专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

EP2261740B1 Lithographic apparatus 有权
标题翻译：石版画家Apparat
公开(公告)号：EP2261740B1
公开(公告)日：2014-07-09
申请号：EP10179586.2
申请日：2004-08-17
申请人： ASML Netherlands BV
发明人： Loopstra, Erik , Baselmans, Johannes , Dierichs, Marcel , Jasper, Johannes , Meijer, Hendricus , Mickan, Uwe , MulkensS, Johannes , Lipson, Matthew
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/7015 , G03F7/70341 , Y10S430/162

2. 发明授权

EP0519278B2 Use of a sheet for protecting the surface of an automobile paint film 失效
标题翻译：使用膜用于保护汽车漆膜的表面
公开(公告)号：EP0519278B2
公开(公告)日：2010-02-17
申请号：EP92109485.0
申请日：1992-06-04
申请人： NITTO DENKO CORPORATION , KANSAI PAINT CO., LTD.
发明人： Matsui, Komaharu, c/o Kansai Paint Co., Ltd. , Wakimoto, Mitrso, c/o Kansai Paint Co., Ltd. , Eda, Takeshi, c/o Kansai Paint Co., Ltd. , Tatsuno, Tadayoshi, c/o Kansai Paint Co., Ltd. , Kuwabara, Yutaka, c/o Nitto Denko Corporation , Shibata, Kenichi, c/o Nitto Denko Corporation
IPC分类号： C09J7/02 , C09J123/02 , C09J153/00
CPC分类号： C09J153/025 , B32B25/08 , B32B27/32 , C08L83/00 , C08L2205/02 , C08L2666/02 , C08L2666/04 , C09J7/22 , C09J7/243 , C09J7/38 , C09J7/383 , C09J7/387 , C09J123/22 , C09J153/00 , C09J2201/122 , C09J2201/606 , C09J2203/306 , Y10S156/927 , Y10S430/162 , Y10T156/1168 , Y10T428/1471 , Y10T428/2495 , Y10T428/2861 , Y10T428/2878 , Y10T428/2891
摘要： An automobile paint film-protective sheet comprising a substrate having formed on one side thereof a rubber-based pressure-sensitive adhesive having a dynamic modulus of from 2x10 to 7x10 dyne/cm at 60 DEG C.

3. 发明授权

EP1690134B1 HIGHLY LUBRICATED IMAGING ELEMENT WITH ELASTOMERIC MATTE 有权
标题翻译： STRONG润滑成像元件与弹性消光剂
公开(公告)号：EP1690134B1
公开(公告)日：2009-12-23
申请号：EP04795923.4
申请日：2004-10-20
申请人： Eastman Kodak Company
发明人： HALLER, Christopher, James , ANDERSON, Charles, Chester , ARMOUR, Eugene, Arthur , HENNESSEY, William, Joseph , ROLLINSON, Peter, David
IPC分类号： G03C1/95 , G03C1/32
CPC分类号： G03C1/95 , G03C1/32 , G03C1/7614 , G03C1/85 , G03C7/30 , G03C2001/7628 , Y10S430/151 , Y10S430/162
摘要： A photographic imaging element is disclosed comprising a support having on a front side thereof a silver halide imaging layer and an outermost protective overcoat layer comprising a film-forming binder, and on the backside thereof an outermost protective backcoat layer comprising a film-forming binder; the protective overcoat and backcoat layers each comprising a lubricant present in an amount of at least 5 mg/m 2 and permanent matting agent having a T g of at least 40° C. and an average particle size of from about 0.5 to about 3 micrometers in an amount of at least 1 mg/m 2 ; and at least one of the protective overcoat layer or the protective backcoat layer further comprising crosslinked elastomeric polymer matte particles, wherein the crosslinked elastomeric polymer matte particles have a T g of 20° C. or less, an average particle size of at least 90% of or greater than that of the permanent matting agent particles having a T g of at least 40° C. in the protective layer in which the crosslinked elastomeric matte is included, and are present in the protective overcoat layer or protective backcoat layer in an amount which is (i) at least 1 mg/m 2 and (ii) less than the total level of permanent matting agent particles having a T g of at least 40° C. in the protective overcoat and backcoat layers combined. Imaging elements comprising highly lubricated protective outermost layers in accordance with the invention advantageously provide increased scratch and wear resistance, while the presence of relatively low T g crosslinked elastomeric matte particles in combination with higher T g permanent matte particles has been found to increase the coefficient of friction of the layer in which they are included to provide good manufacturability of the imaging element while also maintaining wear and other desired film performance properties.

