain a pH change of a polishing slurry after purification against the pH of the polishing slurry before purification.SOLUTION: When the polishing slurry to be purified is acidic, an acidic end group of a functional group having a metal chelate forming ability in a chelate forming fiber is an acidic type (H-type) to perform a liquid-passing treatment. When the polishing slurry to be purified is alkaline, an acidic end group of a functional group having a metal chelate forming performance in a chelate forming fiber is an alkali metal salt or an ammonium salt to perform a liquid-passing treatment.
摘要翻译：要解决的问题：在纯化之前抑制研磨浆料的pH变化与纯化前的研磨浆料的pH值相对应。解决方案：当待纯化的抛光浆料为酸性时，具有金属螯合物的官能团的酸性端基螯合形成纤维中的形成能力是进行液体处理的酸性型（H型）。当待纯化的研磨浆料为碱性时，在形成螯合物的纤维中形成金属螯合物的官能团的酸性端基是碱金属盐或铵盐，以进行液体通过处理。

2. 发明专利

JP2011231163A Filter for liquid filtration for trapping trace metal 有权
标题翻译：用于追踪金属的液体过滤器过滤器
公开(公告)号：JP2011231163A
公开(公告)日：2011-11-17
申请号：JP2010100637
申请日：2010-04-26
申请人： Japan Atomic Energy Agency , Kurashiki Seni Kako Kk , Nomura Micro Sci Co Ltd , 倉敷繊維加工株式会社 , 独立行政法人日本原子力研究開発機構 , 野村マイクロ・サイエンス株式会社
发明人： TAMADA MASAO , SEKO NORIAKI , UEKI YUJI , TAKEDA SHUNEI , NAKANO MASANORI , KAWANO SHINICHI , ABE TSUGI , MIYAGAWA KIYOKAZU
IPC分类号： C08F255/02 , B01D39/14 , B01D39/16 , B01J39/20 , B01J41/14 , B01J45/00 , B01J47/12 , C02F1/42 , C08F8/00 , C08F277/00 , D04H1/4291 , D04H3/16 , D06M14/28 , D06M15/263
CPC分类号： B01D39/1623 , B01D2239/0216 , B01D2239/0414 , B01D2239/0622 , B01D2239/1233 , B01D2239/1291
摘要： PROBLEM TO BE SOLVED: To provide a filter for liquid filtration, which highly accurately removes metal compounds or metal ions included in polishing solutions for semiconductor silicon wafers, alkali cleaning liquids, ultrapure water for cleaning, industrial inorganic chemicals, organic solvents, industrial waste liquids or the like, and which reduces metal elution of impurities from the filter itself.SOLUTION: The filter for liquid filtration comprises a melt-blown nonwoven fabric substrate comprising an ethylene-norbornene copolymer containing an ethylene unit and a norbornene unit, represented by formula [1]. The ethylene-norbornene copolymer has a glass transition temperature (Tg) of from 80 to 180°C and a melt volume rate (MVR) (according to ISO 1133, under measuring conditions of 260°C and 2.16 kg load) of 30 cm/10 minutes or more, and wherein the melt-blown nonwoven fabric substrate comprises fibers having an average fiber diameter ranging from 1 to 30 μm. In the above formula, an ethylene unit (X) and a norbornene unit (Y) are included each by 1 to 99 mol.%.
