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    • 9. 发明公开
    • Method of controlling exposure of process camera using sub-exposure and apparatus therefor
    • 使用副曝光控制过程相机曝光的方法及其设备
    • EP0440209A3
    • 1992-07-29
    • EP91101226.8
    • 1991-01-30
    • Dainippon Screen Mfg. Co., Ltd.
    • Kagosaki,Hiroshi, Dainippon Screen
    • G03B27/66G03B7/093G03B7/16
    • G03B27/72
    • Disclosed are a method of and an apparatus for controlling exposure in halftone photography by calculating a main exposure amount (T M ), a bump exposure amount (T H ) and a flash exposure amount (T F ) based on basic data peculiar to the combination of a screen (36) and a photosensitive material (37) original data depending on an original (35) in a process camera. The method includes the steps of preparing the basic data and the original data, obtaining a dot image by exposing the original (35) to a photosensitive material (37) through a screen (36) based on the prepared basic data and original data, defining a resultant dot percentage correction value by obtaining differences between dot percentages of the portions of the obtained dot image which portions corresponding to a highlight region and a shadow region of the original, respectively, and the respective desired values, and correcting at least one of the main exposure amount (T M ), the bump exposure amount (T H ) and the flash exposure amount (T F ) based on the resultant dot percentage correction value and the basic data. The difference between the dot percentage of the dot image obtained as a result of the exposure and a desired value can be used as a correction value, and therefore, a dot image having a desired dot percentage can be obtained without requiring a difficult procedure of evaluating a correction result.