会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明公开
    • Method of measuring front and back surfaces of target object
    • Verfahren zum Messen der Vorder- undRückseiteeines Objekts
    • EP2090861A1
    • 2009-08-19
    • EP09152885.1
    • 2009-02-16
    • Mitutoyo Corporation
    • Nemoto, KentaroYamagata, Masaoki
    • G01B5/008G01B5/20G01B5/252G01M11/02
    • G01B5/20G01B5/008G01B5/252G01M11/025
    • A method of measuring a front surface profile and a back surface profile of a target object (71) includes: mounting the target object (71) in such a posture that a first measuring surface (front surface) (73) is measurable by a probe (8); first measuring a contour of the target object (71); measuring the first measuring surface (73) of the target object (71); reversing the target object (71); second measuring the contour of the target object (71) with the reversed posture of the target object (71) being maintained; obtaining a measurement position of a second measuring surface (74) by comparison of contour data obtained through the first and second measuring of the contour, the measurement position of the second measuring surface (74) corresponding to a measurement position of the first measuring surface (73) at which the measuring of the first measuring surface (73) is conducted; and measuring a profile of the second measuring surface (74) along the obtained measurement position of the second measuring surface (74).
    • 测量目标物体(71)的前表面轮廓和后表面轮廓的方法包括:以使第一测量表面(前表面)(73)可被探测器测量的姿态安装目标物体(71) (8); 首先测量目标对象(71)的轮廓; 测量目标物体(71)的第一测量表面(73); 反转目标物体(71); 第二测量目标对象(71)的反转姿态被维持的目标对象(71)的轮廓; 通过比较通过轮廓的第一和第二测量获得的轮廓数据,与第一测量表面的测量位置相对应的第二测量表面(74)的测量位置,获得第二测量表面(74)的测量位置 73),进行第一测量面(73)的测量; 以及沿所获得的所述第二测量表面(74)的测量位置测量所述第二测量表面(74)的轮廓。