摘要翻译：要解决的问题：提供一种用于液体过滤的过滤器，其高度精确地除去用于半导体硅晶片的抛光溶液中包含的金属化合物或金属离子，碱性清洗液，用于清洁的超纯水，工业无机化学品，有机溶剂，工业废液等，从而减少过滤器本身杂质的金属洗脱。解决方案：用于液体过滤的过滤器包括由式[1]表示的包含含有乙烯单元和降冰片烯单元的乙烯 - 降冰片烯共聚物的熔喷非织造织物基材。乙烯 - 降冰片烯共聚物的玻璃化转变温度（Tg）为80〜180℃，熔融体积率（MVR）（根据ISO 1133，在260℃，2.16kg负荷的测定条件下）为30cm 3， 10分钟以上，其中熔喷非织造织物基材包含平均纤维直径为1至30μm的纤维。在上式中，乙烯单元（X）和降冰片烯单元（Y）的含量分别为1〜99摩尔％。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2008098369A Polishing method 审中-公开
标题翻译：抛光方法
公开(公告)号：JP2008098369A
公开(公告)日：2008-04-24
申请号：JP2006277909
申请日：2006-10-11
申请人： D-Process:Kk , Nomura Micro Sci Co Ltd , 株式会社D−process , 野村マイクロ・サイエンス株式会社
发明人： KOJIMA SENRI , FUNAKOSHI TAKAO , ABE TSUGI
IPC分类号： H01L21/304 , B24B37/00
摘要： PROBLEM TO BE SOLVED: To provide a polishing method capable of suppressing the generation of a scratch. SOLUTION: A polishing method comprises the step of making a metal film formed on a semiconductor substrate be in contact with a polishing pad adhered onto a rotation table, the step of polishing the metal film which is in contact with the polishing pad by rotating the rotation table, supplying polishing slurry onto the polishing pad, the step of collecting the used polishing slurry containing a metal component used in the metal film polishing step, the step of measuring the zeta potential of the collected used polishing slurry, and the step of controlling the amount of the polishing slurry to be supplied onto the polishing pad so that a measurement value obtained in the zeta potential measuring step is within a predetermined range. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够抑制划痕产生的抛光方法。解决方案：抛光方法包括使形成在半导体衬底上的金属膜与附着在旋转台上的抛光垫接触的步骤，通过以下步骤抛光与抛光垫接触的金属膜：旋转旋转台，将抛光浆料供给到抛光垫上，收集含有金属膜研磨工序中使用的金属成分的废抛光浆料的步骤，测定所收集的二次抛光浆料的ζ电位的步骤，控制要供给到抛光垫上的抛光浆料的量，使得在ζ电位测量步骤中获得的测量值在预定范围内。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2014226642A 超純水製造装置及び超純水製造方法有权
标题翻译：超声波水生产设备和超声波水生产方法
公开(公告)号：JP2014226642A
公开(公告)日：2014-12-08
申请号：JP2013110311
申请日：2013-05-24
申请人：野村マイクロ・サイエンス株式会社 , Nomura Micro Sci Co Ltd
发明人： ABE TSUGI , YONEHARA TAKAHIRO , AMAYA TORU
IPC分类号： B01D61/58 , B01D61/48 , C02F1/32 , C02F1/44 , C02F1/469 , C02F1/58 , C02F9/00
摘要：【課題】原水及び使用済み超純水を被処理水として、高純度の純水を効率よく製造することのできる超純水製造装置及び超純水製造方法を提供すること。【解決手段】前処理システムと、一次純水システムと、回収処理システムとを備える超純水製造装置及びこれを用いた超純水製造方法であって、前記回収処理システムは逆浸透膜装置と電気脱イオン装置とをこの順に備え、使用済み超純水を前記一次純水システムに返送し、前記一次純水システムは逆浸透膜装置と電気脱イオン装置とをこの順に備える超純水製造地及び方法。【選択図】図1
摘要翻译：要解决的问题：提供一种超纯水生产设备和超纯水生产方法，其使得能够使用原水和使用的超纯水作为待处理水有效地生产高纯度纯水。解决方案：提供：超纯水生产设备，包括预处理系统，初级纯水系统和回收处理系统; 以及使用该设备的超纯水生产方法。回收处理系统依次包括反渗透膜装置和电去离子装置，并将所使用的超纯水返回到初级纯水系统，并且初级纯水系统按顺序包括反渗透膜装置和电去离子装置。

