会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明公开
    • Surface acoustic wave device and method of manufacturing a surface acoustic wave device
    • SAW Bauelement und Herstellungsmethodefürein SAW Bauelement
    • EP1675261A1
    • 2006-06-28
    • EP05027864.7
    • 2005-12-20
    • SEIKO EPSON CORPORATION
    • Furuhata, Makoto, c/o Seiko Epson CorporationSato, Hisakatsu, c/o Seiko Epson Corporation
    • H03H9/02
    • H03H3/08H03H9/02866H03H9/02976
    • A surface acoustic wave device including at least an IC region and a surface acoustic wave element region in a semiconductor substrate (30) and formed as a single chip, including, in the IC region, a semiconductor element layer (40) having a semiconductor element (31) and an element insulating film (33) formed to cover the semiconductor element (31) and extending to the surface acoustic wave element region, a wiring layer (41) formed by stacking, on the semiconductor element layer (40), wiring for establishing connection with the semiconductor element and a wiring insulating film (36) extending to the surface acoustic wave element region and for insulating the wiring, and a piezoelectric thin film (38) formed above the wiring insulating film, and in the surface acoustic wave element region, a surface acoustic wave element (24) formed on the piezoelectric thin film and equipped with an IDT electrode (22) provided with a plurality of electrode fingers (21), and at least one layer of layer thickness adjusting films (32,35) having linear shapes and arranged in parallel to and with the same pitch (P) as the electrode fingers (21) of the IDT electrode (22), and formed above one of the semiconductor substrate (30), the element insulating film (33), and the wiring insulating film (36), and below an area in which the surface acoustic wave element is formed.
    • 一种在半导体衬底(30)中至少包括IC区域和表面声波元件区域的表面声波装置,其形成为在IC区域中具有半导体元件层(40)的单芯片, (31)和形成为覆盖半导体元件(31)并延伸到声表面波元件区域的元件绝缘膜(33),在半导体元件层(40)上堆叠形成的布线层(41) 用于与半导体元件建立连接以及延伸到表面声波元件区域并用于绝缘布线的布线绝缘膜(36),以及形成在布线绝缘膜上方的压电薄膜(38),以及在表面声波 元件区域,形成在压电薄膜上并配备有设置有多个电极指(21)的IDT电极(22)的表面声波元件(24),以及至少一层层 具有直线形状并且与IDT电极(22)的电极指(21)平行并与其相同的间距(P)布置的厚度调节膜(32,35),并且形成在半导体衬底(30)之上 ),元件绝缘膜(33)和布线绝缘膜(36),并且在形成表面声波元件的区域的下方。
    • 4. 发明公开
    • Method of manufacturing surface acoustic wave device and surface acoustic wave device
    • Herstellungsmethodefürein SAW Bauelement und SAW Bauelement
    • EP1672789A1
    • 2006-06-21
    • EP05027768.0
    • 2005-12-19
    • SEIKO EPSON CORPORATION
    • Yajima, Aritsugu Seiko Epson CorporationSato, Hisakatsu Seiko Epson CorporationKojima, Takashi Seiko Epson Corporation
    • H03H9/02
    • H03H9/02976H03H3/08H03H9/02866Y10T29/42
    • A method of manufacturing a surface acoustic wave device formed in one chip and including over a semiconductor substrate (30) at least an IC region and a surface acoustic wave element region that are horizontally disposed, the method including: forming in the IC region over the semiconductor substrate a semiconductor element layer (45) that includes a semiconductor element (31) and an insulation layer (33) covering the semiconductor element and being deposited also in the surface acoustic wave element region; forming over the semiconductor element layer a wire layer (46) that includes a plurality of wires coupled to the semiconductor element and a wire insulating film (37) deposited over the plurality of wires to provide insulation among the wires, the wire insulating film (37) being deposited also over the insulation layer (33) in the surface acoustic wave element region; forming an interlayer insulating film (38) having a flattened surface on the wire insulating film (37) in the IC region and the surface acoustic wave element region; forming a piezoelectric thin film (39) on the interlayer insulating film (38); and forming a surface acoustic wave element (40) on the piezoelectric thin film (39) in the surface acoustic wave element region.
    • 一种制造表面声波装置的方法,所述声表面波装置形成在一个芯片中,并且至少包括水平设置的IC区域和表面声波元件区域的半导体衬底(30)上,所述方法包括: 半导体衬底,包括半导体元件(31)的半导体元件层(45)和覆盖半导体元件并且还沉积在表面声波元件区域中的绝缘层(33); 在所述半导体元件层上形成包括耦合到所述半导体元件的多个导线的线层(46)和沉积在所述多根导线上以在所述导线之间提供绝缘的线绝缘膜(37),所述线绝缘膜(37 )沉积在表面声波元件区域中的绝缘层(33)上; 在所述IC区域中的所述导线绝缘膜(37)上形成具有平坦表面的层间绝缘膜(38)和所述表面声波元件区域; 在所述层间绝缘膜(38)上形成压电薄膜(39); 以及在表面声波元件区域中的压电薄膜(39)上形成表面声波元件(40)。