4. 发明授权

EP1422567B1 A process for forming a photosensitive element having a layer of particulate material and an apparatus for performing the process 有权
标题翻译：用于执行该方法用于制备其中设置有物质含有微粒层的光敏元件的方法和装置
公开(公告)号：EP1422567B1
公开(公告)日：2009-03-18
申请号：EP03256226.6
申请日：2003-10-02
申请人： E.I. DU PONT DE NEMOURS AND COMPANY
发明人： Fan, Roxy Ni , Hommes, William John
IPC分类号： G03F7/18
CPC分类号： G03F7/18 , B41C1/00 , B41C1/18 , G03F7/11 , G03F7/28 , Y10S430/136 , Y10S430/151 , Y10S430/162

5. 发明授权

EP1310379B1 THERMAL RECORDING MATERIAL AND METHOD FOR PRODUCTION THEREOF 有权
标题翻译：热敏记录材料及其方法
公开(公告)号：EP1310379B1
公开(公告)日：2008-06-25
申请号：EP01961334.8
申请日：2001-09-04
申请人： OJI PAPER CO., LTD.
发明人： ISHIDA, Koichi, c/o Amagasaki Center , WATANABE, Kazuo, c/o Amagasaki Center , TSUCHIDA, Hideki, c/o Amagasaki Center , ISU, Yutaka, c/o Amagasaki Center
IPC分类号： B41M5/30 , B41M5/40
CPC分类号： B41M5/44 , Y10S430/162
摘要： A thermal recording material (1) which has a supporting material, a thermal recording layer containing a leuco dye and a coloring agent, and a protecting layer containing a resin film, wherein the protecting layer is prepared by applying an aqueous coating fluid for a protecting layer comprising resin particles having a core/shell structure, followed by drying, the resin film formed from said resin particles having a core/shell structure accounts for 80 mass % or more of the total solid contents of the protecting layer, and exhibits a glossiness of the protecting layer (according to JIS P 8142) of 80 % or more; a thermal recording material (2) which further has an intermediate layer between the thermal recording layer and the protecting layer of said thermal recording material (1); a thermal recording material which further has an undercoating layer between the supporting material and the thermal recording layer of said thermal recording material (1) or (2); and methods for producing the above thermal recording materials.

6. 发明公开

EP1863869A1 THERMALLY DEVELOPABLE MATERIALS WITH AMORPHOUS SILICA 审中-公开
标题翻译：无定形二氧化硅热显像材料
公开(公告)号：EP1863869A1
公开(公告)日：2007-12-12
申请号：EP06737210.2
申请日：2006-03-03
申请人： Eastman Kodak Company
发明人： PHILIP, Darlene, Faye , LUDEMANN, Thomas, Jay , KOESTNER, Roland, John , LABELLE, Gary, Elzear
IPC分类号： C08K3/00 , G03C1/00 , G03C1/498
CPC分类号： G03C1/49872 , G03C1/04 , G03C1/4989 , G03C1/85 , G03C2001/7628 , Y10S430/162
摘要： Thermally developable materials including photothermographic and thermographic materials having an outermost backside layer that includes amorphous silica particles having a narrow particle size distribution. The narrower particle size distribution provides reduced haze and increased surface roughness that reduces blocking and machine feeding at comparable weight percent. The materials can also include conductive layers underneath the outermost backside layer.

7. 发明公开

EP1513381A3 Process for producing wiring circuit board 有权
标题翻译：一种用于生产印刷电路板的过程
公开(公告)号：EP1513381A3
公开(公告)日：2007-05-16
申请号：EP04021213.6
申请日：2004-09-07
申请人： NITTO DENKO CORPORATION
发明人： Naito, Toshiki Nitto Denko Corporation
IPC分类号： H05K3/28 , H05K3/00 , G03F7/11
CPC分类号： H05K3/0082 , H05K3/0023 , H05K3/28 , H05K2201/0108 , H05K2203/0191 , H05K2203/1545 , Y10S430/162 , Y10T156/1089 , Y10T156/1092 , Y10T156/1093 , Y10T156/1095 , Y10T156/1097 , Y10T156/1098
摘要： The invention provides a process for producing a wiring circuit board, which comprises the steps of: (A) forming a conductor layer (10b) of a predetermined pattern on an insulating layer (10a); (B) forming a photosensitive solder resist layer (SR) on the insulating layer (10a) and the patterned conductor layer (10b) formed on the insulating layer (10a); (C) disposing a transparent protective film (Fi) on the photosensitive solder resist layer (SR); and (D) exposing the photosensitive solder resist layer (SR) to a light through the transparent protective film (Fi).