5. 发明专利

JP2014091095A Pure water manufacturing system 有权
标题翻译：纯水制造系统
公开(公告)号：JP2014091095A
公开(公告)日：2014-05-19
申请号：JP2012243966
申请日：2012-11-05
申请人： Nomura Micro Sci Co Ltd , 野村マイクロ・サイエンス株式会社
发明人： YONEHARA TAKAHIRO , ABE TSUGI
IPC分类号： C02F1/20 , B01D53/04 , B01D61/00 , C02F1/32 , C02F1/42 , C02F1/44 , C02F9/00
摘要： PROBLEM TO BE SOLVED: To provide a pure water manufacturing system capable of preventing commingling of unexpected volatile organic material with a relatively simple device configuration.SOLUTION: The pure water manufacturing system includes: a decarbonation device which supplies water to be processed together with blow air for decarbonation; and volatile organic material removal means which removes volatile organic material in blow air to be supplied to the decarbonation device.
摘要翻译：要解决的问题：提供一种能够以相对简单的装置结构防止意外的挥发性有机材料的混合的纯水制造系统。解决方案：纯水制造系统包括：将脱水装置与吹气一起供应脱碳以及挥发性有机材料去除装置，其去除要供给到脱碳装置的吹入空气中的挥发性有机材料。

6. 发明专利

JP2011240225A Method and apparatus for producing ultrapure water for immersion exposure 有权
标题翻译：用于生产渗透水的浸渍曝光的方法和装置
公开(公告)号：JP2011240225A
公开(公告)日：2011-12-01
申请号：JP2010112678
申请日：2010-05-14
申请人： Nomura Micro Sci Co Ltd , 野村マイクロ・サイエンス株式会社
发明人： ABE TSUGI , YAMAKOSHI YUJI
IPC分类号： C02F1/32 , B01D61/00 , B01D61/18 , C02F1/20 , C02F1/42 , C02F1/44 , C02F9/00 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a method and apparatus for producing ultrapure water for immersion exposure which can minimize operation stop due to exchange of an expendable part and miniaturize the apparatus configuration.SOLUTION: In order to produce ultrapure water for immersion exposure which is supplied to an exposure light passing space between the lowermost surface and a resist of a projection optical system in the immersion exposure apparatus, a plurality of ultraviolet irradiation devices are disposed in series along a passage, an ion exchanger is disposed on the downstream side of the ultraviolet irradiation devices, primary ultrapure water having TOC of 10 ppb or less is supplied, and one of the ultraviolet irradiation devices is used for continuously producing the ultrapure water for immersion exposure and the performance of the active ultraviolet irradiation device is monitored. When the performance of the active ultraviolet irradiation device becomes a predetermined level or less, switching to another ultraviolet irradiation device is performed to continue the continuous operation.
摘要翻译：要解决的问题：提供一种用于生产用于浸没式曝光的超纯水的方法和装置，其可以最小化由于消耗部件的更换而使操作停止并使装置构造小型化。解决方案：为了在浸没曝光设备中产生供给到投影光学系统的最下表面和抗蚀剂之间的曝光光通过空间的浸没曝光用超纯水，将多个紫外线照射装置设置在沿紫外线照射装置的下游侧配置有离子交换体，供给TOC为10ppb以下的初级超纯水，其中一个紫外线照射装置用于连续制造浸渍用超纯水监测活性紫外线照射装置的曝光和性能。当活性紫外线照射装置的性能达到预定水平或更低时，执行切换到另一紫外线照射装置以继续连续操作。版权所有（C）2012，JPO＆INPIT

7. 发明专利

JP2010001181A Processing method and regenerating method of silicon for electronic component 有权
标题翻译：电子元件硅的加工方法和再生方法
公开(公告)号：JP2010001181A
公开(公告)日：2010-01-07
申请号：JP2008160956
申请日：2008-06-19
申请人： Nomura Micro Sci Co Ltd , 野村マイクロ・サイエンス株式会社
发明人： YONEHARA TAKAHIRO , IIYAMA MASAMITSU , ABE TSUGI
IPC分类号： C01B33/02
摘要： PROBLEM TO BE SOLVED: To provide the processing method and the regenerating method of silicon for the electronic industry, in which chemical reactions of impurity metals and carbon with silicon are inhibited in a silicon processing step and silicon recovering and regenerating steps to reduce contamination of silicon by the metals and carbon. SOLUTION: The processing method of silicon for electronic components includes processing a silicon ingot or a silicon wafer, and the regenerating method of silicon includes recovering silicon from silicon sludge containing processing waste produced by the processing and regenerating it as silicon for the electronic industry. In the methods, a gas which controls oxidation-reduction potential is added to a silicon surface to be processed or to a solution containing silicon shavings. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供在硅加工步骤中抑制杂质金属和碳与硅的化学反应的电子工业的硅的加工方法和再生方法以及硅回收和再生步骤以减少由金属和碳污染硅。解决方案：用于电子部件的硅的处理方法包括处理硅锭或硅晶片，并且硅的再生方法包括从含有由处理产生的处理废料的硅污泥回收硅，并将其再生成用于电子的硅行业。在该方法中，将控制氧化还原电位的气体添加到待加工的硅表面或加入含有硅屑的溶液中。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2005262061A Recycle method of used slurry for polishing semiconductor 有权
标题翻译：用于抛光半导体的回收利用方法
公开(公告)号：JP2005262061A
公开(公告)日：2005-09-29
申请号：JP2004077239
申请日：2004-03-17
申请人： Nomura Micro Sci Co Ltd , 野村マイクロ・サイエンス株式会社
发明人： KOJIMA SENRI , ABE TSUGI , HORI TORU , MAEDA YUSUKE , ISHII KEIICHIRO
IPC分类号： B24B57/02 , B01D61/14 , C02F11/00 , C02F11/12
摘要： PROBLEM TO BE SOLVED: To enable the simplification of recycle operation of used slurry for polishing a semiconductor, and control of deterioration of chelate fibers used for removing metal ions.
SOLUTION: Before the used slurry for polishing a semiconductor is brought in contact with the chelate fiber, decomposition operation of an oxidizing agent, such as hydrogen peroxide, contained in the used slurry is carried out. The decomposition operation of the oxidizing agent is carried out by, for example, an ultraviolet irradiation of the slurry or a contact of the slurry with an oxidizing agent decomposition catalyst.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了简化用于抛光半导体的二手浆料的再循环操作，以及控制用于除去金属离子的螯合纤维的劣化。解决方案：在将用于抛光半导体的二氧化硅浆料与螯合纤维接触之前，进行所用浆料中所含的氧化剂如过氧化氢的分解操作。氧化剂的分解操作通过例如浆料的紫外线照射或浆料与氧化剂分解催化剂的接触来进行。版权所有（C）2005，JPO＆NCIPI

9. 发明专利

JP2014100691A Pure water manufacturing method and pure water manufacturing system 有权
标题翻译：纯水制造方法和纯水制造系统
公开(公告)号：JP2014100691A
公开(公告)日：2014-06-05
申请号：JP2012255683
申请日：2012-11-21
申请人： Nomura Micro Sci Co Ltd , 野村マイクロ・サイエンス株式会社
发明人： YONEHARA TAKAHIRO , ABE TSUGI , YONEKAWA NAOMICHI , YAMAMOTO KATSUMI
IPC分类号： C02F1/20 , B01D61/04 , C02F1/32 , C02F1/42 , C02F1/44 , C02F9/00
摘要： PROBLEM TO BE SOLVED: To provide a pure water manufacturing method and a pure water manufacturing system each capable of preventing inadvertent contaminations by volatile organic matter without virtually changing an existing apparatus constitution.SOLUTION: The provided pure water manufacturing method is for treating pretreated water obtained by treating raw water within a pretreatment system within a primary pure water system equipped with a decarbonator and then treating the pretreated water within a secondary pure water system. On an occasion for performing a decarbonating treatment within the decarbonator by feeding therein treatment target water and by feeding therein blown air via a blow tube so as to induce the contact thereof with the treatment target water, the feeding quantity of the blown air is adjusted depending on the quantity of volatile organic matter within the blown air.
摘要翻译：要解决的问题：提供纯水制造方法和纯水制造系统，每个能够防止挥发性有机物的无意污染，而不会实际改变现有的装置结构。解决方案：提供的纯水制造方法是用于处理获得的预处理水通过在装有脱碳机的初级纯水系统内处理预处理系统内的原水，然后在二次纯水系统内处理预处理的水。在脱脂机中进行脱碳处理的场合，通过向其中供给处理对象水，并且通过吹塑管供给吹入空气，以引起与处理对象水的接触，吹送空气的供给量根据关于吹气中挥发性有机物的数量。

10. 发明专利

JP2010167551A Method for regenerating used slurry 审中-公开
标题翻译：重新使用浆料的方法
公开(公告)号：JP2010167551A
公开(公告)日：2010-08-05
申请号：JP2009147163
申请日：2009-06-22
申请人： Nomura Micro Sci Co Ltd , 野村マイクロ・サイエンス株式会社
发明人： ABE TSUGI , IIYAMA MASAMITSU
IPC分类号： B24B57/02 , H01L21/304
CPC分类号： B01D61/025 , B01D61/04 , B01D2311/04 , B01D2311/08 , B01D2311/12 , B01D2311/2649 , B01D2311/2623
摘要： PROBLEM TO BE SOLVED: To recycle a used polishing slurry having cleaning water mixed therein and solve the problem of waste fluid disposal.
SOLUTION: The method for regenerating the used slurry includes a step of selectively separating and removing a polishing slurry component consisting of abrasives, a solvent, and an additive from a foreign substance component such as a liquid, a polishing object, a pad, and a dresser, which are mixed by the polishing operation and not intrinsically contained in the polishing slurry.
COPYRIGHT: (C)2010,JPO&INPIT

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