8. 发明公开

EP1729178A1 Pattern formation method 有权
标题翻译：维尔法赫尔·赫斯特伦
公开(公告)号：EP1729178A1
公开(公告)日：2006-12-06
申请号：EP06006439.1
申请日：2006-03-28
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Endo, Masayuki Matsushita Electric Ind. , Sasago, Masaru Matsushita Electric Ind.
IPC分类号： G03F7/20 , G03F7/11
CPC分类号： G03F7/11 , G03F7/2041 , Y10S430/162
摘要： In a pattern formation method, a resist film is formed on a substrate, an alkali-soluble first barrier film is formed on the resist film and an alkali-insoluble second barrier film is formed on the first barrier film. Subsequently, with a liquid provided on the second barrier film, pattern exposure is performed by selectively irradiating the resist film with exposing light through the second barrier film and the first barrier film. Then, after removing the second barrier film, the resist film having been subjected to the pattern exposure is developed, so as to remove the first barrier film and form a resist pattern made of the resist film.
摘要翻译：在图案形成方法中，在基板上形成抗蚀剂膜，在抗蚀剂膜上形成碱溶性第一阻挡膜，在第一阻挡膜上形成碱不溶性第二阻挡膜。随后，通过设置在第二阻挡膜上的液体，通过选择性地照射抗蚀剂膜，通过第二阻挡膜和第一阻挡膜曝光光来进行图案曝光。然后，在除去第二阻挡膜之后，对已经进行图案曝光的抗蚀剂膜进行显影，以除去第一阻挡膜并形成由抗蚀剂膜制成的抗蚀剂图案。

9. 发明公开

EP1690134A1 HIGHLY LUBRICATED IMAGING ELEMENT WITH ELASTOMERIC MATTE 有权
标题翻译： STRONG润滑成像元件与弹性消光剂
公开(公告)号：EP1690134A1
公开(公告)日：2006-08-16
申请号：EP04795923.4
申请日：2004-10-20
申请人： EASTMAN KODAK COMPANY
发明人： HALLER, Christopher, James , ANDERSON, Charles, Chester , ARMOUR, Eugene, Arthur , HENNESSEY, William, Joseph , ROLLINSON, Peter, David
IPC分类号： G03C1/95 , G03C1/32
CPC分类号： G03C1/95 , G03C1/32 , G03C1/7614 , G03C1/85 , G03C7/30 , G03C2001/7628 , Y10S430/151 , Y10S430/162
摘要： A photographic imaging element is disclosed comprising a support having on a front side thereof a silver halide imaging layer and an outermost protective overcoat layer comprising a film-forming binder, and on the backside thereof an outermost protective backcoat layer comprising a film-forming binder; the protective overcoat and backcoat layers each comprising a lubricant present in an amount of at least 5 mg/m 2 and permanent matting agent having a T g of at least 40° C. and an average particle size of from about 0.5 to about 3 micrometers in an amount of at least 1 mg/m 2 ; and at least one of the protective overcoat layer or the protective backcoat layer further comprising crosslinked elastomeric polymer matte particles, wherein the crosslinked elastomeric polymer matte particles have a T g of 20° C. or less, an average particle size of at least 90% of or greater than that of the permanent matting agent particles having a T g of at least 40° C. in the protective layer in which the crosslinked elastomeric matte is included, and are present in the protective overcoat layer or protective backcoat layer in an amount which is (i) at least 1 mg/m 2 and (ii) less than the total level of permanent matting agent particles having a T g of at least 40° C. in the protective overcoat and backcoat layers combined. Imaging elements comprising highly lubricated protective outermost layers in accordance with the invention advantageously provide increased scratch and wear resistance, while the presence of relatively low T g crosslinked elastomeric matte particles in combination with higher T g permanent matte particles has been found to increase the coefficient of friction of the layer in which they are included to provide good manufacturability of the imaging element while also maintaining wear and other desired film performance properties.

10. 发明公开

EP1680710A1 THERMALLY DEVELOPABLE IMAGING MATERIALS WITH BARRIER LAYER 审中-公开
标题翻译：与阻挡层的热显影图像资料
公开(公告)号：EP1680710A1
公开(公告)日：2006-07-19
申请号：EP04796251.9
申请日：2004-10-25
申请人： EASTMAN KODAK COMPANY
发明人： SAKIZADEH, Kumars , ECKERT, Karissa Lynn , LA BELLE, Gary Elzear , WHITCOMB, David Robert
IPC分类号： G03C1/498
CPC分类号： G03C1/49872 , G03C1/04 , G03C1/46 , G03C1/498 , G03C1/49818 , G03C1/49845 , G03C1/49863 , G03C1/49881 , G03C5/164 , G03C2001/7635 , Y10S430/162
摘要： Thermographic and photothermographic materials comprise a barrier layer to provide physical protection and to prevent migration of diffusible imaging components and by-products resulting from high temperature imaging and/or development. The barrier layer comprises a scavenger that is a metal hydroxide or ester. This barrier layer is capable of retarding diffusion of mobile chemicals such as organic carboxylic acids, developers, and toners.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式